PL2041332T3 - Sposób i urządzenie do wspomaganego plazmą chemicznego osadzania z fazy gazowej na wewnętrznej ścianie pustej bryły - Google Patents

Sposób i urządzenie do wspomaganego plazmą chemicznego osadzania z fazy gazowej na wewnętrznej ścianie pustej bryły

Info

Publication number
PL2041332T3
PL2041332T3 PL07802376T PL07802376T PL2041332T3 PL 2041332 T3 PL2041332 T3 PL 2041332T3 PL 07802376 T PL07802376 T PL 07802376T PL 07802376 T PL07802376 T PL 07802376T PL 2041332 T3 PL2041332 T3 PL 2041332T3
Authority
PL
Poland
Prior art keywords
plasma
hollow body
wall
vapour deposition
chemical vapour
Prior art date
Application number
PL07802376T
Other languages
English (en)
Inventor
Oliver Nöll
Original Assignee
Surcoatec Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Surcoatec Ag filed Critical Surcoatec Ag
Publication of PL2041332T3 publication Critical patent/PL2041332T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32366—Localised processing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/24—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using chemical vapour deposition [CVD]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
PL07802376T 2006-07-12 2007-07-11 Sposób i urządzenie do wspomaganego plazmą chemicznego osadzania z fazy gazowej na wewnętrznej ścianie pustej bryły PL2041332T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006032568A DE102006032568A1 (de) 2006-07-12 2006-07-12 Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers
PCT/EP2007/057117 WO2008006856A1 (de) 2006-07-12 2007-07-11 Verfahren und vorrichtung zur plasmagestützten chemischen gasphasenabscheidung an der innenwand eines hohlkörpers
EP07802376A EP2041332B1 (de) 2006-07-12 2007-07-11 Verfahren und vorrichtung zur plasmagestützten chemischen gasphasenabscheidung an der innenwand eines hohlkörpers

Publications (1)

Publication Number Publication Date
PL2041332T3 true PL2041332T3 (pl) 2011-07-29

Family

ID=38658502

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07802376T PL2041332T3 (pl) 2006-07-12 2007-07-11 Sposób i urządzenie do wspomaganego plazmą chemicznego osadzania z fazy gazowej na wewnętrznej ścianie pustej bryły

Country Status (14)

Country Link
US (1) US8227052B2 (pl)
EP (1) EP2041332B1 (pl)
JP (1) JP2009542917A (pl)
KR (1) KR20090037461A (pl)
CN (1) CN101522941B (pl)
AT (1) ATE500348T1 (pl)
AU (1) AU2007274256A1 (pl)
CA (1) CA2693039A1 (pl)
DE (2) DE102006032568A1 (pl)
ES (1) ES2362145T3 (pl)
PL (1) PL2041332T3 (pl)
RU (1) RU2446230C2 (pl)
WO (1) WO2008006856A1 (pl)
ZA (1) ZA200900949B (pl)

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DE102007045216A1 (de) * 2007-09-21 2009-04-02 Khs Corpoplast Gmbh & Co. Kg Vorrichtung zur Plasmabehandlung von Werkstücken
DE102009000821B4 (de) 2009-02-12 2013-05-02 Surcoatec Ag Verfahren zum Aufbringen einer Beschichtung auf Werkstücke und/oder Werkstoffe aufweisend mindestens ein leicht oxidierbares Nichteisenmetall sowie Werkstück und/oder Werkstoff hergestellt nach dem Verfahren
DE102009002780A1 (de) 2009-04-30 2010-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Metallsubstrate mit kratzfester und dehnbarer Korrosionsschutzschicht und Verfahren zu deren Herstellung
MX345403B (es) * 2009-05-13 2017-01-30 Sio2 Medical Products Inc Revestimiento por pecvd utilizando un precursor organosilícico.
RU2456373C1 (ru) * 2011-04-05 2012-07-20 Федеральное государственное образовательное учреждение высшего профессионального образования "Тверская государственная сельскохозяйственная академия" (ФГОУ ВПО "Тверская государственная сельскохозяйственная академия") Устройство для нанесения металлических покрытий на внутренние поверхности подшипников скольжения cvd-методом металлоорганических соединений
WO2012164050A1 (de) * 2011-05-31 2012-12-06 Surcoatec Ag Vorrichtung und verfahren zum beschichten und/oder zum abtragen von material mittels pecvd/cde
DE102011105645A1 (de) * 2011-06-07 2012-12-13 Oerlikon Trading Ag, Trübbach Entschichtungsverfahren für harte Kohlenstoffschichten
DE102012201955A1 (de) * 2012-02-09 2013-08-14 Krones Ag Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung
FR2991614B1 (fr) * 2012-06-06 2014-07-18 Snecma Procede de rechargement global de piece metallique pour turboreacteurs d'aeronefs, et outillage de protection globale pour la mise en œuvre du procede
US9121540B2 (en) 2012-11-21 2015-09-01 Southwest Research Institute Superhydrophobic compositions and coating process for the internal surface of tubular structures
DE102013209707B4 (de) * 2013-05-24 2026-07-23 BSH Hausgeräte GmbH Küchengeräte mit leicht reinigbaren oberflächen und verfahren zu deren aufbringung
RU2548016C1 (ru) * 2013-10-16 2015-04-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Сибирский государственный аэрокосмический университет имени академика М.Ф. Решетнева" (СибГАУ) Устройство для ионной обработки внутренних поверхностей изделий миллиметрового диапазона
CN104752633A (zh) * 2013-12-31 2015-07-01 中国科学院微电子研究所 一种薄膜封装方法
CN106282973A (zh) * 2015-06-26 2017-01-04 核工业西南物理研究院 用于管内壁镀膜的装置及方法
GB201614332D0 (en) * 2016-08-22 2016-10-05 Innano As Method and system for treating a surface
CN106840820B (zh) * 2016-11-29 2020-10-23 信利（惠州）智能显示有限公司 Cvd薄膜及其刻蚀处理方法
JP6848578B2 (ja) * 2017-03-23 2021-03-24 三菱ケミカル株式会社 プラスチックボトルの製造方法
WO2021058547A1 (en) * 2019-09-23 2021-04-01 Agc Glass Europe Fabric substrate bearing a carbon based coating and process for making the same
CN110965040B (zh) * 2019-12-04 2021-04-16 江苏菲沃泰纳米科技股份有限公司 用于制备dlc的镀膜设备及其应用
CN112899662A (zh) * 2019-12-04 2021-06-04 江苏菲沃泰纳米科技股份有限公司 Dlc制备装置和制备方法

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Also Published As

Publication number Publication date
CN101522941A (zh) 2009-09-02
EP2041332B1 (de) 2011-03-02
JP2009542917A (ja) 2009-12-03
ATE500348T1 (de) 2011-03-15
EP2041332A1 (de) 2009-04-01
DE502007006616D1 (de) 2011-04-14
ZA200900949B (en) 2010-02-24
US20090280276A1 (en) 2009-11-12
KR20090037461A (ko) 2009-04-15
RU2009101101A (ru) 2010-07-20
US8227052B2 (en) 2012-07-24
RU2446230C2 (ru) 2012-03-27
CA2693039A1 (en) 2008-01-17
CN101522941B (zh) 2011-09-28
AU2007274256A1 (en) 2008-01-17
WO2008006856A1 (de) 2008-01-17
ES2362145T3 (es) 2011-06-29
DE102006032568A1 (de) 2008-01-17

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