MY192422A - Polishing composition, method for polishing substrate, method for producing substrate, and magnetic disk substrate - Google Patents
Polishing composition, method for polishing substrate, method for producing substrate, and magnetic disk substrateInfo
- Publication number
- MY192422A MY192422A MYPI2017701046A MYPI2017701046A MY192422A MY 192422 A MY192422 A MY 192422A MY PI2017701046 A MYPI2017701046 A MY PI2017701046A MY PI2017701046 A MYPI2017701046 A MY PI2017701046A MY 192422 A MY192422 A MY 192422A
- Authority
- MY
- Malaysia
- Prior art keywords
- substrate
- polishing
- polishing composition
- magnetic disk
- producing
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 5
- 239000000758 substrate Substances 0.000 title 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000000149 argon plasma sintering Methods 0.000 abstract 1
- 230000007547 defect Effects 0.000 abstract 1
- 238000001514 detection method Methods 0.000 abstract 1
- 238000002296 dynamic light scattering Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Provided is a polishing composition capable of achieving a high polishing rate with reduced occurrence of surface defects. The present invention provides a polishing composition comprising an abrasive. The abrasive has a standard deviation Stdev30 of particle diameter in a range of 300 nm to 2000 nm based on its light scattering intensity distribution obtained at a detection angle of 30? by dynamic light scattering.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016071363A JP6637816B2 (en) | 2016-03-31 | 2016-03-31 | Polishing composition, substrate polishing method and substrate manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY192422A true MY192422A (en) | 2022-08-19 |
Family
ID=60006348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2017701046A MY192422A (en) | 2016-03-31 | 2017-03-27 | Polishing composition, method for polishing substrate, method for producing substrate, and magnetic disk substrate |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6637816B2 (en) |
| MY (1) | MY192422A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7667079B2 (en) * | 2019-06-17 | 2025-04-22 | 株式会社フジミインコーポレーテッド | Polishing composition |
| JP7041714B2 (en) * | 2019-06-26 | 2022-03-24 | 花王株式会社 | Abrasive liquid composition for silicon oxide film |
| JP7803851B2 (en) * | 2019-09-04 | 2026-01-21 | シーエムシー マテリアルズ リミティド ライアビリティ カンパニー | Polysilicon CMP composition and method |
| CN116000720A (en) * | 2022-11-29 | 2023-04-25 | 湖南工商大学 | Grinding wheel characteristic measuring device in vertical shaft plane grinding and dynamic abrasive grain analysis method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5377117B2 (en) * | 2009-07-01 | 2013-12-25 | 花王株式会社 | Method for detecting non-spherical particles in a particle dispersion |
| JP5890088B2 (en) * | 2010-07-26 | 2016-03-22 | 山口精研工業株式会社 | Abrasive composition |
| JP5661950B2 (en) * | 2011-12-29 | 2015-01-28 | Hoya株式会社 | Manufacturing method of glass substrate for magnetic disk |
| JP6412714B2 (en) * | 2014-04-16 | 2018-10-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
| JP5853117B1 (en) * | 2014-06-30 | 2016-02-09 | 花王株式会社 | Polishing liquid composition for magnetic disk substrate |
-
2016
- 2016-03-31 JP JP2016071363A patent/JP6637816B2/en active Active
-
2017
- 2017-03-27 MY MYPI2017701046A patent/MY192422A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017182858A (en) | 2017-10-05 |
| JP6637816B2 (en) | 2020-01-29 |
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