JPS6476992A - Apparatus for growing single crystal - Google Patents
Apparatus for growing single crystalInfo
- Publication number
- JPS6476992A JPS6476992A JP14102088A JP14102088A JPS6476992A JP S6476992 A JPS6476992 A JP S6476992A JP 14102088 A JP14102088 A JP 14102088A JP 14102088 A JP14102088 A JP 14102088A JP S6476992 A JPS6476992 A JP S6476992A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- single crystal
- silicon
- melt
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
PURPOSE:To surely prevent deformation of upper and peripheral wall of a quartz crucible and prevent occurrence of trouble in pulling up a single crystal, by providing at least one reinforced ring in the crucible. CONSTITUTION:A double crucible 4 consisting of deep dish shaped outside crucible 16 and cylindrical inside crucible 18 is arranged and a resistance heater 20 is arranged in a susceptor arranged in a heat-insulating cylinder 10 housed in a furnace so as to surround the susceptor 12. Then a circular reinforced ring 24 having L-shaped peripheral cross section is mounted in the upper end of the crucible 18. A polycrystal silicon is packed into the crucible 14 and electricity is applied to the heater 20 and the silicon is melted to form the melt 42. Then the crucible 14 is rotated through a driving mechanism 30, shaft 28 and base 26 and simultaneously a seed crystal 38 is immersed into the melt 42 and pulled up while rotating in the reverse direction to rotation of the crucible and a single crystal 44 is grown in the order of neck part 44a, shoulder part 44b and cylindrical part 44c and simultaneously a silicon raw material 46 is fed into the crucible 16 through a feed pipe 40.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63141020A JP2560418B2 (en) | 1987-06-08 | 1988-06-08 | Single crystal growing equipment |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14245987 | 1987-06-08 | ||
| JP62-142459 | 1987-06-08 | ||
| JP63141020A JP2560418B2 (en) | 1987-06-08 | 1988-06-08 | Single crystal growing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6476992A true JPS6476992A (en) | 1989-03-23 |
| JP2560418B2 JP2560418B2 (en) | 1996-12-04 |
Family
ID=26473368
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63141020A Expired - Lifetime JP2560418B2 (en) | 1987-06-08 | 1988-06-08 | Single crystal growing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2560418B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02283693A (en) * | 1989-04-26 | 1990-11-21 | Nkk Corp | Method and device for preparing silicon single crystal |
| DE4030551A1 (en) * | 1989-09-29 | 1991-04-11 | Osaka Titanium | Silicon single crystal prodn. - by czochralski method with oxygen concn. controlled by varying crucible partition immersion depth |
| US7303629B2 (en) * | 2004-05-28 | 2007-12-04 | Sumco Corporation | Apparatus for pulling single crystal |
| JP2012140277A (en) * | 2010-12-28 | 2012-07-26 | Japan Siper Quarts Corp | Composite crucible and method for manufacturing the same |
| CN112144107A (en) * | 2020-09-10 | 2020-12-29 | 徐州鑫晶半导体科技有限公司 | Crystal Growth Furnace and Crystal Production Process |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5930794A (en) * | 1982-08-09 | 1984-02-18 | Toshiba Ceramics Co Ltd | Melting crucible device for pulling up single crystal |
| JPS63166790A (en) * | 1986-12-26 | 1988-07-09 | Toshiba Ceramics Co Ltd | Pulling up device for silicon single crystal |
| JPS63303886A (en) * | 1987-06-02 | 1988-12-12 | Sumitomo Heavy Ind Ltd | Silicon oxide discharge device in single crystal pulling-up device |
-
1988
- 1988-06-08 JP JP63141020A patent/JP2560418B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5930794A (en) * | 1982-08-09 | 1984-02-18 | Toshiba Ceramics Co Ltd | Melting crucible device for pulling up single crystal |
| JPS63166790A (en) * | 1986-12-26 | 1988-07-09 | Toshiba Ceramics Co Ltd | Pulling up device for silicon single crystal |
| JPS63303886A (en) * | 1987-06-02 | 1988-12-12 | Sumitomo Heavy Ind Ltd | Silicon oxide discharge device in single crystal pulling-up device |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02283693A (en) * | 1989-04-26 | 1990-11-21 | Nkk Corp | Method and device for preparing silicon single crystal |
| DE4030551A1 (en) * | 1989-09-29 | 1991-04-11 | Osaka Titanium | Silicon single crystal prodn. - by czochralski method with oxygen concn. controlled by varying crucible partition immersion depth |
| DE4030551C2 (en) * | 1989-09-29 | 1992-12-17 | Osaka Titanium Co. Ltd., Amagasaki, Hyogo, Jp | |
| US5392729A (en) * | 1989-09-29 | 1995-02-28 | Osaka Titanium Co., Ltd. | Method of producing silicon single crystal |
| US7303629B2 (en) * | 2004-05-28 | 2007-12-04 | Sumco Corporation | Apparatus for pulling single crystal |
| JP2012140277A (en) * | 2010-12-28 | 2012-07-26 | Japan Siper Quarts Corp | Composite crucible and method for manufacturing the same |
| CN112144107A (en) * | 2020-09-10 | 2020-12-29 | 徐州鑫晶半导体科技有限公司 | Crystal Growth Furnace and Crystal Production Process |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2560418B2 (en) | 1996-12-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080919 Year of fee payment: 12 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20080919 |