JPS6473719A - Stepper - Google Patents

Stepper

Info

Publication number
JPS6473719A
JPS6473719A JP62229585A JP22958587A JPS6473719A JP S6473719 A JPS6473719 A JP S6473719A JP 62229585 A JP62229585 A JP 62229585A JP 22958587 A JP22958587 A JP 22958587A JP S6473719 A JPS6473719 A JP S6473719A
Authority
JP
Japan
Prior art keywords
stage
wafer
reticle
stepper
target patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62229585A
Other languages
Japanese (ja)
Inventor
Hisamasa Tsuyuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62229585A priority Critical patent/JPS6473719A/en
Publication of JPS6473719A publication Critical patent/JPS6473719A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To measure the target patterns of respective chips for processing the data thereof by a method wherein multiple target patterns of respective chips in a wafer are exposed by an exposure system and a projection lens to process the results by a pattern detector and an X-Y stage with a locator. CONSTITUTION:The title stepper is provided with a projecting lens 2, pattern detectors 5 capable of detecting an in-shot circuit and an X-Y stage with a locator capable of locating the present position. A wafer 4 is mounted on the stage 1 of this stepper; a reticle 8 is made to be mounted on a reticle stage 3; and the wafer 4 is printed by an exposure source 6 through the lens 2. Then, a circuit diagram 9 capable of detecting respective X-Y coordinate values of exposed reticle 8 in the wafer 9 is detected by the detectors 5 to be inputted to a data processor 7. Furthermore, the located values of stage 1 are inputted to the processor 7 so that the target patterns of respective shots may be measured to process the data thereof.
JP62229585A 1987-09-16 1987-09-16 Stepper Pending JPS6473719A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62229585A JPS6473719A (en) 1987-09-16 1987-09-16 Stepper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62229585A JPS6473719A (en) 1987-09-16 1987-09-16 Stepper

Publications (1)

Publication Number Publication Date
JPS6473719A true JPS6473719A (en) 1989-03-20

Family

ID=16894489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62229585A Pending JPS6473719A (en) 1987-09-16 1987-09-16 Stepper

Country Status (1)

Country Link
JP (1) JPS6473719A (en)

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