MY187307A - Tape for semiconductor processing - Google Patents
Tape for semiconductor processingInfo
- Publication number
- MY187307A MY187307A MYPI2019003947A MYPI2019003947A MY187307A MY 187307 A MY187307 A MY 187307A MY PI2019003947 A MYPI2019003947 A MY PI2019003947A MY PI2019003947 A MYPI2019003947 A MY PI2019003947A MY 187307 A MY187307 A MY 187307A
- Authority
- MY
- Malaysia
- Prior art keywords
- tape
- semiconductor processing
- temporary adhesive
- measured
- value
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0442—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0602—Temperature monitoring
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Dicing (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Laminated Bodies (AREA)
Abstract
A tape for semiconductor processing that can be caused to shrink by heating sufficiently in a short time period and can retain a kerf width is provided. A tape for semiconductor processing 10 of the invention includes a temporary adhesive tape 15 having a substrate film 11; and a temporary adhesive layer 12 formed on at least one surface side of the substrate film 11, in which regarding the temporary adhesive tape 15, the sum of the average value of the differential value of the thermal deformation rate in the MD direction per 1?C between 40?C and 80?C measured at the time of raising temperature by means of a thermomechanical characteristics testing machine, and the average value of the differential value of the thermal deformation rate in the TD direction per 1?C between 40?C and 80?C measured at the time of raising temperature by means of a thermomechanical characteristics testing machine, is a negative value.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018061062 | 2018-03-28 | ||
| PCT/JP2018/026882 WO2019187186A1 (en) | 2018-03-28 | 2018-07-18 | Tape for semiconductor processing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY187307A true MY187307A (en) | 2021-09-21 |
Family
ID=68059692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2019003947A MY187307A (en) | 2018-03-28 | 2018-07-18 | Tape for semiconductor processing |
Country Status (8)
| Country | Link |
|---|---|
| JP (2) | JP6535138B1 (en) |
| KR (1) | KR102112771B1 (en) |
| CN (1) | CN110546736B (en) |
| BR (1) | BR112019019520B1 (en) |
| MY (1) | MY187307A (en) |
| SG (1) | SG11201906507PA (en) |
| TW (1) | TWI694508B (en) |
| WO (1) | WO2019187186A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7269096B2 (en) * | 2019-05-29 | 2023-05-08 | 古河電気工業株式会社 | glass processing tape |
| CN114599517B (en) * | 2019-10-23 | 2024-10-01 | 琳得科株式会社 | Film for forming protective film, composite sheet for forming protective film, and method for producing small sheet with protective film |
| JP7622367B2 (en) * | 2020-07-08 | 2025-01-28 | 株式会社レゾナック | Dicing/die bonding integrated film, die bonding film, and method for manufacturing semiconductor device |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2521459B2 (en) * | 1987-02-23 | 1996-08-07 | 日東電工株式会社 | Method of manufacturing semiconductor chip |
| JP4757442B2 (en) * | 1997-02-10 | 2011-08-24 | リンテック株式会社 | Chip body adhesive sheet |
| JP4358502B2 (en) | 2002-03-12 | 2009-11-04 | 浜松ホトニクス株式会社 | Semiconductor substrate cutting method |
| JP2003342393A (en) * | 2002-05-30 | 2003-12-03 | Mitsubishi Polyester Film Copp | Polyester soft film for dicing tape |
| JP2004273895A (en) | 2003-03-11 | 2004-09-30 | Disco Abrasive Syst Ltd | Method of dividing semiconductor wafer |
| KR20050118302A (en) * | 2003-04-08 | 2005-12-16 | 데이진 듀폰 필름 가부시키가이샤 | Base film for semiconductor wafer processing |
| JP4754278B2 (en) | 2005-06-23 | 2011-08-24 | リンテック株式会社 | Chip body manufacturing method |
| JP5554118B2 (en) * | 2010-03-31 | 2014-07-23 | 古河電気工業株式会社 | Wafer processing tape |
| JP2012174945A (en) * | 2011-02-23 | 2012-09-10 | Furukawa Electric Co Ltd:The | Semiconductor wafer processing method |
| JP5801584B2 (en) | 2011-03-29 | 2015-10-28 | リンテック株式会社 | Dicing tape and chip-shaped part manufacturing method |
| KR101903312B1 (en) * | 2012-12-26 | 2018-10-01 | 히타치가세이가부시끼가이샤 | Expansion method, method for manufacturing semiconductor devices, and semiconductor device |
| JP6021263B2 (en) * | 2013-01-29 | 2016-11-09 | 日東電工株式会社 | Adhesive tape |
| JP5855034B2 (en) * | 2013-02-18 | 2016-02-09 | 古河電気工業株式会社 | Adhesive tape for semiconductor wafer processing and method for dividing semiconductor wafer |
| JP6295135B2 (en) | 2014-04-24 | 2018-03-14 | 日東電工株式会社 | Dicing die bond film |
| JP6230730B2 (en) * | 2015-03-24 | 2017-11-15 | 古河電気工業株式会社 | Semiconductor processing tape |
| JP2017147293A (en) * | 2016-02-16 | 2017-08-24 | 日立化成株式会社 | Method for manufacturing semiconductor device by use of adhesive sheet and dicing tape |
| JP6429824B2 (en) * | 2016-03-31 | 2018-11-28 | 古河電気工業株式会社 | Electronic device packaging tape |
-
2018
- 2018-07-18 JP JP2018538797A patent/JP6535138B1/en active Active
- 2018-07-18 CN CN201880005341.4A patent/CN110546736B/en active Active
- 2018-07-18 BR BR112019019520-3A patent/BR112019019520B1/en active IP Right Grant
- 2018-07-18 SG SG11201906507P patent/SG11201906507PA/en unknown
- 2018-07-18 WO PCT/JP2018/026882 patent/WO2019187186A1/en not_active Ceased
- 2018-07-18 MY MYPI2019003947A patent/MY187307A/en unknown
- 2018-07-18 KR KR1020197013960A patent/KR102112771B1/en active Active
- 2018-09-10 TW TW107131680A patent/TWI694508B/en active
-
2019
- 2019-04-23 JP JP2019081611A patent/JP7129375B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6535138B1 (en) | 2019-06-26 |
| JP2019176159A (en) | 2019-10-10 |
| CN110546736A (en) | 2019-12-06 |
| SG11201906507PA (en) | 2019-11-28 |
| JP7129375B2 (en) | 2022-09-01 |
| WO2019187186A1 (en) | 2019-10-03 |
| KR20190113748A (en) | 2019-10-08 |
| CN110546736B (en) | 2020-10-16 |
| KR102112771B1 (en) | 2020-05-19 |
| BR112019019520A2 (en) | 2020-06-09 |
| BR112019019520B1 (en) | 2021-03-16 |
| TWI694508B (en) | 2020-05-21 |
| TW201942963A (en) | 2019-11-01 |
| JPWO2019187186A1 (en) | 2020-04-30 |
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