ES2118893T3 - Metodo para formar una placa de circuitos impresos de capas multiples y producto. - Google Patents

Metodo para formar una placa de circuitos impresos de capas multiples y producto.

Info

Publication number
ES2118893T3
ES2118893T3 ES93301724T ES93301724T ES2118893T3 ES 2118893 T3 ES2118893 T3 ES 2118893T3 ES 93301724 T ES93301724 T ES 93301724T ES 93301724 T ES93301724 T ES 93301724T ES 2118893 T3 ES2118893 T3 ES 2118893T3
Authority
ES
Spain
Prior art keywords
interior layers
photoenurable
epoxy resin
composition
taken
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93301724T
Other languages
English (en)
Inventor
James Rath
Kathy M Flynn
William Luong-Gia Tran
Vinai Ming Tara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Morton International LLC
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton International LLC filed Critical Morton International LLC
Application granted granted Critical
Publication of ES2118893T3 publication Critical patent/ES2118893T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0209—Inorganic, non-metallic particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0571—Dual purpose resist, e.g. etch resist used as solder resist, solder resist used as plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

EN UN PROCESO PARA LA FABRICACION DE UN TABLERO DE CIRCUITOS IMPRESOS DE MULTIPLES CAPAS (20) QUE TENGA UNAS CAPAS INTERIORES PERMANENTES (22) DE UN MATERIAL FOTOENDURECIBLE, LA COMPOSICION DE LA QUE SE PUEDE TOMAR UNA IMAGEN FOTOGRAFICA UTILIZADA PARA FORMAR LA CAPA DURA PERMANENTE CONTIENE UN MONOMERO DE ACRILATO POLIMERIZABLE; UN OLIGOMERO FORMADO MEDIANTE LA REACCION DE UNA RESINA EPOXI CON UN ACIDO ACRILICO O METACRILICO; UN INICIADOR GENERADOR DE RADICAL LIBRE, FOTOSENSIBLE PARA LA POLIMERIZACION DEL MONOMERO ACRILICO Y DEL OLIGOMERO; UNA RESINA EPOXI CURABLE; Y OPCIONALMENTE UN AGENTE ENTRECRUZADOR QUE REACCIONA CON GRUPOS HIDROXILO. TRAS LA EXPOSICION Y REVELADO DE UNA CAPA DE LA COMPOSICION DE LA QUE SE PUEDE TOMAR UNA IMAGEN FOTOGRAFICA Y DEL GRABADO DE LA CAPA METALICA SUBYACENTE DE UN TABLERO, EL MATERIAL FOTOENDURECIBLE RESULTANTE SE DEJA SOBRE LAS TRAZAS DEL CIRCUITO (14). LAS CAPAS INTERIORES DE MATERIAL FOTOENDURECIBLE SE APILAN EN UNA PRENSA QUE LAS CONFORMA INICIALMENTE, BAJO CONDICIONES DE PRESION Y CALOR, PARA RELLENAR LOS HUECOS QUE QUEDAN ENTRE LAS CAPAS INTERIORES Y A CONTINUACION LAS CURA PARA QUE DUREN.
ES93301724T 1992-05-15 1993-03-08 Metodo para formar una placa de circuitos impresos de capas multiples y producto. Expired - Lifetime ES2118893T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88343692A 1992-05-15 1992-05-15

Publications (1)

Publication Number Publication Date
ES2118893T3 true ES2118893T3 (es) 1998-10-01

Family

ID=25382577

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93301724T Expired - Lifetime ES2118893T3 (es) 1992-05-15 1993-03-08 Metodo para formar una placa de circuitos impresos de capas multiples y producto.

Country Status (6)

Country Link
EP (1) EP0570094B1 (es)
JP (1) JPH0783186B2 (es)
CA (1) CA2090099C (es)
DE (1) DE69319277T2 (es)
ES (1) ES2118893T3 (es)
SG (1) SG63569A1 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5928839A (en) * 1992-05-15 1999-07-27 Morton International, Inc. Method of forming a multilayer printed circuit board and product thereof
US5779870A (en) * 1993-03-05 1998-07-14 Polyclad Laminates, Inc. Method of manufacturing laminates and printed circuit boards
TW290583B (es) * 1993-10-14 1996-11-11 Alpha Metals Ltd
DE4337988A1 (de) * 1993-11-06 1995-05-11 Hoellmueller Maschbau H Verfahren zur Herstellung von Multilayern sowie Vorrichtung zur Durchführung dieses Verfahrens
TW353858B (en) * 1994-07-07 1999-03-01 Morton Int Inc Method of forming a multilayer printed circuit board and product thereof
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US5670250A (en) * 1995-02-24 1997-09-23 Polyclad Laminates, Inc. Circuit board prepreg with reduced dielectric constant
US5545510A (en) * 1995-03-28 1996-08-13 Mac Dermid, Inc. Photodefinable dielectric composition useful in the manufacture of printed circuits
US6103134A (en) * 1998-12-31 2000-08-15 Motorola, Inc. Circuit board features with reduced parasitic capacitance and method therefor
US6632511B2 (en) 2001-11-09 2003-10-14 Polyclad Laminates, Inc. Manufacture of prepregs and laminates with relatively low dielectric constant for printed circuit boards
CN111148376A (zh) * 2019-12-24 2020-05-12 江门崇达电路技术有限公司 一种厚介质层pcb的压合方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59171948A (ja) * 1983-03-18 1984-09-28 Sony Corp 感光性樹脂組成物
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
JP2604174B2 (ja) * 1987-03-25 1997-04-30 東京応化工業株式会社 耐熱性感光性樹脂組成物
JPS647695A (en) * 1987-06-30 1989-01-11 Toshiba Corp Manufacture of multi-layer printed wiring board
JPH02266594A (ja) * 1989-04-06 1990-10-31 Toshiba Chem Corp 多層プリント配線板の製造方法

Also Published As

Publication number Publication date
EP0570094B1 (en) 1998-06-24
JPH0690084A (ja) 1994-03-29
DE69319277T2 (de) 1998-11-05
CA2090099C (en) 1997-01-14
CA2090099A1 (en) 1993-11-16
EP0570094A2 (en) 1993-11-18
JPH0783186B2 (ja) 1995-09-06
SG63569A1 (en) 2001-12-19
DE69319277D1 (de) 1998-07-30
EP0570094A3 (en) 1995-06-14
HK1007462A1 (en) 1999-04-09

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