MD3821F1 - Procedeu de obtinere a materialului fotosensibil in baza de semiconductor calcogenic amorf As2(SxSe1-x)3 - Google Patents
Procedeu de obtinere a materialului fotosensibil in baza de semiconductor calcogenic amorf As2(SxSe1-x)3 Download PDFInfo
- Publication number
- MD3821F1 MD3821F1 MDA20070230A MD20070230A MD3821F1 MD 3821 F1 MD3821 F1 MD 3821F1 MD A20070230 A MDA20070230 A MD A20070230A MD 20070230 A MD20070230 A MD 20070230A MD 3821 F1 MD3821 F1 MD 3821F1
- Authority
- MD
- Moldova
- Prior art keywords
- photosensitive material
- sxsl1
- base
- obtaining photosensitive
- chalcogenide semiconductor
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000000463 material Substances 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 150000004770 chalcogenides Chemical class 0.000 title 1
- 239000000203 mixture Substances 0.000 abstract 2
- 230000003287 optical effect Effects 0.000 abstract 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 abstract 1
- 229910017000 As2Se3 Inorganic materials 0.000 abstract 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 abstract 1
- 238000001393 microlithography Methods 0.000 abstract 1
- 230000005693 optoelectronics Effects 0.000 abstract 1
- 229910052958 orpiment Inorganic materials 0.000 abstract 1
Landscapes
- Holo Graphy (AREA)
- Optical Recording Or Reproduction (AREA)
Abstract
Inventia se refera la optoelectronica, si anume la un procedeu de obtinere a materialului fotosensibil in baza de semiconductor calcogenic amorf As2(SxSe1-x)3, care poate fi utilizat in calitate de mediu de inscriere a imaginilor optice si holografice, senzori optici, in microlitografie etc. Procedeul consta in aceea ca se dizolva separat As2S3 siAs2Se3 in monoetanolamina sau etilendiamina la temperatura de 20…40°C, apoi amestecurile se racesc pana la temperatura camerei si se amesteca intr-unraport determinat de valoarea x, dupa care amestecul se depune pe un suport si se usuca cu aer avand temperatura de pana la 40°C, timp de 2 ore.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20070230A MD3821G2 (ro) | 2007-08-23 | 2007-08-23 | Procedeu de obţinere a materialului fotosensibil în bază de semiconductor calcogenic amorf As2(SxSe1-x)3 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20070230A MD3821G2 (ro) | 2007-08-23 | 2007-08-23 | Procedeu de obţinere a materialului fotosensibil în bază de semiconductor calcogenic amorf As2(SxSe1-x)3 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MD3821F1 true MD3821F1 (ro) | 2009-01-31 |
| MD3821G2 MD3821G2 (ro) | 2009-08-31 |
Family
ID=40347775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MDA20070230A MD3821G2 (ro) | 2007-08-23 | 2007-08-23 | Procedeu de obţinere a materialului fotosensibil în bază de semiconductor calcogenic amorf As2(SxSe1-x)3 |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD3821G2 (ro) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MD594Z (ro) * | 2012-07-31 | 2013-09-30 | Институт По Защите Растений И Экологического Сельского Хозяйства Анм | Dispozitiv pentru reproducerea insectelor benefice |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6875661B2 (en) * | 2003-07-10 | 2005-04-05 | International Business Machines Corporation | Solution deposition of chalcogenide films |
-
2007
- 2007-08-23 MD MDA20070230A patent/MD3821G2/ro not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| MD3821G2 (ro) | 2009-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG4A | Patent for invention issued | ||
| KA4A | Patent for invention lapsed due to non-payment of fees (with right of restoration) | ||
| MM4A | Patent for invention definitely lapsed due to non-payment of fees |