JPWO2024257504A1 - - Google Patents

Info

Publication number
JPWO2024257504A1
JPWO2024257504A1 JP2024551616A JP2024551616A JPWO2024257504A1 JP WO2024257504 A1 JPWO2024257504 A1 JP WO2024257504A1 JP 2024551616 A JP2024551616 A JP 2024551616A JP 2024551616 A JP2024551616 A JP 2024551616A JP WO2024257504 A1 JPWO2024257504 A1 JP WO2024257504A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2024551616A
Other languages
Japanese (ja)
Other versions
JP7634139B1 (ja
JPWO2024257504A5 (2
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024257504A1 publication Critical patent/JPWO2024257504A1/ja
Application granted granted Critical
Publication of JP7634139B1 publication Critical patent/JP7634139B1/ja
Publication of JPWO2024257504A5 publication Critical patent/JPWO2024257504A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/03—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2
    • C07C29/04—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2 by hydration of carbon-to-carbon double bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/02—Monohydroxylic acyclic alcohols
    • C07C31/10—Monohydroxylic acyclic alcohols containing three carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2024551616A 2023-06-13 2024-05-07 半導体洗浄用薬液および半導体洗浄用薬液の製造方法 Active JP7634139B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023096884 2023-06-13
JP2023096884 2023-06-13
PCT/JP2024/016925 WO2024257504A1 (ja) 2023-06-13 2024-05-07 半導体薬液および半導体薬液の製造方法

Publications (3)

Publication Number Publication Date
JPWO2024257504A1 true JPWO2024257504A1 (2) 2024-12-19
JP7634139B1 JP7634139B1 (ja) 2025-02-20
JPWO2024257504A5 JPWO2024257504A5 (2) 2025-05-27

Family

ID=93851967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024551616A Active JP7634139B1 (ja) 2023-06-13 2024-05-07 半導体洗浄用薬液および半導体洗浄用薬液の製造方法

Country Status (5)

Country Link
JP (1) JP7634139B1 (2)
KR (1) KR20260021637A (2)
CN (1) CN121039789A (2)
TW (1) TW202500541A (2)
WO (1) WO2024257504A1 (2)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4754058B2 (ja) * 2000-10-16 2011-08-24 三井化学株式会社 イソプロピルアルコールの製造方法
KR102313108B1 (ko) * 2016-06-17 2021-10-15 가부시키가이샤 도쿠야마 이소프로필 알코올의 제조 방법 및 불순물이 저감된 이소프로필 알코올
CN115335966B (zh) * 2020-04-02 2023-07-18 株式会社德山 半导体处理液及其制造方法
CN118742996A (zh) * 2022-03-16 2024-10-01 株式会社德山 半导体清洗液及半导体清洗液的制造方法

Also Published As

Publication number Publication date
WO2024257504A1 (ja) 2024-12-19
JP7634139B1 (ja) 2025-02-20
KR20260021637A (ko) 2026-02-13
TW202500541A (zh) 2025-01-01
CN121039789A (zh) 2025-11-28

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