SG123771A1 - Uniformity correction system having light leak andshadow compensation - Google Patents

Uniformity correction system having light leak andshadow compensation

Info

Publication number
SG123771A1
SG123771A1 SG200508378A SG200508378A SG123771A1 SG 123771 A1 SG123771 A1 SG 123771A1 SG 200508378 A SG200508378 A SG 200508378A SG 200508378 A SG200508378 A SG 200508378A SG 123771 A1 SG123771 A1 SG 123771A1
Authority
SG
Singapore
Prior art keywords
andshadow
compensation
correction system
light leak
uniformity correction
Prior art date
Application number
SG200508378A
Other languages
English (en)
Inventor
Roberto B Wiener
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG123771A1 publication Critical patent/SG123771A1/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G03B27/727—Optical projection devices wherein the contrast is controlled optically (e.g. uniform exposure, two colour exposure on variable contrast sensitive material)
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Polarising Elements (AREA)
SG200508378A 2004-12-28 2005-12-23 Uniformity correction system having light leak andshadow compensation SG123771A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/022,837 US7088527B2 (en) 2004-12-28 2004-12-28 Uniformity correction system having light leak and shadow compensation

Publications (1)

Publication Number Publication Date
SG123771A1 true SG123771A1 (en) 2006-07-26

Family

ID=35999492

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200508378A SG123771A1 (en) 2004-12-28 2005-12-23 Uniformity correction system having light leak andshadow compensation

Country Status (7)

Country Link
US (3) US7088527B2 (de)
EP (1) EP1677148A3 (de)
JP (1) JP4271190B2 (de)
KR (1) KR100673504B1 (de)
CN (1) CN100524036C (de)
SG (1) SG123771A1 (de)
TW (1) TWI317055B (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060139784A1 (en) * 2004-12-28 2006-06-29 Asml Holding N.V. Uniformity correction system having light leak compensation
US7088527B2 (en) * 2004-12-28 2006-08-08 Asml Holding N.V. Uniformity correction system having light leak and shadow compensation
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
NL1036162A1 (nl) * 2007-11-28 2009-06-02 Asml Netherlands Bv Lithographic apparatus and method.
DE102008013229B4 (de) * 2007-12-11 2015-04-09 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Mikrolithographie
CN101221373B (zh) * 2008-01-25 2010-06-02 上海微电子装备有限公司 一种照明均匀性校正装置
CN101221374B (zh) * 2008-01-25 2010-06-09 上海微电子装备有限公司 一种照明均匀性校正装置
WO2009099280A2 (en) * 2008-02-05 2009-08-13 Lg Electronics Inc. Input unit and control method thereof
KR101258344B1 (ko) * 2008-10-31 2013-04-30 칼 짜이스 에스엠티 게엠베하 Ｅｕｖ 마이크로리소그래피용 조명 광학 기기
NL2004770A (nl) * 2009-05-29 2010-11-30 Asml Holding Nv Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation.
DE102011077234A1 (de) 2011-06-08 2012-12-13 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
WO2012126954A1 (en) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh Euv mirror arrangement, optical system comprising euv mirror arrangement and method for operating an optical system comprising an euv mirror arrangement
DE102011005940A1 (de) 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
CN107885038A (zh) * 2016-09-30 2018-04-06 上海微电子装备（集团）股份有限公司 照明均匀性校正装置、校正方法以及一种曝光投影系统
DE102017203647A1 (de) 2017-03-07 2018-09-13 Carl Zeiss Smt Gmbh Spiegel mit einer piezoelektrisch aktiven Schicht
CN109991815B (zh) * 2017-12-29 2020-10-16 上海微电子装备（集团）股份有限公司 一种泛曝补偿板、泛曝装置以及光刻装置
KR102894806B1 (ko) * 2019-04-26 2025-12-04 에이에스엠엘 홀딩 엔.브이. 리소그래피 장치 및 조명 균일성 보정 시스템
JP7249207B2 (ja) * 2019-05-28 2023-03-30 シャープ株式会社 シェーディング補正信号生成装置、複合機及びシェーディング補正信号生成方法
CN115729047B (zh) * 2021-08-30 2025-11-04 上海芯上微装科技股份有限公司 照明均匀性补偿装置和方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0532311A (ja) 1991-02-13 1993-02-09 Kanebo Ltd 物品横倒装置
KR930006480A (ko) * 1991-09-11 1993-04-21 원본미기재 콘트라스트가 개선된 액정 표시판넬
US5508803A (en) * 1994-12-20 1996-04-16 International Business Machines Corporation Method and apparatus for monitoring lithographic exposure
JP3883601B2 (ja) * 1996-03-27 2007-02-21 富士通株式会社 光イコライザ
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JPH10282635A (ja) 1997-04-09 1998-10-23 Sony Corp パターンデータ補正方法、電子線描画方法、フォトマスク及びその作製方法、露光方法、半導体装置及びその製造方法、並びにパターンデータ補正装置
US5981962A (en) 1998-01-09 1999-11-09 International Business Machines Corporation Distributed direct write lithography system using multiple variable shaped electron beams
US6741394B1 (en) * 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
US6404499B1 (en) * 1998-04-21 2002-06-11 Asml Netherlands B.V. Lithography apparatus with filters for optimizing uniformity of an image
US6021009A (en) * 1998-06-30 2000-02-01 Intel Corporation Method and apparatus to improve across field dimensional control in a microlithography tool
JP2000232056A (ja) 1999-02-10 2000-08-22 Minolta Co Ltd 露光装置
JP2001217171A (ja) 2000-01-21 2001-08-10 Promos Technol Inc 高密度パターンと低密度パターンとの変差を解消する方法と装置
US6566016B1 (en) 2000-06-28 2003-05-20 Koninklijke Philips Electronics N.V. Apparatus and method for compensating critical dimension deviations across photomask
US6771350B2 (en) * 2000-02-25 2004-08-03 Nikon Corporation Exposure apparatus and exposure method capable of controlling illumination distribution
JP2001319871A (ja) * 2000-02-29 2001-11-16 Nikon Corp 露光方法、濃度フィルタの製造方法、及び露光装置
JP3633506B2 (ja) 2001-05-24 2005-03-30 ソニー株式会社 露光方法および半導体装置の製造方法
DE60225216T2 (de) * 2001-09-07 2009-03-05 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7030958B2 (en) * 2003-12-31 2006-04-18 Asml Netherlands B.V. Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
US7088527B2 (en) * 2004-12-28 2006-08-08 Asml Holding N.V. Uniformity correction system having light leak and shadow compensation
US20060139784A1 (en) * 2004-12-28 2006-06-29 Asml Holding N.V. Uniformity correction system having light leak compensation

Also Published As

Publication number Publication date
EP1677148A3 (de) 2008-01-23
JP4271190B2 (ja) 2009-06-03
KR20060076700A (ko) 2006-07-04
TWI317055B (en) 2009-11-11
US20080137217A1 (en) 2008-06-12
CN1797218A (zh) 2006-07-05
US7545585B2 (en) 2009-06-09
US7088527B2 (en) 2006-08-08
EP1677148A2 (de) 2006-07-05
TW200625029A (en) 2006-07-16
KR100673504B1 (ko) 2007-01-25
JP2006191067A (ja) 2006-07-20
US20060262426A1 (en) 2006-11-23
US20060139769A1 (en) 2006-06-29
CN100524036C (zh) 2009-08-05

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