JPS648630A - Cleaning method - Google Patents

Cleaning method

Info

Publication number: JPS648630A
Authority: JP; Japan
Prior art keywords: chamber; ozone; tank; matter; cleaning
Prior art date: 1986-09-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP16474187A

Other languages

English (en)

Inventor

Yutaka Amamiya

Shunichi Iimuro

Nobuo Konishi

Yoichi Kurono

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Tokyo Electron Ltd

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-09-22

Filing date

1987-06-30

Publication date

1989-01-12

1987-06-30 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

1987-06-30 Priority to JP16474187A priority Critical patent/JPS648630A/ja

1989-01-12 Publication of JPS648630A publication Critical patent/JPS648630A/ja

Status Pending legal-status Critical Current

Links

238000004140 cleaning Methods 0.000 title abstract 5
238000000034 method Methods 0.000 title 1
CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 4
230000006378 damage Effects 0.000 abstract 2
239000012530 fluid Substances 0.000 abstract 2
239000011368 organic material Substances 0.000 abstract 2
230000001590 oxidative effect Effects 0.000 abstract 2
239000004065 semiconductor Substances 0.000 abstract 2
230000005611 electricity Effects 0.000 abstract 1
230000006698 induction Effects 0.000 abstract 1
230000003068 static effect Effects 0.000 abstract 1

Landscapes

Cleaning By Liquid Or Steam (AREA)
Cleaning Or Drying Semiconductors (AREA)

JP16474187A 1986-09-22 1987-06-30 Cleaning method Pending JPS648630A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP16474187A JPS648630A (en)	1986-09-22	1987-06-30	Cleaning method

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP22460886		1986-09-22
JP16474187A JPS648630A (en)	1986-09-22	1987-06-30	Cleaning method

Publications (1)

Publication Number	Publication Date
JPS648630A true JPS648630A (en)	1989-01-12

Family

ID=26489735

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP16474187A Pending JPS648630A (en)	1986-09-22	1987-06-30	Cleaning method

Country Status (1)

Country	Link
JP (1)	JPS648630A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0341729A (ja) *	1989-07-07	1991-02-22	Tokyo Electron Ltd	基板洗浄方法
WO1992006489A1 (fr) *	1990-10-09	1992-04-16	Chlorine Engineers Corp., Ltd.	Procede d'elimination de revetements organiques
WO1992022087A1 (fr) *	1991-05-31	1992-12-10	Tadahiro Ohmi	Procede de nettoyage et appareil conçu a cet effet
EP0548596A3 (en) *	1991-11-29	1994-08-17	Chlorine Eng Corp Ltd	Method and apparatus for cleaning substrate
US5378317A (en) *	1990-10-09	1995-01-03	Chlorine Engineers Corp., Ltd.	Method for removing organic film
US6277203B1 (en)	1998-09-29	2001-08-21	Lam Research Corporation	Method and apparatus for cleaning low K dielectric and metal wafer surfaces
US6325081B1 (en) *	1996-07-03	2001-12-04	Kabushiki Kaisha Ultraclean Technology Research Institute	Washing apparatus and washing method
US6817370B2 (en)	1997-05-09	2004-11-16	Semitool, Inc.	Method for processing the surface of a workpiece
US6837252B2 (en)	1997-05-09	2005-01-04	Semitool, Inc.	Apparatus for treating a workpiece with steam and ozone
EP2202782A3 (en) *	2008-12-25	2010-10-06	Siltronic AG	Micro-Bubble generating device
CN107081569A (zh) *	2017-03-27	2017-08-22	宁波工程学院	精密零件射流光饰设备及方法

1987
- 1987-06-30 JP JP16474187A patent/JPS648630A/ja active Pending

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0341729A (ja) *	1989-07-07	1991-02-22	Tokyo Electron Ltd	基板洗浄方法
WO1992006489A1 (fr) *	1990-10-09	1992-04-16	Chlorine Engineers Corp., Ltd.	Procede d'elimination de revetements organiques
US5378317A (en) *	1990-10-09	1995-01-03	Chlorine Engineers Corp., Ltd.	Method for removing organic film
WO1992022087A1 (fr) *	1991-05-31	1992-12-10	Tadahiro Ohmi	Procede de nettoyage et appareil conçu a cet effet
EP0548596A3 (en) *	1991-11-29	1994-08-17	Chlorine Eng Corp Ltd	Method and apparatus for cleaning substrate
US6325081B1 (en) *	1996-07-03	2001-12-04	Kabushiki Kaisha Ultraclean Technology Research Institute	Washing apparatus and washing method
US6837252B2 (en)	1997-05-09	2005-01-04	Semitool, Inc.	Apparatus for treating a workpiece with steam and ozone
US6817370B2 (en)	1997-05-09	2004-11-16	Semitool, Inc.	Method for processing the surface of a workpiece
US6319330B1 (en)	1998-09-29	2001-11-20	Lam Research Corporation	Method and apparatus for cleaning low K dielectric and metal wafer surfaces
US6277203B1 (en)	1998-09-29	2001-08-21	Lam Research Corporation	Method and apparatus for cleaning low K dielectric and metal wafer surfaces
EP2202782A3 (en) *	2008-12-25	2010-10-06	Siltronic AG	Micro-Bubble generating device
US8408221B2 (en)	2008-12-25	2013-04-02	Siltronic Ag	Micro bubble generating device and silicon wafer cleaning apparatus
CN107081569A (zh) *	2017-03-27	2017-08-22	宁波工程学院	精密零件射流光饰设备及方法

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