PL2471151T3 - Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowym - Google Patents

Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowym

Info

Publication number
PL2471151T3
PL2471151T3 PL10740685T PL10740685T PL2471151T3 PL 2471151 T3 PL2471151 T3 PL 2471151T3 PL 10740685 T PL10740685 T PL 10740685T PL 10740685 T PL10740685 T PL 10740685T PL 2471151 T3 PL2471151 T3 PL 2471151T3
Authority
PL
Poland
Prior art keywords
laser
semiconductcor
mirror
absorber attached
absorber
Prior art date
Application number
PL10740685T
Other languages
English (en)
Inventor
Johannes Bernhard Koeth
Original Assignee
Nanoplus Nanosystems And Technologies Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanoplus Nanosystems And Technologies Gmbh filed Critical Nanoplus Nanosystems And Technologies Gmbh
Publication of PL2471151T3 publication Critical patent/PL2471151T3/pl

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/028Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/39Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004Confining in the direction perpendicular to the layer structure
    • H01S5/2018Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
    • H01S5/2022Absorbing region or layer parallel to the active layer, e.g. to influence transverse modes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/0014Measuring characteristics or properties thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/005Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/028Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0287Facet reflectivity

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Geometry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Semiconductor Lasers (AREA)
PL10740685T 2009-08-26 2010-08-11 Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowym PL2471151T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009028909A DE102009028909A1 (de) 2009-08-26 2009-08-26 Halbleiterlaser mit auf einem Laserspiegel angebrachtem Absorber
EP10740685.2A EP2471151B1 (de) 2009-08-26 2010-08-11 Halbleiterlaser mit auf einem laserspiegel angebrachtem absorber
PCT/EP2010/061687 WO2011023551A1 (de) 2009-08-26 2010-08-11 Halbleiterlaser mit auf einem laserspiegel angebrachtem absorber

Publications (1)

Publication Number Publication Date
PL2471151T3 true PL2471151T3 (pl) 2020-07-27

Family

ID=42751535

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10740685T PL2471151T3 (pl) 2009-08-26 2010-08-11 Laser półprzewodnikowy z absorberem, umieszczonym na lustrze laserowym

Country Status (7)

Country Link
US (1) US8879599B2 (pl)
EP (1) EP2471151B1 (pl)
JP (1) JP5837493B2 (pl)
DE (1) DE102009028909A1 (pl)
LT (1) LT2471151T (pl)
PL (1) PL2471151T3 (pl)
WO (1) WO2011023551A1 (pl)

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Publication number Priority date Publication date Assignee Title
US8415208B2 (en) * 2001-07-16 2013-04-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and peeling off method and method of manufacturing semiconductor device
JP5803167B2 (ja) * 2011-03-14 2015-11-04 日亜化学工業株式会社 窒化物半導体レーザ素子の製造方法
DE102011081417A1 (de) 2011-08-23 2012-09-20 Siemens Ag Optoelektronisches Bauelement
JP5899146B2 (ja) * 2013-03-26 2016-04-06 日本電信電話株式会社 多波長半導体レーザ光源
US11901692B2 (en) 2018-11-27 2024-02-13 Skorpios Technologies, Inc. Wafer-level etched facet for perpendicular coupling of light from a semiconductor laser device
US11217963B1 (en) * 2018-11-27 2022-01-04 Skorpios Technologies, Inc. Wafer level coatings for photonic die
WO2021214172A1 (de) 2020-04-24 2021-10-28 Osram Opto Semiconductors Gmbh Halbleiterlaser und lidar-system mit dem halbleiterlaser
US11728619B2 (en) * 2020-07-07 2023-08-15 Marvell Asia Pte Ltd Side mode suppression for extended c-band tunable laser
DE102020212422A1 (de) 2020-10-01 2022-04-07 Robert Bosch Gesellschaft mit beschränkter Haftung Laserdiodenvorrichtung und Datenbrillensystem
WO2022185970A1 (ja) 2021-03-05 2022-09-09 株式会社堀場製作所 半導体レーザ装置

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JPS5543822A (en) 1978-09-21 1980-03-27 Fujitsu Ltd Semiconductor light emission device
US4503541A (en) 1982-11-10 1985-03-05 The United States Of America As Represented By The Secretary Of The Navy Controlled-linewidth laser source
US4684258A (en) * 1985-07-31 1987-08-04 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method and apparatus for enhancing laser absorption sensitivity
JPH01254841A (ja) * 1988-04-05 1989-10-11 Fujitsu Ltd ガスセンサの信号処理方法
JPH02214182A (ja) * 1989-02-14 1990-08-27 Mitsubishi Electric Corp 半導体レーザ装置
JPH04207091A (ja) * 1990-11-30 1992-07-29 Toshiba Corp 半導体レーザ装置
JPH0537072A (ja) * 1991-07-30 1993-02-12 Sharp Corp 半導体レーザ素子
JP2980435B2 (ja) * 1991-09-12 1999-11-22 株式会社東芝 半導体装置
JPH0745910A (ja) * 1993-07-30 1995-02-14 Ricoh Co Ltd 半導体レーザー
EP0847608B1 (de) * 1995-08-29 1999-06-30 Siemens Aktiengesellschaft Laservorrichtung
JPH10125989A (ja) * 1996-10-17 1998-05-15 Furukawa Electric Co Ltd:The 光集積素子
FR2753794A1 (fr) 1996-12-24 1998-03-27 Commissariat Energie Atomique Systeme de mesure spectrophotometrique par diodes a cavite resonnante
US6347107B1 (en) * 1998-07-15 2002-02-12 Eastman Kodak Company System and method of improving intensity control of laser diodes using back facet photodiode
JP3422364B2 (ja) 1998-08-21 2003-06-30 セイコーエプソン株式会社 インクジェット式記録ヘッド及びインクジェット式記録装置
JP4035021B2 (ja) 1999-02-17 2008-01-16 松下電器産業株式会社 半導体レーザ装置、光ディスク装置及び光集積化装置
DE19908426C2 (de) 1999-02-26 2001-03-22 Siemens Ag Vertikalresonator-Laserdiode mit einer lichtabsorbierenden Schicht und Verfahren zu ihrer Herstellung
JP2001133403A (ja) * 1999-11-02 2001-05-18 Nippon Sanso Corp 半導体レーザ多重反射吸収分光によるガス分析方法及び装置
JP2001154067A (ja) * 1999-12-01 2001-06-08 Nec Corp 光導波路を使用した光送受信モジュール
JP2001257413A (ja) * 2000-03-14 2001-09-21 Toshiba Electronic Engineering Corp 半導体レーザ装置及びその製造方法
US7573928B1 (en) * 2003-09-05 2009-08-11 Santur Corporation Semiconductor distributed feedback (DFB) laser array with integrated attenuator
JP4253027B2 (ja) * 2006-11-21 2009-04-08 古河電気工業株式会社 光モジュール
US7940003B2 (en) 2007-06-13 2011-05-10 Sharp Kabushiki Kaisha Light emitting device and method of fabricating a light emitting device
JP5122337B2 (ja) * 2007-06-13 2013-01-16 シャープ株式会社 発光素子及び発光素子の製造方法
DE102008012859B4 (de) 2007-12-21 2023-10-05 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Laserlichtquelle mit einer Filterstruktur

Also Published As

Publication number Publication date
DE102009028909A1 (de) 2011-03-17
WO2011023551A1 (de) 2011-03-03
US8879599B2 (en) 2014-11-04
EP2471151B1 (de) 2020-02-19
JP2013503466A (ja) 2013-01-31
EP2471151A1 (de) 2012-07-04
JP5837493B2 (ja) 2015-12-24
LT2471151T (lt) 2020-04-10
US20120177075A1 (en) 2012-07-12

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