JPS6465257A - Method for controlling amount of evaporation in vacuum deposition device - Google Patents
Method for controlling amount of evaporation in vacuum deposition deviceInfo
- Publication number
- JPS6465257A JPS6465257A JP22196587A JP22196587A JPS6465257A JP S6465257 A JPS6465257 A JP S6465257A JP 22196587 A JP22196587 A JP 22196587A JP 22196587 A JP22196587 A JP 22196587A JP S6465257 A JPS6465257 A JP S6465257A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- amount
- heater power
- value
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008020 evaporation Effects 0.000 title abstract 10
- 238000001704 evaporation Methods 0.000 title abstract 10
- 238000000034 method Methods 0.000 title abstract 2
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 230000001276 controlling effect Effects 0.000 abstract 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 230000035939 shock Effects 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To reduce the disturbance of bath temp. and to carry out stable vacuum vapor deposition, by controlling the amount of evaporation by providing the prescribed set heat power or the maximum or minimum heater power according to the opening of a shutter carrying out the instantaneous control of the amount of evaporation. CONSTITUTION:The opening of a shutter provided on the outlet of an evaporation tank is regulated according to the target value of the amount of evaporation, by which the instantaneous control of the amount of evaporation is performed. Subsequently, the control of heat balance is carried out by means of heater power to control the amount of evaporation. In controlling the amount of evaporation in the above vacuum deposition device, the above shutter opening is detected, and then, the deviation value between this detected value and the set value is determined. When this deviation value is within the tolerance, a set heater power maintaining the target evaporation amount is provided. Further, when the above deviation value exceeds the tolerance, a heater power changed according to the heater power maintaining the target evaporation amount or the minimum heater power is provided. By this method, the disturbance of bath temp. is reduced and splashing from a metal-bath surface is prevented, and further, the breakage of a heater due to thermal shock can be avoided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22196587A JPS6465257A (en) | 1987-09-07 | 1987-09-07 | Method for controlling amount of evaporation in vacuum deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22196587A JPS6465257A (en) | 1987-09-07 | 1987-09-07 | Method for controlling amount of evaporation in vacuum deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6465257A true JPS6465257A (en) | 1989-03-10 |
Family
ID=16774938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22196587A Pending JPS6465257A (en) | 1987-09-07 | 1987-09-07 | Method for controlling amount of evaporation in vacuum deposition device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6465257A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60251273A (en) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | Method for controlling extent of evaporation in vacuum depositing apparatus |
| JPS648265A (en) * | 1987-06-30 | 1989-01-12 | Mitsubishi Heavy Ind Ltd | Method for controlling evaporation rate of vacuum deposition device |
-
1987
- 1987-09-07 JP JP22196587A patent/JPS6465257A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60251273A (en) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | Method for controlling extent of evaporation in vacuum depositing apparatus |
| JPS648265A (en) * | 1987-06-30 | 1989-01-12 | Mitsubishi Heavy Ind Ltd | Method for controlling evaporation rate of vacuum deposition device |
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