PL1788443T3 - Sposób wytwarzania litograficznej płyty drukowej - Google Patents
Sposób wytwarzania litograficznej płyty drukowejInfo
- Publication number
- PL1788443T3 PL1788443T3 PL05110918T PL05110918T PL1788443T3 PL 1788443 T3 PL1788443 T3 PL 1788443T3 PL 05110918 T PL05110918 T PL 05110918T PL 05110918 T PL05110918 T PL 05110918T PL 1788443 T3 PL1788443 T3 PL 1788443T3
- Authority
- PL
- Poland
- Prior art keywords
- producing
- printing plate
- lithographic printing
- lithographic
- plate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05110918.9A EP1788443B1 (en) | 2005-11-18 | 2005-11-18 | Method of making a lithographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL1788443T3 true PL1788443T3 (pl) | 2014-12-31 |
Family
ID=36950332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL05110918T PL1788443T3 (pl) | 2005-11-18 | 2005-11-18 | Sposób wytwarzania litograficznej płyty drukowej |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US8119330B2 (pl) |
| EP (2) | EP1788443B1 (pl) |
| JP (1) | JP2009516222A (pl) |
| KR (1) | KR101290271B1 (pl) |
| CN (1) | CN101331433B (pl) |
| AU (1) | AU2006314571B2 (pl) |
| BR (1) | BRPI0616819B1 (pl) |
| ES (1) | ES2479066T3 (pl) |
| PL (1) | PL1788443T3 (pl) |
| WO (1) | WO2007057348A1 (pl) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1843203A1 (en) * | 2006-04-03 | 2007-10-10 | Agfa Graphics N.V. | Method of making a photopolymer printing plate |
| DE602006009919D1 (de) * | 2006-08-03 | 2009-12-03 | Agfa Graphics Nv | Flachdruckplattenträger |
| EP2149071A1 (en) * | 2007-05-15 | 2010-02-03 | Agfa Graphics N.V. | A method for making a lithographic printing plate precursor |
| US7763413B2 (en) | 2007-10-16 | 2010-07-27 | Eastman Kodak Company | Methods for imaging and processing negative-working imageable elements |
| DE602007006822D1 (de) | 2007-11-30 | 2010-07-08 | Agfa Graphics Nv | Verfahren zur Behandlung einer Lithografiedruckplatte |
| US8323874B2 (en) | 2008-01-22 | 2012-12-04 | Eastman Kodak Company | Method of making lithographic printing plates |
| EP2098376B1 (en) | 2008-03-04 | 2013-09-18 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| ES2378413T3 (es) | 2008-03-26 | 2012-04-12 | Agfa Graphics N.V. | Método de fabricación de planchas de impresión litográficas |
| JP4914864B2 (ja) * | 2008-03-31 | 2012-04-11 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| ES2365885T3 (es) | 2008-03-31 | 2011-10-13 | Agfa Graphics N.V. | Un método para tratar una plancha de impresión litográfica. |
| US8377629B2 (en) | 2008-07-16 | 2013-02-19 | Agfa Graphics Nv | Method for preparing lithographic printing plate precursors |
| ES2382371T3 (es) | 2008-10-23 | 2012-06-07 | Agfa Graphics N.V. | Plancha de impresión litográfica |
| US20110177456A1 (en) * | 2010-01-21 | 2011-07-21 | Mathias Jarek | Method of making lithographic printing plates |
| US20120141935A1 (en) * | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| JP5711168B2 (ja) | 2012-02-27 | 2015-04-30 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷版の作製方法 |
| JP5715975B2 (ja) | 2012-02-29 | 2015-05-13 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷版の製造方法 |
| EP2855152B1 (en) | 2012-06-05 | 2016-03-16 | AGFA Graphics NV | A lithographic printing plate precursor |
| CN105308504B (zh) | 2013-06-14 | 2019-12-03 | 爱克发有限公司 | 平版印刷版前体 |
| EP2883699B1 (en) | 2013-12-11 | 2017-05-03 | Agfa Graphics Nv | A lithographic printing plate precursor and monomer |
| EP2916171B1 (en) * | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
| US20160259243A1 (en) * | 2015-03-03 | 2016-09-08 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| AU2017235148A1 (en) | 2016-03-16 | 2018-07-12 | Agfa Nv | Method and apparatus for processing a lithographic printing plate |
| EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
| EP3431290B1 (en) | 2017-07-20 | 2021-09-08 | Agfa Nv | A lithographic printing plate precursor |
| EP3441223B1 (en) | 2017-08-07 | 2024-02-21 | Eco3 Bv | A lithographic printing plate precursor |
| EP3474073B1 (en) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | A method for making a printing plate |
| ES2881270T3 (es) | 2017-12-08 | 2021-11-29 | Agfa Nv | Procedimiento de fabricación de una plancha de impresión litográfica |
| WO2019179995A1 (en) | 2018-03-22 | 2019-09-26 | Agfa Nv | A lithographic printing plate precursor |
| EP3793829B1 (en) | 2018-05-14 | 2023-07-12 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3587113B1 (en) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3587112B1 (en) | 2018-06-21 | 2024-04-03 | Eco3 Bv | A lithographic printing plate precursor |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| EP3650938A1 (en) | 2018-11-09 | 2020-05-13 | Agfa Nv | A lithographic printing plate precursor |
| US11465404B2 (en) | 2018-12-10 | 2022-10-11 | Agfa Offset Bv | On-press processing of a UV or violet-sensitized lithographic printing plate |
| EP3686011A1 (en) | 2019-01-23 | 2020-07-29 | Agfa Nv | A lithographic printing plate precursor |
| EP3815900A1 (en) | 2019-10-31 | 2021-05-05 | Agfa Nv | A lithographic printing plate precursor and method for making hydrophobic resin particles |
| EP3875271B1 (en) | 2020-03-04 | 2025-10-15 | Eco3 Bv | A lithographic printing plate precursor |
| EP3892469B1 (en) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographic printing plate precursor |
| WO2021259650A1 (en) | 2020-06-24 | 2021-12-30 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3928983B1 (en) | 2020-06-24 | 2023-09-27 | Eco3 Bv | A lithographic printing plate precursor |
| CN115697708B (zh) | 2020-06-24 | 2026-02-17 | 易客发有限公司 | 平版印刷版前体 |
| ES3037727T3 (en) | 2020-08-31 | 2025-10-06 | Eco3 Bv | A lithographic printing plate precursor, a method for making a lithographic printing plate precursor and a method for making a lithographic printing plate |
| CN116324620B (zh) | 2020-10-09 | 2025-08-08 | 易客发有限公司 | 平版印刷版前体 |
| EP4035897A1 (en) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4129682B1 (en) | 2021-08-05 | 2025-10-01 | Eco3 Bv | A lithographic printing plate precursor |
| NL2030535B1 (en) * | 2022-01-13 | 2023-07-25 | Xsys Prepress N V | Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system |
| EP4223534A1 (en) | 2022-02-07 | 2023-08-09 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4461539A1 (en) | 2023-05-10 | 2024-11-13 | Eco3 Bv | A negative-working lithographic printing plate precursor |
| EP4730039A1 (en) * | 2024-10-18 | 2026-04-22 | Vianord Engineering Sasu | Method for developing a flexographic plate and apparatus for implementing such method |
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| WO2005015318A1 (en) | 2003-07-17 | 2005-02-17 | Kodak Polychrome Graphics Gmbh | Apparatus and method for treating imaging materials |
| ATE491968T1 (de) | 2003-07-22 | 2011-01-15 | Fujifilm Corp | Flachdruckplattenvorläufer und lithographisches druckverfahren |
| DE60320549T2 (de) | 2003-08-13 | 2009-05-14 | Agfa Graphics N.V. | Verfahren zum Nacheinbrennen von lithographischen Druckplatten |
| JP2005067006A (ja) | 2003-08-22 | 2005-03-17 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法、平版印刷方法および平版印刷原版 |
| JP4288123B2 (ja) * | 2003-09-03 | 2009-07-01 | 富士フイルム株式会社 | 光重合性平版印刷版の製版装置 |
| JP2005084092A (ja) * | 2003-09-04 | 2005-03-31 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP4644458B2 (ja) | 2003-09-30 | 2011-03-02 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
| EP1557262B1 (en) | 2004-01-23 | 2007-11-14 | FUJIFILM Corporation | Lithographic printing plate precursor and lithographic printing method |
| ATE533089T1 (de) * | 2004-05-19 | 2011-11-15 | Agfa Graphics Nv | Verfahren zur herstellung einer fotopolymer- druckplatte |
| WO2006005688A1 (en) | 2004-07-08 | 2006-01-19 | Agfa-Gevaert | Method for making negative-working heat-sensitive lithographic printing plate precursor. |
| CN101076448B (zh) * | 2004-10-01 | 2010-12-08 | 爱克发印艺公司 | 制作平版印刷印版的方法 |
| JP4792326B2 (ja) * | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
-
2005
- 2005-11-18 EP EP05110918.9A patent/EP1788443B1/en not_active Expired - Lifetime
- 2005-11-18 PL PL05110918T patent/PL1788443T3/pl unknown
- 2005-11-18 EP EP14163143.2A patent/EP2772805A1/en not_active Withdrawn
- 2005-11-18 ES ES05110918.9T patent/ES2479066T3/es not_active Expired - Lifetime
-
2006
- 2006-11-09 KR KR1020087011570A patent/KR101290271B1/ko not_active Expired - Fee Related
- 2006-11-09 AU AU2006314571A patent/AU2006314571B2/en not_active Ceased
- 2006-11-09 BR BRPI0616819-1A patent/BRPI0616819B1/pt not_active IP Right Cessation
- 2006-11-09 JP JP2008540585A patent/JP2009516222A/ja active Pending
- 2006-11-09 WO PCT/EP2006/068303 patent/WO2007057348A1/en not_active Ceased
- 2006-11-09 CN CN2006800422613A patent/CN101331433B/zh not_active Expired - Fee Related
- 2006-11-09 US US12/093,376 patent/US8119330B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| ES2479066T3 (es) | 2014-07-23 |
| KR101290271B1 (ko) | 2013-07-29 |
| KR20080068070A (ko) | 2008-07-22 |
| CN101331433B (zh) | 2010-12-01 |
| EP2772805A1 (en) | 2014-09-03 |
| BRPI0616819B1 (pt) | 2018-03-27 |
| AU2006314571B2 (en) | 2011-08-25 |
| EP1788443B1 (en) | 2014-07-02 |
| BRPI0616819A2 (pt) | 2011-07-05 |
| WO2007057348A1 (en) | 2007-05-24 |
| JP2009516222A (ja) | 2009-04-16 |
| CN101331433A (zh) | 2008-12-24 |
| AU2006314571A1 (en) | 2007-05-24 |
| US20080286695A1 (en) | 2008-11-20 |
| US8119330B2 (en) | 2012-02-21 |
| EP1788443A1 (en) | 2007-05-23 |
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