KR970077237A - 반도체소자 제조용 플라즈마 식각장치 - Google Patents
반도체소자 제조용 플라즈마 식각장치 Download PDFInfo
- Publication number
- KR970077237A KR970077237A KR1019960014674A KR19960014674A KR970077237A KR 970077237 A KR970077237 A KR 970077237A KR 1019960014674 A KR1019960014674 A KR 1019960014674A KR 19960014674 A KR19960014674 A KR 19960014674A KR 970077237 A KR970077237 A KR 970077237A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- plasma etching
- semiconductor device
- wafers
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0418—Apparatus for fluid treatment for etching
- H10P72/0421—Apparatus for fluid treatment for etching for drying etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (2)
- 웨이퍼가 안착되는 애노드를 구비한 반도체소자 제조용 플라즈마 식각장치에 있어서, 상기 애노드의 중심에 상기 웨이퍼가 삽입되는 홈이 형성된 것을 특징으로 하는 반도체소자 제조용 플라즈마 식각장치.
- 제1항에 있어서, 상기 홈의 바닥은 평탄면을 갖도록 한 것을 특징으로 하는 반도체 제조용 플라즈마 식각장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960014674A KR970077237A (ko) | 1996-05-06 | 1996-05-06 | 반도체소자 제조용 플라즈마 식각장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960014674A KR970077237A (ko) | 1996-05-06 | 1996-05-06 | 반도체소자 제조용 플라즈마 식각장치 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970077237A true KR970077237A (ko) | 1997-12-12 |
Family
ID=66216610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960014674A Withdrawn KR970077237A (ko) | 1996-05-06 | 1996-05-06 | 반도체소자 제조용 플라즈마 식각장치 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970077237A (ko) |
-
1996
- 1996-05-06 KR KR1019960014674A patent/KR970077237A/ko not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| PC1203 | Withdrawal of no request for examination |
St.27 status event code: N-1-6-B10-B12-nap-PC1203 |
|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid | ||
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |