TR201909175T4 - Püskürtme sistemi için uç blok ve çubuk mıknatıs. - Google Patents

Püskürtme sistemi için uç blok ve çubuk mıknatıs. Download PDF

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Publication number
TR201909175T4
TR201909175T4 TR2019/09175T TR201909175T TR201909175T4 TR 201909175 T4 TR201909175 T4 TR 201909175T4 TR 2019/09175 T TR2019/09175 T TR 2019/09175T TR 201909175 T TR201909175 T TR 201909175T TR 201909175 T4 TR201909175 T4 TR 201909175T4
Authority
TR
Turkey
Prior art keywords
bar magnet
end block
signal connector
spraying system
rotate
Prior art date
Application number
TR2019/09175T
Other languages
English (en)
Inventor
De Bosscher Wilmert
Van De Putte Ivan
Gobin Guy
Original Assignee
Soleras Advanced Coatings Bvba
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soleras Advanced Coatings Bvba filed Critical Soleras Advanced Coatings Bvba
Publication of TR201909175T4 publication Critical patent/TR201909175T4/tr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3461—Means for shaping the magnetic field, e.g. magnetic shunts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Mevcut buluş, püskürtme hedef borusunu (200) döner şekilde taşımak ve söz konusu püskürtme hedef borusunun içinde çubuk mıknatısı döner şekilde tutmak için bir uç blok (100) sağlamaktadır. Uç blok (100), bir çubuk mıknatıs tertibatını (150) almak için bir hazne içerir; burada söz konusu hazne, söz konusu mıknatıstan bir sinyal konektörünün bir ikinci kısmını (164) alacak şekilde düzenlenmiş bir sinyal konektörünün bir birinci kısmını (162) içerir ve çubuk mıknatıs tertibatını (150) ve uç blok (100) ile çubuk mıknatıs (220) arasında bir sinyal konektörünün oluşturulmasına izin verilir. Uç blok, çubuk mıknatıs ve uç blok arasında iletilen bir güç ve/veya veri sinyalinin bozulmasından, tahrip edilmesinden veya karışmasından korumak için çevresindeki soğutma sıvısından ve/veya çevresindeki yüksek enerji alanlarından dolayı sinyal konektörüne koruma araçları sağlamak üzere uyarlanmıştır. Mevcut buluş ayrıca karşılık gelen bir çubuk mıknatısı ve bir çubuk mıknatısın manyetik bir konfigürasyonunu silindirik püskürtme aparatına uyarlamak için bir yöntem sağlamaktadır.
TR2019/09175T 2012-02-13 2013-02-13 Püskürtme sistemi için uç blok ve çubuk mıknatıs. TR201909175T4 (tr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP12155246.7A EP2626887A1 (en) 2012-02-13 2012-02-13 Online adjustable magnet bar

Publications (1)

Publication Number Publication Date
TR201909175T4 true TR201909175T4 (tr) 2019-07-22

Family

ID=47720505

Family Applications (1)

Application Number Title Priority Date Filing Date
TR2019/09175T TR201909175T4 (tr) 2012-02-13 2013-02-13 Püskürtme sistemi için uç blok ve çubuk mıknatıs.

Country Status (10)

Country Link
US (1) US10163612B2 (tr)
EP (2) EP2626887A1 (tr)
JP (1) JP6367119B2 (tr)
KR (1) KR101955748B1 (tr)
CN (1) CN104137221B (tr)
ES (1) ES2732740T3 (tr)
HU (1) HUE044065T2 (tr)
PL (1) PL2815419T3 (tr)
TR (1) TR201909175T4 (tr)
WO (1) WO2013120920A1 (tr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9418823B2 (en) 2013-03-01 2016-08-16 Sputtering Components, Inc. Sputtering apparatus
US9312108B2 (en) 2013-03-01 2016-04-12 Sputtering Components, Inc. Sputtering apparatus
BE1021296B1 (nl) * 2014-04-18 2015-10-23 Soleras Advanced Coatings Bvba Sputter systeem voor uniform sputteren
CN106795621B (zh) * 2014-04-28 2020-05-22 零件喷涂公司 磁控管组件和旋转靶阴极组件
BE1022682B1 (nl) 2015-01-11 2016-07-14 Soleras Advanced Coatings Bvba Een deksel met een sensorsysteem voor een configureerbaar meetsysteem voor een configureerbaar sputtersysteem
BE1024754B9 (nl) * 2016-11-29 2018-07-24 Soleras Advanced Coatings Bvba Een universeel monteerbaar eindblok
JP2019164851A (ja) 2018-03-19 2019-09-26 株式会社東芝 ディスク装置
KR102535667B1 (ko) * 2018-08-08 2023-05-26 어플라이드 머티어리얼스, 인코포레이티드 스퍼터링 디바이스, 증착 장치, 및 스퍼터링 디바이스를 작동시키는 방법
BE1027175B1 (nl) * 2019-04-05 2020-11-03 Soleras Advanced Coatings Bv Magneetstaaf met aangehechte sensor
CN116057200B (zh) * 2020-09-16 2024-09-10 株式会社爱发科 旋转式阴极单元用驱动块
CN116057199B (zh) * 2020-10-08 2024-09-03 株式会社爱发科 旋转式阴极单元用的驱动块
US11908669B2 (en) 2021-01-08 2024-02-20 Arizona Thin Film Research, LLC Thermally controlled magnetic fields optimization system for sputter deposition processes
CN120210752B (zh) * 2025-05-09 2025-09-23 中科纳微真空科技(合肥)有限公司 一种磁控溅射镀膜设备、旋转阴极及在线可调磁棒
CN120138588A (zh) * 2025-05-15 2025-06-13 宏舜(浙江)真空科技有限公司 一种远程可控的旋转阴极磁组件

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4500408A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Apparatus for and method of controlling sputter coating
JPH0565634A (ja) * 1991-09-06 1993-03-19 Rohm Co Ltd スパツタ装置
DE4342766A1 (de) * 1993-12-15 1995-06-22 Andre Dipl Ing Linnenbruegger Magnetron-Zerstäuberquellenanordnung
US5445721A (en) * 1994-08-25 1995-08-29 The Boc Group, Inc. Rotatable magnetron including a replacement target structure
US5518592A (en) * 1994-08-25 1996-05-21 The Boc Group, Inc. Seal cartridge for a rotatable magnetron
DE10102493B4 (de) * 2001-01-19 2007-07-12 W.C. Heraeus Gmbh Rohrförmiges Target und Verfahren zur Herstellung eines solchen Targets
US6736948B2 (en) * 2002-01-18 2004-05-18 Von Ardenne Anlagentechnik Gmbh Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation
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US20060207871A1 (en) * 2005-03-16 2006-09-21 Gennady Yumshtyk Sputtering devices and methods
BRPI0911980A2 (pt) * 2008-05-16 2015-10-13 Bekaert Advanced Coatings pulverização catódica rotativa de magnetron com alta rigidez
DE102009033546B4 (de) * 2009-07-16 2014-07-17 Von Ardenne Anlagentechnik Gmbh Versorgungsendblock für ein rotierendes Magnetron
KR20130012017A (ko) * 2010-03-31 2013-01-30 무스탕 배큠 시스템즈 인코포레이티드 실린더형 회전 마크네트론 스퍼터링 음극 장치 및 무선 주파수 방사를 사용하여 재료를 증착하는 방법
JP5265811B2 (ja) * 2010-06-03 2013-08-14 株式会社アルバック スパッタ成膜装置

Also Published As

Publication number Publication date
JP6367119B2 (ja) 2018-08-01
US10163612B2 (en) 2018-12-25
CN104137221B (zh) 2017-04-26
ES2732740T3 (es) 2019-11-25
WO2013120920A1 (en) 2013-08-22
EP2626887A1 (en) 2013-08-14
JP2015510039A (ja) 2015-04-02
EP2815419A1 (en) 2014-12-24
EP2815419B1 (en) 2019-04-03
CN104137221A (zh) 2014-11-05
HUE044065T2 (hu) 2019-09-30
KR101955748B1 (ko) 2019-03-07
KR20140129039A (ko) 2014-11-06
US20160013034A1 (en) 2016-01-14
PL2815419T3 (pl) 2019-09-30

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