NO20031998L - Mikrostruktur med bevegelig masse - Google Patents
Mikrostruktur med bevegelig masseInfo
- Publication number
- NO20031998L NO20031998L NO20031998A NO20031998A NO20031998L NO 20031998 L NO20031998 L NO 20031998L NO 20031998 A NO20031998 A NO 20031998A NO 20031998 A NO20031998 A NO 20031998A NO 20031998 L NO20031998 L NO 20031998L
- Authority
- NO
- Norway
- Prior art keywords
- mass
- microstructure
- movable mass
- base member
- arranged above
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/18—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/12—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0035—Constitution or structural means for controlling the movement of the flexible or deformable elements
- B81B3/0051—For defining the movement, i.e. structures that guide or limit the movement of an element
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/12—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
- G01P15/123—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance by piezo-resistive elements, e.g. semiconductor strain gauges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0235—Accelerometers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/0242—Gyroscopes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0181—See-saws
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/053—Translation according to an axis perpendicular to the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/05—Type of movement
- B81B2203/058—Rotation out of a plane parallel to the substrate
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/084—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass
- G01P2015/0842—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass the mass being suspended at more than one of its sides, e.g. membrane-type suspension, so as to permit multi-axis movement of the mass the mass being of clover leaf shape
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Remote Sensing (AREA)
- Computer Hardware Design (AREA)
- Radar, Positioning & Navigation (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
- Stringed Musical Instruments (AREA)
- Gyroscopes (AREA)
- Switches Operated By Changes In Physical Conditions (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001266604 | 2001-09-04 | ||
| JP2002244282A JP2004082238A (ja) | 2002-08-23 | 2002-08-23 | 可動構造部を有する微小構造体 |
| JP2002244283A JP2003156511A (ja) | 2001-09-04 | 2002-08-23 | 可動構造部を有する微小構造体 |
| PCT/JP2002/008879 WO2003023414A1 (en) | 2001-09-04 | 2002-09-02 | Microstructure with movable mass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO20031998D0 NO20031998D0 (no) | 2003-05-02 |
| NO20031998L true NO20031998L (no) | 2003-07-02 |
Family
ID=27347434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO20031998A NO20031998L (no) | 2001-09-04 | 2003-05-02 | Mikrostruktur med bevegelig masse |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6931928B2 (no) |
| EP (1) | EP1423714B1 (no) |
| KR (1) | KR100638928B1 (no) |
| CN (1) | CN100335905C (no) |
| AT (1) | ATE333651T1 (no) |
| DE (1) | DE60213257T2 (no) |
| DK (1) | DK1423714T3 (no) |
| NO (1) | NO20031998L (no) |
| TW (1) | TW569460B (no) |
| WO (1) | WO2003023414A1 (no) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1491901A1 (en) | 2003-06-25 | 2004-12-29 | Matsushita Electric Works, Ltd. | Semiconductor acceleration sensor and method of manufacturing the same |
| EP1571454B1 (fr) | 2004-03-02 | 2007-08-01 | Colibrys S.A. | Microsystème électromécanique |
| US7710335B2 (en) * | 2004-05-19 | 2010-05-04 | Delphi Technologies, Inc. | Dual band loop antenna |
| JP4438579B2 (ja) * | 2004-09-14 | 2010-03-24 | 株式会社デンソー | センサ装置 |
| JP2006125887A (ja) * | 2004-10-26 | 2006-05-18 | Fujitsu Media Device Kk | 加速度センサ |
| US7406870B2 (en) * | 2005-01-06 | 2008-08-05 | Ricoh Company, Ltd. | Semiconductor sensor |
| JP2006201041A (ja) * | 2005-01-20 | 2006-08-03 | Oki Electric Ind Co Ltd | 加速度センサ |
| JP2006242692A (ja) * | 2005-03-02 | 2006-09-14 | Oki Electric Ind Co Ltd | 加速度センサチップ |
| US7594440B2 (en) * | 2006-10-05 | 2009-09-29 | Endevco Corporation | Highly sensitive piezoresistive element |
| JP4486103B2 (ja) * | 2007-03-19 | 2010-06-23 | Okiセミコンダクタ株式会社 | 加速度センサ、及び加速度センサの製造方法 |
| KR100844143B1 (ko) * | 2007-05-02 | 2008-07-04 | 재단법인서울대학교산학협력재단 | 3차원 구조의 미세 전극 어레이 제조방법 |
| JP2009020001A (ja) * | 2007-07-12 | 2009-01-29 | Oki Electric Ind Co Ltd | 加速度センサ |
| JP2009053180A (ja) * | 2007-07-27 | 2009-03-12 | Hitachi Metals Ltd | 加速度センサー |
| US8187903B2 (en) | 2009-01-13 | 2012-05-29 | Robert Bosch Gmbh | Method of epitaxially growing piezoresistors |
| CN102190282A (zh) * | 2010-03-03 | 2011-09-21 | 南茂科技股份有限公司 | 微机电芯片封装结构及其制造方法 |
| US8776601B2 (en) * | 2010-11-23 | 2014-07-15 | Honeywell International Inc. | MEMS sensor using multi-layer movable combs |
| JP2014049733A (ja) * | 2012-09-04 | 2014-03-17 | Fujitsu Semiconductor Ltd | 半導体装置及び半導体装置の製造方法 |
| GB2506171B (en) * | 2012-09-24 | 2015-01-28 | Wolfson Microelectronics Plc | MEMS device and process |
| US11987494B2 (en) | 2020-11-24 | 2024-05-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wire-bond damper for shock absorption |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4129042A (en) * | 1977-11-18 | 1978-12-12 | Signetics Corporation | Semiconductor transducer packaged assembly |
| JPH0679033B2 (ja) | 1987-12-21 | 1994-10-05 | 日産自動車株式会社 | 半導体加速度センサ |
| DE8805846U1 (de) * | 1988-05-03 | 1989-09-07 | Robert Bosch Gmbh, 70469 Stuttgart | Sensor |
| DE3814952A1 (de) * | 1988-05-03 | 1989-11-23 | Bosch Gmbh Robert | Sensor |
| US5191794A (en) * | 1990-12-24 | 1993-03-09 | Litton Systems, Inc. | Integrated accelerometer with resilient limit stops |
| US5894090A (en) | 1996-05-31 | 1999-04-13 | California Institute Of Technology | Silicon bulk micromachined, symmetric, degenerate vibratorygyroscope, accelerometer and sensor and method for using the same |
| US5914521A (en) * | 1997-07-30 | 1999-06-22 | Motorola, Inc. | Sensor devices having a movable structure |
| CN1069972C (zh) * | 1997-11-11 | 2001-08-22 | 李韫言 | 双电极单晶硅电容加速度传感器及其制造方法 |
| CN2438607Y (zh) * | 2000-08-25 | 2001-07-11 | 华北工学院微米纳米技术研究中心 | 集成硅微电阻式加速度传感器 |
-
2002
- 2002-09-02 US US10/488,490 patent/US6931928B2/en not_active Expired - Fee Related
- 2002-09-02 KR KR1020047003193A patent/KR100638928B1/ko not_active Expired - Fee Related
- 2002-09-02 DK DK02760798T patent/DK1423714T3/da active
- 2002-09-02 DE DE60213257T patent/DE60213257T2/de not_active Expired - Lifetime
- 2002-09-02 CN CNB02817352XA patent/CN100335905C/zh not_active Expired - Fee Related
- 2002-09-02 WO PCT/JP2002/008879 patent/WO2003023414A1/en not_active Ceased
- 2002-09-02 AT AT02760798T patent/ATE333651T1/de not_active IP Right Cessation
- 2002-09-02 EP EP02760798A patent/EP1423714B1/en not_active Expired - Lifetime
- 2002-09-04 TW TW091120206A patent/TW569460B/zh not_active IP Right Cessation
-
2003
- 2003-05-02 NO NO20031998A patent/NO20031998L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| NO20031998D0 (no) | 2003-05-02 |
| CN1551985A (zh) | 2004-12-01 |
| DE60213257D1 (de) | 2006-08-31 |
| EP1423714B1 (en) | 2006-07-19 |
| CN100335905C (zh) | 2007-09-05 |
| EP1423714A1 (en) | 2004-06-02 |
| KR100638928B1 (ko) | 2006-10-26 |
| ATE333651T1 (de) | 2006-08-15 |
| DK1423714T3 (da) | 2006-11-06 |
| KR20040041158A (ko) | 2004-05-14 |
| US6931928B2 (en) | 2005-08-23 |
| DE60213257T2 (de) | 2007-06-14 |
| WO2003023414A1 (en) | 2003-03-20 |
| TW569460B (en) | 2004-01-01 |
| US20050016271A1 (en) | 2005-01-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FC2A | Withdrawal, rejection or dismissal of laid open patent application |