NO891062L - Positiv fotofoelsom sammensetning. - Google Patents

Positiv fotofoelsom sammensetning.

Info

Publication number: NO891062L
Authority: NO; Norway
Prior art keywords: cresol; mixture; novolak resin; approx; weight
Prior art date: 1988-03-31

Application number

NO89891062A

Other languages

English (en)

Norwegian (no)

Other versions

NO891062D0 (no

Inventor

Richard Michael Lazarus

Edward Joseph Reardon

Sunit Suresh Dixit

Original Assignee

Thiokol Morton Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-03-31

Filing date

1989-03-13

Publication date

1989-10-02

1989-03-13 Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc

1989-03-13 Publication of NO891062D0 publication Critical patent/NO891062D0/no

1989-10-02 Publication of NO891062L publication Critical patent/NO891062L/no

Links

239000000203 mixture Substances 0.000 title claims description 115
229920005989 resin Polymers 0.000 claims description 135
239000011347 resin Substances 0.000 claims description 135
IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 claims description 132
229920003986 novolac Polymers 0.000 claims description 112
RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 claims description 93
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 76
239000000463 material Substances 0.000 claims description 69
229920002120 photoresistant polymer Polymers 0.000 claims description 55
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 45
239000003504 photosensitizing agent Substances 0.000 claims description 36
QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims description 31
239000000758 substrate Substances 0.000 claims description 29
150000005690 diesters Chemical class 0.000 claims description 27
150000001299 aldehydes Chemical class 0.000 claims description 25
238000000034 method Methods 0.000 claims description 24
150000003934 aromatic aldehydes Chemical class 0.000 claims description 22
239000002904 solvent Substances 0.000 claims description 22
150000005691 triesters Chemical class 0.000 claims description 22
230000005855 radiation Effects 0.000 claims description 20
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 16
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 15
BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 15
FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 15
238000004519 manufacturing process Methods 0.000 claims description 14
RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 claims description 13
238000000576 coating method Methods 0.000 claims description 13
-1 aliphatic aldehyde Chemical class 0.000 claims description 12
239000011248 coating agent Substances 0.000 claims description 11
150000002989 phenols Chemical class 0.000 claims description 11
239000002243 precursor Substances 0.000 claims description 11
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 10
150000002148 esters Chemical class 0.000 claims description 10
SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 claims description 10
239000008096 xylene Substances 0.000 claims description 10
SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 claims description 8
IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 claims description 8
239000012670 alkaline solution Substances 0.000 claims description 8
238000009833 condensation Methods 0.000 claims description 7
230000005494 condensation Effects 0.000 claims description 7
239000007859 condensation product Substances 0.000 claims description 6
ALVGSDOIXRPZFH-UHFFFAOYSA-N [(1-diazonioimino-3,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide Chemical compound C1=CC=C2C(=N[N+]#N)C(=NN=[N-])C(=O)C(=O)C2=C1 ALVGSDOIXRPZFH-UHFFFAOYSA-N 0.000 claims description 3
ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 claims 1
239000003795 chemical substances by application Substances 0.000 claims 1
LLACVNYOVGHAKH-UHFFFAOYSA-N ethyl 3-propoxypropanoate Chemical group CCCOCCC(=O)OCC LLACVNYOVGHAKH-UHFFFAOYSA-N 0.000 claims 1
235000019256 formaldehyde Nutrition 0.000 description 20
238000011161 development Methods 0.000 description 12
HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 11
WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 11
239000010408 film Substances 0.000 description 9
238000009472 formulation Methods 0.000 description 6
QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 5
229930003836 cresol Natural products 0.000 description 5
239000000243 solution Substances 0.000 description 5
239000003153 chemical reaction reagent Substances 0.000 description 4
150000001875 compounds Chemical class 0.000 description 4
238000004090 dissolution Methods 0.000 description 4
230000035945 sensitivity Effects 0.000 description 4
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
235000012431 wafers Nutrition 0.000 description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
DMYOHQBLOZMDLP-UHFFFAOYSA-N 1-[2-(2-hydroxy-3-piperidin-1-ylpropoxy)phenyl]-3-phenylpropan-1-one Chemical compound C1CCCCN1CC(O)COC1=CC=CC=C1C(=O)CCC1=CC=CC=C1 DMYOHQBLOZMDLP-UHFFFAOYSA-N 0.000 description 3
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
229920001079 Thiokol (polymer) Polymers 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
239000004615 ingredient Substances 0.000 description 3
239000000376 reactant Substances 0.000 description 3
238000010992 reflux Methods 0.000 description 3
238000003860 storage Methods 0.000 description 3
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
239000004809 Teflon Substances 0.000 description 2
229920006362 Teflon® Polymers 0.000 description 2
238000010521 absorption reaction Methods 0.000 description 2
239000002253 acid Substances 0.000 description 2
125000000217 alkyl group Chemical group 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
239000003054 catalyst Substances 0.000 description 2
230000000052 comparative effect Effects 0.000 description 2
239000000975 dye Substances 0.000 description 2
238000002156 mixing Methods 0.000 description 2
239000002245 particle Substances 0.000 description 2
230000002165 photosensitisation Effects 0.000 description 2
238000002360 preparation method Methods 0.000 description 2
229910052710 silicon Inorganic materials 0.000 description 2
239000010703 silicon Substances 0.000 description 2
239000007787 solid Substances 0.000 description 2
239000000126 substance Substances 0.000 description 2
DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 1
ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 1
FALJDJGJWQSYBM-UHFFFAOYSA-N (6z)-6-diazo-5-hydroxy-5h-naphthalene-1-sulfonyl chloride Chemical compound C1=CC=C(S(Cl)(=O)=O)C2=C1C(O)C(=[N+]=[N-])C=C2 FALJDJGJWQSYBM-UHFFFAOYSA-N 0.000 description 1
BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
FPYUJUBAXZAQNL-UHFFFAOYSA-N 2-chlorobenzaldehyde Chemical compound ClC1=CC=CC=C1C=O FPYUJUBAXZAQNL-UHFFFAOYSA-N 0.000 description 1
ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
SQJBDVFEXQYNPV-UHFFFAOYSA-N C1(C(C=CC2=CC=CC=C12)=O)=O.OC1=C(C(=O)C2=CC=CC=C2)C=CC(=C1O)O Chemical compound C1(C(C=CC2=CC=CC=C12)=O)=O.OC1=C(C(=O)C2=CC=CC=C2)C=CC(=C1O)O SQJBDVFEXQYNPV-UHFFFAOYSA-N 0.000 description 1
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
229910001218 Gallium arsenide Inorganic materials 0.000 description 1
229930192627 Naphthoquinone Natural products 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
239000003377 acid catalyst Substances 0.000 description 1
239000000654 additive Substances 0.000 description 1
125000001931 aliphatic group Chemical group 0.000 description 1
239000003513 alkali Substances 0.000 description 1
125000003118 aryl group Chemical group 0.000 description 1
239000011230 binding agent Substances 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
BNWKXMCELVEAPW-UHFFFAOYSA-N chembl3305990 Chemical compound O=C1C(=[N+]=[N-])C=CC2=C1C=CC=C2S(=O)(=O)O BNWKXMCELVEAPW-UHFFFAOYSA-N 0.000 description 1
229910052801 chlorine Inorganic materials 0.000 description 1
239000000460 chlorine Substances 0.000 description 1
239000002131 composite material Substances 0.000 description 1
229940118056 cresol / formaldehyde Drugs 0.000 description 1
150000001896 cresols Chemical class 0.000 description 1
239000008367 deionised water Substances 0.000 description 1
229910021641 deionized water Inorganic materials 0.000 description 1
150000008049 diazo compounds Chemical class 0.000 description 1
229910001873 dinitrogen Inorganic materials 0.000 description 1
238000001312 dry etching Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
238000007687 exposure technique Methods 0.000 description 1
239000007888 film coating Substances 0.000 description 1
238000009501 film coating Methods 0.000 description 1
239000010419 fine particle Substances 0.000 description 1
238000007429 general method Methods 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
125000005843 halogen group Chemical group 0.000 description 1
150000002367 halogens Chemical group 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000012535 impurity Substances 0.000 description 1
238000010348 incorporation Methods 0.000 description 1
239000003112 inhibitor Substances 0.000 description 1
238000005468 ion implantation Methods 0.000 description 1
238000001459 lithography Methods 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
229940100630 metacresol Drugs 0.000 description 1
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
238000001393 microlithography Methods 0.000 description 1
RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 description 1
QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
150000002791 naphthoquinones Chemical class 0.000 description 1
125000000486 o-cresyl group Chemical group [H]C1=C([H])C(O*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
238000005457 optimization Methods 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
238000007539 photo-oxidation reaction Methods 0.000 description 1
238000001556 precipitation Methods 0.000 description 1
238000012545 processing Methods 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
239000007921 spray Substances 0.000 description 1
125000001424 substituent group Chemical group 0.000 description 1
238000006467 substitution reaction Methods 0.000 description 1
239000010409 thin film Substances 0.000 description 1
230000001988 toxicity Effects 0.000 description 1
231100000419 toxicity Toxicity 0.000 description 1
230000009466 transformation Effects 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Materials For Photolithography (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Phenolic Resins Or Amino Resins (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

NO89891062A 1988-03-31 1989-03-13 Positiv fotofoelsom sammensetning. NO891062L (no)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US17570688A	1988-03-31	1988-03-31
US22908888A	1988-08-05	1988-08-05

Publications (2)

Publication Number	Publication Date
NO891062D0 NO891062D0 (no)	1989-03-13
NO891062L true NO891062L (no)	1989-10-02

Family

ID=26871494

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO89891062A NO891062L (no)	1988-03-31	1989-03-13	Positiv fotofoelsom sammensetning.

Country Status (8)

Country	Link
EP (1)	EP0336605B1 (da)
JP (1)	JPH0778627B2 (da)
KR (1)	KR940001550B1 (da)
AU (1)	AU3127689A (da)
DE (1)	DE68909084T2 (da)
DK (1)	DK155289A (da)
IL (1)	IL89632A (da)
NO (1)	NO891062L (da)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02110462A (ja) *	1988-06-21	1990-04-23	Mitsubishi Kasei Corp	ポジ型フォトレジスト
JPH04328747A (ja) *	1991-03-27	1992-11-17	Internatl Business Mach Corp <Ibm>	均一にコートされたフォトレジスト組成物
KR100341563B1 (ko) *	1992-03-23	2002-10-25	제이에스알 가부시끼가이샤	레지스트도포조성물
DE4209343A1 (de) *	1992-03-23	1993-09-30	Hoechst Ag	1,2-Naphthochinon-2-diazid-sulfonsäureester, damit hergestelltes strahlungsempfindliches Gemisch und strahlungsempfindliches Aufzeichnungsmaterial
US5612164A (en) *	1995-02-09	1997-03-18	Hoechst Celanese Corporation	Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
KR100363273B1 (ko) *	2000-07-29	2002-12-05	주식회사 동진쎄미켐	액정표시장치 회로용 포토레지스트 조성물
KR101324645B1 (ko) *	2006-05-08	2013-11-01	주식회사 동진쎄미켐	포토레지스트 조성물
JP2017088675A (ja) *	2015-11-05	2017-05-25	Dic株式会社	ノボラック型フェノール性水酸基含有樹脂及びレジスト材料

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3274354D1 (en) *	1981-06-22	1987-01-08	Hunt Chem Corp Philip A	Novolak resin and a positive photoresist composition containing the same
JPS5817112A (ja) *	1981-06-22	1983-02-01	フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン	ポジ型ノボラツクホトレジスト組成物及びその調製物
DE3220816A1 (de) *	1982-06-03	1983-12-08	Merck Patent Gmbh, 6100 Darmstadt	Lichtempfindliche komponenten fuer positiv arbeitende fotoresistmaterialien
JPH0658529B2 (ja) *	1983-08-17	1994-08-03	三菱化成株式会社	ポジ型クレゾ−ルノボラツクフオトレジスト組成物
JPS61141441A (ja) *	1984-12-14	1986-06-28	Tokyo Ohka Kogyo Co Ltd	ポジ型ホトレジスト組成物
US4626492A (en) *	1985-06-04	1986-12-02	Olin Hunt Specialty Products, Inc.	Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JPS62123444A (ja) *	1985-08-07	1987-06-04	Japan Synthetic Rubber Co Ltd	ポジ型感放射線性樹脂組成物
JPS63184745A (ja) *	1987-01-27	1988-07-30	Sumitomo Chem Co Ltd	ポジ型フオトレジスト組成物

1989
- 1989-03-13 NO NO89891062A patent/NO891062L/no unknown
- 1989-03-14 AU AU31276/89A patent/AU3127689A/en not_active Abandoned
- 1989-03-16 IL IL89632A patent/IL89632A/xx unknown
- 1989-03-22 DE DE89302865T patent/DE68909084T2/de not_active Expired - Fee Related
- 1989-03-22 EP EP19890302865 patent/EP0336605B1/en not_active Expired - Lifetime
- 1989-03-30 DK DK155289A patent/DK155289A/da not_active IP Right Cessation
- 1989-03-31 KR KR1019890004297A patent/KR940001550B1/ko not_active Expired - Fee Related
- 1989-03-31 JP JP1078688A patent/JPH0778627B2/ja not_active Expired - Fee Related

Also Published As

Publication number	Publication date
DE68909084T2 (de)	1994-01-13
JPH0210348A (ja)	1990-01-16
DE68909084D1 (de)	1993-10-21
EP0336605B1 (en)	1993-09-15
KR940001550B1 (ko)	1994-02-24
EP0336605A3 (en)	1990-07-25
NO891062D0 (no)	1989-03-13
DK155289A (da)	1989-10-01
IL89632A0 (en)	1989-09-10
KR900003680A (ko)	1990-03-26
IL89632A (en)	1993-01-31
DK155289D0 (da)	1989-03-30
EP0336605A2 (en)	1989-10-11
AU3127689A (en)	1989-10-05
JPH0778627B2 (ja)	1995-08-23

Publication	Publication Date	Title
US4943511A (en)	1990-07-24	High sensitivity mid and deep UV resist
US4377631A (en)	1983-03-22	Positive novolak photoresist compositions
US5145763A (en)	1992-09-08	Positive photoresist composition
US4920028A (en)	1990-04-24	High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
KR930006913B1 (ko)	1993-07-24	혼합 알데히드 노볼락수지와 이것으로 제조한 고콘트라스트 및 고열안정성의 양성 광레지스트
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