KR910020060A - 잠재성 촉매, 경화-억제된 에폭시수지 조성물 및 이로부터 제조한 적층물 - Google Patents
잠재성 촉매, 경화-억제된 에폭시수지 조성물 및 이로부터 제조한 적층물 Download PDFInfo
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- KR910020060A KR910020060A KR1019910008147A KR910008147A KR910020060A KR 910020060 A KR910020060 A KR 910020060A KR 1019910008147 A KR1019910008147 A KR 1019910008147A KR 910008147 A KR910008147 A KR 910008147A KR 910020060 A KR910020060 A KR 910020060A
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
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Abstract
Description
Claims (20)
- A. 폴리에폭사이드; 및 B. 붕상 또는 말레산, 또는 붕산과 약친핵성 음이온을 갖는 산 하나 이상과의 혼합물을 포함하는 경화 억제제를 포함하는 에폭시 수지 조성물.
- A. 승온에서 폴리에폭사이드와 반응할 수 있는 경화제; 및 B. 붕산또는 말레선, 또는 붕산과 약친핵성 음이온을 갖는 산 하나 이상과의 혼합물의 억제량을 포함하는, 폴리에폭사이드 또는 진척된(advanced)에폭시 수지를 경화시키는데 유용한 조성물.
- 제1항에 있어서, 승온에서 폴리에폭사이드와 반응할 수 있는 경화제를 추가로 포함하는 에폭시 수지 조성물.
- 제1항 내지 제3항중 어느 한항에 있어서, 아민, 헤테르사이클릭 질소, 포스핀, 황화물, 암모늄, 포스포늄, 아르소늄, 또는 설포늄-함유 화합물 또는 이러한 화합물들의 혼합물을 포함하는, 경화제에 의한 폴리에폭사이드의 경화를 가속화시킬 수 있는 에폭시 수지 촉매를 추가로 포함하는 조성물.
- i)아민, 헤테로사이클릭 질소, 포스핀, 황화물, 암모늄, 포스포늄, 설포늄 또는 아르소늄-함유 화합물 또는 이의 혼합물을 포함하는 폴리에폭사이드 경화용 촉매를, ii)붕산, 또는 붕산과 약친핵성 음이온을 갖는 산하나 이상과의 혼합물과 접촉시켜 제조한 폴리에폭사이드 경화용 잠재성 촉매.
- 제4항에 있어서, 경화 억제제및 촉매가 제5항에 따른 잠재성 촉매 조성물의 형태로 존재함을 특징으로 하는 조성물.
- 제4항 내지 제6항중 어느 한 항에 있어서, 촉매가 에틸틀리페닐 포스포늄 아세테이트, 에틸트리페닐 포스포늄 아세테이트, 아세트산 착화합물, 테트라부틸 포스포늄 아세테이트, 테트라부틸 포스포튬 아세테이트, 아세트산 착화합물, 에틸트리페닐 포스포늄 클로라이드, 에틸 트리페닐 포스포늄 요오다이드, 테트라부틸 포스포늄 클로라이드, 테트라부틸 포스포늄 요오다이드 및 테트라부틸포스포늄 하이드록사이드로 이루어진 그룹중에서 선택된 포스포늄 화합물; 테트라부틸암모늄 하이드록사이드, 테트라에틸암모늄 하이드록사이드, 테트라메틸암모늄 하이드록사이드, 에틸트리(2-에톡시에틸)암모늄 하이드록사이드, 트리에틸(2-티오에틸에틸)암모늄 하이드록사이드, N-메틸-N-메틸메탄암미늄 아세테이트, N-메틸-N메틸렌메탄암미늄 아세테이트, 아세트산 착화합물, N-메틸렌메탄암미늄 클로라이드, N-메틸-메틸메탄암미늄 요오다이드, N-메틸피라디늄 아세테이트, N-메틸피리디늄 아세테이트, 아세트산 착화합물, N-메틸-N-메틸피라디늄 클로라이드, N-메틸피리디늄 요오다이드, 1-에틸-2,3-디메틸이미다졸롬 아세테이트, 1-에틸-2,3-디메틸-이미다졸륨 아세테이트, 아세트산 착화합물, 1-에틸-2,3-디메틸이미다졸륨 클로라이드, 1-에틸-2-3디메틸-이미다졸륨 요오다이드, N-메틸퀴놀리늄 아세테이트, N-메틸퀴놀리늄 아세테이트, 아세트산 착화합물, N-메틸퀴놀리늄 클로라이드, N-메틸퀴놀리늄 요오다이드, N-메틸-1,3,5-트리아지늄 아세테이트, N-메틸-1,3,5-트리아지늄 아세테이트, 아세트산 착화합물, N-메틸-1,3,5-트리아지늄 클로라이드 및 N-메틸-1,3,5-트리아지늄 요오다이드로 이루어진 그룹중에서 선택된 암모늄 화합물; 에틸아민, 디에틸아민, 트리에틸아민, n-프로필아민, 디-n-프로필아민, 트리-n-프로필아민, 이소프로필아민, 디이소프로필아민, 트리이소프로필아민, 부틸아민, 디부틸아민, 트리부틸아민 및 메틸디부틸아민으로 이루어진 그룹중에서 선택된 비-헤케로사이클릭 아민; 이미다졸, 이미다졸리딘, 이미다졸린, 옥사졸, 피톨, 티아졸, 피리딘, 피라진, 모르폴린, 피리다진, 피리미딘, 피틀리딘, 피라졸, 퀴녹살린, 퀴나졸린, 프탈로진, 퀴놀린, 퓨린, 인다졸, 인돌, 인돌아진, 페나진, 페나르사진, 페노티아진, 피롤린, 인돌린, 피페리딘 및 피페라진으로 이루어진 그룹중에서 선택된 헤테로사이클릭 아민; 또는 이들의 특정 혼합물이며, 약친핵성 음이온을 갖는 산이 존재하는 경우에는 이 산이 플루오로붕산인 조성물.
- 제4항 내지 제7항중 어느 한항에 있어서, 촉매가 3급 아민-함유 화합물 또는 헤테로사이클릭 아민-함유화합물인 조성물.
- 제4항 내지 제7항중 어느 한항에 있어서, 촉매가 2-메틸 이미다졸, 2-에틸 이미다졸, 4-메틸 이미다졸 또는 2-페닐 이미다졸인 조성물.
- 제2항 내지 제4항 및 제6항 내지 제9항중 어느 한항에 있어서, 경화제가 무수물, 방향족 하이드록실 하나이상을 함유하는 화합물, 폴리아미드 또는 폴리아민인 조성물.
- 제2항 내지 제4항 및 제6항 내지 제9항중 어느 한항에 있어서, 경화제가 시안아미드, 디시안아미드, 시안아미드 또는 디시안아미드의 유도체, 디하이드록시 페놀, 비페놀, 비스페놀, 할로겐화 비스페놀, 알킬화 비스페놀, 트리스페놀, 페놀-알데히드 수지 할로겐화 페놀-알데히드 노볼락 수지, 알킬화 페놀-알데히드 노볼로 수지, 페놀-하이드록시벤즈 알데히드 수지, 알킬화 페놀-하이드록시벤즈알데히드 수지, 탄화수소-페놀수지, 탄화수소-할로겐화 페놀 수지, 탄화수소-알킬 페놀 수지, 또는 이의 혼합물인 조성물.
- A)임의로는 하나 이상의 혼화성 용매중에 존재하는 제3항 내지 제10항중 어느 한항에 따른 조성물을 제품과 접촉시키고, B)임의로는, 상기 피복제품을, 존재하는 특정용매를 증발시키기에는 충분하나, 폴리에폭사이드가 현저히, 경화되지 않는 온도이하에서 가열 영역으로 통과시키고; C)임의로는 피복 제품을 폴리에폭사이드가 적어도 부분적으로 경화될 수 있도록 하는 조건하에 노출시킴을 특징으로 하여 제품을 피복시키는 방법.
- 제12항에 있어서, 촉매 및 억제제가 예비생성된 착화합물의 형태로 존재하는 방법.
- 제11항 내지 제13항중 어느 한항에 있어서, 에폭시 수지 조성물이, i)비극성 용매중 폴리에폭사이드100부, ii)용매 중수지 100당 경화제0.5내지 30부, iii)극성 용매 중 수지 100부당 붕산 0.01내지 2.0부, 및 iV)수지 100부당 촉매 0.01내지 2.0부를 포함하며, 촉매에 대한 억제제의 비가 0.1:1 내지 4.0:1.0 인 방법.
- 제14항에 있어서, C. 피복된 보강물질의 세그먼트(segmant)를 형성시키고, D. 피복된 보강물질의 세그먼트를 목적하는 배열로 접촉시키며, E. 피복된 보강물질의 접촉된 세그먼트를 폴리에폭사이드가 현저히 경화되는 온도에서 가압(이때 압력은 각각의 세그먼트상 폴레에폭사이드가 유동하여, 인접한 세그먼트상 폴리에폭사이드 또는 진척된 에폭시 수지와 혼합되도록 하기에 충분하다)시킴을 추가로 포함하여, 제품이 보강물질인 적층물의 제조하는 방법.
- 제3항 내지 제10항중 어느 한항에 따른 조성물의 부분 경화 반응 생성물(이때, 이 생성물을 추가로 경화될 수 있다)을 포함하는 조성물.
- 겔화 시간을 증가시키기 위해 붕산의 농도를 증가시키거나 또는 겔화 시간을 감소시키기 위해 붕산의 농도를 감소시킴으로써 억제제의 농도를 조절함을 특징으로 하여, 제3항, 제4항 및 제6항 내지 제10항중 어느 한항에 따른 조성물의 겔화 시간을 조정하는 방법.
- 제1항 내지 제10항에 있어서, 디-또는 트리하이드록시 치환된 탄화수소 용매의 용액중에서 붕산을 본 발명의 다른 성분하나 이상과 접촉시킴을 특징으로 하는 조성물.
- 제18항에 있어서, 용매가 1,2-프로판디올, 에틸렌글리콜 또는 글리세린인 조성물.
- ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US52648790A | 1990-05-21 | 1990-05-21 | |
| US526488 | 1990-05-21 | ||
| US07/526,488 US5169473A (en) | 1990-05-21 | 1990-05-21 | Latent catalysts, epoxy compositions incorporating same, and coating, impregnating and bonding methods employing the compositions |
| US07/526,487 | 1990-05-21 | ||
| US7/526,487 | 1990-05-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR910020060A true KR910020060A (ko) | 1991-12-19 |
| KR100229301B1 KR100229301B1 (ko) | 1999-11-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019910008147A Expired - Lifetime KR100229301B1 (ko) | 1990-05-21 | 1991-05-20 | 에폭시 수지 조성물 및 폴리에폭사이드 경화용 잠재성 촉매 |
Country Status (15)
| Country | Link |
|---|---|
| EP (1) | EP0458502B1 (ko) |
| JP (5) | JP3080245B2 (ko) |
| KR (1) | KR100229301B1 (ko) |
| CN (3) | CN1035823C (ko) |
| AT (1) | ATE243227T1 (ko) |
| AU (1) | AU657264B2 (ko) |
| BR (1) | BR9102108A (ko) |
| CA (1) | CA2042858A1 (ko) |
| DE (1) | DE69133280T2 (ko) |
| FI (1) | FI912435A7 (ko) |
| IL (1) | IL98185A (ko) |
| MY (1) | MY141502A (ko) |
| NO (1) | NO911933L (ko) |
| PT (1) | PT97724A (ko) |
| SG (1) | SG43193A1 (ko) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200079381A (ko) * | 2018-12-24 | 2020-07-03 | 주식회사 하이플럭스 | 내화 조성물 |
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| DE102013008723A1 (de) | 2013-05-23 | 2014-11-27 | Deutsche Institute Für Textil- Und Faserforschung Denkendorf | Polymerisierbare Reaktionsmischung zur Herstellung von Epoxidharzen und deren Verwendung |
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| CN108565041B (zh) * | 2018-04-20 | 2020-04-28 | 四川省银河化学股份有限公司 | 一种高电导耐焊接型低温银浆及其制备方法 |
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| WO2020050200A1 (ja) | 2018-09-05 | 2020-03-12 | 三菱ケミカル株式会社 | シートモールディングコンパウンド、および繊維強化複合材料 |
| JP7261563B2 (ja) * | 2018-11-02 | 2023-04-20 | 谷川油化興業株式会社 | 熱交換媒体 |
| DE102019121195A1 (de) * | 2019-08-06 | 2021-02-11 | Alzchem Trostberg Gmbh | Lagerstabile Epoxidharz-Zusammensetzung |
| CN111892695B (zh) * | 2020-07-13 | 2022-12-30 | 四川省玻纤集团有限公司 | 耐γ辐照的改性树脂及其制备方法、层压板及其制备工艺与应用 |
| KR102906330B1 (ko) * | 2023-01-12 | 2025-12-30 | 도레이첨단소재 주식회사 | 인장신율이 향상된 에폭시 수지 조성물과 이로부터 제조되는 강화섬유 복합재료 |
| CN117124521B (zh) * | 2023-07-25 | 2026-02-03 | 中国工程物理研究院化工材料研究所 | 一种通过取向填料含量V字形调控热压成型环氧vitrimer复合材料动态性能的方法 |
| CN118421192B (zh) * | 2024-07-04 | 2024-08-30 | 湖南飘峰电气股份有限公司 | 防火耐高温聚酰亚胺电磁线及其制备方法 |
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| US4001156A (en) * | 1972-08-03 | 1977-01-04 | Ppg Industries, Inc. | Method of producing epoxy group-containing, quaternary ammonium salt-containing resins |
| US4594291A (en) * | 1984-07-17 | 1986-06-10 | The Dow Chemical Company | Curable, partially advanced epoxy resins |
| IL75806A (en) * | 1984-07-17 | 1988-10-31 | Dow Chemical Co | Partially advanced epoxy resin compositions and products resulting from reacting and curing said compositions |
| US4668758A (en) * | 1985-09-30 | 1987-05-26 | Shell Oil Company | Cure rate control in epoxy resin compositions |
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1991
- 1991-05-13 EP EP91304277A patent/EP0458502B1/en not_active Expired - Lifetime
- 1991-05-13 DE DE69133280T patent/DE69133280T2/de not_active Expired - Lifetime
- 1991-05-13 SG SG1996005258A patent/SG43193A1/en unknown
- 1991-05-13 AT AT91304277T patent/ATE243227T1/de not_active IP Right Cessation
- 1991-05-16 NO NO91911933A patent/NO911933L/no unknown
- 1991-05-17 BR BR919102108A patent/BR9102108A/pt not_active Application Discontinuation
- 1991-05-17 CA CA002042858A patent/CA2042858A1/en not_active Abandoned
- 1991-05-17 MY MYPI91000833A patent/MY141502A/en unknown
- 1991-05-17 IL IL9818591A patent/IL98185A/en not_active IP Right Cessation
- 1991-05-20 PT PT97724A patent/PT97724A/pt not_active Application Discontinuation
- 1991-05-20 FI FI912435A patent/FI912435A7/fi not_active Application Discontinuation
- 1991-05-20 JP JP03114740A patent/JP3080245B2/ja not_active Expired - Lifetime
- 1991-05-20 KR KR1019910008147A patent/KR100229301B1/ko not_active Expired - Lifetime
- 1991-05-20 AU AU77211/91A patent/AU657264B2/en not_active Ceased
- 1991-05-20 CN CN91103442A patent/CN1035823C/zh not_active Expired - Fee Related
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1995
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1999
- 1999-03-01 JP JP05329299A patent/JP3321429B2/ja not_active Expired - Lifetime
- 1999-09-16 JP JP26274899A patent/JP3333762B2/ja not_active Expired - Lifetime
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2000
- 2000-04-04 JP JP2000106716A patent/JP3269621B2/ja not_active Expired - Lifetime
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2001
- 2001-11-08 JP JP2001343762A patent/JP3383658B2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200079381A (ko) * | 2018-12-24 | 2020-07-03 | 주식회사 하이플럭스 | 내화 조성물 |
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