KR20020007342A - 디벤조일메탄 유도체, 예를 들면 parsol(r) 1789및 나프탈렌 디카르복시산 광안정제의 디에스테르 또는폴리에스테르 및 자외선 차단 지수(spf)의 증강제를함유하는 광안정성 햇빛 차단제 조성물 - Google Patents
디벤조일메탄 유도체, 예를 들면 parsol(r) 1789및 나프탈렌 디카르복시산 광안정제의 디에스테르 또는폴리에스테르 및 자외선 차단 지수(spf)의 증강제를함유하는 광안정성 햇빛 차단제 조성물 Download PDFInfo
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Abstract
Description
| 성분 | 제형 A (표준) | 제형 B | 제형 C | 기능 |
| 헥실데실 벤조에이트 &부틸옥틸 벤조에이트 | 7.50% | 7.50% | 7.50% | 연화제,용매 |
| 이소프로필 미리스테이트 | 5.00% | 5.00% | 1.00% | 공용매 |
| 아보벤존 | 1.00% | 1.00% | 1.00% | UV-A 햇빛 차단제 |
| 미리스틸 미리스테이트 | 4.00% | 0.00% | 0.00% | 구현제(bodyng agent) |
| 2,6-나프탈렌 디카르복시산의폴리에스테르 | 0.00% | 4.00% | 8.00% | 광안정화제 |
| 소르비탄 올레에이트 | 0.20% | 0.20% | 0.20% | 입도 감소제 |
| 디메티콘 코폴리올 | 0.10% | 0.10% | 0.10% | 윤활제 |
| 카르보머(carbomer) | 0.20% | 0.20% | 0.20% | 증점제, 안정화제 |
| 아크릴레이트/C10-30알킬 아크릴레이트가교폴리머 | 0.25% | 0.25% | 0.25% | 에멀젼화제 |
| 탈이온수 | Q.S. | Q.S. | Q.S. | 용매, 담체 |
| 디소듐 EDTA | 0.05% | 0.05% | 0.05% | 킬레이트제 |
| 하이드록시프로필-메틸셀룰로오스 | 0.20% | 0.20% | 0.20% | 필름 형성제 |
| 글리세린 | 4.00% | 4.00% | 4.00% | 습윤제 |
| 부틸렌 글리콜 | 2.00% | 2.00% | 2.00% | 습윤제, 용매 |
| 페녹시에탄올 & 파라벤 | 0.50% | 0.50% | 0.50% | 방부제 |
| 트리에탄올아민 | 0.45% | 0.45% | 0.45% | 중화제 |
| 성분 | 제형 A | 제형 B | 기능 |
| 헥실데실 벤조에이트 & 부틸옥틸 벤조에이트 | 7.50% | 7.50% | 연화제, 용매 |
| 이소프로필 미리스테이트 | 5.00% | 5.00% | 공용매 |
| 아보벤존 | 1.00% | 1.00% | UV-A 햇빛 차단제 |
| 옥토크릴렌 | 4.00% | 0.00% | UV-A/UV-B 햇빛 차단제 |
| 2,6-나프탈렌 디카르복시산의 폴리에스테르 | 0.00% | 4.00% | 광안정화제 |
| 소르비탄 올레에이트 | 0.20% | 0.20% | 입도 감소제 |
| 디메티콘 코폴리올 | 0.10% | 0.10% | 윤활제 |
| 카르보머 | 0.20% | 0.20% | 증점제, 안정화제 |
| 아크릴레이트/C10-30알킬 아크릴레이트가교폴리머 | 0.25% | 0.25% | 에멀젼화제 |
| 탈이온수 | Q.S. | Q.S. | 용매, 담체 |
| 디소듐 EDTA | 0.05% | 0.05% | 킬레이트제 |
| 하이드록시프로필메틸셀룰로오스 | 0.20% | 0.20% | 필름 형성제 |
| 글리세린 | 4.00% | 4.00% | 습윤제 |
| 부틸렌 글리콜 | 2.00% | 2.00% | 습윤제, 용매 |
| 페녹시에탄올 & 파라벤 | 0.50% | 0.50% | 방부제 |
| 트리에탄올아민 | 0.45% | 0.45% | 중화제 |
| 제형 A | 제형 B | |
| UV-A의 평균 손실 | 26.33% | 22.36% |
| UV-B의 평균 손실 | 25.15% | 18.29% |
| SPF의 평균 손실 | 26.82% | 20.35% |
Claims (20)
- 화장품용으로 허용 가능한 담체 내에 적어도 약 0.5 중량%의 디벤조일메탄 유도체 및 화학식(I), 화학식(Ⅱ) 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 적어도 약 0.5 중량%의 나프탈렌 디카르복시산의 디에스테르 또는 폴리에스테르를 포함하는, 자외선으로부터 인간의 피부를 보호하기 위해 국부적으로 적용하기 위한 적어도 2의 SPF(자외선 차단 지수)를 가지는 햇빛 차단제 조성물:(I)(Ⅱ)상기 식에서, 각각의 R1은 동일하거나 상이하고, 1개 내지 22개의 탄소 원자를 가지는 알킬기; 구조식 HO-R2-OH를 가지는 디올; 및 구조식 HO-R3-(-O-R2-)m-OH를 가지는 폴리디올 또는 그들의 혼합물로 이루어지는 군으로부터 선택되며,R2및 R3는 동일하거나 상이하고, 1개 내지 6개의 탄소 원자를 가지는 직쇄 또는 분지형의 알킬렌기이고,m 및 n은 각각 1 내지 약 100의 범위임.
- 제1항에 있어서,화학식(I) 또는 화학식(Ⅱ)을 가지는 상기 안정화 화합물 대 상기 디벤조일메탄 유도체의 몰비가 약 0.1:1 내지 약 10:1인 햇빛 차단제 조성물.
- 제1항에 있어서,화학식(I) 또는 화학식(Ⅱ)을 가지는 상기 안정화 화합물 대 상기 디벤조일메탄 유도체의 몰비가 약 0.1:1 내지 약 0.3:1인 햇빛 차단제 조성물.
- 제3항에 있어서,상기 디벤조일메탄 유도체가 4-(1,1-디메틸에틸)-4'-메톡시디벤조일메탄; 4-이소프로필 디벤조일메탄; 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 햇빛 차단제 조성물.
- 제4항에 있어서,상기 디벤조일메탄 유도체가 4-(1,1-디메틸에틸)-4'-메톡시디벤조일메탄인 햇빛 차단제 조성물.
- 제5항에 있어서,상기 디벤조일메탄 유도체가 조성물의 약 0.5 중량% 내지 약 5 중량%의 양으로 포함되는 햇빛 차단제 조성물.
- 제6항에 있어서,상기 디벤조일메탄 유도체가 조성물의 약 0.5 중량% 내지 약 3 중량%의 양으로 포함되는 햇빛 차단제 조성물.
- 제7항에 있어서,상기 안정화 화합물이 조성물의 약 1 중량% 내지 약 20 중량%의 양으로 포함되는 햇빛 차단제 조성물.
- 제7항에 있어서,상기 안정화 화합물이 2,6-나프탈렌 디카르복시산의 폴리에스테르인 햇빛 차단제 조성물.
- 화장품용으로 허용 가능한 담체 내에 0.5 중량% 내지 5 중량%의 디벤조일메탄 유도체 및 화학식(I), 화학식(Ⅱ) 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 나프탈렌 디카르복시산 안정화 화합물의 디에스테르 또는 폴리에스테르를 포함하는 조성물을 인간의 피부에 국부적으로 적용하는 것을 포함하는, 인간의 피부로부터 자외선을 여과하는 방법:(I)(Ⅱ)상기 식에서, 각각의 R1은 동일하거나 상이하고, 1개 내지 22개의 탄소 원자를 가지는 알킬기; 구조식 HO-R2-OH를 가지는 디올; 및 구조식 HO-R3-(-O-R2-)m-OH를 가지는 폴리디올 또는 그들의 혼합물로 이루어지는 군으로부터 선택되며,R2및 R3는 동일하거나 상이하고, 1개 내지 6개의 탄소 원자를 가지는 직쇄 또는 분지형의 알킬렌기이고,m 및 n은 각각 1 내지 약 100의 범위임.
- 제10항에 있어서,화학식(I) 또는 화학식(Ⅱ)을 가지는 상기 안정화 화합물 대 상기 디벤조일메탄 유도체의 몰비가 약 0.1:1 내지 약 10:1인 여과 방법.
- 제10항에 있어서,화학식(I)을 가지는 상기 안정화 화합물 대 상기 디벤조일메탄 유도체의 몰비가 약 0.1:1 내지 약 0.3:1인 여과 방법.
- 제12항에 있어서,상기 디벤조일메탄 유도체가 4-(1,1-디메틸에틸)-4'-메톡시디벤조일메탄; 4-이소프로필 디벤조일메탄; 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 여과 방법.
- 제13항에 있어서,상기 디벤조일메탄 유도체가 4-(1,1-디메틸에틸)-4'-메톡시디벤조일메탄인 여과 방법.
- 제14항에 있어서,상기 디벤조일메탄 유도체가 조성물의 약 0.5 중량% 내지 약 3 중량%의 양으로 포함되는 여과 방법.
- 화장품용으로 허용 가능한 담체 내의 화학식(I), 화학식(Ⅱ) 및 이들의 혼합물로 이루어지는 군으로부터 선택되는 나프탈렌 디카르복시산 화합물의 디에스테르 또는 폴리에스테르를 인간의 피부에 국부적으로 적용하는 것을 포함하는, 인간의 피부로부터 자외선을 여과하는 방법:(I)(Ⅱ)상기 식에서, 각각의 R1은 동일하거나 상이하고, 1개 내지 22개의 탄소 원자를 가지는 알킬기; 구조식 HO-R2-OH를 가지는 디올; 및 구조식 HO-R3-(-O-R2-)m-OH를 가지는 폴리디올 또는 그들의 혼합물로 이루어지는 군으로부터 선택되며,R2및 R3는 동일하거나 상이하고, 1개 내지 6개의 탄소 원자를 가지는 직쇄 또는 분지형의 알킬렌기이고,m 및 n은 각각 1 내지 약 100의 범위임.
- 제1항에 따르는 안정화제를 포함하는 하기 조성을 가지는 햇빛 차단제 조성물:화학명 w/w%디벤조일메탄 유도체 1-10제1항에 따르는 안정화제 1-15옥토크릴렌 0-10헥실데실 벤조에이트 & 부틸옥틸 벤조에이트 0-10UV-A/UV-B 햇빛 차단제 #1 0-10UV-A/UV-B 햇빛 차단제 #2 0-10UV-A/UV-B 햇빛 차단제 #3 0-10UV-A/UV-B 햇빛 차단제 #4 0-10디메티콘 코폴리올 0-2이소프로필 미리스테이트 0-5옥시벤존 0-8증점제 0-2소르비탄 올리에이트 0-5아크릴레이트/C10-30알킬 아크릴레이트 가교폴리머 0-5물 50-90카르보머 0-2디소듐 EDTA 0-2글리세린 0-10부틸렌 글리콜 0-5페녹시에탄올, 메틸파라벤, 에틸파라벤, 0-5프로필파라벤, 부틸파라벤클로르페니센(Chlorphenisen) 0-5.
- 제17항에 있어서,하기 조성을 가지는 햇빛 차단제 조성물:화학명 w/w%4-(1,1-디메틸에틸)-4'-메톡시디벤조일메탄 1-10제1항에 따르는 안정화제 1-15부틸옥틸 살리실레이트 1-10UV-A/UV-B 햇빛 차단제 0.5-10물 50-90.
- 제1항에서 정의된 안정화제를 포함하는 하기 조성을 가지는 햇빛 차단제 조성물:화학명 w/w%디벤조일메탄 유도체 1-82,6-나프탈렌 디카르복시산의 폴리에스테르 1-10옥토크릴렌 1-5부틸옥틸 살리실레이트 5-10UV-B/UV-A 햇빛 차단제 0.5-5이소프로필 미리스테이트 3-7아크릴레이트/C10-30알킬 아크릴레이트 가교폴리머 0.1-1물 50-90카르보머 0.1-0.5페녹시에탄올, 메틸파라벤, 에틸파라벤, 0.1-1.프로필파라벤, 부틸파라벤
- 제1항에 따르는 안정화제를 포함하는 하기 조성을 가지는 햇빛 차단제 조성물:화학명 w/w%디벤조일메탄 유도체 1-8제1항에 따르는 안정화제 1-10부틸옥틸 살리실레이트 1-10UV-A 햇빛 차단제 0.5-5물 50-90.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/276,051 | 1999-03-25 | ||
| US09/276,051 US5993789A (en) | 1999-03-25 | 1999-03-25 | Photostable sunscreen compositions containing dibenzoylmethane derivative, E.G., parsol® 1789, and diesters or polyesters of naphthalene dicarboxylic acid photostabilizers and enhancers of the sun protection factor (SPF) |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20020007342A true KR20020007342A (ko) | 2002-01-26 |
| KR100599919B1 KR100599919B1 (ko) | 2006-07-12 |
Family
ID=23054945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020017012201A Expired - Fee Related KR100599919B1 (ko) | 1999-03-25 | 1999-07-06 | 디벤조일메탄 유도체, 예를 들면 parsol(r) 1789 및 나프탈렌 디카르복시산 광안정화제의 디에스테르 또는 폴리에스테르 및 자외선 차단 지수(spf)의 증강제를 함유하는 광안정성 햇빛 차단제 조성물 |
Country Status (14)
| Country | Link |
|---|---|
| US (3) | US5993789A (ko) |
| EP (1) | EP1162942B1 (ko) |
| JP (1) | JP2002540135A (ko) |
| KR (1) | KR100599919B1 (ko) |
| CN (1) | CN1213725C (ko) |
| AT (1) | ATE268158T1 (ko) |
| AU (1) | AU765602B2 (ko) |
| BR (1) | BR9917231B1 (ko) |
| CA (1) | CA2370522A1 (ko) |
| DE (1) | DE69917811T2 (ko) |
| ES (1) | ES2221400T3 (ko) |
| RU (1) | RU2209621C2 (ko) |
| TR (1) | TR200103174T2 (ko) |
| WO (1) | WO2000057850A1 (ko) |
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| JP2526989B2 (ja) * | 1988-05-20 | 1996-08-21 | 三菱瓦斯化学株式会社 | 芳香族多価アルコ―ルの製造方法 |
| JPH04221330A (ja) | 1990-12-20 | 1992-08-11 | Mitsubishi Gas Chem Co Inc | 芳香族多価アルコールの製造方法 |
| FR2677543B1 (fr) * | 1991-06-13 | 1993-09-24 | Oreal | Composition cosmetique filtrante a base d'acide benzene 1,4-di(3-methylidene-10-camphosulfonique) et de nanopigments d'oxydes metalliques. |
| RU2020274C1 (ru) * | 1991-08-26 | 1994-09-30 | Борисовский завод "Автогидроусилитель" | Насос гидроусилителя руля автомобиля |
| US5783173A (en) * | 1996-11-21 | 1998-07-21 | The C. P. Hall Company | Stable sunscreen composition containing dibenzoylmethane derivative, E. G., PARSOL 1789, and C12, C16, C18, branched chain hydroxybenzoate and/or C12, C16, branched chain benzoate stabilizers/solubilizers |
| US5849273A (en) * | 1996-11-21 | 1998-12-15 | The C. P. Hall Company | Skin care and sunscreen composition containing dibenzoylmethane derivative, e.g., parsol® 1789, and C12, C16, C18 branched chain hydroxybenzoate and/or C12, C16 branched chain benzoate stabilizers/solubilizers |
| FR2757055B1 (fr) * | 1996-12-17 | 1999-02-05 | Oreal | Compositions comprenant un derive de dibenzoylmethane, un derive de 1,2,3-triazine et un benzalmalonate de dialkyle et utilisations |
| US6555190B1 (en) | 1997-11-06 | 2003-04-29 | Honeywell International Inc. | Films with UV blocking characteristics |
| US5976513A (en) * | 1998-10-16 | 1999-11-02 | The Procter & Gamble Company | UV protection compositions |
-
1999
- 1999-03-25 US US09/276,051 patent/US5993789A/en not_active Expired - Lifetime
- 1999-07-06 ES ES99932258T patent/ES2221400T3/es not_active Expired - Lifetime
- 1999-07-06 AT AT99932258T patent/ATE268158T1/de not_active IP Right Cessation
- 1999-07-06 JP JP2000607601A patent/JP2002540135A/ja active Pending
- 1999-07-06 TR TR2001/03174T patent/TR200103174T2/xx unknown
- 1999-07-06 KR KR1020017012201A patent/KR100599919B1/ko not_active Expired - Fee Related
- 1999-07-06 EP EP99932258A patent/EP1162942B1/en not_active Expired - Lifetime
- 1999-07-06 CA CA002370522A patent/CA2370522A1/en not_active Abandoned
- 1999-07-06 RU RU2001128498/14A patent/RU2209621C2/ru not_active IP Right Cessation
- 1999-07-06 CN CNB998166642A patent/CN1213725C/zh not_active Expired - Fee Related
- 1999-07-06 BR BRPI9917231-3A patent/BR9917231B1/pt not_active IP Right Cessation
- 1999-07-06 WO PCT/US1999/015192 patent/WO2000057850A1/en not_active Ceased
- 1999-07-06 DE DE69917811T patent/DE69917811T2/de not_active Expired - Lifetime
- 1999-07-06 AU AU48607/99A patent/AU765602B2/en not_active Expired
- 1999-09-08 US US09/391,766 patent/US6129909A/en not_active Expired - Lifetime
-
2000
- 2000-01-24 US US09/490,230 patent/US6284916B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1359286A (zh) | 2002-07-17 |
| ES2221400T3 (es) | 2004-12-16 |
| KR100599919B1 (ko) | 2006-07-12 |
| US6284916B1 (en) | 2001-09-04 |
| WO2000057850A1 (en) | 2000-10-05 |
| AU4860799A (en) | 2000-10-16 |
| TR200103174T2 (tr) | 2002-04-22 |
| US5993789A (en) | 1999-11-30 |
| BR9917231B1 (pt) | 2011-06-28 |
| JP2002540135A (ja) | 2002-11-26 |
| CA2370522A1 (en) | 2000-10-05 |
| CN1213725C (zh) | 2005-08-10 |
| RU2209621C2 (ru) | 2003-08-10 |
| DE69917811T2 (de) | 2005-07-14 |
| BR9917231A (pt) | 2001-12-18 |
| EP1162942B1 (en) | 2004-06-02 |
| US6129909A (en) | 2000-10-10 |
| EP1162942A1 (en) | 2001-12-19 |
| ATE268158T1 (de) | 2004-06-15 |
| AU765602B2 (en) | 2003-09-25 |
| DE69917811D1 (de) | 2004-07-08 |
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