JPS5743424A - Electron beam exposure system - Google Patents

Electron beam exposure system

Info

Publication number
JPS5743424A
JPS5743424A JP55119343A JP11934380A JPS5743424A JP S5743424 A JPS5743424 A JP S5743424A JP 55119343 A JP55119343 A JP 55119343A JP 11934380 A JP11934380 A JP 11934380A JP S5743424 A JPS5743424 A JP S5743424A
Authority
JP
Japan
Prior art keywords
stages
electron beam
beam exposure
exposure system
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55119343A
Other languages
Japanese (ja)
Inventor
Toshihiko Osada
Takayuki Miyazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55119343A priority Critical patent/JPS5743424A/en
Publication of JPS5743424A publication Critical patent/JPS5743424A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten the exposure period of an electron beam exposure system by individually controlling the stages of a deflection correction arithmetic circuit with clock signal and performing in parallel an arithmetic process for the different deflecting position assignment data in the respective stages, thereby processing the correction calculation in a pipeline process. CONSTITUTION:Delay circuits 11, 12, 13, 14 delay clock signals applied to X-axis and Y-axis registers 8, 9 in the prescribed time, and apply them to respective first to fourth stage arithmetic units. The clock signals are applied to the respective stages at every 300ns, and the stages thus calculate in parallel the data Xn, Yn different in the respective stages and deliver them to the following stages in a pipeline process. Consequently, the electron beam exposure is performed at every 300ns.
JP55119343A 1980-08-29 1980-08-29 Electron beam exposure system Pending JPS5743424A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55119343A JPS5743424A (en) 1980-08-29 1980-08-29 Electron beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55119343A JPS5743424A (en) 1980-08-29 1980-08-29 Electron beam exposure system

Publications (1)

Publication Number Publication Date
JPS5743424A true JPS5743424A (en) 1982-03-11

Family

ID=14759129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55119343A Pending JPS5743424A (en) 1980-08-29 1980-08-29 Electron beam exposure system

Country Status (1)

Country Link
JP (1) JPS5743424A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59204626A (en) * 1983-05-06 1984-11-20 Asahi Chem Ind Co Ltd Finely porous film of synthetic resin having nonporous layer
JPH02159014A (en) * 1988-12-13 1990-06-19 Toshiba Corp Method of and apparatus for producing data for charged particle beam lithography

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59204626A (en) * 1983-05-06 1984-11-20 Asahi Chem Ind Co Ltd Finely porous film of synthetic resin having nonporous layer
JPH02159014A (en) * 1988-12-13 1990-06-19 Toshiba Corp Method of and apparatus for producing data for charged particle beam lithography

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