SG63569A1 - Method of forming a multilayer printed circuit board and product thereof - Google Patents

Method of forming a multilayer printed circuit board and product thereof

Info

Publication number
SG63569A1
SG63569A1 SG9603044A SG1996003044A SG63569A1 SG 63569 A1 SG63569 A1 SG 63569A1 SG 9603044 A SG9603044 A SG 9603044A SG 1996003044 A SG1996003044 A SG 1996003044A SG 63569 A1 SG63569 A1 SG 63569A1
Authority
SG
Singapore
Prior art keywords
product
forming
circuit board
printed circuit
multilayer printed
Prior art date
Application number
SG9603044A
Other languages
English (en)
Inventor
Rath James
Luong-Gia Tran William
M Flynn Kathy
Ming Tara Vinai
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton Int Inc filed Critical Morton Int Inc
Publication of SG63569A1 publication Critical patent/SG63569A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0209—Inorganic, non-metallic particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0571—Dual purpose resist, e.g. etch resist used as solder resist, solder resist used as plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SG9603044A 1992-05-15 1993-03-08 Method of forming a multilayer printed circuit board and product thereof SG63569A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88343692A 1992-05-15 1992-05-15

Publications (1)

Publication Number Publication Date
SG63569A1 true SG63569A1 (en) 2001-12-19

Family

ID=25382577

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9603044A SG63569A1 (en) 1992-05-15 1993-03-08 Method of forming a multilayer printed circuit board and product thereof

Country Status (6)

Country Link
EP (1) EP0570094B1 (fr)
JP (1) JPH0783186B2 (fr)
CA (1) CA2090099C (fr)
DE (1) DE69319277T2 (fr)
ES (1) ES2118893T3 (fr)
SG (1) SG63569A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5928839A (en) * 1992-05-15 1999-07-27 Morton International, Inc. Method of forming a multilayer printed circuit board and product thereof
US5779870A (en) * 1993-03-05 1998-07-14 Polyclad Laminates, Inc. Method of manufacturing laminates and printed circuit boards
TW290583B (fr) * 1993-10-14 1996-11-11 Alpha Metals Ltd
DE4337988A1 (de) * 1993-11-06 1995-05-11 Hoellmueller Maschbau H Verfahren zur Herstellung von Multilayern sowie Vorrichtung zur Durchführung dieses Verfahrens
TW353858B (en) * 1994-07-07 1999-03-01 Morton Int Inc Method of forming a multilayer printed circuit board and product thereof
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US5670250A (en) * 1995-02-24 1997-09-23 Polyclad Laminates, Inc. Circuit board prepreg with reduced dielectric constant
US5545510A (en) * 1995-03-28 1996-08-13 Mac Dermid, Inc. Photodefinable dielectric composition useful in the manufacture of printed circuits
US6103134A (en) * 1998-12-31 2000-08-15 Motorola, Inc. Circuit board features with reduced parasitic capacitance and method therefor
US6632511B2 (en) 2001-11-09 2003-10-14 Polyclad Laminates, Inc. Manufacture of prepregs and laminates with relatively low dielectric constant for printed circuit boards
CN111148376A (zh) * 2019-12-24 2020-05-12 江门崇达电路技术有限公司 一种厚介质层pcb的压合方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59171948A (ja) * 1983-03-18 1984-09-28 Sony Corp 感光性樹脂組成物
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
EP0283990A2 (fr) * 1987-03-25 1988-09-28 Tokyo Ohka Kogyo Co., Ltd. Composition de résines photosensibles résistant à la chaleur

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS647695A (en) * 1987-06-30 1989-01-11 Toshiba Corp Manufacture of multi-layer printed wiring board
JPH02266594A (ja) * 1989-04-06 1990-10-31 Toshiba Chem Corp 多層プリント配線板の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59171948A (ja) * 1983-03-18 1984-09-28 Sony Corp 感光性樹脂組成物
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
EP0283990A2 (fr) * 1987-03-25 1988-09-28 Tokyo Ohka Kogyo Co., Ltd. Composition de résines photosensibles résistant à la chaleur

Also Published As

Publication number Publication date
EP0570094B1 (fr) 1998-06-24
JPH0690084A (ja) 1994-03-29
DE69319277T2 (de) 1998-11-05
CA2090099C (fr) 1997-01-14
CA2090099A1 (fr) 1993-11-16
EP0570094A2 (fr) 1993-11-18
JPH0783186B2 (ja) 1995-09-06
ES2118893T3 (es) 1998-10-01
DE69319277D1 (de) 1998-07-30
EP0570094A3 (fr) 1995-06-14
HK1007462A1 (en) 1999-04-09

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