SG49621A1 - Waterborne photoresists having binders neutralized with amino acids - Google Patents

Waterborne photoresists having binders neutralized with amino acids

Info

Publication number
SG49621A1
SG49621A1 SG1996001170A SG1996001170A SG49621A1 SG 49621 A1 SG49621 A1 SG 49621A1 SG 1996001170 A SG1996001170 A SG 1996001170A SG 1996001170 A SG1996001170 A SG 1996001170A SG 49621 A1 SG49621 A1 SG 49621A1
Authority
SG
Singapore
Prior art keywords
aminoacrylate
amino acids
compsn
binder polymer
neutralized
Prior art date
Application number
SG1996001170A
Other languages
English (en)
Inventor
Daniel E Lundy
Robert K Barr
Thanh N Tran
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/199,037 external-priority patent/US5364737A/en
Application filed by Morton Int Inc filed Critical Morton Int Inc
Publication of SG49621A1 publication Critical patent/SG49621A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Paper (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Dental Preparations (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
SG1996001170A 1994-01-25 1994-10-27 Waterborne photoresists having binders neutralized with amino acids SG49621A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/238,133 US5393643A (en) 1994-01-25 1994-05-04 Waterborne photoresists having binders neutralized with amino acrylates

Publications (1)

Publication Number Publication Date
SG49621A1 true SG49621A1 (en) 1998-06-15

Family

ID=27392162

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996001170A SG49621A1 (en) 1994-01-25 1994-10-27 Waterborne photoresists having binders neutralized with amino acids

Country Status (11)

Country Link
EP (1) EP0664488B1 (fr)
JP (1) JPH07234507A (fr)
CN (1) CN1071911C (fr)
AT (1) ATE164012T1 (fr)
AU (1) AU660881B1 (fr)
BR (1) BR9500257A (fr)
CA (1) CA2133148C (fr)
DE (1) DE69408969T2 (fr)
ES (1) ES2115886T3 (fr)
IL (1) IL112008A (fr)
SG (1) SG49621A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
NL1013300C2 (nl) * 1999-10-15 2001-04-18 Stahl Int Bv Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden.
NL1013299C2 (nl) 1999-10-15 2001-04-18 Stahl Int Bv Dispersies in water van een polyurethaan met geblokkeerde reactieve groepen.
JP4397601B2 (ja) * 2003-02-06 2010-01-13 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) * 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) * 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
DE3639955A1 (de) * 1986-11-22 1988-05-26 Wolfen Filmfab Veb Verfahren zur herstellung fotopolymerisierbarer materialien
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP3240769B2 (ja) * 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JPH06258832A (ja) * 1992-11-17 1994-09-16 W R Grace & Co 感光性樹脂組成物
JPH06230573A (ja) * 1993-01-29 1994-08-19 Japan Synthetic Rubber Co Ltd レジスト組成物
EP0666504B1 (fr) * 1994-01-10 1998-06-03 E.I. Du Pont De Nemours And Company Emulsion aqueuse photosensible, film photosensible et sa production

Also Published As

Publication number Publication date
HK1005069A1 (en) 1998-12-18
CN1071911C (zh) 2001-09-26
ATE164012T1 (de) 1998-03-15
EP0664488A1 (fr) 1995-07-26
JPH07234507A (ja) 1995-09-05
AU660881B1 (en) 1995-07-06
IL112008A0 (en) 1995-03-15
CA2133148A1 (fr) 1995-07-26
DE69408969D1 (de) 1998-04-16
DE69408969T2 (de) 1998-07-02
BR9500257A (pt) 1995-10-17
ES2115886T3 (es) 1998-07-01
EP0664488B1 (fr) 1998-03-11
IL112008A (en) 1999-03-12
CA2133148C (fr) 1999-06-15
CN1106935A (zh) 1995-08-16

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