KR970077146A - 집적회로 에어 브리지 구조 및 그것을 형성하기 위한 방법 - Google Patents

집적회로 에어 브리지 구조 및 그것을 형성하기 위한 방법 Download PDF

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Publication number
KR970077146A
KR970077146A KR1019970019607A KR19970019607A KR970077146A KR 970077146 A KR970077146 A KR 970077146A KR 1019970019607 A KR1019970019607 A KR 1019970019607A KR 19970019607 A KR19970019607 A KR 19970019607A KR 970077146 A KR970077146 A KR 970077146A
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Prior art keywords
wafer
air bridge
cavity
handle wafer
forming
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Inventor
호세 에이. 델가도
스티븐 제이. 골
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스콧 티. 마이쿠엔
해리스 코포레이션
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Publication of KR970077146A publication Critical patent/KR970077146A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/482—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes for individual devices provided for in groups H10D8/00 - H10D48/00, e.g. for power transistors
    • H10W20/483—Interconnections over air gaps, e.g. air bridges
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/061—Manufacture or treatment using SOI processes together with lateral isolation, e.g. combinations of SOI and shallow trench isolations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/181—Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H10P90/1914—Preparing SOI wafers using bonding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/021—Manufacture or treatment of air gaps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/20—Air gaps

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

핸들 웨이퍼는 유전체로 코팅된 공동을 가진다 .디바이스 웨이퍼는 핸들 웨이퍼에 접합되어 있다. 디바이스층에 제조된 금속도선, 디바이스 혹은 회로는 핸들 웨이퍼에서의 공동을 오버레이하여 그 결과 핸들 웨이퍼에 대한 기생 커패시턴스와 핸들 웨이퍼를 통한 혼선을 감소시킨다. 이것은 플라스틱 패키지에서 보호가 가능하고/또는 배치가 가능한 강한 에어 브리지 구조의 구성요소가 된다.

Description

집적회로 에어 브리지 구조 및 그것을 형성하기 위한 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제3도는 디바이스의 핸들링 및 오염방지를 용이하게 하도록 접합되고 에워싸여진 구조로 되는 브리지 구성에 도전성 재료를 포함하는 집적회로 일부의 단면도이다.

Claims (8)

  1. 접합된 웨이퍼에 에어 브리지를 형성하기 위한 방법에 있어서; 핸들 기판에 공동을 형성하는 단계와; 디바이스 웨이퍼를 핸들 웨이퍼에 접합시키는 단계와; 상기 디바이스 위이퍼를 금속층으로 덮는 단계와; 핸들웨이퍼의 공동 위의 금속 리드선에 상기 금속층을 형성하는 단계를 포함하는 것을 특징으로 하는 접합된 웨이퍼에 에어 브리지를 형성하기 위한 방법.
  2. 제1항에 있어서, 공동의 표면을 유전체로 덮는 단계를 특징으로 하는 방법.
  3. 제1항 또는 제2항에 있어서, 디바이스 웨이퍼와 핸들 웨이퍼를 결합하는 산화막 단계를 특징으로 하는 방법.
  4. 제1항 내지 3항 중 어느 항에 있어서, 핸들웨이퍼에 있는 공동 주위의 개구트랜치에 대하여 이것의 표면에 유전체층을 증착하고 트랜치를 채우는 것을 특징으로 하는 방법.
  5. 제4항에 있어서, 제1금속층 위에 인터레벨 금속유전체층(ILD)을 증착하고, ILD층을 통해 콘택 바이어스를 열고, 상기 ILD층 위에 제2금속층을 증착하고, ILD에 있는 바이어스를 통해 제1금속층에 대한 콘택에 제2금속층의 일부를 형성하는 것을 특징으로 하는 방법.
  6. 접합된 웨이퍼상의 에어 브리지에 있어서;핸들 웨이퍼의 표면에 에어 브리지 공동을 가지는 핸들 웨이퍼와; 핸들 웨이퍼에 접합되고 에어 브리지 공동을 덮는 디바이스 웨이퍼와;디바이스 웨이퍼상의 금속리드선과; 에어 브리지 공동의 표면을 코팅하는 유전체층을 포함하는 것을 특징으로 하는 에어 브리지.
  7. 제6항에 있어서, 디바이스 웨이퍼에 있는 트랜치의 분리 및 에어 브리지 공동을 둘러싸는 것을 특징으로 하는 에어 브리지 구조.
  8. 제7항에 있어서, 트랜치 표면에 유전체 코팅을 특징으로 하는 에어 브리지 구조
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970019607A 1996-05-20 1997-05-20 집적회로 에어 브리지 구조 및 그것을 형성하기 위한 방법 Ceased KR970077146A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/650,762 US5949144A (en) 1996-05-20 1996-05-20 Pre-bond cavity air bridge
US08/650,762 1996-05-20

Publications (1)

Publication Number Publication Date
KR970077146A true KR970077146A (ko) 1997-12-12

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Country Status (6)

Country Link
US (1) US5949144A (ko)
EP (1) EP0809288A3 (ko)
JP (1) JPH1050826A (ko)
KR (1) KR970077146A (ko)
CN (1) CN1181624A (ko)
TW (1) TW349233B (ko)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5767546A (en) * 1994-12-30 1998-06-16 Siliconix Incorporated Laternal power mosfet having metal strap layer to reduce distributed resistance
US6492705B1 (en) * 1996-06-04 2002-12-10 Intersil Corporation Integrated circuit air bridge structures and methods of fabricating same
US6236101B1 (en) * 1997-11-05 2001-05-22 Texas Instruments Incorporated Metallization outside protective overcoat for improved capacitors and inductors
US6072213A (en) * 1998-04-30 2000-06-06 Advanced Micro Devices, Inc. Transistor having an etchant-scalable channel length and method of making same
KR100268878B1 (ko) * 1998-05-08 2000-10-16 김영환 반도체소자 및 그의 제조방법
US6433401B1 (en) * 1999-04-06 2002-08-13 Analog Devices Imi, Inc. Microfabricated structures with trench-isolation using bonded-substrates and cavities
US6465811B1 (en) * 1999-07-12 2002-10-15 Gore Enterprise Holdings, Inc. Low-capacitance bond pads for high speed devices
US7335965B2 (en) 1999-08-25 2008-02-26 Micron Technology, Inc. Packaging of electronic chips with air-bridge structures
US6677209B2 (en) * 2000-02-14 2004-01-13 Micron Technology, Inc. Low dielectric constant STI with SOI devices
US6492209B1 (en) * 2000-06-30 2002-12-10 Advanced Micro Devices, Inc. Selectively thin silicon film for creating fully and partially depleted SOI on same wafer
JP3957038B2 (ja) * 2000-11-28 2007-08-08 シャープ株式会社 半導体基板及びその作製方法
JP2006511075A (ja) * 2002-12-19 2006-03-30 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 無応力複合基板及びその製造方法
JP4559839B2 (ja) * 2004-12-13 2010-10-13 トヨタ自動車株式会社 半導体装置の製造方法
US7767589B2 (en) 2007-02-07 2010-08-03 Raytheon Company Passivation layer for a circuit device and method of manufacture
US8173906B2 (en) * 2007-02-07 2012-05-08 Raytheon Company Environmental protection coating system and method
CN104752424B (zh) * 2013-12-27 2019-05-17 中芯国际集成电路制造(上海)有限公司 一种半导体器件及其制造方法和电子装置
CN105084296B (zh) * 2014-04-25 2017-02-08 无锡华润上华半导体有限公司 Mems电容式压力传感器的制作方法
CN107078713B (zh) * 2014-09-30 2021-10-26 株式会社村田制作所 梯型滤波器
US9666703B2 (en) * 2014-12-17 2017-05-30 Great Wall Semiconductor Corporation Semiconductor devices with cavities
US10461152B2 (en) 2017-07-10 2019-10-29 Globalfoundries Inc. Radio frequency switches with air gap structures
US10833153B2 (en) 2017-09-13 2020-11-10 Globalfoundries Inc. Switch with local silicon on insulator (SOI) and deep trench isolation
US10446643B2 (en) * 2018-01-22 2019-10-15 Globalfoundries Inc. Sealed cavity structures with a planar surface
US11056382B2 (en) * 2018-03-19 2021-07-06 Globalfoundries U.S. Inc. Cavity formation within and under semiconductor devices
US11410872B2 (en) 2018-11-30 2022-08-09 Globalfoundries U.S. Inc. Oxidized cavity structures within and under semiconductor devices
US10923577B2 (en) 2019-01-07 2021-02-16 Globalfoundries U.S. Inc. Cavity structures under shallow trench isolation regions
US11127816B2 (en) 2020-02-14 2021-09-21 Globalfoundries U.S. Inc. Heterojunction bipolar transistors with one or more sealed airgap
CN111463136B (zh) * 2020-04-30 2024-09-13 北京飞宇微电子电路有限责任公司 一种金属封装外壳及其制作方法和混合集成电路

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940020594A (ko) * 1993-02-17 1994-09-16 김광호 에스오아이(SOI : silicon on insulator) 구조의 반도체 장치 제조방법
KR20020041765A (ko) * 2000-11-28 2002-06-03 마찌다 가쯔히꼬 반도체 기판 및 그의 제조 방법
KR100347740B1 (ko) * 1998-09-22 2002-08-09 인터내셔널 비지네스 머신즈 코포레이션 전자 소자 및 채널 제조 방법

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4571608A (en) * 1983-01-03 1986-02-18 Honeywell Inc. Integrated voltage-isolation power supply
US4507845A (en) * 1983-09-12 1985-04-02 Trw Inc. Method of making field effect transistors with opposed source _and gate regions
JPS61184843A (ja) * 1985-02-13 1986-08-18 Toshiba Corp 複合半導体装置とその製造方法
US4859629A (en) * 1986-04-18 1989-08-22 M/A-Com, Inc. Method of fabricating a semiconductor beam lead device
US4894114A (en) * 1987-02-11 1990-01-16 Westinghouse Electric Corp. Process for producing vias in semiconductor
US5041881A (en) * 1987-05-18 1991-08-20 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Whiskerless Schottky diode
US4963505A (en) * 1987-10-27 1990-10-16 Nippondenso Co., Ltd. Semiconductor device and method of manufacturing same
DE3850855T2 (de) * 1987-11-13 1994-11-10 Nissan Motor Halbleitervorrichtung.
US5343064A (en) * 1988-03-18 1994-08-30 Spangler Leland J Fully integrated single-crystal silicon-on-insulator process, sensors and circuits
JPH01246850A (ja) * 1988-03-29 1989-10-02 Fujitsu Ltd 半導体基板及びその製法
US5354695A (en) * 1992-04-08 1994-10-11 Leedy Glenn J Membrane dielectric isolation IC fabrication
US5204282A (en) * 1988-09-30 1993-04-20 Nippon Soken, Inc. Semiconductor circuit structure and method for making the same
US4992764A (en) * 1989-02-21 1991-02-12 Hittite Microwave Corporation High-power FET circuit
US5209119A (en) * 1990-12-12 1993-05-11 Regents Of The University Of Minnesota Microdevice for sensing a force
US5406109A (en) * 1992-10-28 1995-04-11 Whitney; Julie G. Micro electronic element and method of making same
JPH0722583A (ja) * 1992-12-15 1995-01-24 Internatl Business Mach Corp <Ibm> 多層回路装置
US5426072A (en) * 1993-01-21 1995-06-20 Hughes Aircraft Company Process of manufacturing a three dimensional integrated circuit from stacked SOI wafers using a temporary silicon substrate
US5324683A (en) * 1993-06-02 1994-06-28 Motorola, Inc. Method of forming a semiconductor structure having an air region
JP3350152B2 (ja) * 1993-06-24 2002-11-25 三菱電機株式会社 半導体装置およびその製造方法
US5476819A (en) * 1993-07-26 1995-12-19 Litton Systems, Inc. Substrate anchor for undercut silicon on insulator microstructures
US5491461A (en) * 1994-05-09 1996-02-13 General Motors Corporation Magnetic field sensor on elemental semiconductor substrate with electric field reduction means
US5521406A (en) * 1994-08-31 1996-05-28 Texas Instruments Incorporated Integrated circuit with improved thermal impedance
US5608263A (en) * 1994-09-06 1997-03-04 The Regents Of The University Of Michigan Micromachined self packaged circuits for high-frequency applications
US5548099A (en) * 1994-09-13 1996-08-20 Martin Marietta Corporation Method for making an electronics module having air bridge protection without large area ablation
US5567982A (en) * 1994-09-30 1996-10-22 Bartelink; Dirk J. Air-dielectric transmission lines for integrated circuits
US5602052A (en) * 1995-04-24 1997-02-11 Harris Corporation Method of forming dummy island capacitor
FR2737342B1 (fr) * 1995-07-25 1997-08-22 Thomson Csf Composant semiconducteur avec dissipateur thermique integre

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940020594A (ko) * 1993-02-17 1994-09-16 김광호 에스오아이(SOI : silicon on insulator) 구조의 반도체 장치 제조방법
KR100347740B1 (ko) * 1998-09-22 2002-08-09 인터내셔널 비지네스 머신즈 코포레이션 전자 소자 및 채널 제조 방법
KR20020041765A (ko) * 2000-11-28 2002-06-03 마찌다 가쯔히꼬 반도체 기판 및 그의 제조 방법

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TW349233B (en) 1999-01-01
EP0809288A2 (en) 1997-11-26
JPH1050826A (ja) 1998-02-20
EP0809288A3 (en) 1999-01-13
US5949144A (en) 1999-09-07
CN1181624A (zh) 1998-05-13

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