MD3634F1 - Procedeu de obtinere a compozitului fotosensibil in baza de semiconductor calcogenic amorf compus si polimer organic - Google Patents

Procedeu de obtinere a compozitului fotosensibil in baza de semiconductor calcogenic amorf compus si polimer organic Download PDF

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Publication number
MD3634F1
MD3634F1 MDA20070147A MD20070147A MD3634F1 MD 3634 F1 MD3634 F1 MD 3634F1 MD A20070147 A MDA20070147 A MD A20070147A MD 20070147 A MD20070147 A MD 20070147A MD 3634 F1 MD3634 F1 MD 3634F1
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MD
Moldova
Prior art keywords
organic polymer
calcogenic
homogenized
amorphous
obtaining
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MDA20070147A
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English (en)
Other versions
MD3634G2 (ro
Inventor
Andrei Andries
Svetlana BUZURNIUC
Mihail Iovu
Victor VERLAN
Original Assignee
Institutul De Fizica Aplicata Al Academiei De Stiinte A Moldovei
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Publication date
Application filed by Institutul De Fizica Aplicata Al Academiei De Stiinte A Moldovei filed Critical Institutul De Fizica Aplicata Al Academiei De Stiinte A Moldovei
Priority to MDA20070147A priority Critical patent/MD3634G2/ro
Publication of MD3634F1 publication Critical patent/MD3634F1/ro
Publication of MD3634G2 publication Critical patent/MD3634G2/ro

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Abstract

Inventia se refera la optoelectronica, si anume la metodele de obtinere a compozitelor fotosensibile in baza de semiconductori calcogenici amorfi compusi si polimer organic, utilizate pentru confectionarea diferitor medii fotosensibile in forma de pelicule subtiri, fibre, etc., pentru utilizarea lor in calitate de medii de inscriere a imaginilor optice sau informatiei holografice, senzorilor optici, etc. Procedeul de obtinere a compozitului fotosensibil in baza de semiconductor calcogenic amorfcompus si polimer organic consta in aceea ca se dizolva separat in monoetanolamina semiconductoarele calcogenice amorfe in baza de S si Se si se omogenizeaza la temperatura de 20…40°C, la o presiune atmosferica normala, timp de 20…30 ore. Dupa racirea pana la temperatura camerei, ambele solutii se amesteca si se omogenizeaza timp de pana la 30 min. Se prepara o solutie metanolica de poli-n-vinilpirolidona, apoi solutiile se amesteca si se omogenizeaza timp de pana la 30 min. Amestecul se depunepe suport si se usuca la temperatura de 18…40°C timp de 2 ore.
MDA20070147A 2007-05-23 2007-05-23 Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic MD3634G2 (ro)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MDA20070147A MD3634G2 (ro) 2007-05-23 2007-05-23 Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MDA20070147A MD3634G2 (ro) 2007-05-23 2007-05-23 Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

Publications (2)

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MD3634F1 true MD3634F1 (ro) 2008-06-30
MD3634G2 MD3634G2 (ro) 2009-01-31

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MDA20070147A MD3634G2 (ro) 2007-05-23 2007-05-23 Procedeu de obţinere a compozitului fotosensibil în bază de semiconductor calcogenic amorf compus şi polimer organic

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD389Z (ro) * 2010-05-11 2012-01-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a unui nanocompozit luminofor pe baza compusului coordinativ al Eu3+ şi poli-N-vinilpirolidonei
MD503Z (ro) * 2011-07-29 2012-11-30 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a unui nanocompozit luminofor pe baza compusului coordinativ al terbiului(III) şi poli-N-vinilpirolidonei

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MD2202G2 (ro) * 2002-08-01 2004-02-29 Государственный Университет Молд0 Strat fotosensibil pentru purtători de informaţie
MD3174G2 (ro) * 2006-01-05 2007-05-31 Центр Оптоэлектроники Института Прикладной Физики Академии Наук Республики Молдова Compozit fotosensibil din semiconductor calcogenic amorf şi polimer organic
MD3327G2 (ro) * 2006-09-27 2007-12-31 Институт Прикладной Физики Академии Наук Молдовы Procedeu de obţinere a compozitului fotosensibil din semiconductor calcogenic amorf şi polimer organic

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MD3634G2 (ro) 2009-01-31

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