MY181562A - Black color surface-treated copper foil, method of manufacturing black color surface-treated copper foil, copper-clad laminate and flexible printed wiring board - Google Patents
Black color surface-treated copper foil, method of manufacturing black color surface-treated copper foil, copper-clad laminate and flexible printed wiring boardInfo
- Publication number
- MY181562A MY181562A MYPI2015702425A MYPI2015702425A MY181562A MY 181562 A MY181562 A MY 181562A MY PI2015702425 A MYPI2015702425 A MY PI2015702425A MY PI2015702425 A MYPI2015702425 A MY PI2015702425A MY 181562 A MY181562 A MY 181562A
- Authority
- MY
- Malaysia
- Prior art keywords
- copper foil
- black color
- wiring board
- printed wiring
- color surface
- Prior art date
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 6
- 239000011889 copper foil Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 238000007788 roughening Methods 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 1
- 238000007689 inspection Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/028—Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0692—Regulating the thickness of the coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- ing And Chemical Polishing (AREA)
- Structure Of Printed Boards (AREA)
Abstract
An object is to provide a copper foil for a printed wiring board, wherein the copper foil has a black color roughening-treated surface which enhances CCD visibility in terminal connection processing and precision of inspection by AOI of a flexible printed wiring board; and has an appropriate roughness suitable for manufacturing a flexible printed wiring board and excellent in etching performance. To achieve the object, a surface-treated copper foil having a roughening-treated surface which is a black color surface-treated copper foil for manufacturing of a flexible printed wiring board, wherein the roughening-treated surface is a black color roughening-treated surface having a maximum height of the waviness data (Wmax) of 1.2 micron-meters or less and having color: lightness L* of 30 or less in an L*a*b* color system is employed. Figure 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013039388 | 2013-02-28 | ||
| PCT/JP2014/055173 WO2014133164A1 (en) | 2013-02-28 | 2014-02-28 | Blackened surface-treated copper foil, method for manufacturing blackened surface-treated copper foil, copper-clad laminate and flexible printed circuit board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY181562A true MY181562A (en) | 2020-12-29 |
Family
ID=51428422
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2015702425A MY181562A (en) | 2013-02-28 | 2014-02-28 | Black color surface-treated copper foil, method of manufacturing black color surface-treated copper foil, copper-clad laminate and flexible printed wiring board |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5705381B2 (en) |
| KR (2) | KR102116928B1 (en) |
| CN (1) | CN105008593B (en) |
| MY (1) | MY181562A (en) |
| TW (1) | TWI690625B (en) |
| WO (1) | WO2014133164A1 (en) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101895256B1 (en) * | 2014-09-02 | 2018-09-05 | 미쓰이금속광업주식회사 | Blackened surface treated copper foil and copper foil with carrier foil |
| KR102402300B1 (en) * | 2014-12-08 | 2022-05-27 | 미쓰이금속광업주식회사 | Method of manufacturing printed wiring board |
| KR101929844B1 (en) * | 2015-01-22 | 2018-12-17 | 미쓰이금속광업주식회사 | Ultrathin copper foil with carrier and method for manufacturing same |
| JP6487704B2 (en) | 2015-02-12 | 2019-03-20 | 福田金属箔粉工業株式会社 | Treated copper foil, copper-clad laminate using the treated copper foil, and printed wiring board |
| CN107429417B (en) * | 2015-03-31 | 2019-11-22 | 三井金属矿业株式会社 | Roughened copper foil, copper foil with carrier, copper clad laminate and printed circuit board |
| JP2017014608A (en) * | 2015-07-06 | 2017-01-19 | 古河電気工業株式会社 | Electrolytic copper foil, lithium ion secondary battery negative electrode and lithium ion secondary battery, printed wiring board, and electromagnetic wave-shielding material |
| US9397343B1 (en) | 2015-10-15 | 2016-07-19 | Chang Chun Petrochemical Co., Ltd. | Copper foil exhibiting anti-swelling properties |
| CN109072472B (en) * | 2016-04-14 | 2020-10-16 | 三井金属矿业株式会社 | Surface-treated copper foil, copper foil with carrier, and copper-clad laminate and printed wiring board manufacturing method using same |
| CN106229344B (en) | 2016-08-19 | 2019-10-15 | 京东方科技集团股份有限公司 | Thin film transistor, its manufacturing method and display device |
| KR102180926B1 (en) | 2017-06-28 | 2020-11-19 | 에스케이넥실리스 주식회사 | Copper foil having improved workability and charge discharge characteristics, electrode comprisng the same, secondary battery comprising the same and method for manufacturing the same |
| TWI694176B (en) * | 2018-08-10 | 2020-05-21 | 南韓商Kcf科技有限公司 | Copper foil having improved workability and charge/discharge characteristics, electrode including the same, secondary battery including the same and method for manufacturing the same |
| CN111058063B (en) * | 2018-10-16 | 2021-02-02 | 长春石油化学股份有限公司 | Electrolytic copper foil, electrode including the same, and lithium ion battery including the same |
| US11365486B2 (en) | 2018-10-16 | 2022-06-21 | Chang Chun Petrochemical Co., Ltd. | Electrolytic copper foil, electrode comprising the same, and lithium ion battery comprising the same |
| JP7409602B2 (en) * | 2019-05-09 | 2024-01-09 | ナミックス株式会社 | composite copper parts |
| JP7352939B2 (en) * | 2019-05-09 | 2023-09-29 | ナミックス株式会社 | composite copper parts |
| JP7456578B2 (en) * | 2019-05-09 | 2024-03-27 | ナミックス株式会社 | Copper surface processing equipment |
| CN116997684A (en) | 2021-03-26 | 2023-11-03 | 三井金属矿业株式会社 | Roughened copper foil, copper foil with carrier, copper-clad laminate and printed circuit board |
| WO2022202541A1 (en) | 2021-03-26 | 2022-09-29 | 三井金属鉱業株式会社 | Roughened copper foil, copper foil with carrier, copper-cladded laminate board, and printed wiring board |
| JP7834086B2 (en) | 2021-03-29 | 2026-03-23 | 三井金属株式会社 | Roughened copper foil, copper-clad laminates, and printed circuit boards |
| CN117044412A (en) | 2021-03-29 | 2023-11-10 | 三井金属矿业株式会社 | Roughening of copper foil, copper-clad laminates and printed circuit boards |
| CN113997675A (en) * | 2021-11-16 | 2022-02-01 | 昆山欧贝达电子科技有限公司 | Preparation process of polyphenylene sulfide double-sided copper foil substrate |
| CN118805004A (en) | 2022-03-24 | 2024-10-18 | 三井金属矿业株式会社 | Roughening copper foil, copper foil with carrier, copper clad laminate and printed circuit board |
| WO2023182178A1 (en) | 2022-03-24 | 2023-09-28 | 三井金属鉱業株式会社 | Roughened copper foil, copper foil equipped with carrier, copper-clad laminate, and printed wiring board |
| KR20240166988A (en) | 2022-03-24 | 2024-11-26 | 미쓰이금속광업주식회사 | Copper foil with harmonic treatment, copper foil with carrier, copper-clad laminate and printed wiring board |
| CN118829747A (en) | 2022-03-24 | 2024-10-22 | 三井金属矿业株式会社 | Roughening copper foil, copper foil with carrier, copper clad laminate and printed circuit board |
| CN115135043B (en) * | 2022-07-18 | 2023-03-07 | 东莞市国盈电子有限公司 | A sensor circuit board and its manufacturing process |
| TWI876541B (en) * | 2023-09-19 | 2025-03-11 | 南亞塑膠工業股份有限公司 | Manufacturing method of roughened copper foil |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3306404B2 (en) * | 2000-01-28 | 2002-07-24 | 三井金属鉱業株式会社 | Method for producing surface-treated copper foil and copper-clad laminate using surface-treated copper foil obtained by the method |
| JP2004263300A (en) * | 2003-02-12 | 2004-09-24 | Furukawa Techno Research Kk | Copper foil for fine pattern printed wiring and manufacturing method thereof |
| JP2004256832A (en) * | 2003-02-24 | 2004-09-16 | Mitsui Mining & Smelting Co Ltd | Surface-treated copper foil having a blackened surface and magnetically shielded conductive mesh for front panel of plasma display using the surface-treated copper foil |
| TW200535259A (en) * | 2004-02-06 | 2005-11-01 | Furukawa Circuit Foil | Treated copper foil and circuit board |
| KR100852863B1 (en) * | 2004-02-17 | 2008-08-18 | 닛코킨조쿠 가부시키가이샤 | Copper foil having blackened surface or layer |
| US6979627B2 (en) | 2004-04-30 | 2005-12-27 | Freescale Semiconductor, Inc. | Isolation trench |
| JP2006210689A (en) * | 2005-01-28 | 2006-08-10 | Fukuda Metal Foil & Powder Co Ltd | Copper foil for high frequency printed wiring board and method for producing the same |
| KR101137274B1 (en) * | 2005-04-04 | 2012-04-20 | 우베 고산 가부시키가이샤 | Copper clad laminate |
| TW200738913A (en) * | 2006-03-10 | 2007-10-16 | Mitsui Mining & Smelting Co | Surface treated elctrolytic copper foil and process for producing the same |
| JP4958045B2 (en) | 2006-10-27 | 2012-06-20 | 三井金属鉱業株式会社 | Surface-treated copper foil for producing flexible copper-clad laminate and flexible copper-clad laminate obtained using the surface-treated copper foil |
| JP2009004423A (en) * | 2007-06-19 | 2009-01-08 | Hitachi Cable Ltd | Copper foil with carrier foil |
| JP5256747B2 (en) * | 2008-01-21 | 2013-08-07 | 宇部興産株式会社 | Manufacturing method of copper wiring insulating film by semi-additive method, and copper wiring insulating film manufactured therefrom |
| WO2010046804A2 (en) * | 2008-10-21 | 2010-04-29 | Alembic Limited | A process for preparation of losartan potassium form i |
| JP6219034B2 (en) * | 2010-10-06 | 2017-10-25 | 古河電気工業株式会社 | Copper foil and manufacturing method thereof, copper foil with carrier and manufacturing method thereof, printed wiring board, multilayer printed wiring board |
-
2014
- 2014-02-28 WO PCT/JP2014/055173 patent/WO2014133164A1/en not_active Ceased
- 2014-02-28 KR KR1020167031887A patent/KR102116928B1/en active Active
- 2014-02-28 CN CN201480010680.3A patent/CN105008593B/en active Active
- 2014-02-28 KR KR1020157019621A patent/KR20150090265A/en not_active Ceased
- 2014-02-28 JP JP2014532134A patent/JP5705381B2/en active Active
- 2014-02-28 MY MYPI2015702425A patent/MY181562A/en unknown
- 2014-03-03 TW TW103106970A patent/TWI690625B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI690625B (en) | 2020-04-11 |
| KR20160135369A (en) | 2016-11-25 |
| JPWO2014133164A1 (en) | 2017-02-09 |
| CN105008593B (en) | 2018-08-24 |
| TW201447051A (en) | 2014-12-16 |
| KR20150090265A (en) | 2015-08-05 |
| KR102116928B1 (en) | 2020-05-29 |
| CN105008593A (en) | 2015-10-28 |
| WO2014133164A1 (en) | 2014-09-04 |
| JP5705381B2 (en) | 2015-04-22 |
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