SG143200A1 - Polishing composition and polishing process - Google Patents

Polishing composition and polishing process

Info

Publication number
SG143200A1
SG143200A1 SG200717999-7A SG2007179997A SG143200A1 SG 143200 A1 SG143200 A1 SG 143200A1 SG 2007179997 A SG2007179997 A SG 2007179997A SG 143200 A1 SG143200 A1 SG 143200A1
Authority
SG
Singapore
Prior art keywords
polishing composition
polishing
composition
polishing process
polish
Prior art date
Application number
SG200717999-7A
Other languages
English (en)
Inventor
Masayuki Hattori
Hideyuki Satoh
Atsunori Kawamura
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of SG143200A1 publication Critical patent/SG143200A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
SG200717999-7A 2006-11-27 2007-11-22 Polishing composition and polishing process SG143200A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006318669A JP2008135452A (ja) 2006-11-27 2006-11-27 研磨用組成物及び研磨方法

Publications (1)

Publication Number Publication Date
SG143200A1 true SG143200A1 (en) 2008-06-27

Family

ID=39114993

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200717999-7A SG143200A1 (en) 2006-11-27 2007-11-22 Polishing composition and polishing process

Country Status (7)

Country Link
US (1) US20080120918A1 (fr)
EP (1) EP1925649A3 (fr)
JP (1) JP2008135452A (fr)
KR (1) KR101427418B1 (fr)
CN (1) CN101200628A (fr)
SG (1) SG143200A1 (fr)
TW (1) TW200911936A (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101279969B1 (ko) * 2008-12-31 2013-07-05 제일모직주식회사 금속 배선 연마용 ｃｍｐ 슬러리 조성물 및 이를 이용한 연마 방법
WO2010140671A1 (fr) * 2009-06-05 2010-12-09 株式会社Sumco Procédé de polissage de tranche de silicium et tranche de silicium
US8551887B2 (en) 2009-12-22 2013-10-08 Air Products And Chemicals, Inc. Method for chemical mechanical planarization of a copper-containing substrate
JP6068791B2 (ja) * 2011-11-25 2017-01-25 株式会社フジミインコーポレーテッド 研磨用組成物
US9238755B2 (en) 2011-11-25 2016-01-19 Fujima Incorporated Polishing composition
US9303191B2 (en) 2012-03-30 2016-04-05 Nitta Haas Incorporated Polishing composition
WO2016033417A1 (fr) * 2014-08-29 2016-03-03 Cabot Microelectronics Corporation Composition et procédé pour polir une surface de saphir
JP6423279B2 (ja) * 2015-02-10 2018-11-14 株式会社フジミインコーポレーテッド 研磨用組成物
KR101834418B1 (ko) * 2015-10-02 2018-03-05 유비머트리얼즈주식회사 슬러리 및 이를 이용한 기판 연마 방법
JP2019062078A (ja) * 2017-09-26 2019-04-18 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物の製造方法、研磨方法および半導体基板の製造方法
WO2019181487A1 (fr) * 2018-03-23 2019-09-26 富士フイルム株式会社 Liquide de polissage, et procédé de polissage chimique et mécanique

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2545862B1 (fr) * 1983-05-11 1986-08-22 Barreau Jean Paul Perfectionnement aux boites de branchement des conduites d'eaux pluviales, utilisees dans le batiment
US5244534A (en) * 1992-01-24 1993-09-14 Micron Technology, Inc. Two-step chemical mechanical polishing process for producing flush and protruding tungsten plugs
US5340370A (en) * 1993-11-03 1994-08-23 Intel Corporation Slurries for chemical mechanical polishing
US5527423A (en) * 1994-10-06 1996-06-18 Cabot Corporation Chemical mechanical polishing slurry for metal layers
EP0852615B1 (fr) * 1996-07-25 2005-12-14 DuPont Air Products NanoMaterials L.L.C. Composition et procede de polissage mecanique chimique
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
US6001269A (en) * 1997-05-20 1999-12-14 Rodel, Inc. Method for polishing a composite comprising an insulator, a metal, and titanium
US6083419A (en) * 1997-07-28 2000-07-04 Cabot Corporation Polishing composition including an inhibitor of tungsten etching
JP4264781B2 (ja) * 1999-09-20 2009-05-20 株式会社フジミインコーポレーテッド 研磨用組成物および研磨方法
US6319096B1 (en) * 1999-11-15 2001-11-20 Cabot Corporation Composition and method for planarizing surfaces
US6293848B1 (en) * 1999-11-15 2001-09-25 Cabot Microelectronics Corporation Composition and method for planarizing surfaces
US6299795B1 (en) * 2000-01-18 2001-10-09 Praxair S.T. Technology, Inc. Polishing slurry
US6355075B1 (en) * 2000-02-11 2002-03-12 Fujimi Incorporated Polishing composition
JP4954398B2 (ja) * 2001-08-09 2012-06-13 株式会社フジミインコーポレーテッド 研磨用組成物およびそれを用いた研磨方法
JP2003142435A (ja) * 2001-10-31 2003-05-16 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
KR20040094758A (ko) * 2002-03-04 2004-11-10 가부시키가이샤 후지미인코퍼레이티드 연마용 조성물 및 이를 사용한 배선구조의 형성방법
JP4083528B2 (ja) * 2002-10-01 2008-04-30 株式会社フジミインコーポレーテッド 研磨用組成物
JP2005244123A (ja) * 2004-02-27 2005-09-08 Fujimi Inc 研磨用組成物
JP2005268664A (ja) * 2004-03-19 2005-09-29 Fujimi Inc 研磨用組成物
JP5319887B2 (ja) * 2005-01-05 2013-10-16 ニッタ・ハース株式会社 研磨用スラリー
JP2006318669A (ja) 2005-05-10 2006-11-24 Toshiba Corp 燃料電池装置

Also Published As

Publication number Publication date
JP2008135452A (ja) 2008-06-12
EP1925649A2 (fr) 2008-05-28
EP1925649A3 (fr) 2009-03-04
TW200911936A (en) 2009-03-16
CN101200628A (zh) 2008-06-18
US20080120918A1 (en) 2008-05-29
KR20080047988A (ko) 2008-05-30
KR101427418B1 (ko) 2014-08-08

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