PL1694886T3 - Urządzenie do obróbki chemicznej na mokro lub obróbki elektrolitycznej elementów płaskich - Google Patents

Urządzenie do obróbki chemicznej na mokro lub obróbki elektrolitycznej elementów płaskich

Info

Publication number
PL1694886T3
PL1694886T3 PL04801219T PL04801219T PL1694886T3 PL 1694886 T3 PL1694886 T3 PL 1694886T3 PL 04801219 T PL04801219 T PL 04801219T PL 04801219 T PL04801219 T PL 04801219T PL 1694886 T3 PL1694886 T3 PL 1694886T3
Authority
PL
Poland
Prior art keywords
treatment
wet
chemical
flat workpieces
electrolytic treatment
Prior art date
Application number
PL04801219T
Other languages
English (en)
Inventor
Uwe Hauf
Henry Kunze
Ferdinand Wiener
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of PL1694886T3 publication Critical patent/PL1694886T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1619—Apparatus for electroless plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1619—Apparatus for electroless plating
    • C23C18/1628—Specific elements or parts of the apparatus
    • C23C18/163—Supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C25D17/28—Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736—Methods for applying liquids, e.g. spraying
    • H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1509—Horizontally held PCB
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1572—Processing both sides of a PCB by the same process; Providing a similar arrangement of components on both sides; Making interlayer connections from two sides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Weting (AREA)
  • Processing Of Meat And Fish (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Coating Apparatus (AREA)
PL04801219T 2003-12-19 2004-12-07 Urządzenie do obróbki chemicznej na mokro lub obróbki elektrolitycznej elementów płaskich PL1694886T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10361880A DE10361880B3 (de) 2003-12-19 2003-12-19 Behandlungseinheit zur nasschemischen oder elektrolytischen Behandlung von flachem Behandlungsgut und Verwendung der Behandlungseinheit
PCT/EP2004/014008 WO2005059206A2 (en) 2003-12-19 2004-12-07 Treatment unit for the wet-chemical or electrolytic treatment of flat workpieces
EP04801219A EP1694886B1 (en) 2003-12-19 2004-12-07 Treatment unit for the wet-chemical or electrolytic treatment of flat workpieces

Publications (1)

Publication Number Publication Date
PL1694886T3 true PL1694886T3 (pl) 2008-03-31

Family

ID=34399723

Family Applications (1)

Application Number Title Priority Date Filing Date
PL04801219T PL1694886T3 (pl) 2003-12-19 2004-12-07 Urządzenie do obróbki chemicznej na mokro lub obróbki elektrolitycznej elementów płaskich

Country Status (13)

Country Link
US (1) US7993486B2 (pl)
EP (1) EP1694886B1 (pl)
JP (1) JP4887157B2 (pl)
KR (1) KR101149302B1 (pl)
CN (1) CN1894444B (pl)
AT (1) ATE374266T1 (pl)
BR (1) BRPI0417271A (pl)
DE (2) DE10361880B3 (pl)
ES (1) ES2293364T3 (pl)
NO (1) NO20063257L (pl)
PL (1) PL1694886T3 (pl)
TW (1) TWI388699B (pl)
WO (1) WO2005059206A2 (pl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4805195B2 (ja) * 2007-03-13 2011-11-02 富士フイルム株式会社 軸受体、液切り装置及びめっき被膜付きフィルムの製造装置
DE102007026635B4 (de) 2007-06-06 2010-07-29 Atotech Deutschland Gmbh Vorrichtung zum nasschemischen Behandeln von Ware, Verwendung eines Strömungsorgans, Verfahren zum Einbauen eines Strömungsorgans in die Vorrichtung sowie Verfahren zur Herstellung einer nasschemisch behandelten Ware
US20120305192A1 (en) 2011-06-03 2012-12-06 Arthur Keigler Parallel single substrate processing fluid jet module
CN103266334B (zh) * 2013-04-24 2015-12-02 东莞市鸿展机械设备有限公司 隔液传送装置
CN103213804A (zh) * 2013-05-08 2013-07-24 湖南三星磊洋玻璃机械有限公司 一种固定架

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4385967A (en) * 1981-10-07 1983-05-31 Chemcut Corporation Electroplating apparatus and method
JPS5915014A (ja) * 1982-05-28 1984-01-26 ドウ・ラ・リユ・システムズ・リミテイド 結束方法及び装置
US4607590A (en) * 1982-09-07 1986-08-26 Pender Don P Apparatus for directing fluid stream against substrate sheet
JP2538671B2 (ja) 1989-06-26 1996-09-25 川崎製鉄株式会社 水平処理槽におけるロ―ル交換装置
DE4035932A1 (de) * 1990-11-12 1992-05-14 Hoellmueller Hans Vorrichtung zur herstellung flexibler schaltungen bzw. von multilayer-innenschichten
JPH04311590A (ja) * 1991-04-11 1992-11-04 Seiko Instr Inc フープ材両面部分めっき装置
DE4402596C2 (de) * 1994-01-28 1997-03-27 Atotech Deutschland Gmbh Elektrolytisches Verfahren in horizontalen Durchlaufanlagen und Vorrichtung zur Durchführung desselben
US5592958A (en) * 1995-02-01 1997-01-14 Coates, Asi, Inc. Flood conveyer
US5755935A (en) * 1996-03-07 1998-05-26 Jackson; Dale Processing system
DE05075545T1 (de) * 1998-05-20 2006-08-31 Process Automation International Ltd., Tai Po Vorrichtung zur Elektroplattierung
US6153064A (en) * 1998-11-25 2000-11-28 Oliver Sales Company Apparatus for in line plating
DE10015349A1 (de) * 2000-03-23 2001-10-25 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum Behandeln von durchgehende Löcher und/oder Vertiefungen aufweisenden Schaltungsträgern sowie Anwendung des Verfahrens und Verwendung der Vorrichtung
DE10210538B4 (de) * 2002-03-05 2004-11-18 Atotech Deutschland Gmbh Horizontal-Durchlaufanlage und Verfahren zum galvanotechnischen Behandeln von Behandlungsgut

Also Published As

Publication number Publication date
JP4887157B2 (ja) 2012-02-29
KR101149302B1 (ko) 2012-05-25
US20070012560A1 (en) 2007-01-18
ES2293364T3 (es) 2008-03-16
EP1694886A2 (en) 2006-08-30
TWI388699B (zh) 2013-03-11
JP2007514866A (ja) 2007-06-07
TW200533790A (en) 2005-10-16
KR20060133995A (ko) 2006-12-27
HK1088641A1 (en) 2006-11-10
NO20063257L (no) 2006-09-19
DE602004009215T2 (de) 2008-06-26
BRPI0417271A (pt) 2007-03-27
CN1894444B (zh) 2010-07-14
CN1894444A (zh) 2007-01-10
DE602004009215D1 (de) 2007-11-08
ATE374266T1 (de) 2007-10-15
WO2005059206A3 (en) 2006-01-12
US7993486B2 (en) 2011-08-09
EP1694886B1 (en) 2007-09-26
DE10361880B3 (de) 2005-05-04
WO2005059206A2 (en) 2005-06-30

Similar Documents

Publication Publication Date Title
SG108989A1 (en) Etchant, replenishment solution and method for producing copper wiring using the same
EP1514957A4 (en) METHOD FOR PRODUCING A METAL-COATED FOIL, CATHODE ROLLER FOR METAL STATIONS AND METHOD FOR PRODUCING A LADDER PLATE
EP1481796A4 (en) METAL SHEET HAVING METALLIC COATING AND RESIN LAMINATE, PRINTED CIRCUIT BOARD USING THE SAME, AND PROCESS FOR PRODUCING THE SAME
GB0322290D0 (en) Circuit board support arrangement,method,and method for using the same
WO2004007060A3 (en) Uv treated membranes
EP1698218A4 (en) METHOD FOR CREATING A METAL CONFIGURATION, METAL CONFIGURATION, PRINTED WIRING PANEL, METHOD FOR CREATING A CONDUCTIVE THIN LAYER AND CONDUCTIVE THIN LAYER
AU2003259049A8 (en) Electrolytic copper plating solutions
ZA200204312B (en) Laminate and process for its manufacture.
GB2394360B (en) Thin surface mounted type solid electrolytic capacitor
EP1742991A4 (en) METHOD OF FORMING SURFACE POLLUTION, METHOD OF FORMING A CONDUCTIVE FILM, METHOD OF FORMING METAL STRUCTURE, METHOD OF FORMING A MULTILAYER WIRING PLATE, SURFACE CARVED MATERIAL AND CONDUCTIVE MATERIAL
PL1952427T5 (pl) Urządzenie i sposób obróbki chemicznej na mokro płaskich, cienkich substratów w procesie ciągłym
MY145344A (en) Galvanic process for filling through-holes with metals, in particular of printed circuit boards with copper
GB0301239D0 (en) Plain bearing and process for producing the same
WO2004022814A3 (en) Device and method for electrolytically treating an at least superficially electrically conducting work piece
IL150703A (en) Selective electrochemical reduction of halogenated 4 - aminopicolinic acids
AU2003265173A1 (en) Metal foil for capacitor, solid electrolytic capacitor using the foil and production methods of the foil and the capacitor
EP1574599A4 (en) COPPER ELECTROLYTIC SOLUTION AND COPPER ELECTROLYTIC SHEET THUS PRODUCED
NO20063257L (no) Behandlingsenhet for vatkjemisk eller elektrolytisk behandling av flate arbeidsstykker
SG153797A1 (en) Circuit board
IL154329A0 (en) Complexes containing perfluoroalkyl with polar radicals, method for the production and use thereof
GB0109942D0 (en) Copper foil for printed circuit boards and its surface treatment method
EP1964668A4 (en) STRATIFIED PLATE OF BIAXIALLY LAMINATED FILMS AND LAMINATES, ELECTRICAL INSULATION PLATE AND MACHINE PIECE
EP1662614A4 (en) ANISOTROPIC CONDUCTIVE SHEET, PROCESS FOR PRODUCING SAME, AND CIRCUIT BOARD INSPECTION APPARATUS
TW256858B (en) Copper foil for printed circuit board
PL363225A1 (pl) Urządzenie do walcowania wyrobów, zwłaszcza foliimetalowych