NO861300L - Fremgangsmaate for regenerering av permanganat-etsebad. - Google Patents

Fremgangsmaate for regenerering av permanganat-etsebad.

Info

Publication number: NO861300L
Authority: NO; Norway
Prior art keywords: permanganate; bath; inorganic; oxidizing agent; solution
Prior art date: 1985-05-31

Application number

NO861300A

Other languages

English (en)

Norwegian (no)

Inventor

Gerald Krulik

Original Assignee

Thiokol Morton Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-05-31

Filing date

1986-04-02

Publication date

1986-12-01

1986-04-02 Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc

1986-12-01 Publication of NO861300L publication Critical patent/NO861300L/no

Links

238000000034 method Methods 0.000 title claims abstract description 39
230000008929 regeneration Effects 0.000 title claims description 10
238000011069 regeneration method Methods 0.000 title claims description 10
239000007800 oxidant agent Substances 0.000 claims abstract description 53
WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims abstract description 21
XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims abstract description 19
239000000203 mixture Substances 0.000 claims abstract description 14
150000002500 ions Chemical class 0.000 claims abstract description 10
SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 claims abstract description 8
JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims abstract description 8
QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 claims abstract description 6
SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 claims abstract description 5
229910001919 chlorite Inorganic materials 0.000 claims abstract description 4
229910052619 chlorite group Inorganic materials 0.000 claims abstract description 4
238000005530 etching Methods 0.000 claims description 26
238000002360 preparation method Methods 0.000 claims description 18
239000011572 manganese Substances 0.000 claims description 16
PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 15
229910052748 manganese Inorganic materials 0.000 claims description 15
230000001172 regenerating effect Effects 0.000 abstract description 12
239000000243 solution Substances 0.000 description 52
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 43
LBSANEJBGMCTBH-UHFFFAOYSA-N manganate Chemical compound [O-][Mn]([O-])(=O)=O LBSANEJBGMCTBH-UHFFFAOYSA-N 0.000 description 13
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
239000011347 resin Substances 0.000 description 9
229920005989 resin Polymers 0.000 description 9
239000003795 chemical substances by application Substances 0.000 description 7
NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 7
239000011734 sodium Substances 0.000 description 7
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
150000008044 alkali metal hydroxides Chemical class 0.000 description 6
239000003518 caustics Substances 0.000 description 6
239000000463 material Substances 0.000 description 6
229910052751 metal Inorganic materials 0.000 description 6
239000002184 metal Substances 0.000 description 6
238000007254 oxidation reaction Methods 0.000 description 6
230000004580 weight loss Effects 0.000 description 6
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
150000001875 compounds Chemical class 0.000 description 5
229910052802 copper Inorganic materials 0.000 description 5
239000010949 copper Substances 0.000 description 5
230000003647 oxidation Effects 0.000 description 5
230000001590 oxidative effect Effects 0.000 description 5
239000012286 potassium permanganate Substances 0.000 description 5
239000002244 precipitate Substances 0.000 description 5
XUXNAKZDHHEHPC-UHFFFAOYSA-M sodium bromate Chemical compound [Na+].[O-]Br(=O)=O XUXNAKZDHHEHPC-UHFFFAOYSA-M 0.000 description 5
229910019093 NaOCl Inorganic materials 0.000 description 4
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
239000002253 acid Substances 0.000 description 4
239000003054 catalyst Substances 0.000 description 4
238000006243 chemical reaction Methods 0.000 description 4
230000000694 effects Effects 0.000 description 4
RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 4
SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 4
239000000758 substrate Substances 0.000 description 4
229910019321 NaMnC Inorganic materials 0.000 description 3
150000001768 cations Chemical class 0.000 description 3
239000012141 concentrate Substances 0.000 description 3
-1 copper Chemical class 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
239000007787 solid Substances 0.000 description 3
RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 2
229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
229910000147 aluminium phosphate Inorganic materials 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
239000002585 base Substances 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
238000004140 cleaning Methods 0.000 description 2
239000004020 conductor Substances 0.000 description 2
238000007323 disproportionation reaction Methods 0.000 description 2
150000004820 halides Chemical class 0.000 description 2
229910001437 manganese ion Inorganic materials 0.000 description 2
238000005259 measurement Methods 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
239000005416 organic matter Substances 0.000 description 2
230000000737 periodic effect Effects 0.000 description 2
150000004976 peroxydisulfates Chemical class 0.000 description 2
150000003839 salts Chemical class 0.000 description 2
UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 2
BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 description 1
229910000951 Aluminide Inorganic materials 0.000 description 1
239000004215 Carbon black (E152) Substances 0.000 description 1
229910000975 Carbon steel Inorganic materials 0.000 description 1
RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
239000012425 OXONE® Substances 0.000 description 1
239000002202 Polyethylene glycol Substances 0.000 description 1
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
239000003513 alkali Substances 0.000 description 1
229910052783 alkali metal Inorganic materials 0.000 description 1
150000001340 alkali metals Chemical class 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
239000010962 carbon steel Substances 0.000 description 1
239000003638 chemical reducing agent Substances 0.000 description 1
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
238000005253 cladding Methods 0.000 description 1
238000000576 coating method Methods 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
230000000593 degrading effect Effects 0.000 description 1
229940079920 digestives acid preparations Drugs 0.000 description 1
BNBLBRISEAQIHU-UHFFFAOYSA-N disodium dioxido(dioxo)manganese Chemical compound [Na+].[Na+].[O-][Mn]([O-])(=O)=O BNBLBRISEAQIHU-UHFFFAOYSA-N 0.000 description 1
239000003822 epoxy resin Substances 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000011152 fibreglass Substances 0.000 description 1
150000002222 fluorine compounds Chemical class 0.000 description 1
AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
239000000174 gluconic acid Substances 0.000 description 1
235000012208 gluconic acid Nutrition 0.000 description 1
239000003906 humectant Substances 0.000 description 1
229930195733 hydrocarbon Natural products 0.000 description 1
150000002430 hydrocarbons Chemical class 0.000 description 1
239000004615 ingredient Substances 0.000 description 1
CWYNVVGOOAEACU-UHFFFAOYSA-N iron (II) ion Substances [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
238000006386 neutralization reaction Methods 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
HJKYXKSLRZKNSI-UHFFFAOYSA-I pentapotassium;hydrogen sulfate;oxido sulfate;sulfuric acid Chemical compound [K+].[K+].[K+].[K+].[K+].OS([O-])(=O)=O.[O-]S([O-])(=O)=O.OS(=O)(=O)O[O-].OS(=O)(=O)O[O-] HJKYXKSLRZKNSI-UHFFFAOYSA-I 0.000 description 1
150000002978 peroxides Chemical class 0.000 description 1
238000005554 pickling Methods 0.000 description 1
238000005498 polishing Methods 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
229920001223 polyethylene glycol Polymers 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
229910052700 potassium Inorganic materials 0.000 description 1
239000011591 potassium Substances 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
239000012260 resinous material Substances 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(I) nitrate Inorganic materials [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 1
229910000029 sodium carbonate Inorganic materials 0.000 description 1
229960002218 sodium chlorite Drugs 0.000 description 1
238000004611 spectroscopical analysis Methods 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
238000003756 stirring Methods 0.000 description 1
229920001059 synthetic polymer Polymers 0.000 description 1
238000012360 testing method Methods 0.000 description 1
238000004448 titration Methods 0.000 description 1
230000001988 toxicity Effects 0.000 description 1
231100000419 toxicity Toxicity 0.000 description 1
238000012546 transfer Methods 0.000 description 1
230000009466 transformation Effects 0.000 description 1
238000005303 weighing Methods 0.000 description 1
230000004584 weight gain Effects 0.000 description 1
235000019786 weight gain Nutrition 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
ing And Chemical Polishing (AREA)
Weting (AREA)
Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Treatments Of Macromolecular Shaped Articles (AREA)
Catalysts (AREA)
Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Processing Of Solid Wastes (AREA)
Treatment Of Water By Oxidation Or Reduction (AREA)
Saccharide Compounds (AREA)
Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

NO861300A 1985-05-31 1986-04-02 Fremgangsmaate for regenerering av permanganat-etsebad. NO861300L (no)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US74012985A	1985-05-31	1985-05-31

Publications (1)

Publication Number	Publication Date
NO861300L true NO861300L (no)	1986-12-01

Family

ID=24975163

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO861300A NO861300L (no)	1985-05-31	1986-04-02	Fremgangsmaate for regenerering av permanganat-etsebad.

Country Status (14)

Country	Link
EP (1)	EP0204399B1 (da)
JP (1)	JPS61279688A (da)
KR (1)	KR900001826B1 (da)
AT (1)	ATE50602T1 (da)
AU (1)	AU576072B2 (da)
BR (1)	BR8602232A (da)
CA (1)	CA1245137A (da)
DE (2)	DE204399T1 (da)
DK (1)	DK255486A (da)
ES (1)	ES8707312A1 (da)
IL (1)	IL78266A (da)
NO (1)	NO861300L (da)
NZ (1)	NZ215546A (da)
ZA (1)	ZA862435B (da)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3716013C2 (de) *	1987-05-11	1993-11-18	Schering Ag	Verfahren zur Regenerierung von Permanganat-Ätzlösungen
US4853095A (en) *	1988-03-09	1989-08-01	Macdermid, Incorporated	Conversion of manganese dioxide to permanganate
JPH01273231A (ja) *	1988-04-25	1989-11-01	Canon Inc	情報記録再生用駆動装置
DE10025551C2 (de) *	2000-05-19	2002-04-18	Atotech Deutschland Gmbh	Kathode für die elektrochemische Regenerierung von Permanganat-Ätzlösungen, Verfahren zu deren Herstellung sowie elektrochemische Regeneriervorrichtung
KR100777441B1 (ko) *	2006-12-27	2007-11-28	이강복	과망간산 재생기
KR101266291B1 (ko)	2008-12-30	2013-05-22	제일모직주식회사	레지스트 하층막용 조성물 및 이를 이용한 반도체 집적회로디바이스의 제조방법
DE102011111294B4 (de) *	2011-08-26	2018-12-20	Atotech Deutschland Gmbh	Verfahren zur Behandlung von Kunststoffsubstraten und Vorrichtung zur Regeneration einer Behandlungslösung
CN110438506A (zh) *	2019-07-08	2019-11-12	深圳市裕展精密科技有限公司	退镀液的再生制备方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4592852A (en) *	1984-06-07	1986-06-03	Enthone, Incorporated	Composition and process for treating plastics with alkaline permanganate solutions
US4629636A (en) *	1984-06-07	1986-12-16	Enthone, Incorporated	Process for treating plastics with alkaline permanganate solutions

1986
- 1986-03-20 NZ NZ215546A patent/NZ215546A/xx unknown
- 1986-03-21 CA CA000504750A patent/CA1245137A/en not_active Expired
- 1986-03-25 IL IL78266A patent/IL78266A/xx unknown
- 1986-03-26 AU AU55271/86A patent/AU576072B2/en not_active Ceased
- 1986-03-27 DE DE198686302335T patent/DE204399T1/de active Pending
- 1986-03-27 EP EP86302335A patent/EP0204399B1/en not_active Expired - Lifetime
- 1986-03-27 DE DE8686302335T patent/DE3669179D1/de not_active Expired - Lifetime
- 1986-03-27 AT AT86302335T patent/ATE50602T1/de not_active IP Right Cessation
- 1986-04-02 NO NO861300A patent/NO861300L/no unknown
- 1986-04-02 ZA ZA862435A patent/ZA862435B/xx unknown
- 1986-05-16 BR BR8602232A patent/BR8602232A/pt unknown
- 1986-05-20 JP JP61113846A patent/JPS61279688A/ja active Granted
- 1986-05-30 KR KR1019860004263A patent/KR900001826B1/ko not_active Expired
- 1986-05-30 DK DK255486A patent/DK255486A/da not_active Application Discontinuation
- 1986-05-30 ES ES555512A patent/ES8707312A1/es not_active Expired

Also Published As

Publication number	Publication date
DE204399T1 (de)	1988-04-07
BR8602232A (pt)	1987-01-13
CA1245137A (en)	1988-11-22
DK255486A (da)	1986-12-01
EP0204399B1 (en)	1990-02-28
EP0204399A1 (en)	1986-12-10
DK255486D0 (da)	1986-05-30
ATE50602T1 (de)	1990-03-15
AU5527186A (en)	1987-01-15
KR860009099A (ko)	1986-12-20
JPS6352116B2 (da)	1988-10-18
ZA862435B (en)	1986-11-26
ES555512A0 (es)	1987-07-01
JPS61279688A (ja)	1986-12-10
IL78266A0 (en)	1986-07-31
IL78266A (en)	1989-02-28
DE3669179D1 (de)	1990-04-05
ES8707312A1 (es)	1987-07-01
KR900001826B1 (ko)	1990-03-24
NZ215546A (en)	1988-10-28
AU576072B2 (en)	1988-08-11

Publication	Publication Date	Title
US4698124A (en)	1987-10-06	Method of regenerating permanganate etch bath
US3269881A (en)	1966-08-30	Hydrogen peroxide etching of copper in manufacture of printed circuits
KR101397363B1 (ko)	2014-05-19	모노과황산칼륨 용액
JP2562811B2 (ja)	1996-12-11	共通イオンを含有する過マンガン酸ナトリウムのアルカリ性水性溶液及び樹脂基板の処理方法
US3407141A (en)	1968-10-22	Dissolution of metal with acidified hydrogen peroxide solutions
JPS5945601B2 (ja)	1984-11-07	過酸化水素水溶液
CA1331578C (en)	1994-08-23	Conversion of manganese dioxide to permanganate
EP0349600B1 (en)	1992-10-28	Improved copper etchant compositions
CA1245137A (en)	1988-11-22	Method of regenerating permanganate etch bath
US4437928A (en)	1984-03-20	Dissolution of metals utilizing a glycol ether
JP2006522003A5 (da)	2010-09-02
US3466208A (en)	1969-09-09	Solution and method for dissolving copper
CA1215300A (en)	1986-12-16	Regenerative copper etching process and solution
EP3356577B1 (en)	2022-08-17	Treatment of etch baths
US3855141A (en)	1974-12-17	Method of processing a spent copper etching solution for reuse in an electroless copper recovery baths
JPH0733595B2 (ja)	1995-04-12	過マンガン酸塩へのマンガン酸塩の転化
EP0054371B1 (en)	1985-03-27	Process for detoxification
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