KR960001902A - 주사형 노광 장치 - Google Patents

주사형 노광 장치 Download PDF

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Publication number
KR960001902A
KR960001902A KR1019950016562A KR19950016562A KR960001902A KR 960001902 A KR960001902 A KR 960001902A KR 1019950016562 A KR1019950016562 A KR 1019950016562A KR 19950016562 A KR19950016562 A KR 19950016562A KR 960001902 A KR960001902 A KR 960001902A
Authority
KR
South Korea
Prior art keywords
stage
mask
speed
command signal
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019950016562A
Other languages
English (en)
Korean (ko)
Inventor
스스무 마끼노우찌
도시오 우에다
Original Assignee
오노 시게오
가부시끼가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오노 시게오, 가부시끼가이샤 니콘 filed Critical 오노 시게오
Publication of KR960001902A publication Critical patent/KR960001902A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950016562A 1994-06-17 1995-06-17 주사형 노광 장치 Withdrawn KR960001902A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-135615 1994-06-17
JP6135615A JPH088159A (ja) 1994-06-17 1994-06-17 走査型露光装置

Publications (1)

Publication Number Publication Date
KR960001902A true KR960001902A (ko) 1996-01-26

Family

ID=15155954

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950016562A Withdrawn KR960001902A (ko) 1994-06-17 1995-06-17 주사형 노광 장치

Country Status (2)

Country Link
JP (1) JPH088159A (ja)
KR (1) KR960001902A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100337596B1 (ko) * 1998-07-17 2002-05-23 히로시 오우라 다중 컬럼의 대전 입자 빔 리소그라피 시스템

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100483982B1 (ko) * 1996-06-07 2005-08-10 가부시키가이샤 니콘 진동절연장치및노광장치
US6646715B1 (en) 1997-01-14 2003-11-11 Nikon Corporation Scanning exposure apparatus and method with run-up distance control
DE10121857B4 (de) 2000-05-09 2006-03-23 Nagatanien Co., Ltd. Biskuitkuchen-Vormischung und Teig zur Zubereitung von Biskuitkuchen
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
US7468782B2 (en) * 2005-04-25 2008-12-23 Asml Netherlands B.V. Lithographic apparatus, position quantity controller and control method with feedforward signal
US7352149B2 (en) * 2006-08-29 2008-04-01 Asml Netherlands B.V. Method for controlling the position of a movable object, a positioning system, and a lithographic apparatus
US8852751B2 (en) 2009-09-25 2014-10-07 Hamilton Sundstrand Corporation Wear resistant device and process therefor
WO2013161858A1 (ja) * 2012-04-24 2013-10-31 株式会社ニコン 制御装置、ステージ装置、露光装置、及び制御方法
US9946168B2 (en) * 2012-04-27 2018-04-17 Asml Netherlands B.V. Lithographic apparatus
JP6032503B2 (ja) * 2012-07-09 2016-11-30 株式会社ニコン 駆動システム及び駆動方法、並びに露光装置及び露光方法
JP7023121B2 (ja) * 2018-01-15 2022-02-21 倉敷化工株式会社 アクティブ除振装置
JP7737252B2 (ja) * 2021-07-13 2025-09-10 キヤノン株式会社 露光装置、および物品の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100337596B1 (ko) * 1998-07-17 2002-05-23 히로시 오우라 다중 컬럼의 대전 입자 빔 리소그라피 시스템

Also Published As

Publication number Publication date
JPH088159A (ja) 1996-01-12

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19950617

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid