JPS6471128A - Method and device for applying resist and developing device for resist - Google Patents

Method and device for applying resist and developing device for resist

Info

Publication number
JPS6471128A
JPS6471128A JP63017558A JP1755888A JPS6471128A JP S6471128 A JPS6471128 A JP S6471128A JP 63017558 A JP63017558 A JP 63017558A JP 1755888 A JP1755888 A JP 1755888A JP S6471128 A JPS6471128 A JP S6471128A
Authority
JP
Japan
Prior art keywords
resist
substrate
applying
vibrated
susceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63017558A
Other languages
Japanese (ja)
Inventor
Takaharu Kawazu
Hideyuki Jinbo
Yoichi To
Yoshio Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP63017558A priority Critical patent/JPS6471128A/en
Publication of JPS6471128A publication Critical patent/JPS6471128A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a fine resist pattern by applying a resist while a substrate is vibrated minutely when the resist is applied onto the substrate. CONSTITUTION:An silicon substrate 11 is placed onto a support plate 15a for a susceptor 15, and the substrate 11 is fixed to the susceptor 15 by a suction mechanism. Power is applied to vibrating means 31, and the substrate 11 is vibrated finely. When the substrate 11 is vibrated finely, a positive type resist is dropped from a resist dropper 21. A fixed time passes, the substrate 11 is turned, and resist application through the so-called spin coating is conducted.
JP63017558A 1987-05-02 1988-01-28 Method and device for applying resist and developing device for resist Pending JPS6471128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63017558A JPS6471128A (en) 1987-05-02 1988-01-28 Method and device for applying resist and developing device for resist

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10919287 1987-05-02
JP63017558A JPS6471128A (en) 1987-05-02 1988-01-28 Method and device for applying resist and developing device for resist

Publications (1)

Publication Number Publication Date
JPS6471128A true JPS6471128A (en) 1989-03-16

Family

ID=26354103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63017558A Pending JPS6471128A (en) 1987-05-02 1988-01-28 Method and device for applying resist and developing device for resist

Country Status (1)

Country Link
JP (1) JPS6471128A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02152966A (en) * 1988-12-05 1990-06-12 Otsuka Pharmaceut Co Ltd 4-hydroxycarbostyril derivative
JPH03186851A (en) * 1989-12-18 1991-08-14 Fujitsu Ltd Developing method for photoresist
JPH06163388A (en) * 1992-11-18 1994-06-10 Sekisui Finechem Co Ltd Coating method of resist material
JP2007090236A (en) * 2005-09-28 2007-04-12 Matsushita Electric Ind Co Ltd Die, coating apparatus, optical disc manufacturing method, and optical disc
JP2008253937A (en) * 2007-04-06 2008-10-23 Disco Abrasive Syst Ltd Liquid resin coating method and coating apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02152966A (en) * 1988-12-05 1990-06-12 Otsuka Pharmaceut Co Ltd 4-hydroxycarbostyril derivative
JPH03186851A (en) * 1989-12-18 1991-08-14 Fujitsu Ltd Developing method for photoresist
JPH06163388A (en) * 1992-11-18 1994-06-10 Sekisui Finechem Co Ltd Coating method of resist material
JP2007090236A (en) * 2005-09-28 2007-04-12 Matsushita Electric Ind Co Ltd Die, coating apparatus, optical disc manufacturing method, and optical disc
JP2008253937A (en) * 2007-04-06 2008-10-23 Disco Abrasive Syst Ltd Liquid resin coating method and coating apparatus

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