MY200070A - Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic disk - Google Patents

Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic disk

Info

Publication number
MY200070A
MY200070A MYPI2018701219A MYPI2018701219A MY200070A MY 200070 A MY200070 A MY 200070A MY PI2018701219 A MYPI2018701219 A MY PI2018701219A MY PI2018701219 A MYPI2018701219 A MY PI2018701219A MY 200070 A MY200070 A MY 200070A
Authority
MY
Malaysia
Prior art keywords
magnetic disk
polishing
polishing composition
particles
disk substrate
Prior art date
Application number
MYPI2018701219A
Inventor
OYAMA Takaharu
Kamiya Tomohide
Yokomichi Noritaka
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=64107459&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MY200070(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY200070A publication Critical patent/MY200070A/en

Links

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

Provided is a polishing composition that allows effectively reducing the number of scratches present on a polished surface. The polishing composition provided herein contains: an abrasive containing silica particles; and water. The abrasive has an average aspect ratio of 1 to 1.25 for D0-5 particles of a cumulative 0% to 5% in a number-basis cumulative particle size distribution from a small diameter side, and an average aspect ratio of 1 to 1.30 for total particles.
MYPI2018701219A 2017-03-31 2018-03-26 Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic disk MY200070A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017070453A JP6864519B2 (en) 2017-03-31 2017-03-31 Polishing composition, manufacturing method of magnetic disk substrate, and polishing method of magnetic disk

Publications (1)

Publication Number Publication Date
MY200070A true MY200070A (en) 2023-12-06

Family

ID=64107459

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018701219A MY200070A (en) 2017-03-31 2018-03-26 Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic disk

Country Status (2)

Country Link
JP (1) JP6864519B2 (en)
MY (1) MY200070A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7041714B2 (en) * 2019-06-26 2022-03-24 花王株式会社 Abrasive liquid composition for silicon oxide film
JP7368997B2 (en) * 2019-09-30 2023-10-25 株式会社フジミインコーポレーテッド polishing composition
JP7319157B2 (en) * 2019-09-30 2023-08-01 株式会社フジミインコーポレーテッド Polishing composition
JP7450439B2 (en) * 2020-03-31 2024-03-15 株式会社フジミインコーポレーテッド Polishing composition and method for producing magnetic disk substrate
JP7396953B2 (en) * 2020-03-31 2023-12-12 株式会社フジミインコーポレーテッド Polishing composition, substrate manufacturing method, and polishing method
JP7742752B2 (en) * 2021-09-30 2025-09-22 株式会社フジミインコーポレーテッド Polishing composition and method for producing magnetic disk substrate
JP7742751B2 (en) * 2021-09-30 2025-09-22 株式会社フジミインコーポレーテッド Polishing composition and method for producing magnetic disk substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012000700A (en) * 2010-06-15 2012-01-05 Yamaguchi Seiken Kogyo Kk Abrasive composition and method for polishing magnetic disk substrate
JP6436517B2 (en) * 2013-02-20 2018-12-12 株式会社フジミインコーポレーテッド Polishing composition
JP6412714B2 (en) * 2014-04-16 2018-10-24 株式会社フジミインコーポレーテッド Polishing composition

Also Published As

Publication number Publication date
JP2018174009A (en) 2018-11-08
JP6864519B2 (en) 2021-04-28

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