PL2480052T3 - Ceramiczna płytka drukowana oraz sposób jej wytwarzania - Google Patents

Ceramiczna płytka drukowana oraz sposób jej wytwarzania

Info

Publication number
PL2480052T3
PL2480052T3 PL10817188T PL10817188T PL2480052T3 PL 2480052 T3 PL2480052 T3 PL 2480052T3 PL 10817188 T PL10817188 T PL 10817188T PL 10817188 T PL10817188 T PL 10817188T PL 2480052 T3 PL2480052 T3 PL 2480052T3
Authority
PL
Poland
Prior art keywords
production
circuit board
printed circuit
ceramic printed
ceramic
Prior art date
Application number
PL10817188T
Other languages
English (en)
Inventor
Hiromasa Kato
Original Assignee
Toshiba Kk
Toshiba Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk, Toshiba Materials Co Ltd filed Critical Toshiba Kk
Publication of PL2480052T3 publication Critical patent/PL2480052T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00—Soldering, e.g. brazing, or unsoldering
    • B23K1/0008—Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B23K1/0016—Soldering of electronic components
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/023—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used
    • C04B37/026—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used consisting of metals or metal salts
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00—Arrangements for thermal protection or thermal control
    • H10W40/20—Arrangements for cooling
    • H10W40/25—Arrangements for cooling characterised by their materials
    • H10W40/255—Arrangements for cooling characterised by their materials having a laminate or multilayered structure, e.g. direct bond copper [DBC] ceramic substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • H10W70/692—Ceramics or glasses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658—Atmosphere during thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/9607—Thermal properties, e.g. thermal expansion coefficient
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/125—Metallic interlayers based on noble metals, e.g. silver
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/126—Metallic interlayers wherein the active component for bonding is not the largest fraction of the interlayer
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/126—Metallic interlayers wherein the active component for bonding is not the largest fraction of the interlayer
    • C04B2237/127—The active component for bonding being a refractory metal
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/34—Oxidic
    • C04B2237/343—Alumina or aluminates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/36—Non-oxidic
    • C04B2237/366—Aluminium nitride
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/36—Non-oxidic
    • C04B2237/368—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70—Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/706—Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the metallic layers or articles
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/88—Joining of two substrates, where a substantial part of the joining material is present outside of the joint, leading to an outside joining of the joint
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0335—Layered conductors or foils
    • H05K2201/0355—Metal foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0392—Pretreatment of metal, e.g. before finish plating, etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/04—Soldering or other types of metallurgic bonding
    • H05K2203/0465—Shape of solder, e.g. differing from spherical shape, different shapes due to different solder pads
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0545—Pattern for applying drops or paste; Applying a pattern made of drops or paste
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/125—Inorganic compounds, e.g. silver salt
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/167—Using mechanical means for positioning, alignment or registration, e.g. using rod-in-hole alignment
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/202—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3465—Application of solder
    • H05K3/3485—Application of solder paste, slurry or powder
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Products (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Structure Of Printed Boards (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
PL10817188T 2009-09-15 2010-09-15 Ceramiczna płytka drukowana oraz sposób jej wytwarzania PL2480052T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009213511 2009-09-15
EP10817188.5A EP2480052B1 (en) 2009-09-15 2010-09-15 Ceramic circuit board and process for producing same
PCT/JP2010/065914 WO2011034075A1 (ja) 2009-09-15 2010-09-15 セラミックス回路基板及びその製造方法

Publications (1)

Publication Number Publication Date
PL2480052T3 true PL2480052T3 (pl) 2018-01-31

Family

ID=43758676

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10817188T PL2480052T3 (pl) 2009-09-15 2010-09-15 Ceramiczna płytka drukowana oraz sposób jej wytwarzania

Country Status (6)

Country Link
US (2) US8785785B2 (pl)
EP (2) EP3273755B1 (pl)
JP (7) JP5637992B2 (pl)
HU (2) HUE034429T2 (pl)
PL (1) PL2480052T3 (pl)
WO (1) WO2011034075A1 (pl)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5637992B2 (ja) * 2009-09-15 2014-12-10 株式会社東芝 セラミックス回路基板の製造方法
KR101659194B1 (ko) 2011-12-20 2016-09-22 가부시끼가이샤 도시바 세라믹 구리 회로 기판과 그것을 사용한 반도체 장치
WO2014175459A1 (ja) * 2013-04-26 2014-10-30 京セラ株式会社 複合積層体および電子装置
CN105452194B (zh) 2013-08-08 2017-05-03 株式会社东芝 电路基板以及半导体装置
EP3125286B1 (en) * 2014-03-26 2019-05-08 Kyocera Corporation Circuit board and electronic device provided with same
US9731384B2 (en) * 2014-11-18 2017-08-15 Baker Hughes Incorporated Methods and compositions for brazing
DE102015110607A1 (de) * 2015-07-01 2017-01-05 Epcos Ag Verfahren zur Herstellung eines elektrischen Bauelements
WO2017056666A1 (ja) * 2015-09-28 2017-04-06 株式会社東芝 窒化珪素回路基板およびそれを用いた半導体モジュール
EP3358614B1 (en) * 2015-09-28 2022-12-14 Kabushiki Kaisha Toshiba Circuit substrate and semiconductor device
WO2017115461A1 (en) * 2015-12-28 2017-07-06 Ngk Insulators, Ltd. Bonded substrate and method for manufacturing bonded substrate
EP3471517B1 (en) * 2016-06-10 2024-08-21 Tanaka Kikinzoku Kogyo K.K. Ceramic circuit substrate and method for producing ceramic circuit substrate
CN115172290B (zh) 2016-07-14 2024-12-13 株式会社东芝 陶瓷电路基板及半导体模块
CN109476556B (zh) * 2016-07-28 2022-03-01 株式会社东芝 接合体、电路基板及半导体装置
CN109478538B (zh) 2016-07-28 2022-04-01 株式会社东芝 电路基板以及半导体模块
WO2018207396A1 (ja) * 2017-05-11 2018-11-15 住友電気工業株式会社 半導体装置
WO2019006101A1 (en) * 2017-06-30 2019-01-03 Kyocera International, Inc. MICROELECTRONIC BUILDING CONSTRUCTION ACTIVATED BY REINFORCING AND DESIGNING CERAMIC INSULATION
CN107369741A (zh) * 2017-07-13 2017-11-21 东莞市凯昶德电子科技股份有限公司 带一体式金属围坝的led支架模组及其制备方法
KR102521140B1 (ko) * 2017-07-25 2023-04-12 덴카 주식회사 세라믹스 회로 기판 및 그 제조 방법
US10695875B2 (en) * 2018-03-19 2020-06-30 Asia Vital Components Co., Ltd. Soldering method of soldering jig
US20210212214A1 (en) 2018-05-23 2021-07-08 Sumitomo Bakelite Co., Ltd. Method of manufacturing circuit board
JP7243182B2 (ja) * 2018-12-26 2023-03-22 三菱マテリアル株式会社 絶縁回路基板の製造方法及びその絶縁回路基板
JP7289910B2 (ja) * 2019-03-14 2023-06-12 日本碍子株式会社 接合基板及び接合基板の製造方法
WO2020208698A1 (ja) 2019-04-09 2020-10-15 日本碍子株式会社 接合基板及び接合基板の製造方法
CN113508462B (zh) 2019-09-02 2024-09-20 株式会社东芝 接合体、电路基板及半导体装置
CN113053833A (zh) * 2019-12-26 2021-06-29 财团法人工业技术研究院 一种半导体装置及其制作方法
JP7659223B2 (ja) * 2020-02-18 2025-04-09 住友金属鉱山株式会社 エッチング後フレキシブル基板
KR20220160636A (ko) * 2020-03-30 2022-12-06 덴카 주식회사 레지스트 경화막을 구비하는 세라믹 회로 기판 및 그 제조 방법, 그리고 세라믹 회로 기판의 제조 방법
DE102020111700B4 (de) * 2020-04-29 2024-12-05 Rogers Germany Gmbh Trägersubstrat und Verfahren zur Herstellung eines Trägersubstrats
JP7672204B2 (ja) * 2020-07-15 2025-05-07 Dowaメタルテック株式会社 絶縁基板およびその製造方法
CN116745904A (zh) * 2020-12-24 2023-09-12 株式会社东芝 绝缘性电路基板及使用了其的半导体装置
JP7540345B2 (ja) * 2021-01-13 2024-08-27 三菱マテリアル株式会社 銅/セラミックス接合体、および、絶縁回路基板
EP4342614A4 (en) * 2021-05-19 2025-06-25 Kabushiki Kaisha Toshiba Manufacturing methods for bonded objects and manufacturing methods for ceramic circuit substrates therewith
JP7620726B2 (ja) * 2021-10-25 2025-01-23 株式会社東芝 セラミックス銅回路基板およびそれを用いた半導体装置
JP2023066874A (ja) * 2021-10-29 2023-05-16 三菱マテリアル株式会社 銅/セラミックス接合体、および、絶縁回路基板
EP4311818A1 (de) * 2022-07-29 2024-01-31 Heraeus Electronics GmbH & Co. KG Metall-keramik-substrat mit kontaktbereich
JP7576209B2 (ja) * 2022-11-25 2024-10-30 デンカ株式会社 窒化ケイ素焼結体及びその製造方法、接合体、並びに、パワーモジュール

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1393352A (fr) * 1963-01-21 1965-03-26 Ibm Fabricaition de micro-circuits
US5541368A (en) * 1994-07-15 1996-07-30 Dell Usa, L.P. Laminated multi chip module interconnect apparatus
JPH10190176A (ja) * 1996-12-26 1998-07-21 Denki Kagaku Kogyo Kk 回路基板
US6286206B1 (en) * 1997-02-25 2001-09-11 Chou H. Li Heat-resistant electronic systems and circuit boards
JP3449458B2 (ja) * 1997-05-26 2003-09-22 電気化学工業株式会社 回路基板
TW453137B (en) * 1997-08-25 2001-09-01 Showa Denko Kk Electrode structure of silicon semiconductor device and the manufacturing method of silicon device using it
JP3447532B2 (ja) * 1997-09-19 2003-09-16 科学技術振興事業団 ろう付け用構造体およびメタライズ構造体
JP3847954B2 (ja) 1998-05-22 2006-11-22 株式会社東芝 セラミックス回路基板の製造方法
US6700053B2 (en) * 2000-07-03 2004-03-02 Komatsu Ltd. Thermoelectric module
DE10146227B4 (de) * 2000-09-20 2015-01-29 Hitachi Metals, Ltd. Siliciumnitrid-Sinterkörper, Leiterplatte und thermoelektrisches Modul
JP5038565B2 (ja) * 2000-09-22 2012-10-03 株式会社東芝 セラミックス回路基板およびその製造方法
CN1226752C (zh) * 2001-01-29 2005-11-09 捷时雅株式会社 介电体用复合颗粒、超微颗粒复合树脂颗粒、介电体形成用组合物及其用途
JP4887583B2 (ja) * 2001-08-09 2012-02-29 Dowaメタルテック株式会社 セラミックス回路基板の製造方法
JP3648189B2 (ja) * 2001-09-28 2005-05-18 同和鉱業株式会社 金属−セラミックス回路基板
JP4362597B2 (ja) * 2003-05-30 2009-11-11 Dowaメタルテック株式会社 金属−セラミックス回路基板およびその製造方法
JP3816508B2 (ja) * 2004-11-04 2006-08-30 三井金属鉱業株式会社 キャパシタ層形成材及びそのキャパシタ層形成材を用いて得られる内蔵キャパシタ層を備えたプリント配線板
JP4345066B2 (ja) * 2005-05-24 2009-10-14 日立金属株式会社 セラミックス回路基板及びこれを用いたパワー半導体モジュール
JP5186719B2 (ja) * 2005-08-29 2013-04-24 日立金属株式会社 セラミックス配線基板、その製造方法及び半導体モジュール
JP2007173577A (ja) * 2005-12-22 2007-07-05 Hitachi Metals Ltd セラミックス回路基板
JP2007281219A (ja) * 2006-04-07 2007-10-25 Hitachi Metals Ltd セラミックス回路基板およびその製造方法
JP5258045B2 (ja) * 2006-06-30 2013-08-07 日本電気株式会社 配線基板、配線基板を用いた半導体装置、及びそれらの製造方法
JP5226511B2 (ja) * 2006-07-04 2013-07-03 株式会社東芝 セラミックス−金属接合体、その製造方法およびそれを用いた半導体装置
JP2009170930A (ja) * 2009-03-12 2009-07-30 Hitachi Metals Ltd セラミックス回路基板及びこれを用いたパワー半導体モジュール
JP5637992B2 (ja) * 2009-09-15 2014-12-10 株式会社東芝 セラミックス回路基板の製造方法
EP2573809A4 (en) * 2010-05-18 2017-05-24 Toyota Jidosha Kabushiki Kaisha Semiconductor device and method for manufacturing the same
EP2727898B1 (en) * 2011-06-30 2017-02-01 Hitachi Metals, Ltd. Brazing filler metal, brazing filler metal paste, ceramic circuit substrate, and ceramic master circuit substrate
JP6128367B2 (ja) * 2012-08-28 2017-05-17 東芝ライテック株式会社 発光装置、および配線基板の製造方法

Also Published As

Publication number Publication date
JP2016165001A (ja) 2016-09-08
JP6271628B2 (ja) 2018-01-31
JP2016165000A (ja) 2016-09-08
JP6271629B2 (ja) 2018-01-31
JP6400788B2 (ja) 2018-10-03
HUE034429T2 (en) 2018-02-28
EP3273755B1 (en) 2018-11-07
EP2480052B1 (en) 2017-08-09
JP2017191943A (ja) 2017-10-19
US9101065B2 (en) 2015-08-04
JP6158144B2 (ja) 2017-07-05
JP2017195378A (ja) 2017-10-26
JP5637992B2 (ja) 2014-12-10
EP3273755A1 (en) 2018-01-24
US20120168209A1 (en) 2012-07-05
US20140291385A1 (en) 2014-10-02
JP2014207482A (ja) 2014-10-30
EP2480052A4 (en) 2016-01-27
JPWO2011034075A1 (ja) 2013-02-14
WO2011034075A1 (ja) 2011-03-24
JP2017147470A (ja) 2017-08-24
JP6334781B2 (ja) 2018-05-30
EP2480052A1 (en) 2012-07-25
JP6400787B2 (ja) 2018-10-03
HUE041380T2 (hu) 2019-05-28
US8785785B2 (en) 2014-07-22

Similar Documents

Publication Publication Date Title
EP2480052A4 (en) CERAMIC PLATE AND MANUFACTURING METHOD THEREFOR
TWI561128B (en) Print circuit board and method of manufacturing the same
TWI370473B (en) Switch structure mounted on the sidewall of circuit boards for electronic devices and manufacturing methods of the circuit boards thereof
PL2916627T3 (pl) Sposób wytwarzania ceramicznej płytki drukowanej układu elektronicznego
DK2592915T3 (da) Fremstillingsfremgangsmåde til lamineret printplade
PL2130417T3 (pl) Płytki obwodów drukowanych
TWI341706B (en) Circuit board and manufacture method thereof
EP2427036A4 (en) METHOD FOR PRODUCING CONDUCTOR PLATES
EP2475231A4 (en) METHOD FOR MANUFACTURING CIRCUIT BOARD AND CIRCUIT BOARD
HRP20191441T1 (hr) Postupak dobivanja kontaktnog područja elektronske komponente
EP2496060A4 (en) PRINTED CIRCUIT BOARD UNIT
DE602007013758D1 (de) Verdrahtete Leiterplatte
EP2461659A4 (en) FITTED PCB, MULTILAYER BUILT-UP PCB AND MANUFACTURING PROCESS THEREFOR
PL2517265T3 (pl) Moduł fotowoltaiczny z płytką drukowaną i sposób jego wytwarzania oraz zastosowanie
GB2464328B (en) Circuit board of communication product and manufacturing method thereof
EP2151150A4 (en) METHOD FOR MANUFACTURING PRINTED CIRCUIT BOARDS
TWI340614B (en) Circuit board and method of fabricating the same
TWI371998B (en) Printed circuit board structure and method for manufacturing the same
TWI373113B (en) Method of fabricating printed circuit board having semiconductor components embedded therein
BR112012004172A2 (pt) estrutura de conexão de substrato e equipamento eletrônico
TWI319699B (en) Circuit board and method of fabricating the same
TWI373293B (en) Printed circuit board and fabrication method thereof
EP2100486A4 (en) METHOD FOR MANUFACTURING A CONDUCTOR CIRCUIT BOARD
TWI367697B (en) Printed circuit board and fabrication method thereof
EP2542041A4 (en) METHOD FOR PRODUCING A FITTED PCB AND FITTED PCB