TW202500541A - 半導體液體藥劑及半導體液體藥劑的製造方法 - Google Patents

半導體液體藥劑及半導體液體藥劑的製造方法 Download PDF

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Publication number
TW202500541A
TW202500541A TW113117119A TW113117119A TW202500541A TW 202500541 A TW202500541 A TW 202500541A TW 113117119 A TW113117119 A TW 113117119A TW 113117119 A TW113117119 A TW 113117119A TW 202500541 A TW202500541 A TW 202500541A
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TW
Taiwan
Prior art keywords
less
continuous reactor
gas
content
semiconductor liquid
Prior art date
Application number
TW113117119A
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English (en)
Chinese (zh)
Inventor
保坂俊輔
德永貴史
山下義晶
Original Assignee
日商德山股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商德山股份有限公司 filed Critical 日商德山股份有限公司
Publication of TW202500541A publication Critical patent/TW202500541A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B61/00—Other general methods
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/03—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2
    • C07C29/04—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2 by hydration of carbon-to-carbon double bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/02—Monohydroxylic acyclic alcohols
    • C07C31/10—Monohydroxylic acyclic alcohols containing three carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
TW113117119A 2023-06-13 2024-05-09 半導體液體藥劑及半導體液體藥劑的製造方法 TW202500541A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023-096884 2023-06-13
JP2023096884 2023-06-13

Publications (1)

Publication Number Publication Date
TW202500541A true TW202500541A (zh) 2025-01-01

Family

ID=93851967

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113117119A TW202500541A (zh) 2023-06-13 2024-05-09 半導體液體藥劑及半導體液體藥劑的製造方法

Country Status (5)

Country Link
JP (1) JP7634139B1 (2)
KR (1) KR20260021637A (2)
CN (1) CN121039789A (2)
TW (1) TW202500541A (2)
WO (1) WO2024257504A1 (2)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4754058B2 (ja) * 2000-10-16 2011-08-24 三井化学株式会社 イソプロピルアルコールの製造方法
JP6935399B2 (ja) * 2016-06-17 2021-09-15 株式会社トクヤマ イソプロピルアルコールの製造方法
WO2021200936A1 (ja) * 2020-04-02 2021-10-07 株式会社トクヤマ 半導体処理液及びその製造方法
KR20240163660A (ko) * 2022-03-16 2024-11-19 가부시키가이샤 도쿠야마 반도체 세정액 및 반도체 세정액의 제조 방법

Also Published As

Publication number Publication date
WO2024257504A1 (ja) 2024-12-19
KR20260021637A (ko) 2026-02-13
JP7634139B1 (ja) 2025-02-20
CN121039789A (zh) 2025-11-28
JPWO2024257504A1 (2) 2024-12-19

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