PL2471151T3 - Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowym - Google Patents
Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowymInfo
- Publication number
- PL2471151T3 PL2471151T3 PL10740685T PL10740685T PL2471151T3 PL 2471151 T3 PL2471151 T3 PL 2471151T3 PL 10740685 T PL10740685 T PL 10740685T PL 10740685 T PL10740685 T PL 10740685T PL 2471151 T3 PL2471151 T3 PL 2471151T3
- Authority
- PL
- Poland
- Prior art keywords
- laser
- semiconductcor
- mirror
- absorber attached
- absorber
- Prior art date
Links
- 239000006096 absorbing agent Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2018—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
- H01S5/2022—Absorbing region or layer parallel to the active layer, e.g. to influence transverse modes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/0014—Measuring characteristics or properties thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
- H01S5/0287—Facet reflectivity
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Geometry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009028909A DE102009028909A1 (de) | 2009-08-26 | 2009-08-26 | Halbleiterlaser mit auf einem Laserspiegel angebrachtem Absorber |
| EP10740685.2A EP2471151B1 (de) | 2009-08-26 | 2010-08-11 | Halbleiterlaser mit auf einem laserspiegel angebrachtem absorber |
| PCT/EP2010/061687 WO2011023551A1 (de) | 2009-08-26 | 2010-08-11 | Halbleiterlaser mit auf einem laserspiegel angebrachtem absorber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PL2471151T3 true PL2471151T3 (pl) | 2020-07-27 |
Family
ID=42751535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL10740685T PL2471151T3 (pl) | 2009-08-26 | 2010-08-11 | Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowym |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8879599B2 (pl) |
| EP (1) | EP2471151B1 (pl) |
| JP (1) | JP5837493B2 (pl) |
| DE (1) | DE102009028909A1 (pl) |
| LT (1) | LT2471151T (pl) |
| PL (1) | PL2471151T3 (pl) |
| WO (1) | WO2011023551A1 (pl) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8415208B2 (en) * | 2001-07-16 | 2013-04-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and peeling off method and method of manufacturing semiconductor device |
| JP5803167B2 (ja) * | 2011-03-14 | 2015-11-04 | 日亜化学工業株式会社 | 窒化物半導体レーザ素子の製造方法 |
| DE102011081417A1 (de) | 2011-08-23 | 2012-09-20 | Siemens Ag | Optoelektronisches Bauelement |
| JP5899146B2 (ja) * | 2013-03-26 | 2016-04-06 | 日本電信電話株式会社 | 多波長半導体レーザ光源 |
| US11901692B2 (en) | 2018-11-27 | 2024-02-13 | Skorpios Technologies, Inc. | Wafer-level etched facet for perpendicular coupling of light from a semiconductor laser device |
| US11217963B1 (en) * | 2018-11-27 | 2022-01-04 | Skorpios Technologies, Inc. | Wafer level coatings for photonic die |
| WO2021214172A1 (de) | 2020-04-24 | 2021-10-28 | Osram Opto Semiconductors Gmbh | Halbleiterlaser und lidar-system mit dem halbleiterlaser |
| US11728619B2 (en) * | 2020-07-07 | 2023-08-15 | Marvell Asia Pte Ltd | Side mode suppression for extended c-band tunable laser |
| DE102020212422A1 (de) | 2020-10-01 | 2022-04-07 | Robert Bosch Gesellschaft mit beschränkter Haftung | Laserdiodenvorrichtung und Datenbrillensystem |
| WO2022185970A1 (ja) | 2021-03-05 | 2022-09-09 | 株式会社堀場製作所 | 半導体レーザ装置 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5543822A (en) | 1978-09-21 | 1980-03-27 | Fujitsu Ltd | Semiconductor light emission device |
| US4503541A (en) | 1982-11-10 | 1985-03-05 | The United States Of America As Represented By The Secretary Of The Navy | Controlled-linewidth laser source |
| US4684258A (en) * | 1985-07-31 | 1987-08-04 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method and apparatus for enhancing laser absorption sensitivity |
| JPH01254841A (ja) * | 1988-04-05 | 1989-10-11 | Fujitsu Ltd | ガスセンサの信号処理方法 |
| JPH02214182A (ja) * | 1989-02-14 | 1990-08-27 | Mitsubishi Electric Corp | 半導体レーザ装置 |
| JPH04207091A (ja) * | 1990-11-30 | 1992-07-29 | Toshiba Corp | 半導体レーザ装置 |
| JPH0537072A (ja) * | 1991-07-30 | 1993-02-12 | Sharp Corp | 半導体レーザ素子 |
| JP2980435B2 (ja) * | 1991-09-12 | 1999-11-22 | 株式会社東芝 | 半導体装置 |
| JPH0745910A (ja) * | 1993-07-30 | 1995-02-14 | Ricoh Co Ltd | 半導体レーザー |
| EP0847608B1 (de) * | 1995-08-29 | 1999-06-30 | Siemens Aktiengesellschaft | Laservorrichtung |
| JPH10125989A (ja) * | 1996-10-17 | 1998-05-15 | Furukawa Electric Co Ltd:The | 光集積素子 |
| FR2753794A1 (fr) | 1996-12-24 | 1998-03-27 | Commissariat Energie Atomique | Systeme de mesure spectrophotometrique par diodes a cavite resonnante |
| US6347107B1 (en) * | 1998-07-15 | 2002-02-12 | Eastman Kodak Company | System and method of improving intensity control of laser diodes using back facet photodiode |
| JP3422364B2 (ja) | 1998-08-21 | 2003-06-30 | セイコーエプソン株式会社 | インクジェット式記録ヘッド及びインクジェット式記録装置 |
| JP4035021B2 (ja) | 1999-02-17 | 2008-01-16 | 松下電器産業株式会社 | 半導体レーザ装置、光ディスク装置及び光集積化装置 |
| DE19908426C2 (de) | 1999-02-26 | 2001-03-22 | Siemens Ag | Vertikalresonator-Laserdiode mit einer lichtabsorbierenden Schicht und Verfahren zu ihrer Herstellung |
| JP2001133403A (ja) * | 1999-11-02 | 2001-05-18 | Nippon Sanso Corp | 半導体レーザ多重反射吸収分光によるガス分析方法及び装置 |
| JP2001154067A (ja) * | 1999-12-01 | 2001-06-08 | Nec Corp | 光導波路を使用した光送受信モジュール |
| JP2001257413A (ja) * | 2000-03-14 | 2001-09-21 | Toshiba Electronic Engineering Corp | 半導体レーザ装置及びその製造方法 |
| US7573928B1 (en) * | 2003-09-05 | 2009-08-11 | Santur Corporation | Semiconductor distributed feedback (DFB) laser array with integrated attenuator |
| JP4253027B2 (ja) * | 2006-11-21 | 2009-04-08 | 古河電気工業株式会社 | 光モジュール |
| US7940003B2 (en) | 2007-06-13 | 2011-05-10 | Sharp Kabushiki Kaisha | Light emitting device and method of fabricating a light emitting device |
| JP5122337B2 (ja) * | 2007-06-13 | 2013-01-16 | シャープ株式会社 | 発光素子及び発光素子の製造方法 |
| DE102008012859B4 (de) | 2007-12-21 | 2023-10-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Laserlichtquelle mit einer Filterstruktur |
-
2009
- 2009-08-26 DE DE102009028909A patent/DE102009028909A1/de not_active Ceased
-
2010
- 2010-08-11 LT LTEP10740685.2T patent/LT2471151T/lt unknown
- 2010-08-11 EP EP10740685.2A patent/EP2471151B1/de active Active
- 2010-08-11 JP JP2012525983A patent/JP5837493B2/ja active Active
- 2010-08-11 WO PCT/EP2010/061687 patent/WO2011023551A1/de not_active Ceased
- 2010-08-11 PL PL10740685T patent/PL2471151T3/pl unknown
- 2010-08-11 US US13/391,449 patent/US8879599B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| DE102009028909A1 (de) | 2011-03-17 |
| WO2011023551A1 (de) | 2011-03-03 |
| US8879599B2 (en) | 2014-11-04 |
| EP2471151B1 (de) | 2020-02-19 |
| JP2013503466A (ja) | 2013-01-31 |
| EP2471151A1 (de) | 2012-07-04 |
| JP5837493B2 (ja) | 2015-12-24 |
| LT2471151T (lt) | 2020-04-10 |
| US20120177075A1 (en) | 2012-07-12 |
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