SE7800954L - Metod for jonimplantation - Google Patents

Metod for jonimplantation

Info

Publication number: SE7800954L
Authority: SE; Sweden
Prior art keywords: ion implantation; implantation; ion
Prior art date: 1977-01-31

Application number

SE7800954A

Other languages

English (en)

Other versions

SE425826B (sv

Inventor

H S Rupprecht

R O Schwenker

Original Assignee

Ibm

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-01-31

Filing date

1978-01-26

Publication date

1978-08-01

1978-01-26 Application filed by Ibm filed Critical Ibm

1978-08-01 Publication of SE7800954L publication Critical patent/SE7800954L/sv

1982-11-08 Publication of SE425826B publication Critical patent/SE425826B/sv

Links

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P30/00—Ion implantation into wafers, substrates or parts of devices
- H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P30/00—Ion implantation into wafers, substrates or parts of devices
- H10P30/40—Ion implantation into wafers, substrates or parts of devices into insulating materials
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices

SE7800954A 1977-01-31 1978-01-26 Metod for jonimplantation SE425826B (sv)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US05/763,789 US4076558A (en)	1977-01-31	1977-01-31	Method of high current ion implantation and charge reduction by simultaneous kerf implant

Publications (2)

Publication Number	Publication Date
SE7800954L true SE7800954L (sv)	1978-08-01
SE425826B SE425826B (sv)	1982-11-08

Family

ID=25068815

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE7800954A SE425826B (sv)	1977-01-31	1978-01-26	Metod for jonimplantation

Country Status (12)

Country	Link
US (1)	US4076558A (sv)
JP (1)	JPS5910576B2 (sv)
BE (1)	BE862557A (sv)
CA (1)	CA1043474A (sv)
CH (1)	CH632105A5 (sv)
DE (1)	DE2801271C2 (sv)
ES (1)	ES466448A1 (sv)
FR (1)	FR2379163A1 (sv)
GB (1)	GB1549971A (sv)
IT (1)	IT1114183B (sv)
NL (1)	NL7800851A (sv)
SE (1)	SE425826B (sv)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5839376B2 (ja) *	1978-10-30	1983-08-30	富士通株式会社	イオン注入法
US4249962A (en) *	1979-09-11	1981-02-10	Western Electric Company, Inc.	Method of removing contaminating impurities from device areas in a semiconductor wafer
US4463255A (en) *	1980-09-24	1984-07-31	Varian Associates, Inc.	Apparatus for enhanced neutralization of positively charged ion beam
US4453086A (en) *	1981-12-31	1984-06-05	International Business Machines Corporation	Electron beam system with reduced charge buildup
JPS60198721A (ja) *	1984-03-22	1985-10-08	Fujitsu Ltd	半導体装置の製造方法
US5136171A (en) *	1990-03-02	1992-08-04	Varian Associates, Inc.	Charge neutralization apparatus for ion implantation system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3507709A (en) *	1967-09-15	1970-04-21	Hughes Aircraft Co	Method of irradiating dielectriccoated semiconductor bodies with low energy electrons
NL154061B (nl) *	1967-11-04	1977-07-15	Philips Nv	Werkwijze voor het vervaardigen van een halfgeleiderinrichting en halfgeleiderinrichting vervaardigd met behulp van de werkwijze.
US3701696A (en) *	1969-08-20	1972-10-31	Gen Electric	Process for simultaneously gettering,passivating and locating a junction within a silicon crystal
JPS4819113B1 (sv) *	1969-08-27	1973-06-11
US3728161A (en) *	1971-12-28	1973-04-17	Bell Telephone Labor Inc	Integrated circuits with ion implanted chan stops
US3790412A (en) *	1972-04-07	1974-02-05	Bell Telephone Labor Inc	Method of reducing the effects of particle impingement on shadow masks
JPS49118367A (sv) *	1973-03-12	1974-11-12

1977
- 1977-01-31 US US05/763,789 patent/US4076558A/en not_active Expired - Lifetime
- 1977-10-26 CA CA289,545A patent/CA1043474A/en not_active Expired
- 1977-12-20 JP JP52152517A patent/JPS5910576B2/ja not_active Expired
- 1977-12-22 IT IT31118/77A patent/IT1114183B/it active
- 1977-12-23 FR FR7739913A patent/FR2379163A1/fr active Granted
- 1977-12-30 BE BE184040A patent/BE862557A/xx not_active IP Right Cessation
1978
- 1978-01-06 GB GB570/78A patent/GB1549971A/en not_active Expired
- 1978-01-10 CH CH21278A patent/CH632105A5/de not_active IP Right Cessation
- 1978-01-13 DE DE2801271A patent/DE2801271C2/de not_active Expired
- 1978-01-24 NL NL7800851A patent/NL7800851A/xx not_active Application Discontinuation
- 1978-01-26 SE SE7800954A patent/SE425826B/sv not_active IP Right Cessation
- 1978-01-28 ES ES466448A patent/ES466448A1/es not_active Expired

Also Published As

Publication number	Publication date
DE2801271A1 (de)	1978-08-03
FR2379163A1 (fr)	1978-08-25
SE425826B (sv)	1982-11-08
US4076558A (en)	1978-02-28
JPS5396665A (en)	1978-08-24
NL7800851A (nl)	1978-08-02
CH632105A5 (de)	1982-09-15
JPS5910576B2 (ja)	1984-03-09
GB1549971A (en)	1979-08-08
IT1114183B (it)	1986-01-27
FR2379163B1 (sv)	1980-12-19
CA1043474A (en)	1978-11-28
BE862557A (fr)	1978-04-14
DE2801271C2 (de)	1988-01-21
ES466448A1 (es)	1978-10-16

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FR2330142A1 (fr)	1977-05-27	Procede de masquage approprie aux techniques d'implantation ionique
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DE3070563D1 (de)	1985-05-30	Ion implantation apparatus
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IT1140936B (it)	1986-10-10	Metodo e macchina per montare calzature
PL203936A1 (pl)	1978-09-11	Sposob barwienia
GB2007378B (en)	1982-03-17	Photographic processing method
DE3266001D1 (de)	1985-10-10	Ion implanter
JPS53100179A (en)	1978-09-01	Activationnreactive evaporation method
JPS53142521A (en)	1978-12-12	Radioimmunoassay method
JPS5392127A (en)	1978-08-12	Retouching method
NL7804691A (nl)	1978-11-07	Ionenimplantatie-inrichting.
DD131103A1 (de)	1978-05-31	Verfahren zur ionenimplantation

Legal Events

Date

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Description

1995-01-31

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