NO180003C - Fremgangsmåte og innretning for rengjöring av arbeidsstykker med organiske residua - Google Patents

Fremgangsmåte og innretning for rengjöring av arbeidsstykker med organiske residua

Info

Publication number
NO180003C
NO180003C NO932938A NO932938A NO180003C NO 180003 C NO180003 C NO 180003C NO 932938 A NO932938 A NO 932938A NO 932938 A NO932938 A NO 932938A NO 180003 C NO180003 C NO 180003C
Authority
NO
Norway
Prior art keywords
organic residues
cleaning workpieces
workpieces
cleaning
residues
Prior art date
Application number
NO932938A
Other languages
English (en)
Norwegian (no)
Other versions
NO180003B (no
NO932938L (no
NO932938D0 (no
Inventor
Robert Adler
Original Assignee
Union Ind Compr Gase Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Ind Compr Gase Gmbh filed Critical Union Ind Compr Gase Gmbh
Publication of NO932938L publication Critical patent/NO932938L/no
Publication of NO932938D0 publication Critical patent/NO932938D0/no
Publication of NO180003B publication Critical patent/NO180003B/no
Publication of NO180003C publication Critical patent/NO180003C/no

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • B08B3/104—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid using propellers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
NO932938A 1991-02-19 1993-08-18 Fremgangsmåte og innretning for rengjöring av arbeidsstykker med organiske residua NO180003C (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT0034291A AT395951B (de) 1991-02-19 1991-02-19 Reinigung von werkstuecken mit organischen rueckstaenden
PCT/EP1992/000322 WO1992014558A1 (fr) 1991-02-19 1992-02-14 Nettoyage de pieces comportant des residus organiques

Publications (4)

Publication Number Publication Date
NO932938L NO932938L (no) 1993-08-18
NO932938D0 NO932938D0 (no) 1993-08-18
NO180003B NO180003B (no) 1996-10-21
NO180003C true NO180003C (no) 1997-01-29

Family

ID=3488054

Family Applications (1)

Application Number Title Priority Date Filing Date
NO932938A NO180003C (no) 1991-02-19 1993-08-18 Fremgangsmåte og innretning for rengjöring av arbeidsstykker med organiske residua

Country Status (12)

Country Link
US (1) US5980648A (fr)
EP (1) EP0571426B1 (fr)
JP (1) JPH06505189A (fr)
AT (1) AT395951B (fr)
AU (1) AU1226892A (fr)
CA (1) CA2103909A1 (fr)
CZ (1) CZ282595B6 (fr)
DE (1) DE59200370D1 (fr)
DK (1) DK0571426T3 (fr)
ES (1) ES2062889T3 (fr)
NO (1) NO180003C (fr)
WO (1) WO1992014558A1 (fr)

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DE4423188C2 (de) * 1994-07-01 1999-03-11 Linde Ag Reinigung von Druckgasbehältern
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US7387868B2 (en) 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
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US20040050406A1 (en) * 2002-07-17 2004-03-18 Akshey Sehgal Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
US20040011386A1 (en) * 2002-07-17 2004-01-22 Scp Global Technologies Inc. Composition and method for removing photoresist and/or resist residue using supercritical fluids
US6722642B1 (en) 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7021635B2 (en) 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7225820B2 (en) 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7077917B2 (en) 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) * 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US7163380B2 (en) 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
US7186093B2 (en) 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
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US7491036B2 (en) 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US7434590B2 (en) 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7140393B2 (en) 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7291565B2 (en) 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7435447B2 (en) 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
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US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7399708B2 (en) 2005-03-30 2008-07-15 Tokyo Electron Limited Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
US7442636B2 (en) 2005-03-30 2008-10-28 Tokyo Electron Limited Method of inhibiting copper corrosion during supercritical CO2 cleaning
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KR101047862B1 (ko) * 2009-03-13 2011-07-08 주식회사 에이앤디코퍼레이션 고압 처리기를 이용한 기판처리장치 및 고압 처리기의 가스재활용방법
US9027609B2 (en) 2011-05-03 2015-05-12 United Technologies Corporation Argon gas level controller
DE102013206908A1 (de) * 2013-04-17 2014-10-23 Dürr Systems GmbH Verfahren und Vorrichtung zum Innenreinigen eines Fluidtanks

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Also Published As

Publication number Publication date
NO180003B (no) 1996-10-21
ATA34291A (de) 1992-09-15
AT395951B (de) 1993-04-26
CZ282595B6 (cs) 1997-08-13
EP0571426B1 (fr) 1994-08-10
DK0571426T3 (da) 1994-09-26
NO932938L (no) 1993-08-18
AU1226892A (en) 1992-09-15
ES2062889T3 (es) 1994-12-16
DE59200370D1 (de) 1994-09-15
JPH06505189A (ja) 1994-06-16
NO932938D0 (no) 1993-08-18
WO1992014558A1 (fr) 1992-09-03
CA2103909A1 (fr) 1992-08-20
CZ167693A3 (en) 1994-03-16
EP0571426A1 (fr) 1993-12-01
US5980648A (en) 1999-11-09

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