SG43005A1 - Transistor with common base region - Google Patents

Transistor with common base region

Info

Publication number
SG43005A1
SG43005A1 SG1996002157A SG1996002157A SG43005A1 SG 43005 A1 SG43005 A1 SG 43005A1 SG 1996002157 A SG1996002157 A SG 1996002157A SG 1996002157 A SG1996002157 A SG 1996002157A SG 43005 A1 SG43005 A1 SG 43005A1
Authority
SG
Singapore
Prior art keywords
transistor
base region
common base
common
region
Prior art date
Application number
SG1996002157A
Other languages
English (en)
Inventor
Stephone P Robb
William L Fragale
Paul J Groenig
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of SG43005A1 publication Critical patent/SG43005A1/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66—Vertical DMOS [VDMOS] FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/63—Vertical IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/025—Manufacture or treatment of FETs having insulated gates [IGFET] of vertical IGFETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126—Top-view geometrical layouts of the regions or the junctions
    • H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/192—Base regions of thyristors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/393—Body regions of DMOS transistors or IGBTs 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251—Source or drain electrodes for field-effect devices
    • H10D64/252—Source or drain electrodes for field-effect devices for vertical or pseudo-vertical devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311—Gate electrodes for field-effect devices
    • H10D64/411—Gate electrodes for field-effect devices for FETs
    • H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/514—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers
    • H10D64/516—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers the thicknesses being non-uniform
SG1996002157A 1993-11-22 1994-11-14 Transistor with common base region SG43005A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15550493A 1993-11-22 1993-11-22
US08/272,899 US5396097A (en) 1993-11-22 1994-07-08 Transistor with common base region

Publications (1)

Publication Number Publication Date
SG43005A1 true SG43005A1 (en) 1997-10-17

Family

ID=26852373

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996002157A SG43005A1 (en) 1993-11-22 1994-11-14 Transistor with common base region

Country Status (6)

Country Link
US (1) US5396097A (ja)
EP (2) EP0827209A1 (ja)
JP (1) JPH07193243A (ja)
KR (1) KR950015830A (ja)
CN (1) CN1034841C (ja)
SG (1) SG43005A1 (ja)

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US6603173B1 (en) 1991-07-26 2003-08-05 Denso Corporation Vertical type MOSFET
US5723890A (en) * 1994-01-07 1998-03-03 Fuji Electric Co., Ltd. MOS type semiconductor device
US5703389A (en) * 1995-02-24 1997-12-30 Motorola, Inc. Vertical IGFET configuration having low on-resistance and method
EP0823735A1 (en) * 1996-08-05 1998-02-11 Sgs-Thomson Microelectronics S.A. MOS-technology power device
WO2001031709A1 (en) * 1999-10-22 2001-05-03 Semiconductor Components Industries, L.L.C. Semiconductor device with a single base region and method therefor
US6545543B2 (en) * 2001-07-06 2003-04-08 Remec, Inc. Small aspect ratio MMIC power amplifier layout
US6870221B2 (en) * 2002-12-09 2005-03-22 Semiconductor Components Industries, Llc Power switching transistor with low drain to gate capacitance
JP4474563B2 (ja) * 2002-12-26 2010-06-09 旭精工株式会社 バイメタルコインの検出装置
JP4802306B2 (ja) * 2003-12-01 2011-10-26 オンセミコンダクター・トレーディング・リミテッド 半導体装置
KR100687108B1 (ko) * 2005-05-31 2007-02-27 라이톤 세미컨덕터 코퍼레이션 기생 바이폴라 트랜지스터의 턴온을 억제할 수 있는 고전력반도체 소자
WO2007016969A1 (en) 2005-07-25 2007-02-15 Freescale Semiconductor, Inc. Power semiconductor device and method of manufacturing a power semiconductor device
US7595523B2 (en) * 2007-02-16 2009-09-29 Power Integrations, Inc. Gate pullback at ends of high-voltage vertical transistor structure
US8723177B2 (en) 2011-12-06 2014-05-13 Globalfoundries Inc. Electrical test structure for devices employing high-k dielectrics or metal gates
US9543396B2 (en) 2013-12-13 2017-01-10 Power Integrations, Inc. Vertical transistor device structure with cylindrically-shaped regions
US10325988B2 (en) 2013-12-13 2019-06-18 Power Integrations, Inc. Vertical transistor device structure with cylindrically-shaped field plates

Family Cites Families (23)

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Publication number Priority date Publication date Assignee Title
JPS53128281A (en) * 1977-04-15 1978-11-09 Hitachi Ltd Insulated gate field effect type semiconductor device for large power
US4135289A (en) * 1977-08-23 1979-01-23 Bell Telephone Laboratories, Incorporated Method for producing a buried junction memory device
US4212684A (en) * 1978-11-20 1980-07-15 Ncr Corporation CISFET Processing including simultaneous doping of silicon components and FET channels
US4210465A (en) * 1978-11-20 1980-07-01 Ncr Corporation CISFET Processing including simultaneous implantation of spaced polycrystalline silicon regions and non-memory FET channel
US4236166A (en) * 1979-07-05 1980-11-25 Bell Telephone Laboratories, Incorporated Vertical field effect transistor
US4593302B1 (en) * 1980-08-18 1998-02-03 Int Rectifier Corp Process for manufacture of high power mosfet laterally distributed high carrier density beneath the gate oxide
DE3040775C2 (de) * 1980-10-29 1987-01-15 Siemens AG, 1000 Berlin und 8000 München Steuerbares MIS-Halbleiterbauelement
US4412242A (en) * 1980-11-17 1983-10-25 International Rectifier Corporation Planar structure for high voltage semiconductor devices with gaps in glassy layer over high field regions
JPS58171861A (ja) * 1982-04-01 1983-10-08 Toshiba Corp 半導体装置
US4672407A (en) * 1984-05-30 1987-06-09 Kabushiki Kaisha Toshiba Conductivity modulated MOSFET
US4646117A (en) * 1984-12-05 1987-02-24 General Electric Company Power semiconductor devices with increased turn-off current ratings and limited current density in peripheral portions
US4809045A (en) * 1985-09-30 1989-02-28 General Electric Company Insulated gate device
US4860072A (en) * 1986-03-05 1989-08-22 Ixys Corporation Monolithic semiconductor device and method of manufacturing same
JPH0758782B2 (ja) * 1986-03-19 1995-06-21 株式会社東芝 半導体装置
US5231474A (en) * 1986-03-21 1993-07-27 Advanced Power Technology, Inc. Semiconductor device with doped electrical breakdown control region
US4823176A (en) * 1987-04-03 1989-04-18 General Electric Company Vertical double diffused metal oxide semiconductor (VDMOS) device including high voltage junction exhibiting increased safe operating area
JPS6449273A (en) * 1987-08-19 1989-02-23 Mitsubishi Electric Corp Semiconductor device and its manufacture
JPH02133966A (ja) * 1988-11-14 1990-05-23 Fuji Electric Co Ltd 電界効果トランジスタ
JPH077750B2 (ja) * 1989-05-15 1995-01-30 株式会社東芝 半導体装置の製造方法
US5208471A (en) * 1989-06-12 1993-05-04 Hitachi, Ltd. Semiconductor device and manufacturing method therefor
US5313088A (en) * 1990-09-19 1994-05-17 Nec Corporation Vertical field effect transistor with diffused protection diode
US5304831A (en) * 1990-12-21 1994-04-19 Siliconix Incorporated Low on-resistance power MOS technology
JPH05206470A (ja) * 1991-11-20 1993-08-13 Nec Corp 絶縁ゲート型電界効果トランジスタ

Also Published As

Publication number Publication date
EP0655787A2 (en) 1995-05-31
JPH07193243A (ja) 1995-07-28
CN1034841C (zh) 1997-05-07
EP0655787A3 (en) 1995-08-16
CN1108814A (zh) 1995-09-20
KR950015830A (ko) 1995-06-17
EP0827209A1 (en) 1998-03-04
US5396097A (en) 1995-03-07

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