JPS6454992U

JPS6454992U -

Info

Publication number: JPS6454992U
Application number: JP14713787U
Authority: JP
Priority date: 1987-09-24
Filing date: 1987-09-24
Publication date: 1989-04-05

Description

[Brief explanation of the drawing]

第１図は本考案に係る電子ビーム加工装置の模
式図、第２図は電子ビームの投射部と電子ビーム
用センサとの関係を示す説明図、第３図はセンサ
出力とテーブルの位置ずれとの関係を示す説明図
、第４図はＸ軸方向の位置ずれに対する調整過程
を示すフローチヤート、第５図はＸ軸方向の調整
過程におけるテーブルの移動軌跡を示す説明図、
第６図はＹ軸方向の調整過程におけるテーブルの
移動軸跡を示す説明図、第７図は従来装置の模式
図、第８図は同じくマーカの平面図、第９図はマ
ーカからの反射電子ビームとそのセンサとの関係
を示す部分拡大図、第１０図はテーブルに位置ず
れが無い場合と有る場合とのセンサ出力を示す波
形図である。１……電子ビームの投射部、２……テーブル、
３……被加工物、４……センサ、５……対物レン
ズ系、６……偏向レンズ系、７……パレツト、８
……位置補正処理部、９……位置調整部、なお、
図中、同一符号は同一、又は相当部分を示す。 Fig. 1 is a schematic diagram of the electron beam processing device according to the present invention, Fig. 2 is an explanatory diagram showing the relationship between the electron beam projection part and the electron beam sensor, and Fig. 3 is a diagram showing the relationship between the sensor output and the positional deviation of the table. 4 is a flowchart showing the adjustment process for positional deviation in the X-axis direction, and FIG. 5 is an explanatory diagram showing the movement locus of the table in the adjustment process in the X-axis direction.
Fig. 6 is an explanatory diagram showing the axis of movement of the table during the adjustment process in the Y-axis direction, Fig. 7 is a schematic diagram of a conventional device, Fig. 8 is a plan view of the marker, and Fig. 9 is a reflection of reflected electrons from the marker. FIG. 10, which is a partially enlarged view showing the relationship between the beam and its sensor, is a waveform diagram showing the sensor output when there is no positional deviation on the table and when there is positional deviation. 1... Electron beam projection unit, 2... Table,
3... Workpiece, 4... Sensor, 5... Objective lens system, 6... Deflection lens system, 7... Palette, 8
...Position correction processing section, 9...Position adjustment section,
In the figures, the same reference numerals indicate the same or corresponding parts.

Claims

[Scope of utility model registration request]

A projection unit for projecting an electron beam, a table on which a workpiece to be processed by the electron beam is placed and movable with respect to the projection unit, a sensor for detecting the electron beam fixed on the table, and a table. Using the output signal of the sensor at a predetermined position as a reference value, finding the difference between this and the detected value of the sensor,
An electron beam processing apparatus comprising: a position correction processing section that outputs a correction signal corresponding to this difference; and a position adjustment section that adjusts the position of the table based on the correction signal of the position correction processing section.