MA52865A - Installation de dépôt sous vide et procédé de revêtement d'un substrat - Google Patents

Installation de dépôt sous vide et procédé de revêtement d'un substrat

Info

Publication number
MA52865A
MA52865A MA052865A MA52865A MA52865A MA 52865 A MA52865 A MA 52865A MA 052865 A MA052865 A MA 052865A MA 52865 A MA52865 A MA 52865A MA 52865 A MA52865 A MA 52865A
Authority
MA
Morocco
Prior art keywords
coating process
substrate coating
vacuum deposit
deposit installation
installation
Prior art date
Application number
MA052865A
Other languages
English (en)
Inventor
Rémy Bonnemann
Sergio Pace
Eric Silberberg
Original Assignee
Arcelormittal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arcelormittal filed Critical Arcelormittal
Publication of MA52865A publication Critical patent/MA52865A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
MA052865A 2018-06-13 2019-04-23 Installation de dépôt sous vide et procédé de revêtement d'un substrat MA52865A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IB2018/054299 WO2019239185A1 (fr) 2018-06-13 2018-06-13 Installation de dépôt sous vide et procédé de revêtement d'un substrat

Publications (1)

Publication Number Publication Date
MA52865A true MA52865A (fr) 2021-04-21

Family

ID=62904530

Family Applications (1)

Application Number Title Priority Date Filing Date
MA052865A MA52865A (fr) 2018-06-13 2019-04-23 Installation de dépôt sous vide et procédé de revêtement d'un substrat

Country Status (12)

Country Link
US (1) US11492695B2 (fr)
EP (1) EP3807438A1 (fr)
JP (1) JP7219780B2 (fr)
KR (1) KR102486851B1 (fr)
CN (1) CN112262226B (fr)
CA (1) CA3103071C (fr)
MA (1) MA52865A (fr)
MX (1) MX2020013546A (fr)
RU (1) RU2755327C1 (fr)
UA (1) UA128726C2 (fr)
WO (2) WO2019239185A1 (fr)
ZA (1) ZA202007535B (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019116081A1 (fr) * 2017-12-14 2019-06-20 Arcelormittal Installation de dépôt sous vide et procédé pour revêtir un substrat
WO2019239186A1 (fr) 2018-06-13 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat
WO2019239184A1 (fr) 2018-06-13 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat
CN120830087A (zh) * 2024-04-24 2025-10-24 宝山钢铁股份有限公司 一种对带钢进行真空镀的系统及方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0723535B2 (ja) * 1985-06-12 1995-03-15 三菱重工業株式会社 複合膜形成装置
JPS6296669A (ja) 1985-10-23 1987-05-06 Nisshin Steel Co Ltd 合金化蒸着亜鉛めっき鋼板の製造方法
JPS6326351A (ja) * 1986-07-18 1988-02-03 Kawasaki Steel Corp 真空蒸着用の蒸発源装置
DD287615A7 (de) * 1988-04-27 1991-03-07 ��@ �K@�K@������� k�� Verfahren zur bandbedampfung mit einem elektronenstrahllinienverdampfer
JPH024963A (ja) 1988-06-23 1990-01-09 Kawasaki Steel Corp イオンプレーティング装置
JPH06102828B2 (ja) * 1990-10-23 1994-12-14 日本鋼管株式会社 帯板の皮膜形成装置
JP3463693B2 (ja) * 1992-10-29 2003-11-05 石川島播磨重工業株式会社 連続帯状物用真空蒸着装置
JP3371454B2 (ja) 1993-01-13 2003-01-27 石川島播磨重工業株式会社 連続真空蒸着装置
US5803976A (en) * 1993-11-09 1998-09-08 Imperial Chemical Industries Plc Vacuum web coating
BE1010351A6 (fr) 1996-06-13 1998-06-02 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
WO2003012161A1 (fr) * 2001-08-01 2003-02-13 Danieli Technology, Inc. Revetement par vapeur metallique
JP4346336B2 (ja) * 2003-04-02 2009-10-21 三洋電機株式会社 有機ｅｌ表示装置の製造方法
SE527385C2 (sv) * 2003-11-04 2006-02-21 Sandvik Intellectual Property Belagd bandprodukt av rostfrit stål för användning i lastbärande applikationer
NO20040302D0 (no) * 2004-01-23 2004-01-23 Juell Per A Kvickskate. Skoyte til bruk pa is og annet underlag, herunder rulleskoyter
WO2006007706A1 (fr) * 2004-07-16 2006-01-26 Dofasco Inc. Systeme de controle pour appareil de revetement
JP2007262540A (ja) 2006-03-29 2007-10-11 Jfe Steel Kk 化学蒸着処理の原料ガス供給用ノズルと被膜形成方法および方向性電磁鋼板
DE102006056984A1 (de) 2006-11-30 2008-06-05 Leybold Optics Gmbh Laufende Beschichtung
US20080245300A1 (en) * 2006-12-04 2008-10-09 Leybold Optics Gmbh Apparatus and method for continuously coating strip substrates
EP1972699A1 (fr) 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
EP2048261A1 (fr) 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique
WO2010067603A1 (fr) 2008-12-10 2010-06-17 パナソニック株式会社 Procédé de formation de film fin
EP2199425A1 (fr) 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)
US8557328B2 (en) 2009-10-02 2013-10-15 Ppg Industries Ohio, Inc. Non-orthogonal coater geometry for improved coatings on a substrate
KR20120029895A (ko) 2010-09-17 2012-03-27 삼성모바일디스플레이주식회사 박막 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
KR101439694B1 (ko) 2012-12-26 2014-09-12 주식회사 포스코 Zn-Mg 합금도금강판 및 그의 제조방법
JP2014132102A (ja) 2013-01-04 2014-07-17 Panasonic Corp 蒸着装置
DE102013206598B4 (de) * 2013-04-12 2019-06-27 VON ARDENNE Asset GmbH & Co. KG Vakuumbeschichtungsanlage
KR101746956B1 (ko) * 2015-10-29 2017-06-14 주식회사 포스코 미립자 발생장치 및 이를 포함하는 코팅 시스템
CN107723663B (zh) * 2017-09-26 2019-11-12 常州大学 一种在高强度钢表面连续真空蒸镀金属锑的装置和方法
WO2019239184A1 (fr) 2018-06-13 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat
WO2019239186A1 (fr) 2018-06-13 2019-12-19 Arcelormittal Installation de dépôt sous vide et procédé de revêtement d'un substrat

Also Published As

Publication number Publication date
US20210230736A1 (en) 2021-07-29
CN112262226A (zh) 2021-01-22
EP3807438A1 (fr) 2021-04-21
BR112020025035A2 (pt) 2021-03-23
WO2019239185A1 (fr) 2019-12-19
US11492695B2 (en) 2022-11-08
KR102486851B1 (ko) 2023-01-09
UA128726C2 (uk) 2024-10-09
JP2021526589A (ja) 2021-10-07
CA3103071C (fr) 2022-10-25
JP7219780B2 (ja) 2023-02-08
RU2755327C1 (ru) 2021-09-15
CN112262226B (zh) 2023-03-21
CA3103071A1 (fr) 2019-12-19
WO2019239228A1 (fr) 2019-12-19
KR20210008071A (ko) 2021-01-20
MX2020013546A (es) 2021-02-26
ZA202007535B (en) 2021-10-27

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