JPS6449252A - Manufacture of groove-shaped capacitor - Google Patents

Manufacture of groove-shaped capacitor

Info

Publication number
JPS6449252A
JPS6449252A JP62206742A JP20674287A JPS6449252A JP S6449252 A JPS6449252 A JP S6449252A JP 62206742 A JP62206742 A JP 62206742A JP 20674287 A JP20674287 A JP 20674287A JP S6449252 A JPS6449252 A JP S6449252A
Authority
JP
Japan
Prior art keywords
film
groove
silicon
capacitor
silicon oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62206742A
Other languages
Japanese (ja)
Inventor
Hirobumi Uchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP62206742A priority Critical patent/JPS6449252A/en
Publication of JPS6449252A publication Critical patent/JPS6449252A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/37—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor being at least partially in a trench in the substrate

Landscapes

  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain a capacitor of high reliability by a method wherein, when a silicon nitride film is to be removed, a diffusion layer is covered with a silicon oxide film in order to prevent an irregularity in the concentration of an impurity in the diffusion layer. CONSTITUTION:A first silicon oxide film 2, a silicon nitride film 3 and a second silicon oxide film 4 are laminated in succession on a silicon substrate 1; a laminated film is formed. An opening is made in the laminated film. The substrate 1 is etched through the opening; a groove 5 is formed. An impurity diffusion layer 6 is formed on an inner wall of the groove 5. The silicon film 4 is removed. A third silicon oxide film 7 is formed on the inner wall of the groove 5. The silicon film 3 is removed. The silicon film 7 is removed. The surface of the substrate 1 including the inner wall of the groove 5 is oxidized; a dielectric film 8 to be used for a capacitor is formed. A polysilicon film 9 to be used as one electrode for the capacitor is formed on the dielectric film 8. By this setup, the capacitor of high reliability can be obtained.
JP62206742A 1987-08-20 1987-08-20 Manufacture of groove-shaped capacitor Pending JPS6449252A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62206742A JPS6449252A (en) 1987-08-20 1987-08-20 Manufacture of groove-shaped capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62206742A JPS6449252A (en) 1987-08-20 1987-08-20 Manufacture of groove-shaped capacitor

Publications (1)

Publication Number Publication Date
JPS6449252A true JPS6449252A (en) 1989-02-23

Family

ID=16528348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62206742A Pending JPS6449252A (en) 1987-08-20 1987-08-20 Manufacture of groove-shaped capacitor

Country Status (1)

Country Link
JP (1) JPS6449252A (en)

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