KR970077474A - 수직 웨이퍼 보트 - Google Patents
수직 웨이퍼 보트 Download PDFInfo
- Publication number
- KR970077474A KR970077474A KR1019970018828A KR19970018828A KR970077474A KR 970077474 A KR970077474 A KR 970077474A KR 1019970018828 A KR1019970018828 A KR 1019970018828A KR 19970018828 A KR19970018828 A KR 19970018828A KR 970077474 A KR970077474 A KR 970077474A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer boat
- support
- vertical wafer
- support groove
- vertical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/12—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/12—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
- H10P72/123—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterised by a material, a roughness, a coating or the like
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S206/00—Special receptacle or package
- Y10S206/832—Semiconductor wafer boat
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (10)
- 상부 위치와 하부 위치에 배열된 한쌍의 단부 플레이트와, 상기 단부 플레이트들을 연결하는 복수의 봉과, 상기 봉에 소정의 간격으로 형성되어 반도체 웨이퍼를 수용 및 지지하는 지지 홈과, 및 인접하는 상기 지지 홈들 사이에 각각 형성되는 빗살-치형의 지지 피스를 포함하는 수직 웨이퍼 보트로서, 상기 단부 플레이트, 봉,지지 홈 및 지지 피스가 탄화규소를 주성분으로서 포함하는 재료로 제조되고, 상기 각 지지 홈의 바닥부와 이에 인접하는 상기지지 피스의 기부 사이에 모퉁이는 0.1-1㎜의 반경으로 모가 둥글게 되는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기 지지 피스가 a㎜의 두께를 갖고, 상기지지 홈이 b㎜의 깊이와 c㎜의 수직 공간을 가지며, 이들 간에는 (b/a)×c〉10㎜의 관계가 성립하는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기지지 홈이 b㎜의 깊이를 갖고, 봉 두께로부터 상기 지지 홈의 깊이를 뺄셈함으로써 얻어지는 길이가 d㎜이며, 이들 간에는 b〉d의 관계가 성립하는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기지지 홈이 10㎛ 이하의 표면조도, 또는 0.1㎜이하의 편평도를 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기지지 피스가1/500-1/20의 원뿔각을 제공하는 테이퍼형 단면형상으로 형성된 것을 특징으로 하는 수직 웨이퍼 보트.
- 제4항에 있어서, 상기 지지 홈의 내벽의 표면조도가 30㎛ 이하인 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기 지지 홈의 바닥부 및 인접하는 상기 지지 피스의 기부 사이의 모퉁이는 0.2-0.7㎜의 반경으로 모가 둥글게 되는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기 각 봉이 65-250㎟의 단면적을 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기 봉과 단부 플레이트는 내부에 채워진 실리콘을 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
- 제1항에 있어서, 상기 봉과 단부 플레이트는 탄화규소를 피막된 표면을 갖는 것을 특징으로 하는 수직 웨이퍼 보트.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14814596A JPH09306980A (ja) | 1996-05-17 | 1996-05-17 | 縦型ウエハボート |
| JP96-148145 | 1996-05-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970077474A true KR970077474A (ko) | 1997-12-12 |
| KR100474157B1 KR100474157B1 (ko) | 2005-04-14 |
Family
ID=15446278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019970018828A Expired - Fee Related KR100474157B1 (ko) | 1996-05-17 | 1997-05-16 | 수직웨이퍼보트 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5858103A (ko) |
| EP (1) | EP0807961B1 (ko) |
| JP (1) | JPH09306980A (ko) |
| KR (1) | KR100474157B1 (ko) |
| DE (1) | DE69716811T2 (ko) |
| TW (1) | TW392275B (ko) |
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW325588B (en) * | 1996-02-28 | 1998-01-21 | Asahi Glass Co Ltd | Vertical wafer boat |
| KR100284567B1 (ko) * | 1997-04-15 | 2001-04-02 | 후지이 아키히로 | 수직 웨이퍼 보트 |
| US6474474B2 (en) * | 1998-02-06 | 2002-11-05 | Sumitomo Metal Industries, Ltd. | Sheet support container |
| US5931666A (en) * | 1998-02-27 | 1999-08-03 | Saint-Gobain Industrial Ceramics, Inc. | Slip free vertical rack design having rounded horizontal arms |
| US6073828A (en) * | 1998-06-30 | 2000-06-13 | Lam Research Corporation | End effector for substrate handling and method for making the same |
| US6171400B1 (en) * | 1998-10-02 | 2001-01-09 | Union Oil Company Of California | Vertical semiconductor wafer carrier |
| US6196211B1 (en) * | 1999-04-15 | 2001-03-06 | Integrated Materials, Inc. | Support members for wafer processing fixtures |
| US6205993B1 (en) | 1999-04-15 | 2001-03-27 | Integrated Materials, Inc. | Method and apparatus for fabricating elongate crystalline members |
| US6225594B1 (en) | 1999-04-15 | 2001-05-01 | Integrated Materials, Inc. | Method and apparatus for securing components of wafer processing fixtures |
| JP2001230312A (ja) * | 2000-02-16 | 2001-08-24 | Nec Corp | 半導体製造装置 |
| US6341935B1 (en) * | 2000-06-14 | 2002-01-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer boat having improved wafer holding capability |
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| JP2002043229A (ja) * | 2000-07-25 | 2002-02-08 | Hitachi Kokusai Electric Inc | 半導体製造装置 |
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| JP2002270614A (ja) * | 2001-03-12 | 2002-09-20 | Canon Inc | Soi基体、その熱処理方法、それを有する半導体装置およびその製造方法 |
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| KR20030048682A (ko) * | 2001-12-12 | 2003-06-25 | 삼성전자주식회사 | 반도체 웨이퍼 가이드 및 이를 구비한 반도체 습식세정장치 |
| US6835039B2 (en) * | 2002-03-15 | 2004-12-28 | Asm International N.V. | Method and apparatus for batch processing of wafers in a furnace |
| AU2003253873A1 (en) * | 2002-07-15 | 2004-02-02 | Aviza Technology, Inc. | Apparatus and method for backfilling a semiconductor wafer process chamber |
| US6582221B1 (en) * | 2002-07-19 | 2003-06-24 | Asm International N.V. | Wafer boat and method for treatment of substrates |
| US7256375B2 (en) * | 2002-08-30 | 2007-08-14 | Asm International N.V. | Susceptor plate for high temperature heat treatment |
| KR100615761B1 (ko) * | 2002-09-11 | 2006-08-28 | 신에츠 폴리머 가부시키가이샤 | 기판 수납 용기 |
| US7033126B2 (en) * | 2003-04-02 | 2006-04-25 | Asm International N.V. | Method and apparatus for loading a batch of wafers into a wafer boat |
| US7749196B2 (en) * | 2003-07-02 | 2010-07-06 | Cook Incorporated | Small gauge needle catheterization apparatus |
| DE10334940B4 (de) * | 2003-07-31 | 2007-08-23 | Infineon Technologies Ag | Trägereinrichtung |
| TWI310850B (en) * | 2003-08-01 | 2009-06-11 | Foxsemicon Integrated Tech Inc | Substrate supporting rod and substrate cassette using the same |
| US7181132B2 (en) | 2003-08-20 | 2007-02-20 | Asm International N.V. | Method and system for loading substrate supports into a substrate holder |
| US20060060145A1 (en) * | 2004-09-17 | 2006-03-23 | Van Den Berg Jannes R | Susceptor with surface roughness for high temperature substrate processing |
| US20060065634A1 (en) * | 2004-09-17 | 2006-03-30 | Van Den Berg Jannes R | Low temperature susceptor cleaning |
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| US20060150906A1 (en) * | 2005-01-07 | 2006-07-13 | Selen Louis J M | Wafer boat for reduced shadow marks |
| US7241141B2 (en) * | 2005-09-19 | 2007-07-10 | Texas Instruments Incorporated | Low contact SiC boat for silicon nitride stress reduction |
| US7736437B2 (en) * | 2006-02-03 | 2010-06-15 | Integrated Materials, Incorporated | Baffled liner cover |
| JP2007329173A (ja) * | 2006-06-06 | 2007-12-20 | Covalent Materials Corp | 縦型ウェーハボート |
| TW200845265A (en) * | 2007-05-10 | 2008-11-16 | Nanya Technology Corp | Wafer supporter |
| US8998004B2 (en) * | 2009-09-02 | 2015-04-07 | Honda Motor Co., Ltd. | Conveyance rack, method for retaining metal ring, and method for heat treatment of metal ring |
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| US20150128863A1 (en) * | 2013-11-14 | 2015-05-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Mechanisms for furnace apparatus and wafer boat |
| US20170175265A1 (en) * | 2015-12-18 | 2017-06-22 | Applied Materials, Inc. | Flat susceptor with grooves for minimizing temperature profile across a substrate |
| JP2018067582A (ja) * | 2016-10-18 | 2018-04-26 | 東芝メモリ株式会社 | 半導体製造装置及び半導体装置の製造方法 |
| TWI690771B (zh) * | 2018-01-11 | 2020-04-11 | 家登精密工業股份有限公司 | 光罩壓抵單元及應用其之極紫外光光罩容器 |
| JP7030604B2 (ja) * | 2018-04-19 | 2022-03-07 | 三菱電機株式会社 | ウエハボートおよびその製造方法 |
| NL2022185B1 (nl) * | 2018-12-12 | 2020-07-02 | Suss Microtec Lithography Gmbh | Substratkassette |
| KR102290078B1 (ko) * | 2019-10-18 | 2021-08-17 | 주식회사 예스파워테크닉스 | 웨이퍼용 보트 |
| KR102768950B1 (ko) * | 2020-02-06 | 2025-02-19 | 삼성디스플레이 주식회사 | 기판용 카세트 |
| JP7431487B2 (ja) * | 2020-03-05 | 2024-02-15 | クアーズテック合同会社 | 縦型ウエハボート及び縦型ウエハボートの製造方法 |
| KR20240025081A (ko) * | 2022-08-17 | 2024-02-27 | 삼성디스플레이 주식회사 | 초박형 유리용 카세트 |
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| JPH07120633B2 (ja) * | 1987-03-17 | 1995-12-20 | 富士通株式会社 | 半導体用治具の製造方法 |
| JPS644018A (en) * | 1987-06-26 | 1989-01-09 | Toshiba Ceramics Co | Vertical-type diffusion furnace |
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| JP2548949B2 (ja) * | 1987-09-01 | 1996-10-30 | 東芝セラミックス株式会社 | 半導体製造用構成部材 |
| JPH02102524A (ja) * | 1988-10-11 | 1990-04-16 | Nec Corp | ウェハーボート |
| JPH02123736A (ja) * | 1988-11-02 | 1990-05-11 | Tel Sagami Ltd | 縦型熱処理炉用ウェハボート |
| JPH04120000A (ja) * | 1990-09-07 | 1992-04-21 | Seiko Epson Corp | 半導体熱処理治具 |
| JPH04300262A (ja) * | 1991-03-28 | 1992-10-23 | Shin Etsu Chem Co Ltd | 炭化珪素質治具 |
| JPH04310373A (ja) * | 1991-04-04 | 1992-11-02 | Nippon Steel Corp | スライシング用内周刃砥石 |
| JPH06163439A (ja) * | 1992-11-16 | 1994-06-10 | Shin Etsu Chem Co Ltd | 半導体拡散炉用ボート及びその製造方法 |
| US5492229A (en) * | 1992-11-27 | 1996-02-20 | Toshiba Ceramics Co., Ltd. | Vertical boat and a method for making the same |
| JP3348936B2 (ja) * | 1993-10-21 | 2002-11-20 | 東京エレクトロン株式会社 | 縦型熱処理装置 |
| JPH06302680A (ja) * | 1993-04-14 | 1994-10-28 | Shunichi Maekawa | ウェハ保持装置 |
| JPH06349758A (ja) * | 1993-06-03 | 1994-12-22 | Kokusai Electric Co Ltd | 縦型半導体製造装置用ボート |
| JPH07147258A (ja) * | 1993-11-25 | 1995-06-06 | Hitachi Ltd | 半導体ウェハの熱処理装置 |
| US5534074A (en) * | 1995-05-17 | 1996-07-09 | Heraeus Amersil, Inc. | Vertical boat for holding semiconductor wafers |
| US5638958A (en) * | 1995-09-08 | 1997-06-17 | Micron Technology, Inc. | Semiconductor film wafer cassette |
-
1996
- 1996-05-17 JP JP14814596A patent/JPH09306980A/ja active Pending
-
1997
- 1997-05-13 TW TW086106372A patent/TW392275B/zh not_active IP Right Cessation
- 1997-05-14 US US08/855,950 patent/US5858103A/en not_active Expired - Lifetime
- 1997-05-16 KR KR1019970018828A patent/KR100474157B1/ko not_active Expired - Fee Related
- 1997-05-16 EP EP97108038A patent/EP0807961B1/en not_active Expired - Lifetime
- 1997-05-16 DE DE69716811T patent/DE69716811T2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0807961A1 (en) | 1997-11-19 |
| KR100474157B1 (ko) | 2005-04-14 |
| DE69716811D1 (de) | 2002-12-12 |
| JPH09306980A (ja) | 1997-11-28 |
| TW392275B (en) | 2000-06-01 |
| EP0807961B1 (en) | 2002-11-06 |
| US5858103A (en) | 1999-01-12 |
| DE69716811T2 (de) | 2003-09-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
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