KR970077474A - 수직 웨이퍼 보트 - Google Patents

수직 웨이퍼 보트 Download PDF

Info

Publication number
KR970077474A
KR970077474A KR1019970018828A KR19970018828A KR970077474A KR 970077474 A KR970077474 A KR 970077474A KR 1019970018828 A KR1019970018828 A KR 1019970018828A KR 19970018828 A KR19970018828 A KR 19970018828A KR 970077474 A KR970077474 A KR 970077474A
Authority
KR
South Korea
Prior art keywords
wafer boat
support
vertical wafer
support groove
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
KR1019970018828A
Other languages
English (en)
Other versions
KR100474157B1 (ko
Inventor
도시오 나까지마
히사오 야마모또
Original Assignee
세야 히로미찌
아사히가라스 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세야 히로미찌, 아사히가라스 가부시끼가이샤 filed Critical 세야 히로미찌
Publication of KR970077474A publication Critical patent/KR970077474A/ko
Application granted granted Critical
Publication of KR100474157B1 publication Critical patent/KR100474157B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/12Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/12Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H10P72/123Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterised by a material, a roughness, a coating or the like
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S206/00Special receptacle or package
    • Y10S206/832Semiconductor wafer boat
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

수직 웨이퍼 보트의 상부와 하부의 단부 플레이트들을 연결하는 봉들에 형성된, 각각의 반도체 웨어퍼 삽입 및 지지 홈의 바닥부와, 상기 지지 홈과 이에 인접하는 지지 홈간의지지 피스의 기부 사이의 모퉁이에 0.1-1㎜의 반경이 제공된다.

Description

수직 웨이퍼 보트
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 일 실시예에 따른 수직 웨이퍼 보트의 지지 홈들의 확대 단면도.

Claims (10)

  1. 상부 위치와 하부 위치에 배열된 한쌍의 단부 플레이트와, 상기 단부 플레이트들을 연결하는 복수의 봉과, 상기 봉에 소정의 간격으로 형성되어 반도체 웨이퍼를 수용 및 지지하는 지지 홈과, 및 인접하는 상기 지지 홈들 사이에 각각 형성되는 빗살-치형의 지지 피스를 포함하는 수직 웨이퍼 보트로서, 상기 단부 플레이트, 봉,지지 홈 및 지지 피스가 탄화규소를 주성분으로서 포함하는 재료로 제조되고, 상기 각 지지 홈의 바닥부와 이에 인접하는 상기지지 피스의 기부 사이에 모퉁이는 0.1-1㎜의 반경으로 모가 둥글게 되는 것을 특징으로 하는 수직 웨이퍼 보트.
  2. 제1항에 있어서, 상기 지지 피스가 a㎜의 두께를 갖고, 상기지지 홈이 b㎜의 깊이와 c㎜의 수직 공간을 가지며, 이들 간에는 (b/a)×c〉10㎜의 관계가 성립하는 것을 특징으로 하는 수직 웨이퍼 보트.
  3. 제1항에 있어서, 상기지지 홈이 b㎜의 깊이를 갖고, 봉 두께로부터 상기 지지 홈의 깊이를 뺄셈함으로써 얻어지는 길이가 d㎜이며, 이들 간에는 b〉d의 관계가 성립하는 것을 특징으로 하는 수직 웨이퍼 보트.
  4. 제1항에 있어서, 상기지지 홈이 10㎛ 이하의 표면조도, 또는 0.1㎜이하의 편평도를 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
  5. 제1항에 있어서, 상기지지 피스가1/500-1/20의 원뿔각을 제공하는 테이퍼형 단면형상으로 형성된 것을 특징으로 하는 수직 웨이퍼 보트.
  6. 제4항에 있어서, 상기 지지 홈의 내벽의 표면조도가 30㎛ 이하인 것을 특징으로 하는 수직 웨이퍼 보트.
  7. 제1항에 있어서, 상기 지지 홈의 바닥부 및 인접하는 상기 지지 피스의 기부 사이의 모퉁이는 0.2-0.7㎜의 반경으로 모가 둥글게 되는 것을 특징으로 하는 수직 웨이퍼 보트.
  8. 제1항에 있어서, 상기 각 봉이 65-250㎟의 단면적을 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
  9. 제1항에 있어서, 상기 봉과 단부 플레이트는 내부에 채워진 실리콘을 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
  10. 제1항에 있어서, 상기 봉과 단부 플레이트는 탄화규소를 피막된 표면을 갖는 것을 특징으로 하는 수직 웨이퍼 보트.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970018828A 1996-05-17 1997-05-16 수직웨이퍼보트 Expired - Fee Related KR100474157B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14814596A JPH09306980A (ja) 1996-05-17 1996-05-17 縦型ウエハボート
JP96-148145 1996-05-17

Publications (2)

Publication Number Publication Date
KR970077474A true KR970077474A (ko) 1997-12-12
KR100474157B1 KR100474157B1 (ko) 2005-04-14

Family

ID=15446278

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970018828A Expired - Fee Related KR100474157B1 (ko) 1996-05-17 1997-05-16 수직웨이퍼보트

Country Status (6)

Country Link
US (1) US5858103A (ko)
EP (1) EP0807961B1 (ko)
JP (1) JPH09306980A (ko)
KR (1) KR100474157B1 (ko)
DE (1) DE69716811T2 (ko)
TW (1) TW392275B (ko)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW325588B (en) * 1996-02-28 1998-01-21 Asahi Glass Co Ltd Vertical wafer boat
KR100284567B1 (ko) * 1997-04-15 2001-04-02 후지이 아키히로 수직 웨이퍼 보트
US6474474B2 (en) * 1998-02-06 2002-11-05 Sumitomo Metal Industries, Ltd. Sheet support container
US5931666A (en) * 1998-02-27 1999-08-03 Saint-Gobain Industrial Ceramics, Inc. Slip free vertical rack design having rounded horizontal arms
US6073828A (en) * 1998-06-30 2000-06-13 Lam Research Corporation End effector for substrate handling and method for making the same
US6171400B1 (en) * 1998-10-02 2001-01-09 Union Oil Company Of California Vertical semiconductor wafer carrier
US6196211B1 (en) * 1999-04-15 2001-03-06 Integrated Materials, Inc. Support members for wafer processing fixtures
US6205993B1 (en) 1999-04-15 2001-03-27 Integrated Materials, Inc. Method and apparatus for fabricating elongate crystalline members
US6225594B1 (en) 1999-04-15 2001-05-01 Integrated Materials, Inc. Method and apparatus for securing components of wafer processing fixtures
JP2001230312A (ja) * 2000-02-16 2001-08-24 Nec Corp 半導体製造装置
US6341935B1 (en) * 2000-06-14 2002-01-29 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer boat having improved wafer holding capability
US6450346B1 (en) 2000-06-30 2002-09-17 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing
US6455395B1 (en) 2000-06-30 2002-09-24 Integrated Materials, Inc. Method of fabricating silicon structures including fixtures for supporting wafers
ATE506693T1 (de) * 2000-06-30 2011-05-15 Integrated Materials Inc Silizium-befestigungen für scheibenhaltervorrichtung zur wärmebehandlung und herstellungsverfahren
JP2002043229A (ja) * 2000-07-25 2002-02-08 Hitachi Kokusai Electric Inc 半導体製造装置
US6631935B1 (en) 2000-08-04 2003-10-14 Tru-Si Technologies, Inc. Detection and handling of semiconductor wafer and wafer-like objects
US20020130061A1 (en) * 2000-11-02 2002-09-19 Hengst Richard R. Apparatus and method of making a slip free wafer boat
US6727191B2 (en) * 2001-02-26 2004-04-27 Integrated Materials, Inc. High temperature hydrogen anneal of silicon wafers supported on a silicon fixture
JP2002270614A (ja) * 2001-03-12 2002-09-20 Canon Inc Soi基体、その熱処理方法、それを有する半導体装置およびその製造方法
US6811040B2 (en) * 2001-07-16 2004-11-02 Rohm And Haas Company Wafer holding apparatus
US6845779B2 (en) * 2001-11-13 2005-01-25 Fsi International, Inc. Edge gripping device for handling a set of semiconductor wafers in an immersion processing system
KR20030048682A (ko) * 2001-12-12 2003-06-25 삼성전자주식회사 반도체 웨이퍼 가이드 및 이를 구비한 반도체 습식세정장치
US6835039B2 (en) * 2002-03-15 2004-12-28 Asm International N.V. Method and apparatus for batch processing of wafers in a furnace
AU2003253873A1 (en) * 2002-07-15 2004-02-02 Aviza Technology, Inc. Apparatus and method for backfilling a semiconductor wafer process chamber
US6582221B1 (en) * 2002-07-19 2003-06-24 Asm International N.V. Wafer boat and method for treatment of substrates
US7256375B2 (en) * 2002-08-30 2007-08-14 Asm International N.V. Susceptor plate for high temperature heat treatment
KR100615761B1 (ko) * 2002-09-11 2006-08-28 신에츠 폴리머 가부시키가이샤 기판 수납 용기
US7033126B2 (en) * 2003-04-02 2006-04-25 Asm International N.V. Method and apparatus for loading a batch of wafers into a wafer boat
US7749196B2 (en) * 2003-07-02 2010-07-06 Cook Incorporated Small gauge needle catheterization apparatus
DE10334940B4 (de) * 2003-07-31 2007-08-23 Infineon Technologies Ag Trägereinrichtung
TWI310850B (en) * 2003-08-01 2009-06-11 Foxsemicon Integrated Tech Inc Substrate supporting rod and substrate cassette using the same
US7181132B2 (en) 2003-08-20 2007-02-20 Asm International N.V. Method and system for loading substrate supports into a substrate holder
US20060060145A1 (en) * 2004-09-17 2006-03-23 Van Den Berg Jannes R Susceptor with surface roughness for high temperature substrate processing
US20060065634A1 (en) * 2004-09-17 2006-03-30 Van Den Berg Jannes R Low temperature susceptor cleaning
US20080257779A1 (en) * 2004-09-29 2008-10-23 Hoya Corporation Supporting Member For Thin-Film-Coated Boards, Storage Container For Thin-Film-Coated Boards, Mask-Blank-Storing Body, Transfer-Mask-Storing Body, and Method For Transporting Thin-Film-Coated Boards
JP2006128316A (ja) * 2004-10-27 2006-05-18 Shin Etsu Handotai Co Ltd 熱処理用縦型ボートおよび熱処理方法
US20060150906A1 (en) * 2005-01-07 2006-07-13 Selen Louis J M Wafer boat for reduced shadow marks
US7241141B2 (en) * 2005-09-19 2007-07-10 Texas Instruments Incorporated Low contact SiC boat for silicon nitride stress reduction
US7736437B2 (en) * 2006-02-03 2010-06-15 Integrated Materials, Incorporated Baffled liner cover
JP2007329173A (ja) * 2006-06-06 2007-12-20 Covalent Materials Corp 縦型ウェーハボート
TW200845265A (en) * 2007-05-10 2008-11-16 Nanya Technology Corp Wafer supporter
US8998004B2 (en) * 2009-09-02 2015-04-07 Honda Motor Co., Ltd. Conveyance rack, method for retaining metal ring, and method for heat treatment of metal ring
US20110259840A1 (en) * 2010-04-23 2011-10-27 Advanced Semiconductor Engineering, Inc. Semiconductor package magazine
US9153466B2 (en) * 2012-04-26 2015-10-06 Asm Ip Holding B.V. Wafer boat
US20150128863A1 (en) * 2013-11-14 2015-05-14 Taiwan Semiconductor Manufacturing Co., Ltd. Mechanisms for furnace apparatus and wafer boat
US20170175265A1 (en) * 2015-12-18 2017-06-22 Applied Materials, Inc. Flat susceptor with grooves for minimizing temperature profile across a substrate
JP2018067582A (ja) * 2016-10-18 2018-04-26 東芝メモリ株式会社 半導体製造装置及び半導体装置の製造方法
TWI690771B (zh) * 2018-01-11 2020-04-11 家登精密工業股份有限公司 光罩壓抵單元及應用其之極紫外光光罩容器
JP7030604B2 (ja) * 2018-04-19 2022-03-07 三菱電機株式会社 ウエハボートおよびその製造方法
NL2022185B1 (nl) * 2018-12-12 2020-07-02 Suss Microtec Lithography Gmbh Substratkassette
KR102290078B1 (ko) * 2019-10-18 2021-08-17 주식회사 예스파워테크닉스 웨이퍼용 보트
KR102768950B1 (ko) * 2020-02-06 2025-02-19 삼성디스플레이 주식회사 기판용 카세트
JP7431487B2 (ja) * 2020-03-05 2024-02-15 クアーズテック合同会社 縦型ウエハボート及び縦型ウエハボートの製造方法
KR20240025081A (ko) * 2022-08-17 2024-02-27 삼성디스플레이 주식회사 초박형 유리용 카세트

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07120633B2 (ja) * 1987-03-17 1995-12-20 富士通株式会社 半導体用治具の製造方法
JPS644018A (en) * 1987-06-26 1989-01-09 Toshiba Ceramics Co Vertical-type diffusion furnace
US4872554A (en) * 1987-07-02 1989-10-10 Fluoroware, Inc. Reinforced carrier with embedded rigid insert
JP2548949B2 (ja) * 1987-09-01 1996-10-30 東芝セラミックス株式会社 半導体製造用構成部材
JPH02102524A (ja) * 1988-10-11 1990-04-16 Nec Corp ウェハーボート
JPH02123736A (ja) * 1988-11-02 1990-05-11 Tel Sagami Ltd 縦型熱処理炉用ウェハボート
JPH04120000A (ja) * 1990-09-07 1992-04-21 Seiko Epson Corp 半導体熱処理治具
JPH04300262A (ja) * 1991-03-28 1992-10-23 Shin Etsu Chem Co Ltd 炭化珪素質治具
JPH04310373A (ja) * 1991-04-04 1992-11-02 Nippon Steel Corp スライシング用内周刃砥石
JPH06163439A (ja) * 1992-11-16 1994-06-10 Shin Etsu Chem Co Ltd 半導体拡散炉用ボート及びその製造方法
US5492229A (en) * 1992-11-27 1996-02-20 Toshiba Ceramics Co., Ltd. Vertical boat and a method for making the same
JP3348936B2 (ja) * 1993-10-21 2002-11-20 東京エレクトロン株式会社 縦型熱処理装置
JPH06302680A (ja) * 1993-04-14 1994-10-28 Shunichi Maekawa ウェハ保持装置
JPH06349758A (ja) * 1993-06-03 1994-12-22 Kokusai Electric Co Ltd 縦型半導体製造装置用ボート
JPH07147258A (ja) * 1993-11-25 1995-06-06 Hitachi Ltd 半導体ウェハの熱処理装置
US5534074A (en) * 1995-05-17 1996-07-09 Heraeus Amersil, Inc. Vertical boat for holding semiconductor wafers
US5638958A (en) * 1995-09-08 1997-06-17 Micron Technology, Inc. Semiconductor film wafer cassette

Also Published As

Publication number Publication date
EP0807961A1 (en) 1997-11-19
KR100474157B1 (ko) 2005-04-14
DE69716811D1 (de) 2002-12-12
JPH09306980A (ja) 1997-11-28
TW392275B (en) 2000-06-01
EP0807961B1 (en) 2002-11-06
US5858103A (en) 1999-01-12
DE69716811T2 (de) 2003-09-04

Similar Documents

Publication Publication Date Title
KR970077474A (ko) 수직 웨이퍼 보트
KR960020637A (ko) 회로 소자 실장 구조물
ES2093092T3 (es) Edificios y metodos de construir edificios.
MY124438A (en) A block wall construction system and components thereof.
DK269688A (da) Fremgangsmaader til fremstilling af antistatisk papir og herved fremstillede papirprodukter og anvendt apparatur
KR970701287A (ko) 깊고 앝은 홈이 교호로 배치되어 있는 리파이너 디스크(refiner disk with alternating depth grooves)
FI854979A7 (fi) Hoernhaollare foer speglar o.d. foeremaol.
DK563884A (da) Biomekaniske mikrostrukturer og fast ikke-biologisk substrat herfor
KR860008593A (ko) 웨이퍼 이재구(Wafer 移載具)
KR880004185A (ko) 프리 액세스 바닥판
KR940012567A (ko) 종형보트
KR830006532A (ko) 제지기의 헤드 박스
KR940008026A (ko) 반도체 패키지
KR870003914A (ko) 차량용 좌석받침대와 이를 구비한 좌석조립체
FR2751588A3 (fr) Porte-crayons modulaire, de forme modifiable
ATE44992T1 (de) Baulagerkonstruktion.
KR920702016A (ko) Cvd 장치를 위한 기판 지지장치
JP2005098891A (ja) 静電容量式センサ
IT8221311A0 (it) Impilatore di pezzi piccoli con disposizione in verticale.
SU1724835A1 (ru) Фиксатор защитного сло бетона дл арматуры
RU96110767A (ru) Насадка регенератора
SU605889A1 (ru) Виброизолированный фундамент
US994257A (en) Biscuit.
TR200100353T1 (tr) Üç boyutlu olarak şekillendirilmiş, delikli plastik malzemeden hazırlanan bir film ve bunun gerçekleştirilmesi için ilişkili bir matris
SU783436A1 (ru) Строительный блок

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

A201 Request for examination
AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

AMND Amendment
J201 Request for trial against refusal decision
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PJ0201 Trial against decision of rejection

St.27 status event code: A-3-3-V10-V11-apl-PJ0201

PB0901 Examination by re-examination before a trial

St.27 status event code: A-6-3-E10-E12-rex-PB0901

B701 Decision to grant
PB0701 Decision of registration after re-examination before a trial

St.27 status event code: A-3-4-F10-F13-rex-PB0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20130201

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20140214

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20150223

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20150223

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000