PL375580A1 - Monokrystaliczne podłoże luminoforowe, sposób jego wytwarzania oraz azotkowe urządzenie półprzewodnikowe wykorzystujące to podłoże - Google Patents

Monokrystaliczne podłoże luminoforowe, sposób jego wytwarzania oraz azotkowe urządzenie półprzewodnikowe wykorzystujące to podłoże

Info

Publication number
PL375580A1
PL375580A1 PL02375580A PL37558002A PL375580A1 PL 375580 A1 PL375580 A1 PL 375580A1 PL 02375580 A PL02375580 A PL 02375580A PL 37558002 A PL37558002 A PL 37558002A PL 375580 A1 PL375580 A1 PL 375580A1
Authority
PL
Poland
Prior art keywords
same
element selected
preparing
single crystal
nitride semiconductor
Prior art date
Application number
PL02375580A
Other languages
English (en)
Other versions
PL211013B1 (pl
Inventor
Robert Dwiliński
Roman Doradziński
Jerzy Garczyński
Leszek Sierzputowski
Yasuo Kanbara
Original Assignee
Ammono Sp.Z O.O.
Nichia Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/147,318 external-priority patent/US6656615B2/en
Application filed by Ammono Sp.Z O.O., Nichia Corporation filed Critical Ammono Sp.Z O.O.
Publication of PL375580A1 publication Critical patent/PL375580A1/pl
Publication of PL211013B1 publication Critical patent/PL211013B1/pl

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/822Materials of the light-emitting regions
    • H10H20/824Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/18Epitaxial-layer growth characterised by the substrate
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403AIII-nitrides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403AIII-nitrides
    • C30B29/406Gallium nitride
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B7/00Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
    • C30B7/10Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by application of pressure, e.g. hydrothermal processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/813Bodies having a plurality of light-emitting regions, e.g. multi-junction LEDs or light-emitting devices having photoluminescent regions within the bodies

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Semiconductor Lasers (AREA)
  • Luminescent Compositions (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)

Abstract

Komponent luminescencyjny, który ma podłoże luminoforowe zawierające co najmniej jeden pierwiastek należący do Grupy 13 (IUPAC 1989), oraz zawierające azotek o wzorze ogólnym XN, w którym X oznacza co najmniej jeden pierwiastek wybrany spośród B, Al, Ga oraz In, azotek o wzorze ogólnym XN:Y, gdzie X oznacza co najmniej jeden pierwiastek wybrany spośród B, Al, Ga oraz In, zaś Y oznacza co najmniej jeden pierwiastek wybrany spośród Be, Mg, Ca, Sr, Ba, Zn, Cd oraz Hg, bądź azotek o wzorze ogólnym XN:Y,Z, gdzie X oznacza co najmniej jeden pierwiastek wybrany spośród B, Al, Ga oraz In, Y oznacza co najmniej jeden pierwiastek wybrany spośród Be, Mg, Ca, Sr, Ba, Zn, Cd oraz Hg, zaś Z oznacza co najmniej jeden pierwiastek wybrany spośród C, Si, Ge, Sn, Pb, O oraz S; a także sposób wytwarzania komponenta luminescencyjnego obejmujący wytworzenie podłoża luminoforowego, z zastosowaniem nadkrytycznego amoniaku oraz uformowanie elementu luminescencyjnego na tym podłożu metodą wzrostu z fazy gazowej. Komponent luminescencyjny według wynalazku ma rozkład widmowy umożliwiający emisję światła białego oraz podobnego i może być wytwarzany z dobrą wydajnością.
PL375580A 2002-05-17 2002-12-13 Monokrystaliczne podłoże luminoforowe, sposób jego wytwarzania oraz azotkowe urządzenie półprzewodnikowe wykorzystujące to podłoże PL211013B1 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/147,318 US6656615B2 (en) 2001-06-06 2002-05-17 Bulk monocrystalline gallium nitride

Publications (2)

Publication Number Publication Date
PL375580A1 true PL375580A1 (pl) 2005-11-28
PL211013B1 PL211013B1 (pl) 2012-03-30

Family

ID=29548308

Family Applications (2)

Application Number Title Priority Date Filing Date
PL375597A PL225427B1 (pl) 2002-05-17 2002-12-11 Struktura urządzenia emitującego światło, zwłaszcza do półprzewodnikowego urządzenia laserowego
PL375580A PL211013B1 (pl) 2002-05-17 2002-12-13 Monokrystaliczne podłoże luminoforowe, sposób jego wytwarzania oraz azotkowe urządzenie półprzewodnikowe wykorzystujące to podłoże

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PL375597A PL225427B1 (pl) 2002-05-17 2002-12-11 Struktura urządzenia emitującego światło, zwłaszcza do półprzewodnikowego urządzenia laserowego

Country Status (6)

Country Link
US (1) US7589358B2 (pl)
JP (1) JP4416648B2 (pl)
AU (2) AU2002354467A1 (pl)
PL (2) PL225427B1 (pl)
TW (1) TWI277220B (pl)
WO (2) WO2003098757A1 (pl)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6656615B2 (en) * 2001-06-06 2003-12-02 Nichia Corporation Bulk monocrystalline gallium nitride
ATE452999T1 (de) * 2001-10-26 2010-01-15 Ammono Sp Zoo Substrat für epitaxie
WO2003043150A1 (en) * 2001-10-26 2003-05-22 Ammono Sp.Zo.O. Light emitting element structure using nitride bulk single crystal layer
US20060138431A1 (en) * 2002-05-17 2006-06-29 Robert Dwilinski Light emitting device structure having nitride bulk single crystal layer
PL225427B1 (pl) 2002-05-17 2017-04-28 Ammono Spółka Z Ograniczoną Odpowiedzialnością Struktura urządzenia emitującego światło, zwłaszcza do półprzewodnikowego urządzenia laserowego
JP4860927B2 (ja) 2002-12-11 2012-01-25 アンモノ・スプウカ・ジ・オグラニチョノン・オドポヴィエドニアウノシツィオン エピタキシ用基板及びその製造方法
TWI334890B (en) * 2002-12-11 2010-12-21 Ammono Sp Zoo Process for obtaining bulk mono-crystalline gallium-containing nitride, eliminating impurities from the obtained crystal and manufacturing substrates made of bulk mono-crystalline gallium-containing nitride
AU2003293497A1 (en) * 2003-04-15 2005-07-21 Japan Science And Technology Agency Non-polar (a1,b,in,ga)n quantum wells
JP5015417B2 (ja) * 2004-06-09 2012-08-29 住友電気工業株式会社 GaN結晶の製造方法
US8398767B2 (en) 2004-06-11 2013-03-19 Ammono S.A. Bulk mono-crystalline gallium-containing nitride and its application
KR20070058465A (ko) * 2004-08-06 2007-06-08 미쓰비시 가가꾸 가부시키가이샤 Ga 함유 질화물 반도체 단결정, 그 제조 방법, 그리고 그결정을 사용한 기판 및 디바이스
PL371405A1 (pl) 2004-11-26 2006-05-29 Ammono Sp.Z O.O. Sposób wytwarzania objętościowych monokryształów metodą wzrostu na zarodku
JP2006202845A (ja) * 2005-01-18 2006-08-03 Sony Corp 半導体発光装置
JP2006202935A (ja) * 2005-01-20 2006-08-03 Nec Corp 半導体レーザ及びその製造方法
JP4917319B2 (ja) * 2005-02-07 2012-04-18 パナソニック株式会社 トランジスタ
US8114313B2 (en) * 2005-12-08 2012-02-14 National Institute For Materials Science Phosphor, process for producing the same, and luminescent device
US8231726B2 (en) 2006-01-20 2012-07-31 Panasonic Corporation Semiconductor light emitting element, group III nitride semiconductor substrate and method for manufacturing such group III nitride semiconductor substrate
US20100095882A1 (en) * 2008-10-16 2010-04-22 Tadao Hashimoto Reactor design for growing group iii nitride crystals and method of growing group iii nitride crystals
US20070234946A1 (en) * 2006-04-07 2007-10-11 Tadao Hashimoto Method for growing large surface area gallium nitride crystals in supercritical ammonia and lagre surface area gallium nitride crystals
US8764903B2 (en) 2009-05-05 2014-07-01 Sixpoint Materials, Inc. Growth reactor for gallium-nitride crystals using ammonia and hydrogen chloride
US8728234B2 (en) * 2008-06-04 2014-05-20 Sixpoint Materials, Inc. Methods for producing improved crystallinity group III-nitride crystals from initial group III-nitride seed by ammonothermal growth
JP4816277B2 (ja) * 2006-06-14 2011-11-16 日立電線株式会社 窒化物半導体自立基板及び窒化物半導体発光素子
JP4821007B2 (ja) * 2007-03-14 2011-11-24 国立大学法人大阪大学 Iii族元素窒化物結晶の製造方法およびiii族元素窒化物結晶
US20080283864A1 (en) * 2007-05-16 2008-11-20 Letoquin Ronan P Single Crystal Phosphor Light Conversion Structures for Light Emitting Devices
JP5286723B2 (ja) * 2007-09-14 2013-09-11 国立大学法人京都大学 窒化物半導体レーザ素子
KR101361575B1 (ko) 2007-09-17 2014-02-13 삼성전자주식회사 발광 다이오드 패키지 및 그 제조방법
JP2009158955A (ja) * 2007-12-06 2009-07-16 Rohm Co Ltd 窒化物半導体レーザダイオード
US20090173958A1 (en) * 2008-01-04 2009-07-09 Cree, Inc. Light emitting devices with high efficiency phospor structures
US8940561B2 (en) * 2008-01-15 2015-01-27 Cree, Inc. Systems and methods for application of optical materials to optical elements
US8058088B2 (en) 2008-01-15 2011-11-15 Cree, Inc. Phosphor coating systems and methods for light emitting structures and packaged light emitting diodes including phosphor coating
EP2245218B1 (en) * 2008-02-25 2019-06-19 SixPoint Materials, Inc. Method for producing group iii nitride wafers and group iii nitride wafers
JP5631746B2 (ja) * 2008-06-04 2014-11-26 シックスポイント マテリアルズ, インコーポレイテッド Iii族窒化物結晶を成長させるための高圧ベッセル、ならびに高圧ベッセルおよびiii族窒化物結晶を用いてiii族窒化物結晶を成長させる方法
JP5377521B2 (ja) 2008-06-12 2013-12-25 シックスポイント マテリアルズ, インコーポレイテッド Iii族窒化物ウェハーを試験する方法および試験データを伴うiii族窒化物ウェハー
WO2010053964A1 (en) * 2008-11-07 2010-05-14 The Regents Of The University Of California Novel vessel designs and relative placements of the source material and seed crystals with respect to the vessel for the ammonothermal growth of group-iii nitride crystals
WO2010060034A1 (en) * 2008-11-24 2010-05-27 Sixpoint Materials, Inc. METHODS FOR PRODUCING GaN NUTRIENT FOR AMMONOTHERMAL GROWTH
US8456082B2 (en) 2008-12-01 2013-06-04 Ifire Ip Corporation Surface-emission light source with uniform illumination
JP2010177651A (ja) * 2009-02-02 2010-08-12 Rohm Co Ltd 半導体レーザ素子
EP2267197A1 (en) * 2009-06-25 2010-12-29 AMMONO Sp.z o.o. Method of obtaining bulk mono-crystalline gallium-containing nitride, bulk mono-crystalline gallium-containing nitride, substrates manufactured thereof and devices manufactured on such substrates
WO2011065436A1 (ja) * 2009-11-27 2011-06-03 三菱化学株式会社 窒化物結晶の製造方法、製造容器および部材
US9991427B2 (en) * 2010-03-08 2018-06-05 Cree, Inc. Photonic crystal phosphor light conversion structures for light emitting devices
US20110220920A1 (en) * 2010-03-09 2011-09-15 Brian Thomas Collins Methods of forming warm white light emitting devices having high color rendering index values and related light emitting devices
TWI492422B (zh) 2010-03-18 2015-07-11 億光電子工業股份有限公司 具有螢光粉層之發光二極體晶片的製作方法
TWI446590B (zh) 2010-09-30 2014-07-21 億光電子工業股份有限公司 發光二極體封裝結構及其製作方法
US9166126B2 (en) 2011-01-31 2015-10-20 Cree, Inc. Conformally coated light emitting devices and methods for providing the same
US9508904B2 (en) 2011-01-31 2016-11-29 Cree, Inc. Structures and substrates for mounting optical elements and methods and devices for providing the same background
TWI470836B (zh) * 2011-07-11 2015-01-21 隆達電子股份有限公司 發光二極體封裝結構
JP5856816B2 (ja) * 2011-11-14 2016-02-10 株式会社小糸製作所 発光装置
WO2013159083A1 (en) * 2012-04-20 2013-10-24 Ii-Vi Incorporated LARGE DIAMETER, HIGH QUALITY SiC SINGLE CRYSTALS, METHOD AND APPARATUS
KR20160017849A (ko) * 2014-08-06 2016-02-17 서울바이오시스 주식회사 고출력 발광 장치 및 그 제조 방법
KR102252992B1 (ko) 2014-12-12 2021-05-20 삼성전자주식회사 반도체 발광소자 패키지의 제조 방법
TWI606611B (zh) * 2016-08-30 2017-11-21 光磊科技股份有限公司 具亞胺化鋰層的基板、具亞胺化鋰層的led及其相關製作方法
JP6931827B2 (ja) 2017-04-07 2021-09-08 日本製鋼所M&E株式会社 結晶製造用圧力容器
JP7000062B2 (ja) * 2017-07-31 2022-01-19 Dowaホールディングス株式会社 Iii族窒化物エピタキシャル基板、電子線励起型発光エピタキシャル基板及びそれらの製造方法、並びに電子線励起型発光装置

Family Cites Families (119)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5141686A (en) 1974-10-07 1976-04-08 Matsushita Electric Industrial Co Ltd Keikotainoseiho
JPH0722692B2 (ja) 1988-08-05 1995-03-15 株式会社日本製鋼所 水熱合成用容器
JPH02137287A (ja) 1988-11-17 1990-05-25 Sanyo Electric Co Ltd 半導体レーザ装置
CN1014535B (zh) 1988-12-30 1991-10-30 中国科学院物理研究所 利用改进的矿化剂生长磷酸钛氧钾单晶的方法
US5096860A (en) 1990-05-25 1992-03-17 Alcan International Limited Process for producing unagglomerated single crystals of aluminum nitride
KR920004181B1 (ko) * 1990-09-13 1992-05-30 한국과학기술연구원 입방정질화붕소의 제조방법
US5190738A (en) * 1991-06-17 1993-03-02 Alcan International Limited Process for producing unagglomerated single crystals of aluminum nitride
JP2540791B2 (ja) 1991-11-08 1996-10-09 日亜化学工業株式会社 p型窒化ガリウム系化合物半導体の製造方法。
US5306662A (en) * 1991-11-08 1994-04-26 Nichia Chemical Industries, Ltd. Method of manufacturing P-type compound semiconductor
US5456204A (en) * 1993-05-28 1995-10-10 Alfa Quartz, C.A. Filtering flow guide for hydrothermal crystal growth
JP3184717B2 (ja) 1993-10-08 2001-07-09 三菱電線工業株式会社 GaN単結晶およびその製造方法
US5679152A (en) * 1994-01-27 1997-10-21 Advanced Technology Materials, Inc. Method of making a single crystals Ga*N article
JPH07249830A (ja) 1994-03-10 1995-09-26 Hitachi Ltd 半導体発光素子の製造方法
EP0711853B1 (en) 1994-04-08 1999-09-08 Japan Energy Corporation Method for growing gallium nitride compound semiconductor crystal, and gallium nitride compound semiconductor device
US5599520A (en) 1994-11-03 1997-02-04 Garces; Juan M. Synthesis of crystalline porous solids in ammonia
US5777350A (en) 1994-12-02 1998-07-07 Nichia Chemical Industries, Ltd. Nitride semiconductor light-emitting device
JPH08250802A (ja) 1995-03-09 1996-09-27 Fujitsu Ltd 半導体レーザ及びその製造方法
US5670798A (en) * 1995-03-29 1997-09-23 North Carolina State University Integrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact non-nitride buffer layer and methods of fabricating same
US5679965A (en) * 1995-03-29 1997-10-21 North Carolina State University Integrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact, non-nitride buffer layer and methods of fabricating same
JP3728332B2 (ja) * 1995-04-24 2005-12-21 シャープ株式会社 化合物半導体発光素子
KR100326101B1 (ko) * 1995-08-31 2002-10-09 가부시끼가이샤 도시바 반도체장치의제조방법및질화갈륨계반도체의성장방법
EP1081818B1 (en) * 1995-09-18 2004-08-18 Hitachi, Ltd. Semiconductor laser devices
AU7346396A (en) 1995-10-13 1997-04-30 Centrum Badan Wysokocisnieniowych Method of manufacturing epitaxial layers of gan or ga(a1,in)n on single crystal gan and mixed ga(a1,in)n substrates
JPH09134878A (ja) 1995-11-10 1997-05-20 Matsushita Electron Corp 窒化ガリウム系化合物半導体の製造方法
JP3778609B2 (ja) 1996-04-26 2006-05-24 三洋電機株式会社 半導体素子の製造方法
JPH107496A (ja) 1996-06-25 1998-01-13 Hitachi Cable Ltd 窒化物結晶の製造方法およびその装置
CN1065289C (zh) 1996-07-22 2001-05-02 中国科学院物理研究所 一种制备掺杂钒酸盐单晶的水热生长方法
JP3179346B2 (ja) * 1996-08-27 2001-06-25 松下電子工業株式会社 窒化ガリウム結晶の製造方法
JPH1084161A (ja) 1996-09-06 1998-03-31 Sumitomo Electric Ind Ltd 半導体レーザ及びその製造方法
US6031858A (en) * 1996-09-09 2000-02-29 Kabushiki Kaisha Toshiba Semiconductor laser and method of fabricating same
US6542526B1 (en) * 1996-10-30 2003-04-01 Hitachi, Ltd. Optical information processor and semiconductor light emitting device suitable for the same
JPH111399A (ja) * 1996-12-05 1999-01-06 Lg Electron Inc 窒化ガリウム半導体単結晶基板の製造方法並びにその基板を用いた窒化ガリウムダイオード
US6677619B1 (en) * 1997-01-09 2004-01-13 Nichia Chemical Industries, Ltd. Nitride semiconductor device
CN100530719C (zh) * 1997-01-09 2009-08-19 日亚化学工业株式会社 氮化物半导体元器件
US5868837A (en) * 1997-01-17 1999-02-09 Cornell Research Foundation, Inc. Low temperature method of preparing GaN single crystals
PL184902B1 (pl) * 1997-04-04 2003-01-31 Centrum Badan Wysokocisnieniowych Pan Sposób usuwania nierówności i obszarów silnie zdefektowanych z powierzchni kryształów i warstw epitaksjalnych GaN i Ga AL In N
JP3491492B2 (ja) * 1997-04-09 2004-01-26 松下電器産業株式会社 窒化ガリウム結晶の製造方法
US5888389A (en) * 1997-04-24 1999-03-30 Hydroprocessing, L.L.C. Apparatus for oxidizing undigested wastewater sludges
PL186905B1 (pl) 1997-06-05 2004-03-31 Cantrum Badan Wysokocisnieniow Sposób wytwarzania wysokooporowych kryształów objętościowych GaN
PL183687B1 (pl) * 1997-06-06 2002-06-28 Ct Badan Sposób wytwarzania półprzewodnikowych związków grupy A-B o przewodnictwie elektrycznym typu p i typu n
TW519551B (en) 1997-06-11 2003-02-01 Hitachi Cable Methods of fabricating nitride crystals and nitride crystals obtained therefrom
US6270569B1 (en) * 1997-06-11 2001-08-07 Hitachi Cable Ltd. Method of fabricating nitride crystal, mixture, liquid phase growth method, nitride crystal, nitride crystal powders, and vapor phase growth method
GB2333520B (en) 1997-06-11 2000-04-26 Hitachi Cable GaN crystal growth method
JP3234799B2 (ja) 1997-08-07 2001-12-04 シャープ株式会社 半導体レーザ素子の製造方法
JP3239812B2 (ja) 1997-08-07 2001-12-17 日本電気株式会社 InGaN層を含む窒化ガリウム系半導体層の結晶成長方法および窒化ガリウム系発光素子およびその製造方法
US6593589B1 (en) * 1998-01-30 2003-07-15 The University Of New Mexico Semiconductor nitride structures
JPH11307813A (ja) * 1998-04-03 1999-11-05 Hewlett Packard Co <Hp> 発光装置、その製造方法およびディスプレイ
US6249534B1 (en) * 1998-04-06 2001-06-19 Matsushita Electronics Corporation Nitride semiconductor laser device
JPH11340576A (ja) * 1998-05-28 1999-12-10 Sumitomo Electric Ind Ltd 窒化ガリウム系半導体デバイス
JP3727187B2 (ja) 1998-07-03 2005-12-14 日亜化学工業株式会社 窒化物半導体レーザ素子の製造方法
JP2000031533A (ja) 1998-07-14 2000-01-28 Toshiba Corp 半導体発光素子
TW413956B (en) 1998-07-28 2000-12-01 Sumitomo Electric Industries Fluorescent substrate LED
JP2000082863A (ja) 1998-09-04 2000-03-21 Sony Corp 半導体発光素子の製造方法
JP2000091637A (ja) * 1998-09-07 2000-03-31 Rohm Co Ltd 半導体発光素子の製法
US6423984B1 (en) * 1998-09-10 2002-07-23 Toyoda Gosei Co., Ltd. Light-emitting semiconductor device using gallium nitride compound semiconductor
US6252261B1 (en) 1998-09-30 2001-06-26 Nec Corporation GaN crystal film, a group III element nitride semiconductor wafer and a manufacturing process therefor
CN1260409A (zh) 1998-10-23 2000-07-19 黄石市皂素厂 L-半胱氨酸盐酸盐一水物生产工艺
TW498102B (en) * 1998-12-28 2002-08-11 Futaba Denshi Kogyo Kk A process for preparing GaN fluorescent substance
US6372041B1 (en) * 1999-01-08 2002-04-16 Gan Semiconductor Inc. Method and apparatus for single crystal gallium nitride (GaN) bulk synthesis
JP2000216494A (ja) * 1999-01-20 2000-08-04 Sanyo Electric Co Ltd 半導体発光素子およびその製造方法
EP1024524A2 (en) * 1999-01-27 2000-08-02 Matsushita Electric Industrial Co., Ltd. Deposition of dielectric layers using supercritical CO2
US6177057B1 (en) * 1999-02-09 2001-01-23 The United States Of America As Represented By The Secretary Of The Navy Process for preparing bulk cubic gallium nitride
KR100683875B1 (ko) * 1999-03-04 2007-02-15 니치아 카가쿠 고교 가부시키가이샤 질화물 반도체 레이저소자
JP3957918B2 (ja) 1999-05-17 2007-08-15 独立行政法人科学技術振興機構 窒化ガリウム単結晶の育成方法
US6592663B1 (en) * 1999-06-09 2003-07-15 Ricoh Company Ltd. Production of a GaN bulk crystal substrate and a semiconductor device formed on a GaN bulk crystal substrate
KR100381742B1 (ko) * 1999-06-30 2003-04-26 스미토모덴키고교가부시키가이샤 Ⅲ-ⅴ족 질화물반도체의 성장방법 및 기상성장장치
JP4329229B2 (ja) 1999-06-30 2009-09-09 住友電気工業株式会社 Iii−v族窒化物半導体の成長方法および気相成長装置
FR2796657B1 (fr) 1999-07-20 2001-10-26 Thomson Csf Procede de synthese de materiaux massifs monocristallins en nitrures d'elements de la colonne iii du tableau de la classification periodique
JP3968920B2 (ja) * 1999-08-10 2007-08-29 双葉電子工業株式会社 蛍光体
JP2001085737A (ja) * 1999-09-10 2001-03-30 Sharp Corp 窒化物半導体発光素子
US6265322B1 (en) * 1999-09-21 2001-07-24 Agere Systems Guardian Corp. Selective growth process for group III-nitride-based semiconductors
WO2001024284A1 (en) * 1999-09-27 2001-04-05 Lumileds Lighting, U.S., Llc A light emitting diode device that produces white light by performing complete phosphor conversion
JP4145437B2 (ja) 1999-09-28 2008-09-03 住友電気工業株式会社 単結晶GaNの結晶成長方法及び単結晶GaN基板の製造方法と単結晶GaN基板
CN1113988C (zh) 1999-09-29 2003-07-09 中国科学院物理研究所 一种氮化镓单晶的热液生长方法
US6398867B1 (en) * 1999-10-06 2002-06-04 General Electric Company Crystalline gallium nitride and method for forming crystalline gallium nitride
EP1104031B1 (en) * 1999-11-15 2012-04-11 Panasonic Corporation Nitride semiconductor laser diode and method of fabricating the same
US6653663B2 (en) * 1999-12-06 2003-11-25 Matsushita Electric Industrial Co., Ltd. Nitride semiconductor device
JP2001168385A (ja) * 1999-12-06 2001-06-22 Toyoda Gosei Co Ltd Iii族窒化物系化合物半導体素子及びiii族窒化物系化合物半導体発光素子
US6355497B1 (en) * 2000-01-18 2002-03-12 Xerox Corporation Removable large area, low defect density films for led and laser diode growth
US6447604B1 (en) * 2000-03-13 2002-09-10 Advanced Technology Materials, Inc. Method for achieving improved epitaxy quality (surface texture and defect density) on free-standing (aluminum, indium, gallium) nitride ((al,in,ga)n) substrates for opto-electronic and electronic devices
JP3946427B2 (ja) * 2000-03-29 2007-07-18 株式会社東芝 エピタキシャル成長用基板の製造方法及びこのエピタキシャル成長用基板を用いた半導体装置の製造方法
JP2001339121A (ja) * 2000-05-29 2001-12-07 Sharp Corp 窒化物半導体発光素子とそれを含む光学装置
GB2363518A (en) 2000-06-17 2001-12-19 Sharp Kk A method of growing a nitride layer on a GaN substrate
JP3646302B2 (ja) 2000-07-07 2005-05-11 ソニー株式会社 半導体レーザ
US6693935B2 (en) * 2000-06-20 2004-02-17 Sony Corporation Semiconductor laser
JP2002016285A (ja) 2000-06-27 2002-01-18 National Institute Of Advanced Industrial & Technology 半導体発光素子
US6586762B2 (en) * 2000-07-07 2003-07-01 Nichia Corporation Nitride semiconductor device with improved lifetime and high output power
JP3968968B2 (ja) * 2000-07-10 2007-08-29 住友電気工業株式会社 単結晶GaN基板の製造方法
US6749819B2 (en) * 2000-07-28 2004-06-15 Japan Pionics Co., Ltd. Process for purifying ammonia
JP4154558B2 (ja) 2000-09-01 2008-09-24 日本電気株式会社 半導体装置
JP4416297B2 (ja) * 2000-09-08 2010-02-17 シャープ株式会社 窒化物半導体発光素子、ならびにそれを使用した発光装置および光ピックアップ装置
WO2002021604A1 (en) * 2000-09-08 2002-03-14 Sharp Kabushiki Kaisha Nitride semiconductor light-emitting device and optical device including the same
JP2002094189A (ja) * 2000-09-14 2002-03-29 Sharp Corp 窒化物半導体レーザ素子およびそれを用いた光学装置
US7053413B2 (en) * 2000-10-23 2006-05-30 General Electric Company Homoepitaxial gallium-nitride-based light emitting device and method for producing
US6936488B2 (en) * 2000-10-23 2005-08-30 General Electric Company Homoepitaxial gallium-nitride-based light emitting device and method for producing
JP4063520B2 (ja) * 2000-11-30 2008-03-19 日本碍子株式会社 半導体発光素子
AU2002219978A1 (en) 2000-11-30 2002-06-11 Kyma Technologies, Inc. Method and apparatus for producing miiin columns and miiin materials grown thereon
JP4003413B2 (ja) * 2000-12-11 2007-11-07 日亜化学工業株式会社 13族窒化物結晶の製造方法
JP3785566B2 (ja) * 2001-03-19 2006-06-14 株式会社日鉱マテリアルズ GaN系化合物半導体結晶の製造方法
US6806508B2 (en) * 2001-04-20 2004-10-19 General Electic Company Homoepitaxial gallium nitride based photodetector and method of producing
PL350375A1 (en) 2001-10-26 2003-05-05 Ammono Sp Z Oo Epitaxial layer substrate
US6656615B2 (en) 2001-06-06 2003-12-02 Nichia Corporation Bulk monocrystalline gallium nitride
PL207400B1 (pl) * 2001-06-06 2010-12-31 Ammono Społka Z Ograniczoną Odpowiedzialnością Sposób i urządzenie do otrzymywania objętościowego monokryształu azotku zawierającego gal
US6734530B2 (en) * 2001-06-06 2004-05-11 Matsushita Electric Industries Co., Ltd. GaN-based compound semiconductor EPI-wafer and semiconductor element using the same
US6488767B1 (en) * 2001-06-08 2002-12-03 Advanced Technology Materials, Inc. High surface quality GaN wafer and method of fabricating same
ATE452999T1 (de) * 2001-10-26 2010-01-15 Ammono Sp Zoo Substrat für epitaxie
WO2003043150A1 (en) * 2001-10-26 2003-05-22 Ammono Sp.Zo.O. Light emitting element structure using nitride bulk single crystal layer
US7097707B2 (en) * 2001-12-31 2006-08-29 Cree, Inc. GaN boule grown from liquid melt using GaN seed wafers
US20030209191A1 (en) * 2002-05-13 2003-11-13 Purdy Andrew P. Ammonothermal process for bulk synthesis and growth of cubic GaN
JP4403067B2 (ja) * 2002-05-17 2010-01-20 アンモノ・スプウカ・ジ・オグラニチョノン・オドポヴィエドニアウノシツィオン 超臨界アンモニアを用いるバルク単結晶生産設備
PL225427B1 (pl) 2002-05-17 2017-04-28 Ammono Spółka Z Ograniczoną Odpowiedzialnością Struktura urządzenia emitującego światło, zwłaszcza do półprzewodnikowego urządzenia laserowego
US20060138431A1 (en) * 2002-05-17 2006-06-29 Robert Dwilinski Light emitting device structure having nitride bulk single crystal layer
KR20050054482A (ko) * 2002-06-26 2005-06-10 암모노 에스피. 제트오. 오. 질화물 반도체 레이저 디바이스 및 그의 성능을향상시키기 위한 방법
AU2003238980A1 (en) * 2002-06-26 2004-01-19 Ammono Sp. Z O.O. Process for obtaining of bulk monocrystallline gallium-containing nitride
WO2004053208A1 (en) * 2002-12-11 2004-06-24 Ammono Sp. Z O.O. Process for obtaining bulk-crystalline gallium-containing nitride
TWI334890B (en) * 2002-12-11 2010-12-21 Ammono Sp Zoo Process for obtaining bulk mono-crystalline gallium-containing nitride, eliminating impurities from the obtained crystal and manufacturing substrates made of bulk mono-crystalline gallium-containing nitride
JP4860927B2 (ja) * 2002-12-11 2012-01-25 アンモノ・スプウカ・ジ・オグラニチョノン・オドポヴィエドニアウノシツィオン エピタキシ用基板及びその製造方法
CN100390329C (zh) 2003-04-03 2008-05-28 三菱化学株式会社 氧化锌单晶
PL371405A1 (pl) * 2004-11-26 2006-05-29 Ammono Sp.Z O.O. Sposób wytwarzania objętościowych monokryształów metodą wzrostu na zarodku

Also Published As

Publication number Publication date
TWI277220B (en) 2007-03-21
US20060054076A1 (en) 2006-03-16
AU2002354485A8 (en) 2003-12-02
WO2003098757A1 (en) 2003-11-27
WO2003098708A1 (en) 2003-11-27
AU2002354485A1 (en) 2003-12-02
PL375597A1 (pl) 2005-12-12
PL225427B1 (pl) 2017-04-28
PL211013B1 (pl) 2012-03-30
JP4416648B2 (ja) 2010-02-17
US7589358B2 (en) 2009-09-15
AU2002354467A8 (en) 2003-12-02
JPWO2003098757A1 (ja) 2005-09-22
AU2002354467A1 (en) 2003-12-02
TW200307372A (en) 2003-12-01

Similar Documents

Publication Publication Date Title
PL375580A1 (pl) Monokrystaliczne podłoże luminoforowe, sposób jego wytwarzania oraz azotkowe urządzenie półprzewodnikowe wykorzystujące to podłoże
CN102047450B (zh) 化合物半导体发光元件、采用该化合物半导体发光元件的照明装置以及化合物半导体发光元件的制造方法
EP1965416A3 (en) Free-Standing III-N layers or devices obtained by selective masking of III-N layers during III-N layer growth
WO2005017062A3 (en) Light emitting devices having sulfoselenide fluorescent phosphors
TW200711188A (en) Single-crystal nitride-based semiconductor substrate and method of manufacturing high-quality nitride-based light emitting device by using the same
EP1921668A3 (en) Compound semiconductor substrate grown on metal layer, method for manufacturing the same, and compund semiconductor device using the same
JP5260502B2 (ja) Iii族窒化物白色発光ダイオード
TW200611963A (en) Phosphor composition and method for producing the same, and light-emitting device using the same
WO2008133660A3 (en) Nanocrystals including a group iiia element and a group va element, method, composition, device and other prodcucts
WO2009041256A1 (ja) Iii族窒化物半導体発光素子及びその製造方法、並びにランプ
EP0855751A3 (en) Light emitting diode
TW200619357A (en) Phosphor, phosphor paste and light-emitting device
EP0810674A3 (en) Light emitting device, wafer for light emitting device, and method of preparing the same
MY149573A (en) Oxynitride phosphor and production process thereof, and light-emitting device using oxynitride phosphor
WO2004079790A3 (en) Garnet phosphors, method of making the same, and application to semiconductor led chips for manufacturing lighting devices
TW200644299A (en) Group III-V nitride semiconductor laminated substrate, method of producing the same and semiconductor device
CN106876540B (zh) 一种提高GaN基LED内量子效率的外延生长方法
TWI222757B (en) Semiconductor light emitting device
US20130313603A1 (en) Wavelength Converter for an LED, Method of Making, and LED Containing Same
JP2004137480A5 (pl)
TWI256150B (en) Oxynitride phosphor and a light-emitting device
EP1383176A4 (en) SEMICONDUCTOR LUMINESCENT ELEMENT CONTAINING GROUP III NITRIDE COMPOUND
CA2418494A1 (en) Phosphor thin film, preparation method, and el panel
EP1911826A4 (en) FLUORESCENT AND LIGHTING DEVICE
EP1560259A3 (en) Nitride semiconductor thin film and method for growing the same