SE9904295L - Device for Hybrid Plasma Processing - Google Patents

Device for Hybrid Plasma Processing

Info

Publication number
SE9904295L
SE9904295L SE9904295A SE9904295A SE9904295L SE 9904295 L SE9904295 L SE 9904295L SE 9904295 A SE9904295 A SE 9904295A SE 9904295 A SE9904295 A SE 9904295A SE 9904295 L SE9904295 L SE 9904295L
Authority
SE
Sweden
Prior art keywords
plasma
hollow cathode
plasma reactor
microwave
cathode
Prior art date
Application number
SE9904295A
Other languages
English (en)
Other versions
SE521904C2 (sv
SE9904295D0 (sv
Inventor
Ladislav Bardos
Hana Barankova
Original Assignee
Ladislav Bardos
Hana Barankova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ladislav Bardos, Hana Barankova filed Critical Ladislav Bardos
Priority to SE9904295A priority Critical patent/SE521904C2/sv
Publication of SE9904295D0 publication Critical patent/SE9904295D0/sv
Priority to PCT/SE2000/002315 priority patent/WO2001039560A1/en
Priority to JP2001540573A priority patent/JP2003515433A/ja
Priority to AU15671/01A priority patent/AU1567101A/en
Priority to EP00978187A priority patent/EP1236381A1/en
Priority to US10/130,709 priority patent/US6899054B1/en
Publication of SE9904295L publication Critical patent/SE9904295L/sv
Publication of SE521904C2 publication Critical patent/SE521904C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SE9904295A 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling SE521904C2 (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling
PCT/SE2000/002315 WO2001039560A1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
JP2001540573A JP2003515433A (ja) 1999-11-26 2000-11-23 ハイブリッドプラズマ処理装置
AU15671/01A AU1567101A (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
EP00978187A EP1236381A1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
US10/130,709 US6899054B1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling

Publications (3)

Publication Number Publication Date
SE9904295D0 SE9904295D0 (sv) 1999-11-26
SE9904295L true SE9904295L (sv) 2001-05-27
SE521904C2 SE521904C2 (sv) 2003-12-16

Family

ID=20417874

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling

Country Status (6)

Country Link
US (1) US6899054B1 (sv)
EP (1) EP1236381A1 (sv)
JP (1) JP2003515433A (sv)
AU (1) AU1567101A (sv)
SE (1) SE521904C2 (sv)
WO (1) WO2001039560A1 (sv)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10247888A1 (de) * 2002-10-14 2004-04-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Erzeugung von Plasmen durch Hochfrequenzentladungen
GB0309932D0 (en) * 2003-04-30 2003-06-04 Boc Group Plc Apparatus and method for forming a plasma
DE10341239B4 (de) * 2003-09-08 2006-05-24 Roth & Rau Ag ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung
ATE532203T1 (de) * 2004-08-27 2011-11-15 Fei Co Lokalisierte plasmabehandlung
CN100395371C (zh) * 2005-12-02 2008-06-18 太原理工大学 微波等离子体增强弧辉渗镀涂层的装置及工艺
DE102006037144B4 (de) * 2006-08-09 2010-05-20 Roth & Rau Ag ECR-Plasmaquelle
US20090255808A1 (en) * 2008-04-11 2009-10-15 Seagate Technology Llc Target for efficient use of precious deposition material
US8263951B2 (en) 2008-06-13 2012-09-11 Fablab Inc. System and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
WO2010017185A1 (en) 2008-08-04 2010-02-11 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
US8168268B2 (en) * 2008-12-12 2012-05-01 Ovishinsky Innovation, LLC Thin film deposition via a spatially-coordinated and time-synchronized process
PT2251454E (pt) 2009-05-13 2014-10-01 Sio2 Medical Products Inc Revestimento e inspeção de vaso
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
IN2013CN05221A (sv) * 2011-01-13 2015-08-07 Univ Minnesota
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
CA2855353C (en) 2011-11-11 2021-01-19 Sio2 Medical Products, Inc. Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
KR101314666B1 (ko) * 2011-11-28 2013-10-04 최대규 하이브리드 플라즈마 반응기
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
CN103227090B (zh) * 2013-02-04 2016-04-06 深圳市劲拓自动化设备股份有限公司 一种线性等离子体源
JP2016518240A (ja) 2013-02-15 2016-06-23 リージェンツ オブ ザ ユニバーシティ オブ ミネソタ 粒子の官能化
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
US9431218B2 (en) 2013-03-15 2016-08-30 Tokyo Electron Limited Scalable and uniformity controllable diffusion plasma source
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
US9427821B2 (en) * 2013-03-15 2016-08-30 Agilent Technologies, Inc. Integrated magnetron plasma torch, and related methods
RU2532779C1 (ru) * 2013-04-19 2014-11-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э. Баумана" (МГТУ им. Н.Э. Баумана) Способ и устройство для ускоренного азотирования деталей машин с использованием импульсов электромагнитного поля
US10167556B2 (en) * 2014-03-14 2019-01-01 The Board Of Trustees Of The University Of Illinois Apparatus and method for depositing a coating on a substrate at atmospheric pressure
WO2015148471A1 (en) 2014-03-28 2015-10-01 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9550694B2 (en) * 2014-03-31 2017-01-24 Corning Incorporated Methods and apparatus for material processing using plasma thermal source
US9533909B2 (en) 2014-03-31 2017-01-03 Corning Incorporated Methods and apparatus for material processing using atmospheric thermal plasma reactor
MY191327A (en) 2014-12-05 2022-06-16 Agc Flat Glass Na Inc Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
KR102272311B1 (ko) 2014-12-05 2021-07-06 에이쥐씨 글래스 유럽 중공형 음극 플라즈마 소스
US20160200618A1 (en) 2015-01-08 2016-07-14 Corning Incorporated Method and apparatus for adding thermal energy to a glass melt
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
TWI615504B (zh) * 2016-09-13 2018-02-21 Zhang yu shun 遠端電漿增強化學氣相沈積系統之電漿產生裝置
EP3309815B1 (de) * 2016-10-12 2019-03-20 Meyer Burger (Germany) AG Plasmabehandlungsvorrichtung mit zwei, miteinander gekoppelten mikrowellenplasmaquellen sowie verfahren zum betreiben einer solchen plasmabehandlungsvorrichtung
SE1651742A1 (en) * 2016-12-27 2018-06-28 Methods and apparatuses for deposition of adherent carbon coatings on insulator surfaces
KR102722787B1 (ko) * 2017-12-04 2024-10-25 포항공과대학교 산학협력단 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법
US10714329B2 (en) * 2018-09-28 2020-07-14 Taiwan Semiconductor Manufacturing Co., Ltd. Pre-clean for contacts
US11120973B2 (en) * 2019-05-10 2021-09-14 Applied Materials, Inc. Plasma processing apparatus and techniques
KR102723043B1 (ko) * 2021-11-09 2024-10-25 한국핵융합에너지연구원 마이크로웨이브로 확장된 아크 플라즈마 제트 발생기
TWI801058B (zh) * 2021-12-23 2023-05-01 明遠精密科技股份有限公司 一種複合式電漿源及其運作方法
CN120033048B (zh) * 2025-04-22 2025-07-04 华东师范大学 电离源装置及氢原子钟

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62180747A (ja) * 1986-02-03 1987-08-08 Anelva Corp 放電反応装置
JPH0686670B2 (ja) * 1987-04-13 1994-11-02 日電アネルバ株式会社 放電化学反応装置
JPH02149339A (ja) * 1988-11-30 1990-06-07 Toshiba Corp マイクロ波プラズマ処理装置
US5279669A (en) * 1991-12-13 1994-01-18 International Business Machines Corporation Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions
JPH07268622A (ja) * 1994-03-01 1995-10-17 Applied Sci & Technol Inc マイクロ波プラズマ付着源
JP2960306B2 (ja) * 1994-08-29 1999-10-06 新日本製鐵株式会社 非移行型プラズマ溶射肉盛方法
JPH0891988A (ja) * 1994-09-27 1996-04-09 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ化学蒸着装置
TW285746B (sv) * 1994-10-26 1996-09-11 Matsushita Electric Industrial Co Ltd
DE19505268C2 (de) * 1995-02-16 1999-02-18 Fraunhofer Ges Forschung CVD-Verfahren zur Beschichtung von Substratoberflächen

Also Published As

Publication number Publication date
WO2001039560A1 (en) 2001-05-31
US6899054B1 (en) 2005-05-31
SE521904C2 (sv) 2003-12-16
SE9904295D0 (sv) 1999-11-26
EP1236381A1 (en) 2002-09-04
JP2003515433A (ja) 2003-05-07
AU1567101A (en) 2001-06-04

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