JPS6473656A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS6473656A JPS6473656A JP62230081A JP23008187A JPS6473656A JP S6473656 A JPS6473656 A JP S6473656A JP 62230081 A JP62230081 A JP 62230081A JP 23008187 A JP23008187 A JP 23008187A JP S6473656 A JPS6473656 A JP S6473656A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- film
- patterned
- insulating film
- silicon nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/31—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
- H10B12/318—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor the storage electrode having multiple segments
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To make it possible to increase a capacitance value of a capacitor by providing the following: a first electrode; a dielectric film covering the surface and the under surface of the first electrode; a second electrode formed to face the surface; and the under surface of the first electrode. CONSTITUTION:A field oxide film 2 is formed on a silicon substrate 2; a window is opened in a part of a diffusion layer 1a formed on the silicon substrate 1; a polysilicon film 3 to be used as a gate electrode of a transfer gate transistor and an insulating film 4 are formed. Then, a polysilicon film is formed on the whole surface of the insulating film 4 and is patterned to form an electrode A 5. Then, a silicon nitride film is formed on the surface of the electrode A 5 and is patterned to form an insulating film A 6. In succession, a polysilicon film is formed on the surface of the insulating film A 6 and is patterned to form an electrode B 7. A silicon nitride film is formed so as to cover this electrode B 7 completely; while the silicon nitride film on the side of the electrode B 7 is left, the silicon nitride film on the surface of the electrode A 5 is removed completely. Lastly, a polysilicon film is formed on the surface of an insulating film B 8 and the electrode B 7, and is patterned to form an electrode C 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62230081A JPS6473656A (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62230081A JPS6473656A (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6473656A true JPS6473656A (en) | 1989-03-17 |
Family
ID=16902250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62230081A Pending JPS6473656A (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6473656A (en) |
-
1987
- 1987-09-14 JP JP62230081A patent/JPS6473656A/en active Pending
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