SG49621A1 - Waterborne photoresists having binders neutralized with amino acids - Google Patents

Waterborne photoresists having binders neutralized with amino acids

Info

Publication number: SG49621A1
Authority: SG; Singapore
Prior art keywords: aminoacrylate; amino acids; compsn; binder polymer; neutralized
Prior art date: 1994-01-25

Application number

SG1996001170A

Other languages

English (en)

Inventor

Daniel E Lundy

Robert K Barr

Thanh N Tran

Original Assignee

Morton Int Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1994-01-25

Filing date

1994-10-27

Publication date

1998-06-15

1994-02-18 Priority claimed from US08/199,037 external-priority patent/US5364737A/en

1994-10-27 Application filed by Morton Int Inc filed Critical Morton Int Inc

1998-06-15 Publication of SG49621A1 publication Critical patent/SG49621A1/en

Links

239000011230 binding agent Substances 0.000 title abstract 3
150000001413 amino acids Chemical class 0.000 title 1
229920002120 photoresistant polymer Polymers 0.000 title 1
YTLYLLTVENPWFT-UPHRSURJSA-N (Z)-3-aminoacrylic acid Chemical compound N\C=C/C(O)=O YTLYLLTVENPWFT-UPHRSURJSA-N 0.000 abstract 3
229920000642 polymer Polymers 0.000 abstract 2
239000002253 acid Substances 0.000 abstract 1
239000000839 emulsion Substances 0.000 abstract 1
239000004816 latex Substances 0.000 abstract 1
229920000126 latex Polymers 0.000 abstract 1
239000000178 monomer Substances 0.000 abstract 1
230000003472 neutralizing effect Effects 0.000 abstract 1
239000000126 substance Substances 0.000 abstract 1
239000002562 thickening agent Substances 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Manufacturing Of Printed Circuit Boards (AREA)
Paints Or Removers (AREA)
Materials For Photolithography (AREA)
Paper (AREA)
Compositions Of Macromolecular Compounds (AREA)
Adhesives Or Adhesive Processes (AREA)
Non-Metallic Protective Coatings For Printed Circuits (AREA)
Dental Preparations (AREA)
Macromonomer-Based Addition Polymer (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

SG1996001170A 1994-01-25 1994-10-27 Waterborne photoresists having binders neutralized with amino acids SG49621A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US18687594A	1994-01-25	1994-01-25
US08/199,037 US5364737A (en)	1994-01-25	1994-02-18	Waterbone photoresists having associate thickeners
US08/238,133 US5393643A (en)	1994-01-25	1994-05-04	Waterborne photoresists having binders neutralized with amino acrylates

Publications (1)

Publication Number	Publication Date
SG49621A1 true SG49621A1 (en)	1998-06-15

Family

ID=27392162

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SG1996001170A SG49621A1 (en)	1994-01-25	1994-10-27	Waterborne photoresists having binders neutralized with amino acids

Country Status (12)

Country	Link
EP (1)	EP0664488B1 (de)
JP (1)	JPH07234507A (de)
CN (1)	CN1071911C (de)
AT (1)	ATE164012T1 (de)
AU (1)	AU660881B1 (de)
BR (1)	BR9500257A (de)
CA (1)	CA2133148C (de)
DE (1)	DE69408969T2 (de)
ES (1)	ES2115886T3 (de)
HK (1)	HK1005069A1 (de)
IL (1)	IL112008A (de)
SG (1)	SG49621A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5925499A (en) *	1995-08-01	1999-07-20	Morton International, Inc.	Epoxy-containing waterborne photoimageable composition
NL1013299C2 (nl)	1999-10-15	2001-04-18	Stahl Int Bv	Dispersies in water van een polyurethaan met geblokkeerde reactieve groepen.
NL1013300C2 (nl)	1999-10-15	2001-04-18	Stahl Int Bv	Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden.
JP4397601B2 (ja) *	2003-02-06	2010-01-13	ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー．	フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物
US8703385B2 (en) *	2012-02-10	2014-04-22	3M Innovative Properties Company	Photoresist composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2443785A1 (de) *	1974-09-13	1976-04-01	Basf Ag	Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) *	1975-10-03	1978-03-14	Rohm And Haas Company	Polyurethane thickeners in latex compositions
US4767826A (en) *	1985-07-18	1988-08-30	Polytechnic Institute Of New York	Radiation-sensitive polymers
US4743698A (en) *	1985-10-01	1988-05-10	Alco Chemical Corp.	Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
DE3639955A1 (de) *	1986-11-22	1988-05-26	Wolfen Filmfab Veb	Verfahren zur herstellung fotopolymerisierbarer materialien
JPH0246460A (ja) *	1988-08-08	1990-02-15	Toyobo Co Ltd	感光性樹脂組成物
US5045435A (en) *	1988-11-25	1991-09-03	Armstrong World Industries, Inc.	Water-borne, alkali-developable, photoresist coating compositions and their preparation
JP3040202B2 (ja) *	1991-07-12	2000-05-15	ダブリュー・アール・グレース・アンド・カンパニー−コーン	水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP3240769B2 (ja) *	1992-10-02	2001-12-25	ジェイエスアール株式会社	感光性樹脂組成物
JPH06258832A (ja) *	1992-11-17	1994-09-16	W R Grace & Co	感光性樹脂組成物
JPH06230573A (ja) *	1993-01-29	1994-08-19	Japan Synthetic Rubber Co Ltd	レジスト組成物
EP0666504B1 (de) *	1994-01-10	1998-06-03	E.I. Du Pont De Nemours And Company	Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

1994
- 1994-09-27 AU AU74215/94A patent/AU660881B1/en not_active Ceased
- 1994-09-28 CA CA002133148A patent/CA2133148C/en not_active Expired - Fee Related
- 1994-10-27 EP EP94307900A patent/EP0664488B1/de not_active Expired - Lifetime
- 1994-10-27 ES ES94307900T patent/ES2115886T3/es not_active Expired - Lifetime
- 1994-10-27 DE DE69408969T patent/DE69408969T2/de not_active Expired - Lifetime
- 1994-10-27 SG SG1996001170A patent/SG49621A1/en unknown
- 1994-10-27 AT AT94307900T patent/ATE164012T1/de not_active IP Right Cessation
- 1994-11-21 CN CN94118622.9A patent/CN1071911C/zh not_active Expired - Lifetime
- 1994-12-16 IL IL11200894A patent/IL112008A/en not_active IP Right Cessation
1995
- 1995-01-19 BR BR9500257A patent/BR9500257A/pt not_active Application Discontinuation
- 1995-01-23 JP JP7008091A patent/JPH07234507A/ja active Pending
1998
- 1998-05-15 HK HK98104211A patent/HK1005069A1/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
DE69408969T2 (de)	1998-07-02
HK1005069A1 (en)	1998-12-18
AU660881B1 (en)	1995-07-06
IL112008A (en)	1999-03-12
ATE164012T1 (de)	1998-03-15
CN1071911C (zh)	2001-09-26
JPH07234507A (ja)	1995-09-05
EP0664488B1 (de)	1998-03-11
EP0664488A1 (de)	1995-07-26
DE69408969D1 (de)	1998-04-16
CA2133148C (en)	1999-06-15
BR9500257A (pt)	1995-10-17
CA2133148A1 (en)	1995-07-26
IL112008A0 (en)	1995-03-15
CN1106935A (zh)	1995-08-16
ES2115886T3 (es)	1998-07-01

Similar Documents

Publication	Publication Date	Title
ZA951684B (en)	1995-12-12	Coating composition based on a hydroxyl group-containing polyacrylate resin and its use in processes for producing a multicoat finish
DE69122331D1 (de)	1996-10-31	Verfahren zur Herstellung von wässrigen Dispersionen von Copolymeren
DE69412730D1 (de)	1998-10-01	System zum Tragen von Handfeuerwaffen
CA2186599A1 (en)	1995-10-19	Process for preparing water-dilutable, air-drying varnish binders and use thereof
SG49621A1 (en)	1998-06-15	Waterborne photoresists having binders neutralized with amino acids
DE59710292D1 (de)	2003-07-24	Verfahren zur Herstellung von im alkalischen löslichen Copolymerisaten auf (Meth) Acrylatbasis
DK0614494T3 (da)	1996-08-05	Anvendelse af copolymerisater med polysiloxanenheder til behandling af læder og pelse
DE69508623D1 (en)	1999-04-29	Ein auf polyolefin-polyacrylat basierendes thermoplastisches elastomer
DE3582487D1 (de)	1991-05-16	Verfahren zur herstellung von zusammensetzungen aus polymerisatlatex, diese zusammensetzungen und ihre verwendungen.
EP1144542A4 (de)	2004-06-09	Zementzusammensetzung und verfahren
NZ333853A (en)	2000-07-28	Thermoformable cast poly(methacrylate) containing a catalytic chain transfer agent which is a cobalt chelate or a derivative
SG72883A1 (en)	2000-05-23	Photoimageable compositions
ZA896632B (en)	1990-05-30	Hardenable composition based on a michael addition product,process for its preparation and its use
AU661438B1 (en)	1995-07-20	Waterborne photoresists having polysiloxanes
TW241307B (de)	1995-02-21
TW200505990A (en)	2005-02-16	Chemical composition and method of polymerisation thereof for use on vehicle bodywork repair
JPS52138538A (en)	1977-11-18	Curable resin compositions
DK0755422T3 (da)	1999-03-22	Vandfortyndeligt bindemiddel, vandige lakker indeholdende dette bindemiddel og fremgangsmåde til grunding eller etlagslaker
DE68909380D1 (de)	1993-10-28	Vorrichtung zur Verhinderung eines Wasserschlages bei Wasserdruckregulierung.
WO1998025975A3 (de)	1998-08-20	Anionische polymerisation von acrylaten und methacrylaten
EP0266966A3 (de)	1989-08-02	Peroxymonocarbonat
TW242637B (de)	1995-03-11
DE59203060D1 (de)	1995-09-07	Verfahren zur Herstellung von Nitrilgruppen enthaltenden Copolymerisaten auf Basis von ethylenisch ungesättigten Monomeren.
DE59502492D1 (de)	1998-07-16	Verfahren zur stereoselektiven Reduktion von 17-Oxo-Steroiden
HUT54740A (en)	1991-03-28	Inhibitor composition for floor heating equipment with plastic tubes