KR20160021299A - 멀티-블록 스퍼터링 타겟 및 이에 관한 제조방법 및 물품 - Google Patents
멀티-블록 스퍼터링 타겟 및 이에 관한 제조방법 및 물품 Download PDFInfo
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Abstract
Description
도 1b는 괄호안에 조인트 라인 폭에 해당하는 부분이 나타나있고, 분말 조인트를 사용하여 형성된 도 1a의 타겟 몸체의 부분을 100 배율 광학 현미경으로 나타낸 사진이다.
도 2a는 타겟 몸체의 블록들간의 결합을 위해 사용되는 어떤 결합제 없이(예를 들어, 분말, 포일, 그 밖의 첨가 물질 없이) 본 발명에 따른 미세구조를 25 배율의 광학 현미경으로 자세히 나타낸 사진이다.
도 2b는 타겟 몸체의 블록들간의 결합을 위해 사용되는 어떤 결합제 없이(예를 들어, 분말, 포일, 그 밖의 첨가 물질 없이) 본 발명에 따른 미세구조를 100 배율의 광학 현미경으로 자세히 나타낸 사진이다.
도 3a는 타겟 몸체의 블록들간의 결합을 위해 사용되는 어떤 결합제 없이(예를 들어, 분말, 포일, 그 밖의 첨가 물질 없이), 결합 전 블록들의 표면 거칠기가 도 2a의 구조에 있어서의 표면 거칠기보다 큰 본 발명에 따라 예상되는 미세구조를 25 배율의 광학 현미경으로 자세히 나타낸 사진이다.
도 3b는 타겟 몸체의 블록들간의 결합을 위해 사용되는 어떤 결합제 없이(예를 들어, 분말, 포일, 그 밖의 첨가 물질 없이), 결합 전 블록들의 표면 거칠기가 도 2a의 구조에 있어서의 표면 거칠기보다 큰 본 발명에 따라 예상되는 미세구조를 100 배율의 광학 현미경으로 자세히 나타낸 사진이다.
도 4는 실시예 1에 따라, 어떤 결합제 없이(예를 들어, 분말, 포일, 그 밖의 첨가 물질 없이) 서로 결합되어 있는 50 at%의 몰리브덴과 50 at%의 티타늄 분말이 혼합된 블록으로부터 만들어지는 열간 등방압 성형의 타겟 몸체의 전형적인 예상 모습을 500배율의 후방산란 주사 전자 현미경으로 나타낸 사진이다.
| 실시예 | 생플 구성 : Mo 40 at%와 Ti 60 at%(아래의 공정 조건에서) | 가시적인 조인트 라인 너비<100㎛ | TRS>690MPa |
| 3 | 1080℃/3시간/150MPa/3.8㎛RA | 예 | 예 |
| 4 | 890℃/4시간/100MPa/3.8㎛RA | 예 | 예 |
| 5 | 825℃/6시간/150MPa/3.8㎛RA | 예 | 예 |
| 6 | 1080℃/3시간/150MPa/1.6㎛RA | 예 | 예 |
| 7 | 890℃/4시간/100MPa/1.6㎛RA | 예 | 예 |
| 8 | 825℃/6시간/150MPa/1.6㎛RA | 예 | 예 |
| 실시예 | 생플 구성 : Mo 60 at%와 Ti 40 at%(아래의 공정 조건에서) | 가시적인 조인트 라인 너비<100㎛ | TRS>690MPa |
| 9 | 1080℃/3시간/150MPa/3.2㎛RA | 예 | 예 |
| 10 | 890℃/4시간/100MPa/3.2㎛RA | 예 | 예 |
| 11 | 825℃/6시간/150MPa/3.2㎛RA | 예 | 예 |
| 12 | 1080℃/3시간/150MPa/1.6㎛RA | 예 | 예 |
| 13 | 890℃/4시간/100MPa/1.6㎛RA | 예 | 예 |
| 14 | 825℃/6시간/150MPa/1.6㎛RA | 예 | 예 |
| 실시예 | 생플 구성 : Mo 50 at%와 Ti 50 at%(아래의 공정 조건에서) | 가시적인 조인트 라인 너비<100㎛ | TRS>690MPa |
| 15 | 1080℃/3시간/150MPa/3.8㎛RA | 예 | 예 |
| 16 | 890℃/4시간/100MPa/3.8㎛RA | 예 | 예 |
| 17 | 825℃/6시간/150MPa/3.8㎛RA | 예 | 예 |
| 18 | 1080℃/3시간/150MPa/1.6㎛RA | 예 | 예 |
| 19 | 890℃/4시간/100MPa/1.6㎛RA | 예 | 예 |
| 20 | 825℃/6시간/150MPa/1.6㎛RA | 예 | 예 |
Claims (17)
- 스퍼터링 타겟의 제조방법으로서,
a. 첫 번째와 두 번째 블록을 제공하되, 상기 첫 번째와 두 번째 블록은 적어도 부분적으로 압밀된 분말 금속 블록이고, 동일한 조성을 가지며, 30 중량% 이상의 몰리브덴과 하나 이상의 첨가 금속 원소를 포함하는 합금을 포함하는, 첫 번째 및 두 번째 블록을 제공하는 단계;
b. 첫 번째와 두 번째 블록 각각의 엣지 표면을 밀링 가공하여 3.8㎛ 보다 작은 평균 표면 거칠기(Ra)값을 나타내는, 접촉된 조인트 구조를 위한 마주보는 표면 처리된 표면을 얻는 단계;
c. 첫 번째 블록의 표면 처리된 표면을 두 번째 블록의 표면 처리된 표면과 접촉시키되 접촉된 표면 사이에 어떠한 결합제의 존재없이 직접 접촉시켜 접촉된 조인트 구조를 형성하는 단계; 및
d. 접촉된 조인트 구조가 밀폐용기에서 캡슐화되는 동안에 500℃ 내지 1000℃ 사이의 온도에서 등방압 압축하여 300㎛ 폭보다 큰 조인트 라인이 없는 압밀된 조인트를 첫 번째 블록과 두 번째 블록 사이에 형성하는 단계를 포함하며,
제조된 스퍼터링 타겟은 적어도 1.3 m의 최대 치수를 갖는,
스퍼터링 타겟의 제조방법. - 스퍼터링 타겟의 제조방법으로서,
a. 각 블록이 5.1㎛보다 작은 표면 거칠기값(Ra)를 나타내도록 표면 처리한 엣지 표면을 가지고, 각 블록이 같은 조성을 가지며 30 중량% 이상의 몰리브덴과 하나 이상의 첨가 합금 원소로 구성된 합금을 포함하는, 첫 번째 및 두 번째의 적어도 부분적으로 압밀된 분말 금속 블록을 제공하는 단계;
b. 첫 번째 블록의 표면 처리한 엣지 표면을 두 번째 블록의 표면 처리한 엣지 표면과 어떤 결합제의 존재없이 직접 접촉시켜 접촉된 조인트 구조를 형성하는 단계; 및
c. 상기 접촉된 조인트 구조를 1000℃ 이하의 온도에서 등방압 압축하여 300㎛ 폭보다 큰 조인트 라인이 없는 압밀된 조인트를 첫 번째 블록과 두 번째 블록 사이에 형성하는 단계를 포함하며,
제조된 스퍼터링 타겟은 ASTM B528-10 에 따른 최소 800MPa의 항절력을 가지는,
스퍼터링 타겟의 제조방법. - 제1항 또는 제2항에 있어서,
상기 제공하는 단계는 몰리브덴; 및,
티타늄, 크롬, 니오븀, 탄탈륨, 텅스텐, 지르코늄, 하프늄, 바나듐, 리튬, 나트륨, 칼륨에서 선택된 적어도 하나의 합금 원소 또는 이들의 조합으로부터 첫 번째와 두 번째 블록을 형성하는 단계를 포함하는,
스퍼터링 타겟의 제조방법. - 제3항에 있어서,
상기 제공하는 단계는 30 내지 70 원자%의 몰리브덴과 불순물을 제외한 나머지의 티타늄으로부터 첫 번째 및 두 번째 블록을 형성하는 단계를 포함하는,
스퍼터링 타겟의 제조방법. - 제4항에 있어서,
상기 제공하는 단계는 상기 접촉된 조인트 구조를 형성할 마주보는 표면 처리된 표면을 형성하기 위해 첫 번째 및 두 번째 블록들의 한 개 이상의 엣지 표면을 평균 표면 거칠기(Ra)값 150 μin(3.8㎛)보다 작은 값으로 밀링 가공하는 단계를 포함하고; 및/또는 상기 등방압 압축하는 단계는 접촉된 조인트 구조가 밀폐용기에서 캡슐화되는 동안 700℃ 내지 1000℃의 온도, 최소 80 MPa 내지 140 MPa의 압력에서 1 내지 6시간 유지하는 것을 포함하는,
스퍼터링 타겟의 제조방법. - 제5항에 있어서,
상기 스퍼터링 타겟은 30 내지 60 부피%의 순수한 몰리브덴 상을 갖는,
스퍼터링 타겟의 제조방법. - 제6항에 있어서,
상기 스퍼터링 타겟은 35 내지 48 부피%의 순수한 몰리브덴 상을 포함하는,
스퍼터링 타겟의 제조방법. - 제7항에 있어서,
상기 적어도 하나의 합금 원소는 티타늄인,
스퍼터링 타겟의 제조방법. - 제8항에 있어서,
상기 스퍼터링 타겟은 몰리브덴과 티타늄의 β상을 포함하고, 이 β상은 타겟 몸체의 40 부피%보다 더 큰 양인,
스퍼터링 타겟의 제조방법. - 제9항에 있어서,
상기 스퍼터링 타겟은 2 내지 15 부피%의 순수한 티타늄 상을 포함하는,
스퍼터링 타겟의 제조방법. - 제10항에 있어서,
상기 스퍼터링 타겟은 40 내지 60 부피%의 몰리브덴/티타늄 β상을 포함하는,
스퍼터링 타겟의 제조방법. - 제11항에 있어서,
타겟 몸체 전체에 걸쳐 순수한 몰리브덴 상, 순수한 티타늄 상, 몰리브덴/티타늄 β상을 포함하는 세 개의 상이 연속적이고 균일하게 분포하는,
스퍼터링 타겟의 제조방법. - 제1항 또는 제2항에 있어서,
타겟 몸체는 50㎛ 폭보다 큰 조인트 라인이 없는,
스퍼터링 타겟의 제조방법. - 제1항 또는 제2항의 제조방법에 의해 제조된 스퍼터링 타겟.
- a. 각 블록이 같은 조성을 가지며 30 중량% 이상의 몰리브덴과 티타늄을 포함하는 하나 이상의 첨가 합금 원소를 포함하는, 둘 이상의 압밀된 블록들; 및
b. 타겟 몸체를 정의하도록 상기 블록들을 결합하며, 결합제 첨가에 의해 일어나는 어떤 미세구조도 포함하지 않고, 200㎛ 폭보다 큰 어떠한 조인트 라인도 없는, 상기 둘 이상의 압밀된 블록들 간의 조인트를 포함하여, 조인트 라인을 따라 ASTM B528-10 에 따른 적어도 600MPa의 항절력을 나타내며,
35 내지 48 부피%의 순수한 몰리브덴 상과, 2 내지 15 부피%의 순수한 티타늄 상과, 40 내지 60 부피%의 몰리브덴/티타늄 β상을 포함하는,
스퍼터링 타겟. - 제15항에 있어서,
타겟 몸체 전체에 걸쳐 상기 세 개의 상이 연속적이고 균일하게 분포하고, 타겟 몸체는 50㎛ 폭보다 큰 조인트 라인이 없는,
스퍼터링 타겟. - 제15항 또는 제16항에 있어서,
적어도 1.3 m의 최대 치수를 갖는,
스퍼터링 타겟.
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| US61/484,450 | 2011-05-10 | ||
| US13/467,323 US9334562B2 (en) | 2011-05-10 | 2012-05-09 | Multi-block sputtering target and associated methods and articles |
| PCT/US2012/037071 WO2012154817A1 (en) | 2011-05-10 | 2012-05-09 | Composite target |
| US13/467,323 | 2012-05-09 |
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2012
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- 2012-05-09 KR KR1020137027874A patent/KR20140001246A/ko not_active Ceased
- 2012-05-09 WO PCT/US2012/037071 patent/WO2012154817A1/en not_active Ceased
- 2012-05-09 US US13/467,323 patent/US9334562B2/en not_active Expired - Fee Related
- 2012-05-09 KR KR1020177002728A patent/KR20170016024A/ko not_active Ceased
- 2012-05-09 JP JP2014510430A patent/JP5808066B2/ja not_active Expired - Fee Related
- 2012-05-09 EP EP12723317.9A patent/EP2707520B1/en not_active Revoked
- 2012-05-09 CN CN201280022837.5A patent/CN103562432B/zh not_active Expired - Fee Related
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2015
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2016
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2019
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|---|---|
| US9334562B2 (en) | 2016-05-10 |
| KR20140001246A (ko) | 2014-01-06 |
| US20200381225A1 (en) | 2020-12-03 |
| US20160196961A1 (en) | 2016-07-07 |
| CN103562432B (zh) | 2015-08-26 |
| CN103562432A (zh) | 2014-02-05 |
| US20120285826A1 (en) | 2012-11-15 |
| JP5808066B2 (ja) | 2015-11-10 |
| US10727032B2 (en) | 2020-07-28 |
| US9922808B2 (en) | 2018-03-20 |
| US20190214237A1 (en) | 2019-07-11 |
| JP2014519549A (ja) | 2014-08-14 |
| KR20170016024A (ko) | 2017-02-10 |
| US20180190476A1 (en) | 2018-07-05 |
| EP2707520A1 (en) | 2014-03-19 |
| WO2012154817A1 (en) | 2012-11-15 |
| JP6164779B2 (ja) | 2017-07-19 |
| US11328912B2 (en) | 2022-05-10 |
| JP2016065307A (ja) | 2016-04-28 |
| US10211035B2 (en) | 2019-02-19 |
| WO2012154817A8 (en) | 2013-11-07 |
| EP2707520B1 (en) | 2018-05-02 |
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