NO902957L - Melaminholdig fotoresist med hoey foelsomhet. - Google Patents

Melaminholdig fotoresist med hoey foelsomhet.

Info

Publication number: NO902957L
Authority: NO; Norway
Prior art keywords: melaminic; photoresist; high sensitivity; photoresists; melamine resin
Prior art date: 1989-07-07

Application number

NO90902957A

Other languages

English (en)

Norwegian (no)

Other versions

NO902957D0 (no

Inventor

Karen Ann Graziano

Leonard Edward Bogan Jr

Robert James Olsen

Susan Elizabeth Anders Mcilnay

Original Assignee

Rohm & Haas

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-07-07

Filing date

1990-07-03

Publication date

1991-01-08

1990-07-03 Application filed by Rohm & Haas filed Critical Rohm & Haas

1990-07-03 Publication of NO902957D0 publication Critical patent/NO902957D0/no

1991-01-08 Publication of NO902957L publication Critical patent/NO902957L/no

Links

229920002120 photoresistant polymer Polymers 0.000 title abstract 4
230000035945 sensitivity Effects 0.000 title abstract 2
229920000877 Melamine resin Polymers 0.000 abstract 3
239000004640 Melamine resin Substances 0.000 abstract 2
BNCADMBVWNPPIZ-UHFFFAOYSA-N 2-n,2-n,4-n,4-n,6-n,6-n-hexakis(methoxymethyl)-1,3,5-triazine-2,4,6-triamine Chemical compound COCN(COC)C1=NC(N(COC)COC)=NC(N(COC)COC)=N1 BNCADMBVWNPPIZ-UHFFFAOYSA-N 0.000 abstract 1
239000004971 Cross linker Substances 0.000 abstract 1
JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Materials For Photolithography (AREA)
Photoreceptors In Electrophotography (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Compositions Of Macromolecular Compounds (AREA)
Light Receiving Elements (AREA)
Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

NO90902957A 1989-07-07 1990-07-03 Melaminholdig fotoresist med hoey foelsomhet. NO902957L (no)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US37671389A	1989-07-07	1989-07-07

Publications (2)

Publication Number	Publication Date
NO902957D0 NO902957D0 (no)	1990-07-03
NO902957L true NO902957L (no)	1991-01-08

Family

ID=23486159

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO90902957A NO902957L (no)	1989-07-07	1990-07-03	Melaminholdig fotoresist med hoey foelsomhet.

Country Status (15)

Country	Link
US (1)	US5376504A (de)
EP (1)	EP0407086B1 (de)
JP (1)	JP2985968B2 (de)
KR (1)	KR0171578B1 (de)
CN (1)	CN1048605A (de)
AT (1)	ATE149256T1 (de)
AU (1)	AU640938B2 (de)
BR (1)	BR9003219A (de)
CA (1)	CA2019693A1 (de)
DE (1)	DE69029978T2 (de)
FI (1)	FI903451A7 (de)
IE (1)	IE902473A1 (de)
IL (1)	IL94984A0 (de)
NO (1)	NO902957L (de)
ZA (1)	ZA904993B (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE4112974A1 (de) *	1991-04-20	1992-10-22	Hoechst Ag	Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH0534921A (ja) *	1991-07-30	1993-02-12	Mitsubishi Kasei Corp	ネガ型感光性組成物
JPH05181277A (ja) *	1991-11-11	1993-07-23	Mitsubishi Kasei Corp	ネガ型感光性組成物
EP0551105A3 (en) *	1992-01-07	1993-09-15	Fujitsu Limited	Negative type composition for chemically amplified resist and process and apparatus of chemically amplified resist pattern
US5389491A (en) *	1992-07-15	1995-02-14	Matsushita Electric Industrial Co., Ltd.	Negative working resist composition
JPH0667431A (ja) *	1992-08-20	1994-03-11	Sumitomo Chem Co Ltd	ネガ型フォトレジスト組成物
JPH0667413A (ja) *	1992-08-20	1994-03-11	Sumitomo Chem Co Ltd	ネガ型フォトレジスト組成物
JP3114166B2 (ja) *	1992-10-22	2000-12-04	ジェイエスアール株式会社	マイクロレンズ用感放射線性樹脂組成物
TW288112B (de) *	1993-06-02	1996-10-11	Sumitomo Chemical Co
US5529885A (en) *	1993-06-04	1996-06-25	Mitsubishi Chemical Corporation	Negative photosensitive composition and method for forming patterns using the composition
US5900346A (en) *	1995-04-06	1999-05-04	Shipley Company, L.L.C.	Compositions comprising photoactivator, acid, generator and chain extender
JP3449664B2 (ja) *	1995-04-19	2003-09-22	東京応化工業株式会社	ネガ型レジスト組成物
US6030747A (en) *	1997-03-07	2000-02-29	Nec Corporation	Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask
JPH1165118A (ja) *	1997-08-15	1999-03-05	Nippon Telegr & Teleph Corp <Ntt>	レジスト材料
US6323287B1 (en) *	1999-03-12	2001-11-27	Arch Specialty Chemicals, Inc.	Hydroxy-amino thermally cured undercoat for 193 NM lithography
JP3929653B2 (ja)	1999-08-11	2007-06-13	富士フイルム株式会社	ネガ型レジスト組成物
PL357093A1 (en) *	2000-02-15	2004-07-12	Solutia Inc.	Alkoxymethyl melamine crosslinkers
JP2003107707A (ja) *	2001-09-28	2003-04-09	Clariant (Japan) Kk	化学増幅型ポジ型感放射線性樹脂組成物
AT500298A1 (de) *	2002-06-14	2005-11-15	Agrolinz Melamin Gmbh	Verfahren zur härtung von aminoplasten
JP4213925B2 (ja)	2002-08-19	2009-01-28	富士フイルム株式会社	ネガ型レジスト組成物
JP4222850B2 (ja)	2003-02-10	2009-02-12	ＳｐａｎｓｉｏｎＪａｐａｎ株式会社	感放射線性樹脂組成物、その製造法並びにそれを用いた半導体装置の製造方法
JP3963456B2 (ja) *	2003-06-16	2007-08-22	キヤノン株式会社	感光性樹脂組成物およびこれを用いたインクジェット記録ヘッドおよびその製造方法
DE102010027239B4 (de) *	2010-07-15	2014-06-12	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Verfahren zur Beschichtung eines Substrates mit einer Schutzschicht, beschichtetes Substrat, elektronisches Bauteil sowie Verwendungszwecke
EP2628755A1 (de) *	2012-02-14	2013-08-21	Cytec Technology Corp.	Aminoplast-Vernetzerharz-Zusammensetzungen, Verfahren zu deren Herstellung, und deren Verwendung
CN106687864B (zh) *	2014-11-26	2020-07-03	日立化成株式会社	感光性树脂组合物、感光性元件、固化物、半导体装置、抗蚀图案的形成方法及电路基材的制造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3322762A (en) *	1964-04-08	1967-05-30	Pittsburgh Plate Glass Co	Production of hexamethylol-melamine and hexakis (methoxy-methyl) melamine
US3744904A (en) *	1970-06-11	1973-07-10	Gaf Corp	Transparent photographic masks
US4149888A (en) *	1972-06-26	1979-04-17	Gaf Corporation	Transparent photographic masks
US4181526A (en) *	1978-06-16	1980-01-01	Eastman Kodak Company	Interpolymer protective overcoats for electrophotographic elements
US4478932A (en) *	1980-09-23	1984-10-23	General Electric Company	Process of making a printed circuit using dry film resists
US4341859A (en) *	1980-09-23	1982-07-27	General Electric Company	Emulsion for making dry film resists
US4518676A (en) *	1982-09-18	1985-05-21	Ciba Geigy Corporation	Photopolymerizable compositions containing diaryliodosyl salts
DE3246037A1 (de) *	1982-12-09	1984-06-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3325022A1 (de) *	1983-07-11	1985-01-24	Hoechst Ag, 6230 Frankfurt	Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
MX170270B (es) *	1984-06-01	1993-08-11	Rohm & Haas	Imagenes sobre una superficie y un metodo para formar imagenes positivas y negativas termicamente estables sobre una superficie
CA1307695C (en) *	1986-01-13	1992-09-22	Wayne Edmund Feely	Photosensitive compounds and thermally stable and aqueous developablenegative images
US5034304A (en) *	1986-01-13	1991-07-23	Rohm And Haas Company	Photosensitive compounds and thermally stable and aqueous developable negative images
DE3604580A1 (de) *	1986-02-14	1987-08-20	Basf Ag	Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
DE3623984A1 (de) *	1986-07-16	1988-01-21	Hoechst Ag	Zeichenmaterial
EP0256981B1 (de) *	1986-08-01	1993-02-17	Ciba-Geigy Ag	Titanocene und deren Verwendung
JPS63123929A (ja) *	1986-11-11	1988-05-27	Takenaka Komuten Co Ltd	パ−ソナル作業スペ−スの暖房装置
US4875124A (en) *	1988-01-11	1989-10-17	International Business Machines Corporation	Thin film magnetic heads with thermally crosslinked insulation
US5129681A (en) *	1990-11-30	1992-07-14	Yano Giken Co., Ltd.	Method of rendering laid pipeline flexible and pipe joint suited for executing this method

1990
- 1990-06-22 CA CA002019693A patent/CA2019693A1/en not_active Abandoned
- 1990-06-27 AT AT90307008T patent/ATE149256T1/de not_active IP Right Cessation
- 1990-06-27 DE DE69029978T patent/DE69029978T2/de not_active Expired - Fee Related
- 1990-06-27 EP EP90307008A patent/EP0407086B1/de not_active Expired - Lifetime
- 1990-06-27 ZA ZA904993A patent/ZA904993B/xx unknown
- 1990-07-03 NO NO90902957A patent/NO902957L/no unknown
- 1990-07-04 AU AU58651/90A patent/AU640938B2/en not_active Ceased
- 1990-07-05 IL IL94984A patent/IL94984A0/xx not_active IP Right Cessation
- 1990-07-06 JP JP2177655A patent/JP2985968B2/ja not_active Expired - Lifetime
- 1990-07-06 BR BR909003219A patent/BR9003219A/pt not_active Application Discontinuation
- 1990-07-06 CN CN90103394A patent/CN1048605A/zh active Pending
- 1990-07-06 KR KR1019900010207A patent/KR0171578B1/ko not_active Expired - Fee Related
- 1990-07-06 FI FI903451A patent/FI903451A7/fi not_active Application Discontinuation
- 1990-07-06 IE IE247390A patent/IE902473A1/en unknown
1992
- 1992-08-27 US US07/936,869 patent/US5376504A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0407086A3 (en)	1992-01-15
FI903451A0 (fi)	1990-07-06
EP0407086A2 (de)	1991-01-09
AU640938B2 (en)	1993-09-09
CN1048605A (zh)	1991-01-16
KR910003441A (ko)	1991-02-27
ATE149256T1 (de)	1997-03-15
US5376504A (en)	1994-12-27
EP0407086B1 (de)	1997-02-26
DE69029978D1 (de)	1997-04-03
JPH0375652A (ja)	1991-03-29
IL94984A0 (en)	1991-06-10
DE69029978T2 (de)	1997-08-21
ZA904993B (en)	1991-03-27
FI903451A7 (fi)	1991-01-08
IE902473A1 (en)	1991-02-13
BR9003219A (pt)	1991-08-27
AU5865190A (en)	1991-01-10
CA2019693A1 (en)	1991-01-07
KR0171578B1 (ko)	1999-03-20
JP2985968B2 (ja)	1999-12-06
NO902957D0 (no)	1990-07-03

Publication	Publication Date	Title
NO902957L (no)	1991-01-08	Melaminholdig fotoresist med hoey foelsomhet.
FR2685700B1 (fr)	1995-02-24	Nouveaux polyamides et objets obtenus a partir de ceux-ci.
ES2084639T3 (es)	1996-05-16	Derivados de acido n-(pirrolo(2,3-d)pirimidin-3-ilacetil)-glutamico.
DE69205714D1 (de)	1995-12-07	Oxolanyl cyclische Acetale als Modifizierungsmittel bei der anionischen Polymerisation.
KR940022180A (ko)	1994-10-20	양성 감광성 조성물
ES2088633T3 (es)	1996-08-16	Estabilizantes polisiloxanicos que contienen grupos fenol y grupos oxamidicos estericamente impedidos.
DE69013547D1 (de)	1994-12-01	N-Hydroxycarbyloxy-gehinderte, phosphorsubstituierte Amine verwendbar als Stabilisatoren gegen Lichteinwirkung.
DE3175216D1 (en)	1986-10-02	Method of producing resist patterns
ES2076616T3 (es)	1995-11-01	Derivados de aminoacidos sulfurosos opticamente activos, su preparacion, su polimerizacion en polimeros opticamente activos y su uso.
ATE141096T1 (de)	1996-08-15	Verträgliche polymermischungen
DE69220181D1 (de)	1997-07-10	Melaminpolykondensat
ATE175280T1 (de)	1999-01-15	Lichtempfindliche, elektroabscheidbare photoresistzusammensetzung
ATE81491T1 (de)	1992-10-15	Plastifizierungsmittel, verfahren zu seiner herstellung sowie seine verwendung.
BR9201398A (pt)	1992-12-01	Emprego de oligouretanas com pesos moleculares de 5.000 ate 50.000
JPS642034A (en)	1989-01-06	Photoresist composition
ES2056171T3 (es)	1994-10-01	Mezclas tolerantes de polimeros.
MX168658B (es)	1993-06-02	Polimero adhesivo mejorado a base de acrilato
ATE480799T1 (de)	2010-09-15	Positiv arbeitende resistzusammensetzung
ATE156147T1 (de)	1997-08-15	Melaminische polykondensate
DE59009489D1 (de)	1995-09-14	Substituierte Aminopyrrole als Stabilisatoren chlorhaltige Polymerisate.
DE58903097D1 (de)	1993-02-04	Vertraegliche polymermischungen (i).
ES2097274T3 (es)	1997-04-01	Composiciones polimericas autoextinguibles.
ES2081763B1 (es)	1997-01-16	Forma puridicada de estreptograminas, su preparacion y las composiciones farmaceuticas que la contienen.
MX9303560A (es)	1994-01-31	Glutarimida resistente a la radiacion ultravioleta
DE59009953D1 (de)	1996-01-18	Melaminderivate als Stabilisatoren für chlorhaltige Polymerisate.