MY192900A - Polishing composition and method for producing magnetic disk substrate - Google Patents
Polishing composition and method for producing magnetic disk substrateInfo
- Publication number
- MY192900A MY192900A MYPI2018703456A MYPI2018703456A MY192900A MY 192900 A MY192900 A MY 192900A MY PI2018703456 A MYPI2018703456 A MY PI2018703456A MY PI2018703456 A MYPI2018703456 A MY PI2018703456A MY 192900 A MY192900 A MY 192900A
- Authority
- MY
- Malaysia
- Prior art keywords
- polishing composition
- magnetic disk
- abrasive
- polishing
- disk substrate
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 7
- 239000000758 substrate Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 238000004438 BET method Methods 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 239000007800 oxidant agent Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 239000011164 primary particle Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Provided is a polishing composition that allows effectively reducing the number of scratches present in a polished surface, while maintaining a high polishing rate. The polishing composition provided by the invention is used for polishing magnetic disk substrates. The polishing composition contains an abrasive, an acid, an oxidant, and water. The abrasive contains at least silica particles. An average primary particle size of the abrasive as measured in accordance with the BET method, is 1 nm to 50 nm. Further, the polishing composition has a pH of 1.8 to 3.0, and an amount of sodium hydroxide necessary for raising the pH by 1.0 is 0.03 mol/L to 0.2 mol/L.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017191464A JP7058097B2 (en) | 2017-09-29 | 2017-09-29 | Method for manufacturing polishing composition and magnetic disk substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY192900A true MY192900A (en) | 2022-09-14 |
Family
ID=66339065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018703456A MY192900A (en) | 2017-09-29 | 2018-09-24 | Polishing composition and method for producing magnetic disk substrate |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7058097B2 (en) |
| MY (1) | MY192900A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7638667B2 (en) * | 2019-11-20 | 2025-03-04 | 株式会社フジミインコーポレーテッド | Polishing composition, polishing method and method for producing substrate |
| JP7814106B2 (en) * | 2021-03-31 | 2026-02-16 | 株式会社フジミインコーポレーテッド | Polishing composition and method for producing magnetic disk substrate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4202157B2 (en) | 2003-02-28 | 2008-12-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
| JP4202172B2 (en) | 2003-03-31 | 2008-12-24 | 株式会社フジミインコーポレーテッド | Polishing composition |
| JP2006077127A (en) | 2004-09-09 | 2006-03-23 | Fujimi Inc | Polishing composition and polishing method using the composition |
-
2017
- 2017-09-29 JP JP2017191464A patent/JP7058097B2/en active Active
-
2018
- 2018-09-24 MY MYPI2018703456A patent/MY192900A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019065155A (en) | 2019-04-25 |
| JP7058097B2 (en) | 2022-04-21 |
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