PL375865A1 - Sposób oczyszczania źródła jonów i odpowiednie urządzenie/system - Google Patents

Sposób oczyszczania źródła jonów i odpowiednie urządzenie/system

Info

Publication number
PL375865A1
PL375865A1 PL03375865A PL37586503A PL375865A1 PL 375865 A1 PL375865 A1 PL 375865A1 PL 03375865 A PL03375865 A PL 03375865A PL 37586503 A PL37586503 A PL 37586503A PL 375865 A1 PL375865 A1 PL 375865A1
Authority
PL
Poland
Prior art keywords
ion source
corresponding apparatus
cleaning ion
cleaning
source
Prior art date
Application number
PL03375865A
Other languages
English (en)
Other versions
PL214874B1 (pl
Inventor
Henry A. Luten
Vijayen S. Veerasamy
Maximo Frati
Denise R. Shaw
Original Assignee
Guardian Industries Corp.
Advanced Energy Industries, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guardian Industries Corp., Advanced Energy Industries, Inc. filed Critical Guardian Industries Corp.
Publication of PL375865A1 publication Critical patent/PL375865A1/pl
Publication of PL214874B1 publication Critical patent/PL214874B1/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/143—Hall-effect ion sources with closed electron drift

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cleaning In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
PL375865A 2002-10-21 2003-10-20 Sposób oczyszczania zródla jonów i zródlo jonów do stosowania tego sposobu PL214874B1 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41951902P 2002-10-21 2002-10-21
US10/419,990 US6812648B2 (en) 2002-10-21 2003-04-22 Method of cleaning ion source, and corresponding apparatus/system

Publications (2)

Publication Number Publication Date
PL375865A1 true PL375865A1 (pl) 2005-12-12
PL214874B1 PL214874B1 (pl) 2013-09-30

Family

ID=32096302

Family Applications (1)

Application Number Title Priority Date Filing Date
PL375865A PL214874B1 (pl) 2002-10-21 2003-10-20 Sposób oczyszczania zródla jonów i zródlo jonów do stosowania tego sposobu

Country Status (6)

Country Link
US (1) US6812648B2 (pl)
EP (1) EP1556879A2 (pl)
AU (1) AU2003277443A1 (pl)
CA (1) CA2499235C (pl)
PL (1) PL214874B1 (pl)
WO (1) WO2004038754A2 (pl)

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JP2006521462A (ja) * 2002-12-18 2006-09-21 日本板硝子株式会社 プラズマ増強膜堆積
US6903511B2 (en) * 2003-05-06 2005-06-07 Zond, Inc. Generation of uniformly-distributed plasma
US7030390B2 (en) * 2003-09-09 2006-04-18 Guardian Industries Corp. Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like
US7819981B2 (en) * 2004-10-26 2010-10-26 Advanced Technology Materials, Inc. Methods for cleaning ion implanter components
US7183559B2 (en) * 2004-11-12 2007-02-27 Guardian Industries Corp. Ion source with substantially planar design
US20060210783A1 (en) * 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
US7405411B2 (en) * 2005-05-06 2008-07-29 Guardian Industries Corp. Ion source with multi-piece outer cathode
US20070137063A1 (en) * 2005-12-21 2007-06-21 Hitachi Global Storage Technologies Netherlands, B.V. Carbon beam deposition chamber for reduced defects
CN101473073B (zh) * 2006-04-26 2012-08-08 高级技术材料公司 半导体加工系统的清洁
FR2902029B1 (fr) * 2006-06-13 2009-01-23 Centre Nat Rech Scient Dispositif et procede de nettoyage d'un reacteur par plasma
US7872422B2 (en) * 2006-07-18 2011-01-18 Guardian Industries Corp. Ion source with recess in electrode
US20080073557A1 (en) * 2006-07-26 2008-03-27 John German Methods and apparatuses for directing an ion beam source
US7488951B2 (en) * 2006-08-24 2009-02-10 Guardian Industries Corp. Ion source including magnet and magnet yoke assembly
US7598500B2 (en) * 2006-09-19 2009-10-06 Guardian Industries Corp. Ion source and metals used in making components thereof and method of making same
US20080142039A1 (en) * 2006-12-13 2008-06-19 Advanced Technology Materials, Inc. Removal of nitride deposits
TWI573179B (zh) 2008-02-11 2017-03-01 先進科技材料公司 在半導體處理系統中離子源之清洗
US7888662B2 (en) * 2008-06-20 2011-02-15 Varian Semiconductor Equipment Associates, Inc. Ion source cleaning method and apparatus
CN102308358B (zh) * 2008-12-08 2015-01-07 通用等离子公司 具有自清洁阳极的闭合漂移磁场离子源装置及基材改性修改方法
US8968535B2 (en) * 2009-12-14 2015-03-03 Spp Process Technology Systems Uk Limited Ion beam source
US8575565B2 (en) 2011-10-10 2013-11-05 Guardian Industries Corp. Ion source apparatus and methods of using the same
US8497155B1 (en) 2012-06-05 2013-07-30 Guardian Industries Corp. Planarized TCO-based anode for OLED devices, and/or methods of making the same
US9530615B2 (en) 2012-08-07 2016-12-27 Varian Semiconductor Equipment Associates, Inc. Techniques for improving the performance and extending the lifetime of an ion source
US9593019B2 (en) 2013-03-15 2017-03-14 Guardian Industries Corp. Methods for low-temperature graphene precipitation onto glass, and associated articles/devices
US9711316B2 (en) * 2013-10-10 2017-07-18 Varian Semiconductor Equipment Associates, Inc. Method of cleaning an extraction electrode assembly using pulsed biasing
US9812305B2 (en) 2015-04-27 2017-11-07 Advanced Energy Industries, Inc. Rate enhanced pulsed DC sputtering system
US11049702B2 (en) 2015-04-27 2021-06-29 Advanced Energy Industries, Inc. Rate enhanced pulsed DC sputtering system
US10373811B2 (en) 2015-07-24 2019-08-06 Aes Global Holdings, Pte. Ltd Systems and methods for single magnetron sputtering
KR101698717B1 (ko) * 2016-02-17 2017-01-20 한국기계연구원 대상물 가공 장치
WO2017196622A2 (en) 2016-05-11 2017-11-16 Veeco Instruments Inc. Ion beam materials processing system with grid short clearing system for gridded ion beam source
SG10201705059TA (en) 2016-06-24 2018-01-30 Veeco Instr Inc Enhanced cathodic arc source for arc plasma deposition
WO2019200312A1 (en) 2018-04-13 2019-10-17 Veeco Instruments Inc. Chemical vapor deposition apparatus with multi-zone injector block
DE102020114162B3 (de) 2020-05-27 2021-07-22 VON ARDENNE Asset GmbH & Co. KG Ionenquelle und Verfahren

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Also Published As

Publication number Publication date
AU2003277443A1 (en) 2004-05-13
US20040075060A1 (en) 2004-04-22
WO2004038754A3 (en) 2004-12-09
CA2499235A1 (en) 2004-05-06
WO2004038754A2 (en) 2004-05-06
CA2499235C (en) 2009-01-27
EP1556879A2 (en) 2005-07-27
AU2003277443A8 (en) 2004-05-13
US6812648B2 (en) 2004-11-02
PL214874B1 (pl) 2013-09-30
WO2004038754A8 (en) 2005-05-19

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