MA46932A - Silicium purifié, dispositifs et systèmes permattant sa production - Google Patents

Silicium purifié, dispositifs et systèmes permattant sa production

Info

Publication number
MA46932A
MA46932A MA046932A MA46932A MA46932A MA 46932 A MA46932 A MA 46932A MA 046932 A MA046932 A MA 046932A MA 46932 A MA46932 A MA 46932A MA 46932 A MA46932 A MA 46932A
Authority
MA
Morocco
Prior art keywords
production
devices
purified silicon
systems enabling
enabling
Prior art date
Application number
MA046932A
Other languages
English (en)
Inventor
Robert M Showalter
Original Assignee
Milwaukee Silicon Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Milwaukee Silicon Llc filed Critical Milwaukee Silicon Llc
Publication of MA46932A publication Critical patent/MA46932A/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/02—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor with moving adsorbents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D21/00—Separation of suspended solid particles from liquids by sedimentation
    • B01D21/0084—Enhancing liquid-particle separation using the flotation principle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J10/00—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor
    • B01J10/005—Chemical processes in general for reacting liquid with gaseous media other than in the presence of solid particles, or apparatus specially adapted therefor carried out at high temperatures in the presence of a molten material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0278—Feeding reactive fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1881—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving downwards while fluidised
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/20—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/06—Crucible or pot furnaces heated electrically, e.g. induction crucible furnaces with or without any other source of heat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00548—Flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00743—Feeding or discharging of solids
    • B01J2208/00752—Feeding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00796—Details of the reactor or of the particulate material
    • B01J2208/00893—Feeding means for the reactants
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)
MA046932A 2015-10-09 2016-10-06 Silicium purifié, dispositifs et systèmes permattant sa production MA46932A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201562239514P 2015-10-09 2015-10-09

Publications (1)

Publication Number Publication Date
MA46932A true MA46932A (fr) 2019-10-09

Family

ID=57153574

Family Applications (1)

Application Number Title Priority Date Filing Date
MA046932A MA46932A (fr) 2015-10-09 2016-10-06 Silicium purifié, dispositifs et systèmes permattant sa production

Country Status (12)

Country Link
US (4) US9783426B2 (fr)
EP (1) EP3359489B1 (fr)
KR (1) KR102641266B1 (fr)
CN (1) CN108367928B (fr)
AU (1) AU2016336428A1 (fr)
CA (1) CA3005156C (fr)
ES (1) ES3036450T3 (fr)
IL (1) IL259197B (fr)
MA (1) MA46932A (fr)
PH (1) PH12018501013A1 (fr)
RU (2) RU2022102529A (fr)
WO (1) WO2017062571A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10318162B2 (en) 2016-09-28 2019-06-11 Amazon Technologies, Inc. Peripheral device providing virtualized non-volatile storage
US11247165B2 (en) 2018-07-12 2022-02-15 Abb Schweiz Ag Material phase between conductive layers
US11471789B2 (en) 2018-07-12 2022-10-18 Abb Schweiz Ag Material phase with electrical lead
CN109346622A (zh) * 2018-10-19 2019-02-15 武汉华星光电半导体显示技术有限公司 Oled阵列基板及其制作方法
CN111017929B (zh) * 2019-12-26 2021-04-13 晶科能源有限公司 一种硅料清洗方法
CN113357913B (zh) * 2021-06-29 2022-12-09 吉利硅谷(谷城)科技有限公司 一种用于多晶硅提纯的电磁加热炉
CN115353109A (zh) * 2022-07-28 2022-11-18 商南中剑实业有限责任公司 掺加锡粉的钠系渣剂去除工业硅中杂质的装置及其方法
CN116443818B (zh) * 2023-04-13 2024-09-10 浙江德欧化工制造有限公司 一种分散2b蓝副产物纯化装置

Family Cites Families (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2519094B2 (ja) 1988-11-29 1996-07-31 高純度シリコン株式会社 トリクロロシラン製造用流動反応装置
JP3205352B2 (ja) 1990-05-30 2001-09-04 川崎製鉄株式会社 シリコン精製方法及び装置
US5563068A (en) * 1994-04-21 1996-10-08 Genetic Therapy, Inc. Bioreactor
JP3020842B2 (ja) * 1995-09-05 2000-03-15 日本エア・リキード株式会社 アルゴン精製方法及び装置
US5776416A (en) * 1995-11-14 1998-07-07 Tokuyama Corporation Cyclone and fluidized bed reactor having same
JPH09309716A (ja) 1996-03-19 1997-12-02 Kawasaki Steel Corp シリコンの精製方法
CA2211028C (fr) 1996-10-14 2002-04-16 Kawasaki Steel Corporation Procede et appareil de production de silicium polycristallin et procede de fabrication de plaquettes de silicium destinees a des piles solaires
JPH10120412A (ja) 1996-10-14 1998-05-12 Kawasaki Steel Corp 金属シリコンの精製方法
JPH10167716A (ja) 1996-12-09 1998-06-23 Kawasaki Steel Corp シリコンの精製方法
JPH1149510A (ja) 1997-07-31 1999-02-23 Daido Steel Co Ltd 金属Ｓｉの精製方法及びその装置
US5972107A (en) 1997-08-28 1999-10-26 Crystal Systems, Inc. Method for purifying silicon
JP2001201017A (ja) 2000-01-18 2001-07-27 Matsushita Electric Ind Co Ltd こんろバーナ
US6667411B2 (en) 2000-04-05 2003-12-23 General Electric Company Method for making organooxysilanes
JP4248743B2 (ja) 2000-12-28 2009-04-02 シャープ株式会社 シリコン溶湯の精製方法
US6489501B2 (en) 2001-02-26 2002-12-03 General Electric Company Method and apparatus for forming a carbon-silicon bond in a silane
JP4953522B2 (ja) 2001-06-21 2012-06-13 シャープ株式会社 溶融シリコンの精製方法および溶融シリコン精製装置
US7208674B2 (en) 2001-09-11 2007-04-24 Eric Aylaian Solar cell having photovoltaic cells inclined at acute angle to each other
NO316020B1 (no) * 2001-10-10 2003-12-01 Elkem Materials Anordning for kontinuerlig slaggbehandling av silisium
DE10157452B4 (de) 2001-11-23 2006-08-24 Infineon Technologies Ag Verfahren zum chemisch-mechanischen Polieren von Wafern
US6620713B2 (en) 2002-01-02 2003-09-16 Intel Corporation Interfacial layer for gate electrode and high-k dielectric layer and methods of fabrication
WO2003066523A1 (fr) 2002-02-04 2003-08-14 Sharp Kabushiki Kaisha Procede de purification du silicium, scories pour purifier le silicium et silicium purifie
JP2003238138A (ja) 2002-02-20 2003-08-27 Sharp Corp シリコンの精製方法およびシリコンの精製装置
IL148376A0 (en) 2002-02-26 2002-09-12 Ati Aluminum Technologies Isra A method for the production of pure silica
US7719091B2 (en) 2002-06-28 2010-05-18 M/A-Com Technology Solutions Holdings, Inc. Diode with improved switching speed
EP2256786A1 (fr) 2004-01-15 2010-12-01 Japan Science and Technology Agency Procédé de production d'un film mince monocristallin et dispositif à film mince monocristallin
US8470279B2 (en) 2004-04-13 2013-06-25 Si Options, Llc High purity silicon-containing products and method of manufacture
US7638108B2 (en) 2004-04-13 2009-12-29 Si Options, Llc High purity silicon-containing products
JP4024232B2 (ja) 2004-07-13 2007-12-19 シャープ株式会社 シリコンの精製方法
JP4632769B2 (ja) * 2004-12-09 2011-02-16 シャープ株式会社 シリコンの精製方法
JP4966560B2 (ja) * 2005-03-07 2012-07-04 新日鉄マテリアルズ株式会社 高純度シリコンの製造方法
US8105434B2 (en) 2005-08-05 2012-01-31 Faris Sadeg M Si ribbon, SiO2 ribbon and ultra pure ribbons of other substances
KR101061530B1 (ko) * 2006-04-04 2011-09-01 6엔 실리콘 아이엔씨. 실리콘의 정제 방법
EP2072464A4 (fr) 2006-09-29 2010-09-01 Shinetsu Chemical Co Procédé de purification du silicium, silicium et cellule solaire
JP5428146B2 (ja) 2006-10-31 2014-02-26 三菱マテリアル株式会社 トリクロロシラン製造装置
CA2680515A1 (fr) 2007-03-13 2008-09-18 6N Silicon Inc. Procede de purification de silicium
CN101790774B (zh) 2007-06-26 2012-05-02 麻省理工学院 半导体晶圆在薄膜包衣中的重结晶以及有关工艺
KR20160021307A (ko) 2007-07-10 2016-02-24 더 리전트 오브 더 유니버시티 오브 캘리포니아 선택된 조직에 조성물을 전달하는 물질 및 방법
ES2360967T3 (es) 2007-08-28 2011-06-10 Commissariat à l'énergie atomique et aux énergies alternatives Método de producción de películas sólidas y porosas a partir de materiales en forma de partículas mediante una fuente de flujo de calor elevado.
CN101131371B (zh) 2007-10-08 2010-06-02 苏州阿特斯阳光电力科技有限公司 一种精炼冶金硅的杂质含量检测分析方法
DE102007050010A1 (de) 2007-10-17 2009-06-25 Jan-Philipp Mai Verfahren und Vorrichtung zur Herstellung von Silizium
US20100140558A1 (en) 2008-12-09 2010-06-10 Bp Corporation North America Inc. Apparatus and Method of Use for a Top-Down Directional Solidification System
RU2415080C2 (ru) * 2008-12-30 2011-03-27 Российская Академия сельскохозяйственных наук Государственное научное учреждение Всероссийский научно-исследовательский институт электрификации сельского хозяйства (ГНУ ВИЭСХ РОССЕЛЬХОЗАКАДЕМИИ) Способ и установка для очистки кремния
US20110300222A1 (en) 2009-02-20 2011-12-08 The Regents Of The University Of California Luminescent porous silicon nanoparticles, methods of making and using same
US8168123B2 (en) * 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon
KR20120031159A (ko) 2009-07-03 2012-03-30 미쓰비시 가가꾸 가부시키가이샤 실리콘의 제조 방법, 실리콘 및 태양 전지용 패널
US8476660B2 (en) 2009-08-20 2013-07-02 Integrated Photovoltaics, Inc. Photovoltaic cell on substrate
DE102010001093A1 (de) 2010-01-21 2011-07-28 Evonik Degussa GmbH, 45128 Verfahren zur Grobentkohlung einer Siliciumschmelze
TWI397617B (zh) 2010-02-12 2013-06-01 Masahiro Hoshino Metal silicon purification device
WO2011112631A1 (fr) 2010-03-08 2011-09-15 Molecular Power Systems Llc Méthode et procédé pour l'extraction, la séparation et la purification d'éléments et/ou de composés
US20110243825A1 (en) 2010-03-30 2011-10-06 Peak Sun Silicon Corporation Tetrahalosilane converter
US8029756B1 (en) 2010-03-30 2011-10-04 Peak Sun Sillcon Corporation Closed-loop silicon production
DE102010029741B4 (de) 2010-06-07 2013-02-28 Solarworld Innovations Gmbh Verfahren zum Herstellen von Silizium-Wafern, Silizium Wafer und Verwendung eines Silizium-Wafer als Silizium-Solarzelle
TWI403461B (zh) 2010-07-21 2013-08-01 Masahiro Hoshino Method and apparatus for improving yield and yield of metallurgical silicon
US9169832B2 (en) 2010-09-13 2015-10-27 Guangdong Fuxing Food Machinery Co., Ltd. Ground high-temperature high-efficiency solar steam electricity-generating device
DE102010044108A1 (de) 2010-11-18 2012-05-24 Evonik Degussa Gmbh Herstellung von Chlorsilanen aus kleinstteiligem Reinstsilicium
KR101186986B1 (ko) * 2010-12-14 2012-09-28 한국기계연구원 고순도 실리콘의 대량 생산 방법
JPWO2012086544A1 (ja) 2010-12-20 2014-05-22 三菱化学株式会社 シリコンの製造方法及び製造装置、シリコンウェハー、並びに、太陽電池用パネル
DE102011004753A1 (de) 2011-02-25 2012-08-30 Evonik Degussa Gmbh Verfahren zum Aufreinigen von Silicium
JP2014519361A (ja) 2011-04-28 2014-08-14 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア Ｓｉ含有粒子を用いた時間ゲート蛍光イメージング
US20120312370A1 (en) 2011-06-07 2012-12-13 Mcgill University Hybrid dye-sensitized solar cell photoanodes based on aqueous synthesized titanium dioxide
WO2013016823A1 (fr) 2011-07-29 2013-02-07 Ats Automation Tooling Systems Inc. Systèmes et procédés pour la production de minces tiges de silicium
US20130089490A1 (en) 2011-10-11 2013-04-11 Wener FILTVEDT Method and device
TWI477667B (zh) * 2011-10-24 2015-03-21 Wen Pin Sun 真空循環精煉太陽能級多晶矽設備及太陽能級多晶矽提煉方法
US20130156675A1 (en) 2011-12-16 2013-06-20 Rec Silicon Inc Process for production of silane and hydrohalosilanes
KR101382682B1 (ko) * 2011-12-20 2014-04-10 재단법인 포항산업과학연구원 실리콘 정련 장치 및 그 방법
US20130195746A1 (en) 2012-01-28 2013-08-01 Xi Chu Method and system for production of silicon and devicies
FR2988721B1 (fr) 2012-03-27 2014-04-04 Centre Nat Rech Scient Nanoparticules de silicium poreux fonctionnalisees et leurs utilisations en therapie photodynamique
DE102012206531B4 (de) 2012-04-17 2015-09-10 Infineon Technologies Ag Verfahren zur Erzeugung einer Kavität innerhalb eines Halbleitersubstrats
GB2502102A (en) 2012-05-16 2013-11-20 Rec Wafer Norway As Improved production of monocrystalline silicon
US9676632B2 (en) * 2012-06-25 2017-06-13 Silicor Materials Inc. Method for purifying silicon
US9352971B2 (en) 2013-06-14 2016-05-31 Rec Silicon Inc Method and apparatus for production of silane and hydrohalosilanes
US20150110701A1 (en) 2013-10-18 2015-04-23 Wadham Energy Lp Biogenic silica as a raw material to create high purity silicon
CN104817088A (zh) * 2015-05-04 2015-08-05 日鑫（永安）硅材料有限公司 低成本制备太阳能级多晶硅的方法

Also Published As

Publication number Publication date
CN108367928B (zh) 2022-07-26
EP3359489C0 (fr) 2025-07-02
RU2018117024A (ru) 2019-11-11
CA3005156A1 (fr) 2017-04-13
US9783426B2 (en) 2017-10-10
RU2022102529A (ru) 2022-03-03
WO2017062571A3 (fr) 2017-05-26
IL259197B (en) 2020-06-30
KR102641266B1 (ko) 2024-02-26
US20180016151A1 (en) 2018-01-18
AU2016336428A1 (en) 2018-05-24
US20170197840A1 (en) 2017-07-13
US10093546B2 (en) 2018-10-09
IL259197A (en) 2018-07-31
ES3036450T3 (en) 2025-09-19
PH12018501013A1 (en) 2018-11-05
CN108367928A (zh) 2018-08-03
RU2766149C2 (ru) 2022-02-08
EP3359489A2 (fr) 2018-08-15
US20180370806A1 (en) 2018-12-27
US20170197841A1 (en) 2017-07-13
WO2017062571A2 (fr) 2017-04-13
KR20180101325A (ko) 2018-09-12
US9802827B2 (en) 2017-10-31
RU2018117024A3 (fr) 2020-08-19
EP3359489B1 (fr) 2025-07-02
CA3005156C (fr) 2022-11-29

Similar Documents

Publication Publication Date Title
MA46932A (fr) Silicium purifié, dispositifs et systèmes permattant sa production
EP3638138A4 (fr) Systèmes, dispositifs et méthodes de polypectomie
EP3528716C0 (fr) Systèmes d'ostéotomie
EP3427295A4 (fr) Structures conductrices, systèmes et dispositifs contenant des structures conductrices et procédés associés
IL246597A0 (en) Spectrometry systems, methods, and applications
EP3057496A4 (fr) Dispositifs, systèmes et procédés intravasculaires
MA46433A (fr) Dispositifs de sécurité
EP3328474A4 (fr) Dispositifs nasaux
EP3443001A4 (fr) Systèmes de biocircuits régulés
EP3403623C0 (fr) Dispositif portable
EP3328444A4 (fr) Dispositifs uv, systèmes uv et procédés de fabrication et d'utilisation
DK3288508T3 (da) Anordninger med reduceret tryk
EP3497724A4 (fr) Dispositifs à réseau de points quantiques
EP3566455A4 (fr) Dispositif vestimentaire
IL243910A0 (en) Devices, systems and methods of virtualizing a mirror
EP3413778A4 (fr) Systèmes endoscopiques, dispositifs et procédés associés
EP3344443A4 (fr) Dispositifs d'impression
EP2981939A4 (fr) Systèmes, procédés et dispositifs de transaction
EP3967244C0 (fr) Dispositifs d'écarteur
EP3417421A4 (fr) Systèmes de suivi de médicaments
EP3622138A4 (fr) Dispositifs de retenue
EP3365072A4 (fr) Dispositifs et systèmes de circuit respiratoire
EP3000133A4 (fr) Capteurs, procédés de fabrication et dispositifs
DK3359275T3 (da) Filterindretninger, -fremgangsmåder og -system
EP3497115A4 (fr) Systèmes de capteurs moléculaires