JPS6448470A - Inspection apparatus - Google Patents

Inspection apparatus

Info

Publication number
JPS6448470A
JPS6448470A JP62204018A JP20401887A JPS6448470A JP S6448470 A JPS6448470 A JP S6448470A JP 62204018 A JP62204018 A JP 62204018A JP 20401887 A JP20401887 A JP 20401887A JP S6448470 A JPS6448470 A JP S6448470A
Authority
JP
Japan
Prior art keywords
sample
detecting signal
signal
detecting
absorbing current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62204018A
Other languages
Japanese (ja)
Inventor
Kenji Takamoto
Yoshikazu Tanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62204018A priority Critical patent/JPS6448470A/en
Publication of JPS6448470A publication Critical patent/JPS6448470A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To enhance the accuracy of a visual inspection for a sample, by combining a first detecting signal with a second detecting signal which is obtained by detecting a sample absorbing current which is generated by capturing secondary electrons and reflected electrons together. CONSTITUTION:A sample 1 absorbs some of secondary electrons 3a and reflected electrons 3b together to generate a sample absorbing current ISC. A second detector 7 outputs a second detecting signal 7a based on the sample absorbing current ISC. A first detecting signal is combined with the signal which is inversions of the second detecting signal 7a to form a picture signal 10a. As a result, the bottom configurations of a hole pattern and the like with a high aspect ratio which are formed on the surface of the sample 1 can be clearly observed with a good contrast. Accordingly, the picture signal can be formed with the lack of the first detecting signal being compensated for thereby the accuracy of a visual inspection can be effectively enhanced without being affected by the surface configuration of the sample.
JP62204018A 1987-08-19 1987-08-19 Inspection apparatus Pending JPS6448470A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62204018A JPS6448470A (en) 1987-08-19 1987-08-19 Inspection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62204018A JPS6448470A (en) 1987-08-19 1987-08-19 Inspection apparatus

Publications (1)

Publication Number Publication Date
JPS6448470A true JPS6448470A (en) 1989-02-22

Family

ID=16483407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62204018A Pending JPS6448470A (en) 1987-08-19 1987-08-19 Inspection apparatus

Country Status (1)

Country Link
JP (1) JPS6448470A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5412210A (en) * 1990-10-12 1995-05-02 Hitachi, Ltd. Scanning electron microscope and method for production of semiconductor device by using the same
US5472917A (en) * 1990-08-29 1995-12-05 Paroc Oy Ab Raw material briquette for mineral wool production and process for its preparation and its use
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
EP0930638A1 (en) * 1990-10-12 1999-07-21 Hitachi, Ltd. Scanning electron microscope, production method for semiconductor device by using the same, image forming method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481075A (en) * 1977-11-24 1979-06-28 Cho Lsi Gijutsu Kenkyu Kumiai Method of detecting article image using electron beam
JPS58182504A (en) * 1982-04-19 1983-10-25 Mitsubishi Electric Corp Detection of mark by electron beam
JPS60239038A (en) * 1985-04-17 1985-11-27 Hitachi Ltd Semiconductor inspecting device
JPS6113638A (en) * 1984-06-28 1986-01-21 Matsushita Electronics Corp Inspection for surface configuration of semiconductor device
JPS61124810A (en) * 1984-11-22 1986-06-12 Hitachi Ltd Pattern shape inspecting apparatus
JPS61239107A (en) * 1985-04-17 1986-10-24 Hitachi Ltd Depth measurement method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5481075A (en) * 1977-11-24 1979-06-28 Cho Lsi Gijutsu Kenkyu Kumiai Method of detecting article image using electron beam
JPS58182504A (en) * 1982-04-19 1983-10-25 Mitsubishi Electric Corp Detection of mark by electron beam
JPS6113638A (en) * 1984-06-28 1986-01-21 Matsushita Electronics Corp Inspection for surface configuration of semiconductor device
JPS61124810A (en) * 1984-11-22 1986-06-12 Hitachi Ltd Pattern shape inspecting apparatus
JPS60239038A (en) * 1985-04-17 1985-11-27 Hitachi Ltd Semiconductor inspecting device
JPS61239107A (en) * 1985-04-17 1986-10-24 Hitachi Ltd Depth measurement method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5472917A (en) * 1990-08-29 1995-12-05 Paroc Oy Ab Raw material briquette for mineral wool production and process for its preparation and its use
US5412210A (en) * 1990-10-12 1995-05-02 Hitachi, Ltd. Scanning electron microscope and method for production of semiconductor device by using the same
US5594245A (en) * 1990-10-12 1997-01-14 Hitachi, Ltd. Scanning electron microscope and method for dimension measuring by using the same
EP0930638A1 (en) * 1990-10-12 1999-07-21 Hitachi, Ltd. Scanning electron microscope, production method for semiconductor device by using the same, image forming method

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